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Simon W. Tam

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  • San Francisco, CA, US
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Patents Grantslast 30 patents

  • Information Patent Grant

    Method for plasma etching a chromium layer suitable for photomask f...
    • Patent number 7,829,243
    • Issue date Nov 9, 2010
    • Applied Materials, Inc.
    • Xiaoyi Chen
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Etch chamber
    • Patent number 6,270,621
    • Issue date Aug 7, 2001
    • Applied Materials, Inc.
    • Simon W. Tam
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Etch chamber
    • Patent number 6,123,864
    • Issue date Sep 26, 2000
    • Applied Materials, Inc.
    • Simon W. Tam
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Electrostatic chuck with fluid flow regulator
    • Patent number 5,883,778
    • Issue date Mar 16, 1999
    • Applied Materials, Inc.
    • Semyon Sherstinsky
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Electrostatic chuck
    • Patent number 5,671,117
    • Issue date Sep 23, 1997
    • Applied Materials Inc.
    • Semyon Sherstinsky
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Method of making a dielectric chuck
    • Patent number 5,634,266
    • Issue date Jun 3, 1997
    • Applied Materials Inc.
    • Semyon Sherstinsky
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Compound clamp ring for semiconductor wafers
    • Patent number 5,421,401
    • Issue date Jun 6, 1995
    • Applied Materials, Inc.
    • Semyon Sherstinsky
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Clamping ring apparatus for processing semiconductor wafers
    • Patent number 5,316,278
    • Issue date May 31, 1994
    • Applied Materials, Inc.
    • Semyon Sherstinsky
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    In-situ photoresist capping process for plasma etching
    • Patent number 4,613,400
    • Issue date Sep 23, 1986
    • Applied Materials, Inc.
    • Simon W. Tam
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents