Shuji Nakao

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Pattern forming method, semiconductor device manufacturing method a...
- Patent number 8,017,305
- Issue date Sep 13, 2011
- Renesas Electronics Corporation
- Takeo Ishibashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, electronic device manufacturing method and...
- Patent number 7,824,843
- Issue date Nov 2, 2010
- Renesas Electronics Corporation
- Shuji Nakao
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Pattern forming method, semiconductor device manufacturing method a...
- Patent number 7,670,756
- Issue date Mar 2, 2010
- Renesas Technology Corp.
- Takeo Ishibashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, semiconductor device manufacturing method a...
- Patent number 7,459,265
- Issue date Dec 2, 2008
- Renesas Technology Corp.
- Takeo Ishibashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask, method for forming pattern using phase shift mask...
- Patent number 6,994,940
- Issue date Feb 7, 2006
- Renesas Technology Corp.
- Shuji Nakao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of focus monitoring and manufacturing method for an electron...
- Patent number 6,890,692
- Issue date May 10, 2005
- Renesas Technology Corp.
- Shuji Nakao
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Pattern forming method and method of fabricating device
- Patent number 6,828,080
- Issue date Dec 7, 2004
- Renesas Technology Corp.
- Shuji Nakao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Focus monitoring method, focus monitoring system, and device fabric...
- Patent number 6,811,939
- Issue date Nov 2, 2004
- Renesas Technology Corp.
- Shuji Nakao
- G02 - OPTICS
Information Patent Grant
Focus monitoring method, focus monitoring apparatus, and method of...
- Patent number 6,797,443
- Issue date Sep 28, 2004
- Renesas Technology Corp.
- Shuji Nakao
- G02 - OPTICS
Information Patent Grant
Photomask for focus monitoring
- Patent number 6,764,794
- Issue date Jul 20, 2004
- Renesas Technology Corp.
- Shuji Nakao
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Photomask for aberration measurement, aberration measurement method...
- Patent number 6,743,554
- Issue date Jun 1, 2004
- Renesas Technology Corp.
- Shuji Nakao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for formation of semiconductor device pattern, method for de...
- Patent number 6,709,792
- Issue date Mar 23, 2004
- Renesas Technology Corp.
- Shuji Nakao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for formation of semiconductor device pattern, method for de...
- Patent number 6,706,453
- Issue date Mar 16, 2004
- Renesas Technology Corp.
- Shuji Nakao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for formation of semiconductor device pattern, method for de...
- Patent number 6,605,411
- Issue date Aug 12, 2003
- Mitsubishi Denki Kabushiki Kaisha
- Shuji Nakao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterned figure resolution verification method and semiconductor p...
- Patent number 6,449,386
- Issue date Sep 10, 2002
- Mitsubishi Denki Kabushiki Kaisha
- Shuji Nakao
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Aligner having shared rotation shaft
- Patent number 6,426,789
- Issue date Jul 30, 2002
- Mitsubishi Denki Kabushiki Kaisha
- Shuji Nakao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection aligner and exposure method using the same
- Patent number 6,388,731
- Issue date May 14, 2002
- Mitsubishi Denki Kabushiki Kaisha
- Shuji Nakao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fine patterning utilizing an exposure method in photolithography
- Patent number 6,329,306
- Issue date Dec 11, 2001
- Mitsubishi Denki Kabushiki Kaisha
- Shuji Nakao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection aligner and exposure method using the same
- Patent number 6,243,159
- Issue date Jun 5, 2001
- Mitsubishi Denki Kabushiki Kaisha
- Shuji Nakao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of surface processing
- Patent number 6,171,662
- Issue date Jan 9, 2001
- Mitsubishi Denki Kabushiki Kaisha
- Shuji Nakao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process for fabricating a semiconductor integrated circuit utilizin...
- Patent number 6,162,736
- Issue date Dec 19, 2000
- Mitsubishi Denki Kabushiki Kaisha
- Shuji Nakao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Aligner and patterning method using phase shift mask
- Patent number 6,134,008
- Issue date Oct 17, 2000
- Mitsubishi Denki Kabushiki Kaisha
- Shuji Nakao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for manufacturing photomask and method of manu...
- Patent number 6,042,977
- Issue date Mar 28, 2000
- Mitsubishi Denki Kabushiki Kaisha
- Shuji Nakao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask and its manufacturing method and semiconductor dev...
- Patent number 5,994,001
- Issue date Nov 30, 1999
- Mitsubishi Denki Kabushiki Kaisha
- Shuji Nakao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Ionized PVD device and method of manufacturing semiconductor device
- Patent number 5,964,989
- Issue date Oct 12, 1999
- Mitsubishi Denki Kabushiki Kaisha
- Shuji Nakao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for manufacturing photomask and method of manu...
- Patent number 5,962,172
- Issue date Oct 5, 1999
- Mitsubishi Denki Kabushiki Kaisha
- Shuji Nakao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method using phase shift mask
- Patent number 5,958,656
- Issue date Sep 28, 1999
