Sook-Kyung Lee

Person

Gwangmyeong-si, KR

People

Patents Grantslast 30 patents

Information Patent Grant
Antibody specifically binding to HER2
- Patent number 10,174,116
- Issue date Jan 8, 2019
- ABCLON INC.
- Jong-Seo Lee
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Electron beam lithography method and apparatus
- Patent number 10,007,185
- Issue date Jun 26, 2018
- Samsung Electronics Co., Ltd.
- Sook Hyun Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure method using electron beam and substrate manufacturing met...
- Patent number 9,709,893
- Issue date Jul 18, 2017
- Samsung Electronics Co., Ltd.
- Sook Hyun Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Display screen or portion thereof with graphical user interface
- Patent number D745531
- Issue date Dec 15, 2015
- Samsung Electronics Co., Ltd.
- Sook-Kyung Lee
- D14 - Recording, communication, or information retrieval equipment
Information Patent Grant
Multi-exposure semiconductor fabrication mask sets and methods of f...
- Patent number 7,604,907
- Issue date Oct 20, 2009
- Samsung Electronics Co., Ltd.
- Doo-Youl Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition comprising photosensitive polymer having lactone...
- Patent number 7,241,552
- Issue date Jul 10, 2007
- Samsung Electronics Co., Ltd.
- Kwang-sub Yoon
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photosensitive polymer and chemically amplified photoresist composi...
- Patent number 7,084,227
- Issue date Aug 1, 2006
- Samsung Electronics Co., Ltd.
- Dong-won Jung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition comprising photosensitive polymer having lactone...
- Patent number 7,045,267
- Issue date May 16, 2006
- Samsung Electronics Co., Ltd.
- Kwang-sub Yoon
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photosensitive polymer and chemically amplified photoresist composi...
- Patent number 6,893,793
- Issue date May 17, 2005
- Samsung Electronics Co., Ltd.
- Dong-won Jung
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photosensitive polymer
- Patent number 6,642,336
- Issue date Nov 4, 2003
- Samsung Electronics Co., Ltd.
- Sook Lee
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive polymer and resist composition containing the same
- Patent number 6,596,459
- Issue date Jul 22, 2003
- Samsung Electronics Co., Ltd.
- Hyun-woo Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive polymer and chemically amplified photoresist composi...
- Patent number 6,593,441
- Issue date Jul 15, 2003
- Samsung Electronics Co., Ltd.
- Dong-won Jung
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition comprising photosensitive polymer having loctone...
- Patent number 6,537,727
- Issue date Mar 25, 2003
- Samsung Electronics Co., Ltd.
- Kwang-sub Yoon
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photosensitive lithocholate derivative and chemically amplified pho...
- Patent number 6,497,987
- Issue date Dec 24, 2002
- Samsung Electronics Co., Ltd.
- Hyun-woo Kim
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photosensitive polymer and chemically amplified photoresist composi...
- Patent number 6,472,120
- Issue date Oct 29, 2002
- Samsung Electronics Co., Ltd.
- Dong-won Jung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
ELECTRON BEAM LITHOGRAPHY METHOD AND APPARATUS
- Publication number 20170192358
- Publication date Jul 6, 2017
- Samsung Electronics Co., Ltd.
- Sook Hyun LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE METHOD USING ELECTRON BEAM AND SUBSTRATE MANUFACTURING MET...
- Publication number 20160223903
- Publication date Aug 4, 2016
- Samsung Electronics Co., Ltd.
- SOOK HYUN LEE
- G02 - OPTICS
Information Patent Application
METHOD FOR FORMING PATTERN USING ANTI-REFLECTIVE COATING COMPOSITIO...
- Publication number 20160187781
- Publication date Jun 30, 2016
- Jihoon Kang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ANTIBODY SPECIFICALLY BINDING TO HER2
- Publication number 20160053011
- Publication date Feb 25, 2016
- ABCLON INC.
- Jong-Seo LEE
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Application
Methods And Kits For In Situ Measurement of Enzyme Activity and Amo...
- Publication number 20090286223
- Publication date Nov 19, 2009
- Ewha University Industry Collaboration Foundation
- Sue Goo Rhee
- G01 - MEASURING TESTING
Information Patent Application
Chemically amplified photoresists and related methods
- Publication number 20060147835
- Publication date Jul 6, 2006
- Sook Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Multi-exposure semiconductor fabrication mask sets and methods of f...
- Publication number 20060073396
- Publication date Apr 6, 2006
- Doo-Youl Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photosensitive polymer and chemically amplified photoresist composi...
- Publication number 20050019693
- Publication date Jan 27, 2005
- Dong-won Jung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist composition comprising photosensitive polymer having lactone...
- Publication number 20050008975
- Publication date Jan 13, 2005
- Kwang-sub Yoon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist composition comprising photosensitive polymer having lactone...
- Publication number 20040018442
- Publication date Jan 29, 2004
- Kwang-sub Yoon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photosensitive polymer and chemically amplified photoresist composi...
- Publication number 20030170563
- Publication date Sep 11, 2003
- Dong-Won Jung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photosensitive polymer and chemically amplified photoresist composi...
- Publication number 20020193542
- Publication date Dec 19, 2002
- Dong-Won Jung
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Resist composition comprising photosensitive polymer having loctone...
- Publication number 20020042016
- Publication date Apr 11, 2002
- Kwang-sub Yoon
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Sook-Kyung Lee

Person

Patents Grantslast 30 patents

Antibody specifically binding to HER2

Electron beam lithography method and apparatus

Exposure method using electron beam and substrate manufacturing met...

Display screen or portion thereof with graphical user interface

Multi-exposure semiconductor fabrication mask sets and methods of f...

Resist composition comprising photosensitive polymer having lactone...

Photosensitive polymer and chemically amplified photoresist composi...

Resist composition comprising photosensitive polymer having lactone...

Photosensitive polymer and chemically amplified photoresist composi...

Photosensitive polymer

Photosensitive polymer and resist composition containing the same

Photosensitive polymer and chemically amplified photoresist composi...

Resist composition comprising photosensitive polymer having loctone...

Photosensitive lithocholate derivative and chemically amplified pho...

Photosensitive polymer and chemically amplified photoresist composi...

Patents Applicationslast 30 patents

ELECTRON BEAM LITHOGRAPHY METHOD AND APPARATUS

EXPOSURE METHOD USING ELECTRON BEAM AND SUBSTRATE MANUFACTURING MET...

METHOD FOR FORMING PATTERN USING ANTI-REFLECTIVE COATING COMPOSITIO...

ANTIBODY SPECIFICALLY BINDING TO HER2

Methods And Kits For In Situ Measurement of Enzyme Activity and Amo...

Chemically amplified photoresists and related methods

Multi-exposure semiconductor fabrication mask sets and methods of f...

Photosensitive polymer and chemically amplified photoresist composi...

Resist composition comprising photosensitive polymer having lactone...

Resist composition comprising photosensitive polymer having lactone...

Photosensitive polymer and chemically amplified photoresist composi...

Photosensitive polymer and chemically amplified photoresist composi...

Resist composition comprising photosensitive polymer having loctone...