Sivakumar Dhandapani

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Preston matrix generator
- Patent number 11,989,492
- Issue date May 21, 2024
- Applied Materials, Inc.
- Sivakumar Dhandapani
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Filtering during in-situ monitoring of polishing
- Patent number 11,969,855
- Issue date Apr 30, 2024
- Applied Materials, Inc.
- Sivakumar Dhandapani
- B24 - GRINDING POLISHING
Information Patent Grant
Control of processing parameters during substrate polishing using e...
- Patent number 11,969,854
- Issue date Apr 30, 2024
- Applied Materials, Inc.
- Benjamin Cherian
- B24 - GRINDING POLISHING
Information Patent Grant
Control of processing parameters during substrate polishing using c...
- Patent number 11,919,121
- Issue date Mar 5, 2024
- Applied Materials, Inc.
- Benjamin Cherian
- B24 - GRINDING POLISHING
Information Patent Grant
System using film thickness estimation from machine learning based...
- Patent number 11,847,776
- Issue date Dec 19, 2023
- Applied Materials, Inc.
- Sivakumar Dhandapani
- B24 - GRINDING POLISHING
Information Patent Grant
Film thickness estimation from machine learning based processing of...
- Patent number 11,836,913
- Issue date Dec 5, 2023
- Applied Materials, Inc.
- Sivakumar Dhandapani
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Filtering during in-situ monitoring of polishing
- Patent number 11,679,466
- Issue date Jun 20, 2023
- Applied Materials, Inc.
- Sivakumar Dhandapani
- B24 - GRINDING POLISHING
Information Patent Grant
Pad conditioner cut rate monitoring
- Patent number 11,577,362
- Issue date Feb 14, 2023
- Applied Materials, Inc.
- Sivakumar Dhandapani
- G01 - MEASURING TESTING
Information Patent Grant
Predictive filter for polishing pad wear rate monitoring
- Patent number 11,504,821
- Issue date Nov 22, 2022
- Applied Materials, Inc.
- Sivakumar Dhandapani
- B24 - GRINDING POLISHING
Information Patent Grant
Filtering during in-situ monitoring of polishing
- Patent number 11,446,783
- Issue date Sep 20, 2022
- Applied Materials, Inc.
- Sivakumar Dhandapani
- B24 - GRINDING POLISHING
Information Patent Grant
Limiting adjustment of polishing rates during substrate polishing
- Patent number 9,607,910
- Issue date Mar 28, 2017
- Applied Materials, Inc.
- Dominic J. Benvegnu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Limiting adjustment of polishing rates during substrate polishing
- Patent number 9,490,186
- Issue date Nov 8, 2016
- Applied Materials, Inc.
- Dominic J. Benvegnu
- B24 - GRINDING POLISHING
Information Patent Grant
Adjustment of polishing rates during substrate polishing with predi...
- Patent number 9,375,824
- Issue date Jun 28, 2016
- Applied Materials, Inc.
- Dominic J. Benvegnu
- B24 - GRINDING POLISHING
Information Patent Grant
Dynamic residue clearing control with in-situ profile control (ISPC)
- Patent number 9,242,337
- Issue date Jan 26, 2016
- Applied Materials, Inc.
- Jun Qian
- B24 - GRINDING POLISHING
Information Patent Grant
Endpointing with selective spectral monitoring
- Patent number 9,221,147
- Issue date Dec 29, 2015
- Applied Materials, Inc.
- Jun Qian
- B24 - GRINDING POLISHING
Information Patent Grant
Closed-loop control for improved polishing pad profiles
- Patent number 9,138,860
- Issue date Sep 22, 2015
- Applied Materials, Inc.
- Sivakumar Dhandapani
- B24 - GRINDING POLISHING
Information Patent Grant
Selecting reference libraries for monitoring of multiple zones on a...
- Patent number 8,954,186
- Issue date Feb 10, 2015
- Applied Materials, Inc.
- Jun Qian
- G05 - CONTROLLING REGULATING
Information Patent Grant
Gathering spectra from multiple optical heads
- Patent number 8,932,107
- Issue date Jan 13, 2015
- Applied Materials, Inc.
- Jeffrey Drue David
- B24 - GRINDING POLISHING
Information Patent Grant
Method for compensation of variability in chemical mechanical polis...
