Silvio J. Rabello

Follow

Person

Palo Alto, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Diffraction based overlay linearity testing
- Patent number 9,239,523
- Issue date Jan 19, 2016
- Nanometrics Incorporated
- Jie Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dark field diffraction based overlay
- Patent number 8,817,273
- Issue date Aug 26, 2014
- Nanometrics Incorporated
- Hwan J. Jeong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Scatterometry measurement of asymmetric structures
- Patent number 8,525,993
- Issue date Sep 3, 2013
- Nanometrics Incorporated
- Silvio J. Rabello
- G01 - MEASURING TESTING
Information Patent Grant
Simulating two-dimensional periodic patterns using compressed fouri...
- Patent number 8,170,838
- Issue date May 1, 2012
- Nanometrics Incorporated
- Silvio J. Rabello
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Local process variation correction for overlay measurement
- Patent number 7,508,976
- Issue date Mar 24, 2009
- Nanometric Incorporated
- Weidong Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measuring an alignment target with a single polarization state
- Patent number 6,992,764
- Issue date Jan 31, 2006
- Nanometrics Incorporated
- Weidong Yang
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Information Patent Application
DARK FIELD DIFFRACTION BASED OVERLAY
- Publication number 20130278942
- Publication date Oct 24, 2013
- Nanometrics Incorporated
- Hwan J. Jeong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Diffraction Based Overlay Linearity Testing
- Publication number 20110238365
- Publication date Sep 29, 2011
- Nanometrics Incorporated
- Jie Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Scatterometry Measurement of Asymmetric Structures
- Publication number 20110080585
- Publication date Apr 7, 2011
- Nanometrics Incorporated
- Silvio J. Rabello
- G01 - MEASURING TESTING
Information Patent Application
Simulating Two-Dimensional Periodic Patterns Using Compressed Fouri...
- Publication number 20100274521
- Publication date Oct 28, 2010
- Nanometrics Incorporated
- Silvio J. Rabello
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Imaging Diffraction Based Overlay
- Publication number 20090296075
- Publication date Dec 3, 2009
- Nanometrics Incorporated
- Jiangtao Hu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Selecting unit cell configuration for repeating structures in optic...
- Publication number 20060187466
- Publication date Aug 24, 2006
- Timbre Technologies, Inc.
- Shifang Li
- G01 - MEASURING TESTING