- Mitsubishi Denki Kabushiki Kaisha
- Shuji Nakao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask, blank for phase shift mask, and method of manufac...
- Patent number 5,902,702
- Issue date May 11, 1999
- Mitsubishi Denki Kabushiki Kaisha
- Shuji Nakao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask, method of manufacturing phase shift mask and meth...
- Patent number 5,882,827
- Issue date Mar 16, 1999
- Mitsubishi Denki Kabushiki Kaisha
- Shuji Nakao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Surface processing device
- Patent number 5,868,849
- Issue date Feb 9, 1999
- Mitsubishi Denki Kabushiki Kaisha
- Shuji Nakao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
PATTERN FORMING METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD AND...
- Publication number 20110033656
- Publication date Feb 10, 2011
- RENESAS ELECTRONICS CORPORATION
- Shuji NAKAO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD A...
- Publication number 20100104983
- Publication date Apr 29, 2010
- Renesas Technology Corp.
- Takeo Ishibashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD A...
- Publication number 20090075187
- Publication date Mar 19, 2009
- Renesas Technology Corp.
- Takeo Ishibashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pattern forming method, electronic device manufacturing method and...
- Publication number 20080182082
- Publication date Jul 31, 2008
- RENESAS TECHNOLOGY CORP.
- Shuji Nakao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask, method of generating mask pattern, and method of manufac...
- Publication number 20060183030
- Publication date Aug 17, 2006
- Renesas Technology Corp.
- Shuji Nakao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pattern forming method, semiconductor device manufacturing method a...
- Publication number 20060088792
- Publication date Apr 27, 2006
- Renesas Technology Corp.
- Takeo Ishibashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask, photomask manufacturing method and semiconductor device...
- Publication number 20050069788
- Publication date Mar 31, 2005
- RENESAS TECHNOLOGY CORP.
- Toshihiko Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK FOR FOCUS MONITORING, METHOD OF FOCUS MONITORING, UNIT FO...
- Publication number 20040219441
- Publication date Nov 4, 2004
- Renesas Technology Corp.
- Shuji Nakao
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Photomask for aberration measurement, aberration measurement method...
- Publication number 20040214095
- Publication date Oct 28, 2004
- Renesas Technology Corp.
- Shuji Nakao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Phase shift mask, method for forming pattern using phase shift mask...
- Publication number 20040161677
- Publication date Aug 19, 2004
- RENESAS TECHNOLOGY CORP.
- Shuji Nakao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Manufacturing method for semiconductor device
- Publication number 20030203618
- Publication date Oct 30, 2003
- Mitsubishi Denki Kabushiki Kaisha
- Ayumi Minamide
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Photomask for aberration measurement, aberration measurement method...
- Publication number 20030095247
- Publication date May 22, 2003
- Mitsubishi Denki Kabushiki Kaisha
- Shuji Nakao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pattern forming method and method of fabricating device
- Publication number 20030091940
- Publication date May 15, 2003
- Mitsubishi Denki Kabushiki Kaisha
- Shuji Nakao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask for focus monitoring, method of focus monitoring, unit fo...
- Publication number 20030073009
- Publication date Apr 17, 2003
- Mitsubishi Denki Kabushiki Kaisha
- Shuji Nakao
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Focus monitoring method, focus monitoring system, and device fabric...
- Publication number 20030031943
- Publication date Feb 13, 2003
- Mitsubishi Denki Kabushiki Kaishi
- Shuji Nakao
- G02 - OPTICS
Information Patent Application
Focus monitoring method, focus monitoring apparatus, and method of...
- Publication number 20020195539
- Publication date Dec 26, 2002
- Mitsubishi Denki Kabushiki Kaisha
- Shuji Nakao
- G02 - OPTICS
Information Patent Application
Aligner having shared rotation shaft
- Publication number 20020159043
- Publication date Oct 31, 2002
- Mitsubishi Denki Kabushiki Kaisha
- Shuji Nakao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for formation of semiconductor device pattern, method for de...
- Publication number 20020155395
- Publication date Oct 24, 2002
- Mitsubishi Denki Kabushiki Kaisha
- Shuji Nakao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for formation of semiconductor device pattern, method for de...
- Publication number 20020150844
- Publication date Oct 17, 2002
- Mitsubishi Denki Kabushiki Kaisha
- Shuji Nakao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ALIGNER HAVING SHARED ROTATION SHAFT
- Publication number 20020072194
- Publication date Jun 13, 2002
- Mitsubishi Denki Kabushiki Kaisha
- Shuji Nakao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for formation of semiconductor device pattern, method for de...
- Publication number 20020028391
- Publication date Mar 7, 2002
- Mitsubishi Denki Kabushiki Kaisha
- Shuji Nakao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Semiconductor device and manufacturing method thereof
- Publication number 20020022353
- Publication date Feb 21, 2002
- Mitsubishi Denki Kabushiki Kaisha
- Shuji Nakao
- H01 - BASIC ELECTRIC ELEMENTS

