Sho Kumakura

Person

Kurokawa-gun, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 12,354,837
- Issue date Jul 8, 2025
- Tokyo Electron Limited
- Takahiro Yonezawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 12,308,241
- Issue date May 20, 2025
- Tokyo Electron Limited
- Masahiro Tabata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 12,125,710
- Issue date Oct 22, 2024
- Tokyo Electron Limited
- Sho Kumakura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method, substrate processing apparatus, and substrate proce...
- Patent number 12,112,954
- Issue date Oct 8, 2024
- Tokyo Electron Limited
- Maju Tomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method
- Patent number 12,100,578
- Issue date Sep 24, 2024
- Tokyo Electron Limited
- Sho Kumakura
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 12,071,687
- Issue date Aug 27, 2024
- Tokyo Electron Limited
- Michiko Nakaya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 11,961,746
- Issue date Apr 16, 2024
- Tokyo Electron Limited
- Sho Kumakura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 11,862,441
- Issue date Jan 2, 2024
- Tokyo Electron Limited
- Hironari Sasagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 11,728,166
- Issue date Aug 15, 2023
- Tokyo Electron Limited
- Sho Kumakura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for selectively etching first region made of silicon nitr...
- Patent number 11,637,025
- Issue date Apr 25, 2023
- Tokyo Electron Limited
- Masahiro Tabata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming method
- Patent number 11,574,806
- Issue date Feb 7, 2023
- Tokyo Electron Limited
- Sho Kumakura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for substrate processing
- Patent number 11,488,836
- Issue date Nov 1, 2022
- Tokyo Electron Limited
- Masahiro Tabata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 11,459,655
- Issue date Oct 4, 2022
- Tokyo Electron Limited
- Michiko Nakaya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 11,450,537
- Issue date Sep 20, 2022
- Tokyo Electron Limited
- Sho Kumakura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and etching apparatus
- Patent number 11,380,555
- Issue date Jul 5, 2022
- Tokyo Electron Limited
- Maju Tomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 11,239,090
- Issue date Feb 1, 2022
- Tokyo Electron Limited
- Masahiro Tabata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for etching target object
- Patent number 11,145,518
- Issue date Oct 12, 2021
- Tokyo Electron Limited
- Sho Kumakura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and etching apparatus
- Patent number 11,139,169
- Issue date Oct 5, 2021
- Tokyo Electron Limited
- Sho Kumakura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method
- Patent number 11,114,304
- Issue date Sep 7, 2021
- Tokyo Electron Limited
- Takayuki Katsunuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and etching apparatus
- Patent number 11,094,550
- Issue date Aug 17, 2021
- Tokyo Electron Limited
- Sho Kumakura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing method and plasma processing apparatus
- Patent number 10,916,420
- Issue date Feb 9, 2021
- Tokyo Electron Limited
- Masahiro Tabata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of processing substrate
- Patent number 10,777,425
- Issue date Sep 15, 2020
- Tokyo Electron Limited
- Masahiro Tabata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and plasma processing apparatus
- Patent number 10,755,944
- Issue date Aug 25, 2020
- Tokyo Electron Limited
- Masahiro Tabata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming method
- Patent number 10,672,605
- Issue date Jun 2, 2020
- Tokyo Electron Limited
- Sho Kumakura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of selectively etching first region made of silicon nitride...
- Patent number 10,600,660
- Issue date Mar 24, 2020
- Tokyo Electron Limited
- Masahiro Tabata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method
- Patent number 10,483,118
- Issue date Nov 19, 2019
- Tokyo Electron Limited
- Sho Kumakura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of selectively etching first region made of silicon nitride...
- Patent number 10,319,613
- Issue date Jun 11, 2019
- Tokyo Electron Limited
- Masahiro Tabata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method
- Patent number 10,269,578
- Issue date Apr 23, 2019
- Tokyo Electron Limited
- Sho Kumakura
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250236951
- Publication date Jul 24, 2025
- TOKYO ELECTRON LIMITED
- Yuta NAKANE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20250226222
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Sho KUMAKURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20250224683
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Sho KUMAKURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20250226223
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Sho KUMAKURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20250210328
- Publication date Jun 26, 2025
- TOKYO ELECTRON LIMITED
- Sho KUMAKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250174466
- Publication date May 29, 2025
- TOKYO ELECTRON LIMITED
- Sho KUMAKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20250164886
- Publication date May 22, 2025
- TOKYO ELECTRON LIMITED
- Sho KUMAKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY-DEVELOPING RESIST FILM FORMED OF METAL-CONTAINING RESIST
- Publication number 20250166976
- Publication date May 22, 2025
- TOKYO ELECTRON LIMITED
- Yuta NAKANE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL METHOD OF SUBSTRATE PROCESSING APPARATUS INCLUDING PARTIALL...
- Publication number 20250125130
- Publication date Apr 17, 2025
- TOKYO ELECTRON LIMITED
- Sho KUMAKURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250087454
- Publication date Mar 13, 2025
- TOKYO ELECTRON LIMITED
- Sho KUMAKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250087455
- Publication date Mar 13, 2025
- TOKYO ELECTRON LIMITED
- Sho KUMAKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250051915
- Publication date Feb 13, 2025
- TOKYO ELECTRON LIMITED
- Yuta NAKANE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR CLEANING CHAMBER OR COMPONENT, SUBSTRATE PROCESSING METH...
- Publication number 20240165677
- Publication date May 23, 2024
- TOKYO ELECTRON LIMITED
- Yuta NAKANE
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20240128092
- Publication date Apr 18, 2024
- TOKYO ELECTRON LIMITED
- Yuta NAKANE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20240120187
- Publication date Apr 11, 2024
- TOKYO ELECTRON LIMITED
- Hironari SASAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20240047223
- Publication date Feb 8, 2024
- TOKYO ELECTRON LIMITED
- Sho KUMAKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20230282447
- Publication date Sep 7, 2023
- TOKYO ELECTRON LIMITED
- Takahiro YONEZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR SUBSTRATE PROCESSING
- Publication number 20230010069
- Publication date Jan 12, 2023
- TOKYO ELECTRON LIMITED
- Masahiro Tabata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20220411928
- Publication date Dec 29, 2022
- TOKYO ELECTRO LIMITED
- Michiko NAKAYA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING METHOD, PLASMA PROCESSING APPARATUS, AND PLASMA P...
- Publication number 20220406609
- Publication date Dec 22, 2022
- TOKYO ELECTRON LIMITED
- Takahiro YONEZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20220399212
- Publication date Dec 15, 2022
- TOKYO ELECTRON LIMITED
- Sho KUMAKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20220384151
- Publication date Dec 1, 2022
- TOKYO ELECTRON LIMITED
- Yuta NAKANE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND ETCHING APPARATUS
- Publication number 20220301881
- Publication date Sep 22, 2022
- TOKYO ELECTRON LIMITED
- Maju TOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20220246440
- Publication date Aug 4, 2022
- TOKYO ELECTRON LIMITED
- Sho KUMAKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20220199371
- Publication date Jun 23, 2022
- TOKYO ELECTRON LIMITED
- Sho KUMAKURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20220115241
- Publication date Apr 14, 2022
- TOKYO ELECTRON LIMITED
- Masahiro TABATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR ETCHING TARGET OBJECT
- Publication number 20220005700
- Publication date Jan 6, 2022
- TOKYO ELECTRON LIMITED
- Sho Kumakura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20210375602
- Publication date Dec 2, 2021
- TOKYO ELECTRON LIMITED
- Hironari SASAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCE...
- Publication number 20210233778
- Publication date Jul 29, 2021
- TOKYO ELECTRON LIMITED
- Maju TOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND ETCHING APPARATUS
- Publication number 20210159084
- Publication date May 27, 2021
- TOKYO ELECTRON LIMITED
- Maju TOMURA
- H01 - BASIC ELECTRIC ELEMENTS

