Shuo-Chun CHOU

Person

Hsinchu City, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Optical proximity correction and photomasks
- Patent number 11,789,370
- Issue date Oct 17, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Dong-Yo Jheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing a semiconductor device and apparatus for ma...
- Patent number 11,709,435
- Issue date Jul 25, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shinn-Sheng Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing a semiconductor device and apparatus for ma...
- Patent number 11,320,747
- Issue date May 3, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shinn-Sheng Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical proximity correction and photomasks
- Patent number 11,243,472
- Issue date Feb 8, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Dong-Yo Jheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask design for generating plasmonic effect
- Patent number 11,211,374
- Issue date Dec 28, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Minfeng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device and apparatus for ma...
- Patent number 10,866,525
- Issue date Dec 15, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shinn-Sheng Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for optimized wafer process simulation
- Patent number 10,698,320
- Issue date Jun 30, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ru-Gun Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask design for generating plasmonic effect
- Patent number 10,685,950
- Issue date Jun 16, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Minfeng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical proximity correction and photomasks
- Patent number 10,678,142
- Issue date Jun 9, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Dong-Yo Jheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern modification and patterning process
- Patent number 10,514,613
- Issue date Dec 24, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shih-Ming Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Source beam optimization method for improving lithography printability
- Patent number 10,417,376
- Issue date Sep 17, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsu-Ting Huang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Target optimization method for improving lithography printability
- Patent number 10,083,270
- Issue date Sep 25, 2018
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shih-Ming Chang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and system to prepare, manufacture and inspect mask patterns...
- Patent number 10,025,175
- Issue date Jul 17, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chi-Ming Tsai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor device and semiconductor system
- Patent number 9,824,985
- Issue date Nov 21, 2017
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shuo-Chun Chou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Circuits and methods of testing a device under test using the same
- Patent number 9,772,366
- Issue date Sep 26, 2017
- Taiwan Semiconductor Manufacturing Company Limited
- Shuo-Chun Chou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Generating final mask pattern by performing inverse beam technology...
- Patent number 9,747,408
- Issue date Aug 29, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsu-Ting Huang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for integrated circuit mask patterning
- Patent number 9,495,507
- Issue date Nov 15, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jue-Chin Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for integrated circuit mask patterning
- Patent number 9,256,709
- Issue date Feb 9, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jue-Chin Yu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for making a mask by forming a phase bar in an integrated ci...
- Patent number 8,850,366
- Issue date Sep 30, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ru-Gun Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and system of mask data preparation for curvilinear mask pat...
- Patent number 8,812,999
- Issue date Aug 19, 2014
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ru-Gun Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photolithography mask and process
- Patent number 8,716,841
- Issue date May 6, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shih-Ming Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
OPTICAL PROXIMITY CORRECTION AND PHOTOMASKS
- Publication number 20230384691
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Co., LTD
- Dong-Yo Jheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND APPARATUS FOR MA...
- Publication number 20230333486
- Publication date Oct 19, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shinn-Sheng YU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET MASK AND METHOD OF MANUFACTURING THE SAME
- Publication number 20220350236
- Publication date Nov 3, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Minfeng CHEN
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND APPARATUS FOR MA...
- Publication number 20220260931
- Publication date Aug 18, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shinn-Sheng YU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optical Proximity Correction and Photomasks
- Publication number 20220155692
- Publication date May 19, 2022
- Taiwan Semiconductor Manufacturing Co., LTD
- Dong-Yo Jheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND APPARATUS FOR MA...
- Publication number 20210096475
- Publication date Apr 1, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shinn-Sheng YU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK DESIGN FOR GENERATING PLASMONIC EFFECT
- Publication number 20200312835
- Publication date Oct 1, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Minfeng CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Optical Proximity Correction and Photomasks
- Publication number 20200301289
- Publication date Sep 24, 2020
- Taiwan Semiconductor Manufacturing Co., LTD
- Dong-Yo Jheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET MASK AND METHOD OF MANUFACTURING THE SAME
- Publication number 20200041892
- Publication date Feb 6, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Minfeng CHEN
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND APPARATUS FOR MA...
- Publication number 20200041915
- Publication date Feb 6, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shinn-Sheng YU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optical Proximity Correction and Photomasks
- Publication number 20190146355
- Publication date May 16, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Dong-Yo Jheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask Design for Generating Plasmonic Effect
- Publication number 20190006343
- Publication date Jan 3, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Minfeng Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Source Beam Optimization Method for Improving Lithography Printability
- Publication number 20180285512
- Publication date Oct 4, 2018
- Taiwan Semiconductor Manufacturing Co., LTD
- Hsu-Ting Huang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Target Optimization Method For Improving Lithography Printability
- Publication number 20180165397
- Publication date Jun 14, 2018
- Taiwan Semiconductor Manufacturing Co., LTD
- Shih-Ming Chang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method for Optimized Wafer Process Simulation
- Publication number 20180165388
- Publication date Jun 14, 2018
- Taiwan Semiconductor Manufacturing Co., LTD
- Ru-Gun Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PATTERN MODIFICATION AND PATTERNING PROCESS
- Publication number 20180149982
- Publication date May 31, 2018
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shih-Ming CHANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Source Beam Optimization Method for Improving Lithography Printability
- Publication number 20180096094
- Publication date Apr 5, 2018
- Taiwan Semiconductor Manufacturing Co., LTD
- Hsu-Ting Huang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method of Mask Data Synthesis and Mask Making
- Publication number 20170053056
- Publication date Feb 23, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsu-Ting Huang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MODEL-BASED RULE TABLE GENERATION
- Publication number 20170053058
- Publication date Feb 23, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jue-Chin Yu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SEMICONDUCTOR DEVICE AND SEMICONDUCTOR SYSTEM
- Publication number 20170018511
- Publication date Jan 19, 2017
- Taiwan Semiconductor Manufacturing Co., LTD
- Shuo-Chun CHOU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CIRCUITS AND METHODS OF TESTING A DEVICE UNDER TEST USING THE SAME
- Publication number 20160252558
- Publication date Sep 1, 2016
- Taiwan Semiconductor Manufacturing Company Limited
- SHUO-CHUN CHOU
- G01 - MEASURING TESTING
Information Patent Application
Method for Integrated Circuit Mask Patterning
- Publication number 20160154925
- Publication date Jun 2, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jue-Chin Yu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND SYSTEM TO PREPARE, MANUFACTURE AND INSPECT MASK PATTERNS...
- Publication number 20160132627
- Publication date May 12, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chi-Ming Tsai
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method For Integrated Circuit Mask Patterning
- Publication number 20150227671
- Publication date Aug 13, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jue-Chin Yu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND SYSTEM OF MASK DATA PREPARATION FOR CURVILINEAR MASK PAT...
- Publication number 20140189614
- Publication date Jul 3, 2014
- Taiwan Semiconductor Manufacturing Co., LTD
- Ru-Gun LIU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods For Making A Mask For An Integrated Circuit Design
- Publication number 20140040838
- Publication date Feb 6, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ru-Gun Liu
- G06 - COMPUTING CALCULATING COUNTING

