Shuji Nomura

Person

Tachikawa, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Double-layer shutter sputtering apparatus
- Patent number 8,900,426
- Issue date Dec 2, 2014
- Canon Anelva Corporation
- Shuji Nomura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Double-layer shutter control method of multi-sputtering system
- Patent number 7,850,827
- Issue date Dec 14, 2010
- Canon Anelva Corporation
- Shuji Nomura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Silicon nitride film forming method
- Patent number 7,704,556
- Issue date Apr 27, 2010
- Canon Anelva Corporation
- Hitoshi Morisaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for depositing a thin film, and semiconductor...
- Patent number 6,723,664
- Issue date Apr 20, 2004
- NEC Compound Semiconductor Devices, Ltd.
- Hideki Matsumura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnetic multi-layer film manufacturing apparatus
- Patent number 6,641,703
- Issue date Nov 4, 2003
- Anelva Corporation
- Shuji Nomura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for depositing a thin film, and semiconductor...
- Patent number 6,349,669
- Issue date Feb 26, 2002
- NEC Corporation
- Hideki Matsumura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for depositing a thin film
- Patent number 6,069,094
- Issue date May 30, 2000
- Hideki Matsumra
- Hideki Matsumura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
DOUBLE-LAYER SHUTTER SPUTTERING APPARATUS
- Publication number 20120097533
- Publication date Apr 26, 2012
- Canon ANELVA Corporation
- Shuji NOMURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DOUBLE-LAYER SHUTTER CONTROL METHOD OF MULTI-SPUTTERING SYSTEM
- Publication number 20090139865
- Publication date Jun 4, 2009
- Canon ANELVA Corporation
- Shuji Nomura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Silicon Nitride Film Forming Method
- Publication number 20080020140
- Publication date Jan 24, 2008
- Hitoshi Morisaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Double-layer shutter control method of multi-sputtering system
- Publication number 20050199490
- Publication date Sep 15, 2005
- ANELVA CORPORATION
- Shuji Nomura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Silicon nitride film forming apparatus and film forming method
- Publication number 20030198743
- Publication date Oct 23, 2003
- Hitoshi Morisaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and apparatus for depositing a thin film, and semiconductor...
- Publication number 20020086557
- Publication date Jul 4, 2002
- Hideki Matsumura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Magnetic multi-layer film manufacturing apparatus
- Publication number 20020064595
- Publication date May 30, 2002
- Shuji Nomura
- B82 - NANO-TECHNOLOGY

Shuji Nomura

Person

Patents Grantslast 30 patents

Double-layer shutter sputtering apparatus

Double-layer shutter control method of multi-sputtering system

Silicon nitride film forming method

Method and apparatus for depositing a thin film, and semiconductor...

Magnetic multi-layer film manufacturing apparatus

Method and apparatus for depositing a thin film, and semiconductor...

Method for depositing a thin film

Patents Applicationslast 30 patents

DOUBLE-LAYER SHUTTER SPUTTERING APPARATUS

DOUBLE-LAYER SHUTTER CONTROL METHOD OF MULTI-SPUTTERING SYSTEM

Silicon Nitride Film Forming Method

Double-layer shutter control method of multi-sputtering system

Silicon nitride film forming apparatus and film forming method

Method and apparatus for depositing a thin film, and semiconductor...

Magnetic multi-layer film manufacturing apparatus