Shuji Nakao

Person

Patents Grantslast 30 patents

Pattern forming method, semiconductor device manufacturing method a...

Pattern forming method, electronic device manufacturing method and...

Pattern forming method, semiconductor device manufacturing method a...

Pattern forming method, semiconductor device manufacturing method a...

Phase shift mask, method for forming pattern using phase shift mask...

Method of focus monitoring and manufacturing method for an electron...

Pattern forming method and method of fabricating device

Focus monitoring method, focus monitoring system, and device fabric...

Focus monitoring method, focus monitoring apparatus, and method of...

Photomask for focus monitoring

Photomask for aberration measurement, aberration measurement method...

Method for formation of semiconductor device pattern, method for de...

Method for formation of semiconductor device pattern, method for de...

Method for formation of semiconductor device pattern, method for de...

Patterned figure resolution verification method and semiconductor p...

Aligner having shared rotation shaft

Projection aligner and exposure method using the same

Fine patterning utilizing an exposure method in photolithography

Projection aligner and exposure method using the same

Method of surface processing

Process for fabricating a semiconductor integrated circuit utilizin...

Aligner and patterning method using phase shift mask

Method and apparatus for manufacturing photomask and method of manu...

Phase shift mask and its manufacturing method and semiconductor dev...

Ionized PVD device and method of manufacturing semiconductor device

Method and apparatus for manufacturing photomask and method of manu...

Pattern forming method using phase shift mask

Phase shift mask, blank for phase shift mask, and method of manufac...

Phase shift mask, method of manufacturing phase shift mask and meth...

Surface processing device

Patents Applicationslast 30 patents

PATTERN FORMING METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD AND...

PATTERN FORMING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD A...

PATTERN FORMING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD A...

Pattern forming method, electronic device manufacturing method and...

Photomask, method of generating mask pattern, and method of manufac...

Pattern forming method, semiconductor device manufacturing method a...

Photomask, photomask manufacturing method and semiconductor device...

PHOTOMASK FOR FOCUS MONITORING, METHOD OF FOCUS MONITORING, UNIT FO...

Photomask for aberration measurement, aberration measurement method...

Phase shift mask, method for forming pattern using phase shift mask...

Manufacturing method for semiconductor device

Photomask for aberration measurement, aberration measurement method...

Pattern forming method and method of fabricating device

Photomask for focus monitoring, method of focus monitoring, unit fo...

Focus monitoring method, focus monitoring system, and device fabric...

Focus monitoring method, focus monitoring apparatus, and method of...

Aligner having shared rotation shaft

Method for formation of semiconductor device pattern, method for de...

Method for formation of semiconductor device pattern, method for de...

ALIGNER HAVING SHARED ROTATION SHAFT

Method for formation of semiconductor device pattern, method for de...

Semiconductor device and manufacturing method thereof