Shunko Magoshi

Person

Kanagawa, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor device fabrication method and pattern formation mold
- Patent number 8,282,868
- Issue date Oct 9, 2012
- Kabushiki Kaisha Toshiba
- Ikuo Yoneda
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for forming pattern and method for manufacturing semiconduct...
- Patent number 8,206,895
- Issue date Jun 26, 2012
- Kabushiki Kaisha Toshiba
- Ikuo Yoneda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electron beam drawing apparatus, deflection amplifier, deflection c...
- Patent number 7,985,958
- Issue date Jul 26, 2011
- Kabushiki Kaisha Toshiba
- Tetsuro Nakasugi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Semiconductor device fabrication method and pattern formation mold
- Patent number 7,854,604
- Issue date Dec 21, 2010
- Kabushiki Kaisha Toshiba
- Ikuo Yoneda
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged beam exposure apparatus and method for manufacturing mask a...
- Patent number 7,368,736
- Issue date May 6, 2008
- Kabushiki Kaisha Toshiba
- Shunko Magoshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam exposure method and method for producing char...
- Patent number 7,102,147
- Issue date Sep 5, 2006
- Kabushiki Kaisha Toshiba
- Ryoichi Inanami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for producing semiconductor devices
- Patent number 7,079,994
- Issue date Jul 18, 2006
- Kabushiki Kaisha Toshiba
- Ryoichi Inanami
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for correcting a proximity effect, an exposure method, a man...
- Patent number 6,835,942
- Issue date Dec 28, 2004
- Kabushiki Kaisha Toshiba
- Shunko Magoshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam exposure system using aperture mask in semico...
- Patent number 6,718,532
- Issue date Apr 6, 2004
- Kabushiki Kaisha Toshiba
- Ryoichi Inanami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for and method of preparing pattern data of electronic part
- Patent number 6,675,368
- Issue date Jan 6, 2004
- Kabushiki Kaisha Toshiba
- Mariko Takayanagi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Circuit pattern design method, circuit pattern design system, and r...
- Patent number 6,560,768
- Issue date May 6, 2003
- Kabushiki Kaisha Toshiba
- Ryoichi Inanami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of extracting characters and computer-readable recording medium
- Patent number 6,543,044
- Issue date Apr 1, 2003
- Kabushiki Kaisha Toshiba
- Ryoichi Inanami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged beam drawing apparatus
- Patent number 6,495,841
- Issue date Dec 17, 2002
- Kabushiki Kaisha Toshiba
- Atsushi Ando
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Circuit pattern design method, exposure method, charged-particle be...
- Patent number 6,481,004
- Issue date Nov 12, 2002
- Kabushiki Kaisha Toshiba
- Ryoichi Inanami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern forming method
- Patent number 6,316,163
- Issue date Nov 13, 2001
- Kabushiki Kaisha Toshiba
- Shunko Magoshi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam image picturing method and image picturing device
- Patent number 6,204,511
- Issue date Mar 20, 2001
- Kabushiki Kaisha Toshiba
- Masamitsu Itoh
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Pattern-forming method and lithographic system
- Patent number 6,093,931
- Issue date Jul 25, 2000
- Kabushiki Kaisha Toshiba
- Kazuyoshi Sugihara
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Pattern forming method through combined electron beam and light exp...
- Patent number 6,020,107
- Issue date Feb 1, 2000
- Kabushiki Kaisha Toshiba
- Hiromi Niiyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern-forming method and lithographic system
- Patent number 5,994,030
- Issue date Nov 30, 1999
- Kabushiki Kaisha Toshiba
- Kazuyoshi Sugihara
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
Semiconductor device fabrication method and pattern formation mold
- Publication number 20110065254
- Publication date Mar 17, 2011
- Kabushiki Kaisha Toshiba
- Ikuo Yoneda
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD FOR FORMING PATTERN AND METHOD FOR MANUFACTURING SEMICONDUCT...
- Publication number 20100021848
- Publication date Jan 28, 2010
- Ikuo Yoneda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY EVALUATING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING M...
- Publication number 20080293169
- Publication date Nov 27, 2008
- KABUSHI KAISHA TOSHIBA
- Kazuo TAWARAYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR DEVICE FABRICATION METHOD AND PATTERN FORMATION MOLD
- Publication number 20080214010
- Publication date Sep 4, 2008
- Ikuo YONEDA
- B82 - NANO-TECHNOLOGY
Information Patent Application
Charged beam exposure apparatus, charged beam exposure method, meth...
- Publication number 20060214116
- Publication date Sep 28, 2006
- Shunko Magoshi
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electron beam drawing apparatus, deflection amplifier, deflection c...
- Publication number 20060151721
- Publication date Jul 13, 2006
- Tetsuro Nakasugi
- B82 - NANO-TECHNOLOGY
Information Patent Application
Lithography evaluating method, semiconductor device manufacturing m...
- Publication number 20050167661
- Publication date Aug 4, 2005
- Kazuo Tawarayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for correcting a proximity effect, an exposure method, a man...
- Publication number 20040075064
- Publication date Apr 22, 2004
- Shunko Magoshi
- B82 - NANO-TECHNOLOGY
Information Patent Application
Charged particle beam exposure method and method for producing char...
- Publication number 20030160192
- Publication date Aug 28, 2003
- Kabushiki Kaisha Toshiba
- Ryoichi Inanami
- B82 - NANO-TECHNOLOGY
Information Patent Application
Charged particle beam exposure system using aperture mask in semico...
- Publication number 20020162088
- Publication date Oct 31, 2002
- Kabushiki Kaisha Toshiba
- Ryoichi Inanami
- B82 - NANO-TECHNOLOGY
Information Patent Application
Apparatus for and method of preparing pattern data of electronic part
- Publication number 20020042906
- Publication date Apr 11, 2002
- Mariko Takayanagi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and system for producing semiconductor devices
- Publication number 20020013930
- Publication date Jan 31, 2002
- Ryoichi Inanami
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Circuit pattern design method, circuit pattern design system, and r...
- Publication number 20020010905
- Publication date Jan 24, 2002
- Kabushiki Kaisha Toshiba
- Ryoichi Inanami
- B82 - NANO-TECHNOLOGY
Information Patent Application
Circuit pattern design method,exposure method, charged-particle bea...
- Publication number 20020010906
- Publication date Jan 24, 2002
- Kabushiki Kaisha Toshiba
- Ryoichi Inanami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of extracting characters and computer-readable recording medium
- Publication number 20010037487
- Publication date Nov 1, 2001
- Kabushiki Kaisha Toshiba
- Ryoichi Inanami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Exposure pattern data generation apparatus associated with standard...
- Publication number 20010028991
- Publication date Oct 11, 2001
- Kabushiki Kaisha Toshiba
- Ryoichi Inanami
- B82 - NANO-TECHNOLOGY