Sho Kumakura

Person

Patents Grantslast 30 patents

Plasma processing method and plasma processing apparatus

Plasma processing method and plasma processing apparatus

Substrate processing method and substrate processing apparatus

Etching method, substrate processing apparatus, and substrate proce...

Substrate processing method

Plasma processing method and plasma processing apparatus

Substrate processing method and substrate processing apparatus

Plasma processing method and plasma processing apparatus

Substrate processing method and substrate processing apparatus

Apparatus for selectively etching first region made of silicon nitr...

Film forming method

Apparatus for substrate processing

Plasma processing method and plasma processing apparatus

Substrate processing method and substrate processing apparatus

Etching method and etching apparatus

Plasma processing method and plasma processing apparatus

Method and apparatus for etching target object

Etching method and etching apparatus

Substrate processing method

Etching method and etching apparatus

Processing method and plasma processing apparatus

Method of processing substrate

Etching method and plasma processing apparatus

Film forming method

Method of selectively etching first region made of silicon nitride...

Etching method

Method of selectively etching first region made of silicon nitride...

Etching method

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM

DRY-DEVELOPING RESIST FILM FORMED OF METAL-CONTAINING RESIST

CONTROL METHOD OF SUBSTRATE PROCESSING APPARATUS INCLUDING PARTIALL...

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

METHOD FOR CLEANING CHAMBER OR COMPONENT, SUBSTRATE PROCESSING METH...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

APPARATUS FOR SUBSTRATE PROCESSING

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD, PLASMA PROCESSING APPARATUS, AND PLASMA P...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

ETCHING METHOD AND ETCHING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

METHOD AND APPARATUS FOR ETCHING TARGET OBJECT

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

ETCHING METHOD, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCE...

ETCHING METHOD AND ETCHING APPARATUS