Shuo-Chun CHOU

Person

Patents Grantslast 30 patents

Optical proximity correction and photomasks

Method of manufacturing a semiconductor device and apparatus for ma...

Method of manufacturing a semiconductor device and apparatus for ma...

Optical proximity correction and photomasks

Photomask design for generating plasmonic effect

Method of manufacturing a semiconductor device and apparatus for ma...

Method for optimized wafer process simulation

Photomask design for generating plasmonic effect

Optical proximity correction and photomasks

Pattern modification and patterning process

Source beam optimization method for improving lithography printability

Target optimization method for improving lithography printability

Method and system to prepare, manufacture and inspect mask patterns...

Semiconductor device and semiconductor system

Circuits and methods of testing a device under test using the same

Generating final mask pattern by performing inverse beam technology...

Method for integrated circuit mask patterning

Method for integrated circuit mask patterning

Method for making a mask by forming a phase bar in an integrated ci...

Method and system of mask data preparation for curvilinear mask pat...

Photolithography mask and process

Patents Applicationslast 30 patents

OPTICAL PROXIMITY CORRECTION AND PHOTOMASKS

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND APPARATUS FOR MA...

EXTREME ULTRAVIOLET MASK AND METHOD OF MANUFACTURING THE SAME

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND APPARATUS FOR MA...

Optical Proximity Correction and Photomasks

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND APPARATUS FOR MA...

PHOTOMASK DESIGN FOR GENERATING PLASMONIC EFFECT

Optical Proximity Correction and Photomasks

EXTREME ULTRAVIOLET MASK AND METHOD OF MANUFACTURING THE SAME

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND APPARATUS FOR MA...

Optical Proximity Correction and Photomasks

Photomask Design for Generating Plasmonic Effect

Source Beam Optimization Method for Improving Lithography Printability

Target Optimization Method For Improving Lithography Printability

Method for Optimized Wafer Process Simulation

PATTERN MODIFICATION AND PATTERNING PROCESS

Source Beam Optimization Method for Improving Lithography Printability

Method of Mask Data Synthesis and Mask Making

MODEL-BASED RULE TABLE GENERATION

SEMICONDUCTOR DEVICE AND SEMICONDUCTOR SYSTEM

CIRCUITS AND METHODS OF TESTING A DEVICE UNDER TEST USING THE SAME

Method for Integrated Circuit Mask Patterning

METHOD AND SYSTEM TO PREPARE, MANUFACTURE AND INSPECT MASK PATTERNS...

Method For Integrated Circuit Mask Patterning

METHOD AND SYSTEM OF MASK DATA PREPARATION FOR CURVILINEAR MASK PAT...

Methods For Making A Mask For An Integrated Circuit Design