Shunko Magoshi

Person

Patents Grantslast 30 patents

Semiconductor device fabrication method and pattern formation mold

Method for forming pattern and method for manufacturing semiconduct...

Electron beam drawing apparatus, deflection amplifier, deflection c...

Semiconductor device fabrication method and pattern formation mold

Charged beam exposure apparatus and method for manufacturing mask a...

Charged particle beam exposure method and method for producing char...

Method and system for producing semiconductor devices

Method for correcting a proximity effect, an exposure method, a man...

Charged particle beam exposure system using aperture mask in semico...

Apparatus for and method of preparing pattern data of electronic part

Circuit pattern design method, circuit pattern design system, and r...

Method of extracting characters and computer-readable recording medium

Charged beam drawing apparatus

Circuit pattern design method, exposure method, charged-particle be...

Pattern forming method

Electron beam image picturing method and image picturing device

Pattern-forming method and lithographic system

Pattern forming method through combined electron beam and light exp...

Pattern-forming method and lithographic system

Patents Applicationslast 30 patents

Semiconductor device fabrication method and pattern formation mold

METHOD FOR FORMING PATTERN AND METHOD FOR MANUFACTURING SEMICONDUCT...

LITHOGRAPHY EVALUATING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING M...

SEMICONDUCTOR DEVICE FABRICATION METHOD AND PATTERN FORMATION MOLD

Charged beam exposure apparatus, charged beam exposure method, meth...

Electron beam drawing apparatus, deflection amplifier, deflection c...

Lithography evaluating method, semiconductor device manufacturing m...

Method for correcting a proximity effect, an exposure method, a man...

Charged particle beam exposure method and method for producing char...

Charged particle beam exposure system using aperture mask in semico...

Apparatus for and method of preparing pattern data of electronic part

Method and system for producing semiconductor devices

Circuit pattern design method, circuit pattern design system, and r...

Circuit pattern design method,exposure method, charged-particle bea...

Method of extracting characters and computer-readable recording medium

Exposure pattern data generation apparatus associated with standard...