- Patent number 8,758,085
- Issue date Jun 24, 2014
- Applied Materials, Inc.
- Sivakumar Dhandapani
- B24 - GRINDING POLISHING
Information Patent Grant
Feedback for polishing rate correction in chemical mechanical polis...
- Patent number 8,755,927
- Issue date Jun 17, 2014
- Applied Materials, Inc.
- Jun Qian
- B24 - GRINDING POLISHING
Information Patent Grant
Gathering spectra from multiple optical heads
- Patent number 8,535,115
- Issue date Sep 17, 2013
- Applied Materials, Inc.
- Jeffrey Drue David
- B24 - GRINDING POLISHING
Information Patent Grant
Feedback for polishing rate correction in chemical mechanical polis...
- Patent number 8,467,896
- Issue date Jun 18, 2013
- Applied Materials, Inc.
- Jun Qian
- B24 - GRINDING POLISHING
Information Patent Grant
Closed-loop control for effective pad conditioning
- Patent number 8,337,279
- Issue date Dec 25, 2012
- Applied Materials, Inc.
- Sivakumar Dhandapani
- B24 - GRINDING POLISHING
Information Patent Grant
Feedback for polishing rate correction in chemical mechanical polis...
- Patent number 8,190,285
- Issue date May 29, 2012
- Applied Materials, Inc.
- Jun Qian
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
SYSTEM USING FILM THICKNESS ESTIMATION FROM MACHINE LEARNING BASED...
- Publication number 20240062364
- Publication date Feb 22, 2024
- Applied Materials, Inc.
- Sivakumar Dhandapani
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
RESIDUE CLASSIFICATION FROM MACHINE LEARNING BASED PROCESSING OF SU...
- Publication number 20240054634
- Publication date Feb 15, 2024
- Applied Materials, Inc.
- Sivakumar Dhandapani
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CONTROL OF PROCESSING PARAMETERS DURING SUBSTRATE POLISHING USING C...
- Publication number 20240009796
- Publication date Jan 11, 2024
- Applied Materials, Inc.
- Benjamin Cherian
- B24 - GRINDING POLISHING
Information Patent Application
FILTERING DURING IN-SITU MONITORING OF POLISHING
- Publication number 20230286105
- Publication date Sep 14, 2023
- Applied Materials, Inc.
- Sivakumar Dhandapani
- B24 - GRINDING POLISHING
Information Patent Application
PAD CONDITIONER CUT RATE MONITORING
- Publication number 20230182264
- Publication date Jun 15, 2023
- Applied Materials, Inc.
- Sivakumar Dhandapani
- B24 - GRINDING POLISHING
Information Patent Application
FILTERING DURING IN-SITU MONITORING OF POLISHING
- Publication number 20220388113
- Publication date Dec 8, 2022
- Applied Materials, Inc.
- Sivakumar Dhandapani
- B24 - GRINDING POLISHING
Information Patent Application
METHODS OF MODELING AND CONTROLLING PAD WEAR
- Publication number 20220379431
- Publication date Dec 1, 2022
- Applied Materials, Inc.
- Sivakumar DHANDAPANI
- G05 - CONTROLLING REGULATING
Information Patent Application
CONTROL OF PROCESSING PARAMETERS DURING SUBSTRATE POLISHING USING C...
- Publication number 20220281055
- Publication date Sep 8, 2022
- Applied Materials, Inc.
- Benjamin Cherian
- B24 - GRINDING POLISHING
Information Patent Application
CONTROL OF PROCESSING PARAMETERS DURING SUBSTRATE POLISHING USING E...
- Publication number 20220281056
- Publication date Sep 8, 2022
- Applied Materials, Inc.
- Benjamin Cherian
- B24 - GRINDING POLISHING
Information Patent Application
CONTROL OF PROCESSING PARAMETERS DURING SUBSTRATE POLISHING USING C...
- Publication number 20220281054
- Publication date Sep 8, 2022
- Applied Materials, Inc.
- Benjamin Cherian
- B24 - GRINDING POLISHING
Information Patent Application
FILM THICKNESS ESTIMATION FROM MACHINE LEARNING BASED PROCESSING OF...
- Publication number 20210407065
- Publication date Dec 30, 2021
- Applied Materials, Inc.
- Sivakumar Dhandapani
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SYSTEM USING FILM THICKNESS ESTIMATION FROM MACHINE LEARNING BASED...
- Publication number 20210407066
- Publication date Dec 30, 2021
- Applied Materials, Inc.
- Sivakumar Dhandapani
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Preston Matrix Generator
- Publication number 20200210547
- Publication date Jul 2, 2020
- Applied Materials, Inc.
- Sivakumar Dhandapani
- B24 - GRINDING POLISHING
Information Patent Application
Pad Conditioner Cut Rate Monitoring
- Publication number 20190283208
- Publication date Sep 19, 2019
- Applied Materials, Inc.
- Sivakumar Dhandapani
- B24 - GRINDING POLISHING
Information Patent Application
Filtering During In-Situ Monitoring of Polishing
- Publication number 20190275633
- Publication date Sep 12, 2019
- Applied Materials, Inc.
- Sivakumar Dhandapani
- B24 - GRINDING POLISHING
Information Patent Application
PREDICTIVE FILTER FOR POLISHING PAD WEAR RATE MONITORING
- Publication number 20190143475
- Publication date May 16, 2019
- Applied Materials, Inc.
- Sivakumar Dhandapani
- B24 - GRINDING POLISHING
Information Patent Application
SEMICONDUCTOR FABRICATION USING PROCESS CONTROL PARAMETER MATRIX
- Publication number 20190096722
- Publication date Mar 28, 2019
- Sivakumar Dhandapani
- B24 - GRINDING POLISHING
Information Patent Application
SEMICONDUCTOR FABRICATION USING MACHINE LEARNING APPROACH TO GENERA...
- Publication number 20190095797
- Publication date Mar 28, 2019
- Sivakumar Dhandapani
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Limiting Adjustment of Polishing Rates During Substrate Polishing
- Publication number 20160372388
- Publication date Dec 22, 2016
- Applied Materials, Inc.
- Dominic J. Benvegnu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Adjustment of Polishing Rates During Substrate Polishing With Predi...
- Publication number 20150147940
- Publication date May 28, 2015
- Applied Materials, Inc.
- Dominic J. Benvegnu
- G01 - MEASURING TESTING
Information Patent Application
Limiting Adjustment of Polishing Rates During Substrate Polishing
- Publication number 20150147829
- Publication date May 28, 2015
- Applied Materials, Inc.
- Dominic J. Benvegnu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DYNAMIC RESIDUE CLEARING CONTROL WITH IN-SITU PROFILE CONTROL (ISPC)
- Publication number 20140273749
- Publication date Sep 18, 2014
- Jun QIAN
- B24 - GRINDING POLISHING
Information Patent Application
FEED FORWARD PARAMETER VALUES FOR USE IN THEORETICALLY GENERATING S...
- Publication number 20140242881
- Publication date Aug 28, 2014
- Jeffrey Drue David
- B24 - GRINDING POLISHING
Information Patent Application
ENDPOINTING WITH SELECTIVE SPECTRAL MONITORING
- Publication number 20140113524
- Publication date Apr 24, 2014
- Jun Qian
- B24 - GRINDING POLISHING
Information Patent Application
Gathering Spectra From Multiple Optical Heads
- Publication number 20140011429
- Publication date Jan 9, 2014
- Applied Materials, Inc.
- Jeffrey Drue David
- B24 - GRINDING POLISHING
Information Patent Application
FEEDBACK FOR POLISHING RATE CORRECTION IN CHEMICAL MECHANICAL POLIS...
- Publication number 20130273812
- Publication date Oct 17, 2013
- Jun Qian
- B24 - GRINDING POLISHING
Information Patent Application
FEEDBACK FOR POLISHING RATE CORRECTION IN CHEMICAL MECHANICAL POLIS...
- Publication number 20120231701
- Publication date Sep 13, 2012
- Jun Qian
- B24 - GRINDING POLISHING
Information Patent Application
Gathering Spectra From Multiple Optical Heads
- Publication number 20120196511
- Publication date Aug 2, 2012
- APPLIED MATERIALS, INC.
- Jeffrey Drue David
- B24 - GRINDING POLISHING
Information Patent Application
APPARATUS AND METHOD FOR COMPENSATION OF VARIABILITY IN CHEMICAL ME...
- Publication number 20120100779
- Publication date Apr 26, 2012
- Applied Materials, Inc.
- Sivakumar Dhandapani
- B24 - GRINDING POLISHING
Information Patent Application
Selecting Reference Libraries For Monitoring Of Multiple Zones On A...
- Publication number 20120028813
- Publication date Feb 2, 2012
- Applied Materials, Inc.
- Jun Qian
- G05 - CONTROLLING REGULATING

Sivakumar Dhandapani

Person

Patents Grantslast 30 patents

Preston matrix generator

Filtering during in-situ monitoring of polishing

Control of processing parameters during substrate polishing using e...

Control of processing parameters during substrate polishing using c...

System using film thickness estimation from machine learning based...

Film thickness estimation from machine learning based processing of...

Filtering during in-situ monitoring of polishing

Pad conditioner cut rate monitoring

Predictive filter for polishing pad wear rate monitoring

Filtering during in-situ monitoring of polishing

Limiting adjustment of polishing rates during substrate polishing

Limiting adjustment of polishing rates during substrate polishing

Adjustment of polishing rates during substrate polishing with predi...

Dynamic residue clearing control with in-situ profile control (ISPC)

Endpointing with selective spectral monitoring

Closed-loop control for improved polishing pad profiles

Selecting reference libraries for monitoring of multiple zones on a...

Gathering spectra from multiple optical heads

Method for compensation of variability in chemical mechanical polis...

Feedback for polishing rate correction in chemical mechanical polis...

Gathering spectra from multiple optical heads

Feedback for polishing rate correction in chemical mechanical polis...

Closed-loop control for effective pad conditioning

Feedback for polishing rate correction in chemical mechanical polis...

Patents Applicationslast 30 patents

SYSTEM USING FILM THICKNESS ESTIMATION FROM MACHINE LEARNING BASED...

RESIDUE CLASSIFICATION FROM MACHINE LEARNING BASED PROCESSING OF SU...

CONTROL OF PROCESSING PARAMETERS DURING SUBSTRATE POLISHING USING C...

FILTERING DURING IN-SITU MONITORING OF POLISHING

PAD CONDITIONER CUT RATE MONITORING

FILTERING DURING IN-SITU MONITORING OF POLISHING

METHODS OF MODELING AND CONTROLLING PAD WEAR

CONTROL OF PROCESSING PARAMETERS DURING SUBSTRATE POLISHING USING C...

CONTROL OF PROCESSING PARAMETERS DURING SUBSTRATE POLISHING USING E...

CONTROL OF PROCESSING PARAMETERS DURING SUBSTRATE POLISHING USING C...

FILM THICKNESS ESTIMATION FROM MACHINE LEARNING BASED PROCESSING OF...

SYSTEM USING FILM THICKNESS ESTIMATION FROM MACHINE LEARNING BASED...

Preston Matrix Generator

Pad Conditioner Cut Rate Monitoring

Filtering During In-Situ Monitoring of Polishing

PREDICTIVE FILTER FOR POLISHING PAD WEAR RATE MONITORING

SEMICONDUCTOR FABRICATION USING PROCESS CONTROL PARAMETER MATRIX

SEMICONDUCTOR FABRICATION USING MACHINE LEARNING APPROACH TO GENERA...

Limiting Adjustment of Polishing Rates During Substrate Polishing

Adjustment of Polishing Rates During Substrate Polishing With Predi...

Limiting Adjustment of Polishing Rates During Substrate Polishing

DYNAMIC RESIDUE CLEARING CONTROL WITH IN-SITU PROFILE CONTROL (ISPC)

FEED FORWARD PARAMETER VALUES FOR USE IN THEORETICALLY GENERATING S...

ENDPOINTING WITH SELECTIVE SPECTRAL MONITORING

Gathering Spectra From Multiple Optical Heads

FEEDBACK FOR POLISHING RATE CORRECTION IN CHEMICAL MECHANICAL POLIS...

FEEDBACK FOR POLISHING RATE CORRECTION IN CHEMICAL MECHANICAL POLIS...

Gathering Spectra From Multiple Optical Heads

APPARATUS AND METHOD FOR COMPENSATION OF VARIABILITY IN CHEMICAL ME...

Selecting Reference Libraries For Monitoring Of Multiple Zones On A...