Claims
- 1. A plasma etch chamber comprisinga pedestal support for a substrate to be processed; a gas distribution plate having openings therein for process gases above and opposed to said pedestal; a vacuum exhaust system; a clamping ring assembly mounted in said chamber so as to overlie a portion of said substrate during processing; and a mount for supporting said clamping ring extending from a bottom wall of said chamber and having a plurality of openings in a sidewall thereof.
- 2. An etch chamber according to claim 1 wherein one of said openings is opposite a slit valve used to transfer a substrate to be processed into and out of said chamber.
- 3. An etch chamber according to claim 1 wherein a coolant gas inlet is mounted in a bottom wall of said chamber within the clamping ring mount.
Parent Case Info
This application is a division of Ser. No. 08/327,126 filed Oct. 21, 1994, now U.S. Pat. No 6,123,864 which is a continuation of Ser. No. 08/071,462 filed Jun. 2, 1993 now abandoned.
US Referenced Citations (14)
Continuations (1)
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Number |
Date |
Country |
Parent |
08/071462 |
Jun 1993 |
US |
Child |
08/327126 |
|
US |