Shinji Nagashima

Person

Kikuchi-gun, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Hardening processing apparatus, hardening processing method, and co...
- Patent number 7,520,936
- Issue date Apr 21, 2009
- Tokyo Electron Limited
- Shinji Nagashima
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Method of coating film, coating unit, aging unit, solvent replaceme...
- Patent number 7,205,024
- Issue date Apr 17, 2007
- Tokyo Electron Limited
- Kazuhiro Takeshita
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Apparatus and method for forming coating film
- Patent number 6,982,002
- Issue date Jan 3, 2006
- Tokyo Electron Limited
- Takashi Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heat treatment method, heat treatment apparatus and treatment system
- Patent number 6,979,474
- Issue date Dec 27, 2005
- Tokyo Electron Limited
- Yuji Matsuyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method
- Patent number 6,827,973
- Issue date Dec 7, 2004
- Tokyo Electron Limited
- Shinji Nagashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas treatment apparatus
- Patent number 6,808,567
- Issue date Oct 26, 2004
- Tokyo Electron Limited
- Kazuhiro Takeshita
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Insulating film forming method and insulating film forming apparatus
- Patent number 6,786,974
- Issue date Sep 7, 2004
- Tokyo Electron Limited
- Takayuki Komiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 6,730,620
- Issue date May 4, 2004
- Tokyo Electron Limited
- Kei Miyazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of coating film, coating unit, aging unit, solvent replaceme...
- Patent number 6,726,775
- Issue date Apr 27, 2004
- Tokyo Electron Limited
- Kazuhiro Takeshita
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Apparatus for forming coating film and apparatus for curing the coa...
- Patent number 6,673,155
- Issue date Jan 6, 2004
- Tokyo Electron Limited
- Shinji Nagashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for heat processing of substrate
- Patent number 6,665,952
- Issue date Dec 23, 2003
- Tokyo Electron Limited
- Shinji Nagashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas treatment apparatus
- Patent number 6,660,096
- Issue date Dec 9, 2003
- Tokyo Electron Limited
- Kazuhiro Takeshita
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 6,605,550
- Issue date Aug 12, 2003
- Tokyo Electron Limited
- Shinji Nagashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heat treatment apparatus and method
- Patent number 6,590,186
- Issue date Jul 8, 2003
- Tokyo Electron Limited
- Takashi Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of coating film, coating unit, aging unit, solvent replaceme...
- Patent number 6,589,339
- Issue date Jul 8, 2003
- Tokyo Electron Limited
- Kazuhiro Takeshita
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Insulating film forming method and insulating film forming apparatus
- Patent number 6,573,191
- Issue date Jun 3, 2003
- Tokyo Electron Limited
- Takayuki Komiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for heat processing of substrate
- Patent number 6,564,474
- Issue date May 20, 2003
- Tokyo Electron Limited
- Shinji Nagashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heat treatment apparatus and method
- Patent number 6,501,191
- Issue date Dec 31, 2002
- Tokyo Electron Limited
- Takashi Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 6,419,751
- Issue date Jul 16, 2002
- Tokyo Electron Limited
- Shinji Nagashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 6,413,317
- Issue date Jul 2, 2002
- Tokyo Electron Limited
- Kei Miyazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for forming coating film
- Patent number 6,350,316
- Issue date Feb 26, 2002
- Tokyo Electron Limited
- Shinichi Hayashi
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Heat treatment method, heat treatment apparatus and treatment system
- Patent number 6,261,365
- Issue date Jul 17, 2001
- Tokyo Electron Limited
- Yuji Matsuyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spin coating apparatus including aging unit and solvent replacement...
- Patent number 6,248,168
- Issue date Jun 19, 2001
- Tokyo Electron Limited
- Kazuhiro Takeshita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming apparatus, substrate conveying apparatus, film forming...
- Patent number 6,197,385
- Issue date Mar 6, 2001
- Tokyo Electron Limited
- Kazuhiro Takeshita
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Gas treatment apparatus
- Patent number 6,190,459
- Issue date Feb 20, 2001
- Tokyo Electron Limited
- Kazuhiro Takeshita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing system
- Patent number 5,826,129
- Issue date Oct 20, 1998
- Tokyo Electron Limited
- Keizo Hasebe
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Method of coating film, coating unit, aging unit, solvent replaceme...
- Publication number 20060292298
- Publication date Dec 28, 2006
- TOKYO ELECTRON LIMITED
- Kazuhiro Takeshita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Hardening processing apparatus, hardening processing method, and co...
- Publication number 20040161548
- Publication date Aug 19, 2004
- TOKYO ELECTRON LIMITED
- Shinji Nagashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of coating film, coating unit, aging unit, solvent replaceme...
- Publication number 20040156996
- Publication date Aug 12, 2004
- TOKYO ELECTRON LIMITED
- Kazuhiro Takeshita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Gas treatment apparatus
- Publication number 20040045184
- Publication date Mar 11, 2004
- TOKYO ELECTRON LIMITED
- Kazuhiro Takeshita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR FORMING COATING FILM AND APPARATUS FOR CURING THE COA...
- Publication number 20030200918
- Publication date Oct 30, 2003
- SHINJI NAGASHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of coating film, coating unit, aging unit, solvent replaceme...
- Publication number 20030196595
- Publication date Oct 23, 2003
- TOKYO ELECTRON LIMITED
- Kazuhiro Takeshita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for heat processing of substrate
- Publication number 20030165787
- Publication date Sep 4, 2003
- TOKYO ELECTRON LIMITED
- Shinji Nagashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Insulating film forming method and insulating film forming apparatus
- Publication number 20030134500
- Publication date Jul 17, 2003
- Takayuki Komiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate processing method and substrate processing apparatus
- Publication number 20020139302
- Publication date Oct 3, 2002
- Shinji Nagashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Heat treatment apparatus and method
- Publication number 20020123236
- Publication date Sep 5, 2002
- TOKYO ELECTRON LIMITED
- Takashi Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate processing method and substrate processing apparatus
- Publication number 20020119678
- Publication date Aug 29, 2002
- Kei Miyazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and method for forming coating film
- Publication number 20020110641
- Publication date Aug 15, 2002
- TOKYO ELECTRON LIMITED
- Takashi Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Film treatment apparatus and method
- Publication number 20020100419
- Publication date Aug 1, 2002
- TOKYO ELECTRON LIMITED
- Shinji Nagashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Heat treatment apparatus and method
- Publication number 20020063119
- Publication date May 30, 2002
- TOKYO ELECTRON LIMITED
- Takashi Tanaka
- C30 - CRYSTAL GROWTH
Information Patent Application
Substrate processing method
- Publication number 20020045011
- Publication date Apr 18, 2002
- Shinji Nagashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for heat processing of substrate
- Publication number 20020031730
- Publication date Mar 14, 2002
- TOKYO ELECTRON LIMITED
- Shinji Nagashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Heat treatment method, heat treatment apparatus and treatment system
- Publication number 20010029890
- Publication date Oct 18, 2001
- TOKYO ELECTRON LIMITED
- Yuji Matsuyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of coating film, coating unit, aging unit, solvent replaceme...
- Publication number 20010017103
- Publication date Aug 30, 2001
- TOKYO ELECTRON LIMITED
- Kazuhiro Takeshita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Gas treatment apparatus
- Publication number 20010000198
- Publication date Apr 12, 2001
- TOKYO ELECTRON LIMITED
- Kazuhiro Takeshita
- H01 - BASIC ELECTRIC ELEMENTS

