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Siegfried Scheler
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Wiesbaden, DE
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last 30 patents
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Patent Grant
2-acylamino-9-arylacridines, process for their preparation and phot...
Patent number
5,834,157
Issue date
Nov 10, 1998
AGFA-Gevaert A.G.
Siegfried Scheler
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
(1,2-naphthoquinone 2-diazide) sulfonic acid esters, radiation-sens...
Patent number
5,563,018
Issue date
Oct 8, 1996
Hoechst Aktiengesellschaft
Gerhard Buhr
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Light-sensitive mixture containing an 0-naphthoquinonediazide-sulfo...
Patent number
5,413,899
Issue date
May 9, 1995
Hoechst Aktiengesellschaft
Siegfried Scheler
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Composition containing naphthoquinone diazide sulfonic acid mixed e...
Patent number
5,306,595
Issue date
Apr 26, 1994
Hoechst Aktiengesellschaft
Siegfried Scheler
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Radiation-sensitive ester and process for its preparation
Patent number
5,268,252
Issue date
Dec 7, 1993
Hoechst Aktiengesellschaft
Siegfried Scheler
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Process for preparing 7-hydroxy-1,2-naphthoquinone-2-diazide-4-sulf...
Patent number
5,192,640
Issue date
Mar 9, 1993
Hoechst Aktiengesellschaft
Siegfried Scheler
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Radiation-sensitive compounds, radiation-sensitive mixture prepared...
Patent number
5,114,816
Issue date
May 19, 1992
Hoechst Aktiengesellschaft
Siegfried Scheler
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Process for preparing substituted 1,2-naphthoquinone-(2)-diazide-4-...
Patent number
5,082,932
Issue date
Jan 21, 1992
Hoechst Aktiengesellschaft
Herbert Siegel
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Substituted 1,2-naphthoquinone-2-diazide-4-sulfonic acids and proce...
Patent number
5,077,395
Issue date
Dec 31, 1991
Hoechst Aktiengesellschaft
Siegfried Scheler
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Two-component diazotype material with diazonium salt with anion of...
Patent number
4,590,143
Issue date
May 20, 1986
Hoechst Aktiengesellschaft
Siegfried Scheler
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Two-component diazotype material with ultraviolet light-absorbing d...
Patent number
4,540,648
Issue date
Sep 10, 1985
Hoechst Aktiengesellschaft
Siegfried Scheler
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Diazotype materials with 2-hydroxy-naphthalene having sulfonamide s...
Patent number
4,492,749
Issue date
Jan 8, 1985
Hoechst Aktiengesellschaft
Siegfried Scheler
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Two-component diazotype material
Patent number
4,457,997
Issue date
Jul 3, 1984
Hoechst Aktiengesellschaft
Klaus Thoese
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Light-sensitive diazotype material with 2-hydroxy-3-naphthoic acid...
Patent number
4,334,004
Issue date
Jun 8, 1982
Hoechst Aktiengesellschaft
Siegfried Scheler
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
2-Hydroxy-3-naphthoic acid amides
Patent number
4,321,373
Issue date
Mar 23, 1982
Hoechst Aktiengesellschaft
Siegfried Scheler
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Recording material containing diazo compounds and process for the m...
Patent number
4,317,875
Issue date
Mar 2, 1982
Hoechst Aktiengesellschaft
Siegfried Scheler
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Diazotype material
Patent number
4,207,110
Issue date
Jun 10, 1980
Hoechst Aktiengesellschaft
Siegfried Scheler
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY