Somchintana Norasetthekul

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Boxford, MA, US

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Patents Grantslast 30 patents

Information Patent Grant
Techniques for forming low stress mask using implantation
- Patent number 10,515,802
- Issue date Dec 24, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Rajesh Prasad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etch rate modulation through ion implantation
- Patent number 10,332,748
- Issue date Jun 25, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Rajesh Prasad
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Etch rate modulation through ion implantation
- Patent number 9,934,982
- Issue date Apr 3, 2018
- Varian Semiconductor Equipment Associates, Inc.
- Rajesh Prasad
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
TECHNIQUES FOR FORMING LOW STRESS MASK USING IMPLANTATION
- Publication number 20190326116
- Publication date Oct 24, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Rajesh Prasad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etch Rate Modulation Through Ion Implantation
- Publication number 20180182636
- Publication date Jun 28, 2018
- Varian Semiconductor Equipment Associates, Inc.
- Rajesh Prasad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etch Rate Modulation Through Ion Implantation
- Publication number 20170178914
- Publication date Jun 22, 2017
- Varian Semiconductor Equipment Associates, Inc.
- Rajesh Prasad
- H01 - BASIC ELECTRIC ELEMENTS