Shinji Nagashima

Person

Patents Grantslast 30 patents

Hardening processing apparatus, hardening processing method, and co...

Method of coating film, coating unit, aging unit, solvent replaceme...

Apparatus and method for forming coating film

Heat treatment method, heat treatment apparatus and treatment system

Substrate processing method

Gas treatment apparatus

Insulating film forming method and insulating film forming apparatus

Substrate processing method and substrate processing apparatus

Method of coating film, coating unit, aging unit, solvent replaceme...

Apparatus for forming coating film and apparatus for curing the coa...

Method for heat processing of substrate

Gas treatment apparatus

Substrate processing method and substrate processing apparatus

Heat treatment apparatus and method

Method of coating film, coating unit, aging unit, solvent replaceme...

Insulating film forming method and insulating film forming apparatus

Apparatus for heat processing of substrate

Heat treatment apparatus and method

Substrate processing method and substrate processing apparatus

Substrate processing method and substrate processing apparatus

Apparatus for forming coating film

Heat treatment method, heat treatment apparatus and treatment system

Spin coating apparatus including aging unit and solvent replacement...

Film forming apparatus, substrate conveying apparatus, film forming...

Gas treatment apparatus

Substrate processing system

Patents Applicationslast 30 patents

Method of coating film, coating unit, aging unit, solvent replaceme...

Hardening processing apparatus, hardening processing method, and co...

Method of coating film, coating unit, aging unit, solvent replaceme...

Gas treatment apparatus

APPARATUS FOR FORMING COATING FILM AND APPARATUS FOR CURING THE COA...

Method of coating film, coating unit, aging unit, solvent replaceme...

Method and apparatus for heat processing of substrate

Insulating film forming method and insulating film forming apparatus

Substrate processing method and substrate processing apparatus

Heat treatment apparatus and method

Substrate processing method and substrate processing apparatus

Apparatus and method for forming coating film

Film treatment apparatus and method

Heat treatment apparatus and method

Substrate processing method

Method and apparatus for heat processing of substrate

Heat treatment method, heat treatment apparatus and treatment system

Method of coating film, coating unit, aging unit, solvent replaceme...

Gas treatment apparatus