Shun Jackson Wu

Person

Cupertino, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Methodology for cleaning of surface metal contamination from electr...
- Patent number 7,578,889
- Issue date Aug 25, 2009
- Lam Research Corporation
- Hong Shih
- B08 - CLEANING
Information Patent Grant
Semiconductor processing apparatus including plasma-resistant, weld...
- Patent number 7,055,732
- Issue date Jun 6, 2006
- Applied Materials, Inc.
- Senh Thach
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Halogen-resistant, anodized aluminum for use in semiconductor proce...
- Patent number 7,048,814
- Issue date May 23, 2006
- Applied Materials, Inc.
- Yixing Lin
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Halogen-resistant, anodized aluminum for use in semiconductor proce...
- Patent number 7,033,447
- Issue date Apr 25, 2006
- Applied Materials, Inc.
- Yixing Lin
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Yttrium oxide based surface coating for semiconductor IC processing...
- Patent number 6,776,873
- Issue date Aug 17, 2004
- Jennifer Y Sun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Clean aluminum alloy for semiconductor processing equipment
- Patent number 6,713,188
- Issue date Mar 30, 2004
- Applied Materials, Inc.
- Shun Wu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma-resistant, welded aluminum structures for use in semiconduct...
- Patent number 6,659,331
- Issue date Dec 9, 2003
- Applied Materials, Inc.
- Senh Thach
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Clean aluminum alloy for semiconductor processing equipment
- Patent number 6,565,984
- Issue date May 20, 2003
- Applied Materials Inc.
- Shun Wu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Robot blade for handling of semiconductor substrates
- Patent number 6,199,927
- Issue date Mar 13, 2001
- Applied Materials, Inc.
- Behzad Shamlou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck and method for fabricating the same
- Patent number 6,175,485
- Issue date Jan 16, 2001
- Applied Materials, Inc.
- Padmanabhan Krishnaraj
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Robot blade for handling of semiconductor substrate
- Patent number 6,024,393
- Issue date Feb 15, 2000
- Applied Materials, Inc.
- Behzad Shamlou
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
REMOVING RESIDUES FROM SUBSTRATE PROCESSING COMPONENTS
- Publication number 20140076354
- Publication date Mar 20, 2014
- QUANTUM GLOBAL TECHNOLOGIES LLC
- Brian T. West
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Removing Residues from Substrate Processing Components
- Publication number 20120107520
- Publication date May 3, 2012
- Brian T. West
- B08 - CLEANING
Information Patent Application
Methodology for cleaning of surface metal contamination from electr...
- Publication number 20080236620
- Publication date Oct 2, 2008
- LAM RESEARCH CORPORATION
- Hong Shih
- B08 - CLEANING
Information Patent Application
Method of coating semiconductor processing apparatus with protectiv...
- Publication number 20080213496
- Publication date Sep 4, 2008
- APPLIED MATERIALS, INC.
- Jennifer Y. Sun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REMOVING RESIDUES FROM SUBSTRATE PROCESSING COMPONENTS
- Publication number 20080092806
- Publication date Apr 24, 2008
- APPLIED MATERIALS, INC.
- Brian T. West
- B08 - CLEANING
Information Patent Application
Semiconductor processing apparatus including plasma-resistant, weld...
- Publication number 20040041004
- Publication date Mar 4, 2004
- Applied Materials, Inc.
- Senh Thach
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
CLEAN ALUMINUM ALLOY FOR SEMICONDUCTOR PROCESSING EQUIPMENT
- Publication number 20030224188
- Publication date Dec 4, 2003
- Shun Wu
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Halogen-resistant, anodized aluminium for use in semiconductor proc...
- Publication number 20030205479
- Publication date Nov 6, 2003
- Yixing Lin
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Plasma-resistant, welded aluminum structures for use in semiconduct...
- Publication number 20030160085
- Publication date Aug 28, 2003
- APPLIED MATERIALS, INC.
- Senh Thach
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
Halogen-resistant, anodized aluminum for use in semiconductor proce...
- Publication number 20030150530
- Publication date Aug 14, 2003
- APPLIED MATERIALS, INC.
- Yixing Lin
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR

Shun Jackson Wu

Person

Patents Grantslast 30 patents

Methodology for cleaning of surface metal contamination from electr...

Semiconductor processing apparatus including plasma-resistant, weld...

Halogen-resistant, anodized aluminum for use in semiconductor proce...

Halogen-resistant, anodized aluminum for use in semiconductor proce...

Yttrium oxide based surface coating for semiconductor IC processing...

Clean aluminum alloy for semiconductor processing equipment

Plasma-resistant, welded aluminum structures for use in semiconduct...

Clean aluminum alloy for semiconductor processing equipment

Robot blade for handling of semiconductor substrates

Electrostatic chuck and method for fabricating the same

Robot blade for handling of semiconductor substrate

Patents Applicationslast 30 patents

REMOVING RESIDUES FROM SUBSTRATE PROCESSING COMPONENTS

Removing Residues from Substrate Processing Components

Methodology for cleaning of surface metal contamination from electr...

Method of coating semiconductor processing apparatus with protectiv...

REMOVING RESIDUES FROM SUBSTRATE PROCESSING COMPONENTS

Semiconductor processing apparatus including plasma-resistant, weld...

CLEAN ALUMINUM ALLOY FOR SEMICONDUCTOR PROCESSING EQUIPMENT

Halogen-resistant, anodized aluminium for use in semiconductor proc...

Plasma-resistant, welded aluminum structures for use in semiconduct...

Halogen-resistant, anodized aluminum for use in semiconductor proce...