Srikanteswara Dakshina-Murthy

Person

Wappingers Falls, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Mask for forming integrated circuit
- Patent number 8,629,535
- Issue date Jan 14, 2014
- GLOBALFOUNDRIES Inc.
- Richard J. Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods that control liquid temperature in immersion li...
- Patent number 8,547,521
- Issue date Oct 1, 2013
- Advanced Micro Devices, Inc.
- Srikanteswara Dakshina-Murthy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for imprint lithography to facilitate dual damasc...
- Patent number 8,007,631
- Issue date Aug 30, 2011
- Advanced Micro Devices, Inc.
- Srikanteswara Dakshina-Murthy
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Methods for forming small contacts
- Patent number 7,915,160
- Issue date Mar 29, 2011
- GLOBALFOUNDRIES Inc.
- Cyrus E. Tabery
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist trim process to define small openings in dielectric layers
- Patent number 7,737,021
- Issue date Jun 15, 2010
- Globalfoundries Inc.
- Srikanteswara Dakshina-Murthy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for imprint lithography to facilitate dual damasc...
- Patent number 7,709,373
- Issue date May 4, 2010
- Advanced Micro Devices, Inc.
- Srikanteswara Dakshina-Murthy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask having sidewall absorbers to enable the printing of finer feat...
- Patent number 7,604,903
- Issue date Oct 20, 2009
- Advanced Micro Devices, Inc.
- Bhanwar Singh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming integrated circuit
- Patent number 7,521,304
- Issue date Apr 21, 2009
- Advanced Micro Devices, Inc.
- Richard J. Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Feedback control of imprint mask feature profile using scatterometr...
- Patent number 7,449,348
- Issue date Nov 11, 2008
- Advanced Micro Devices, Inc.
- Srikanteswara Dakshina-Murthy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Formation of semiconductor devices to achieve <100> channel orienta...
- Patent number 7,432,558
- Issue date Oct 7, 2008
- Advanced Micro Devices, Inc.
- Shibly S. Ahmed
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Combination of non-lithographic shrink techniques and trim process...
- Patent number 7,405,032
- Issue date Jul 29, 2008
- Advanced Micro Devices, Inc.
- Gilles Amblard
- G01 - MEASURING TESTING
Information Patent Grant
Post fabrication CD modification on imprint lithography mask
- Patent number 7,386,162
- Issue date Jun 10, 2008
- Advanced Micro Devices, Inc.
- Srikanteswara Dakshina-Murthy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Imprint lithography mask trimming for imprint mask using etch
- Patent number 7,384,569
- Issue date Jun 10, 2008
- Advanced Micro Devices, Inc.
- Srikanteswara Dakshina-Murthy
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Using supercritical fluids to clean lenses and monitor defects
- Patent number 7,381,278
- Issue date Jun 3, 2008
- Advanced Micro Devices, Inc.
- Ramkumar Subramanian
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Topography compensation of imprint lithography patterning
- Patent number 7,376,259
- Issue date May 20, 2008
- Advanced Micro Devices, Inc.
- Srikanteswara Dakshina-Murthy
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for forming a semiconductor arrangement with gate sidewall s...
- Patent number 7,279,386
- Issue date Oct 9, 2007
- Advanced Micro Devices, Inc.
- Mark C. Kelling
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for semiconductor gate line dimension reduction
- Patent number 7,268,066
- Issue date Sep 11, 2007
- Advanced Micro Devices, Inc.
- Douglas J. Bonser
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for imprint lithography to facilitate dual damasc...
- Patent number 7,235,474
- Issue date Jun 26, 2007
- Advanced Micro Devices, Inc.
- Srikanteswara Dakshina-Murthy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a semiconductor arrangement with reduced field-to...
- Patent number 7,223,698
- Issue date May 29, 2007
- Advanced Micro Devices, Inc.
- Douglas J. Bonser
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Flash memory device
- Patent number 7,196,372
- Issue date Mar 27, 2007
- Spansion LLC
- Bin Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control of bottom dimension of tapered contact via variation(s) of...
- Patent number 7,186,650
- Issue date Mar 6, 2007
- Advanced Micro Devices, Inc.
- Srikanteswara Dakshina-Murthy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming small contacts
- Patent number 7,183,223
- Issue date Feb 27, 2007
- Advanced Micro Devices, Inc.
- Cyrus E. Tabery
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Epitaxially grown fin for FinFET
- Patent number 7,183,152
- Issue date Feb 27, 2007
- Advanced Micro Devices, Inc.
- Srikanteswara Dakshina-Murthy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device having a fin structure
- Patent number 7,179,692
- Issue date Feb 20, 2007
- Advanced Micro Devices, Inc.
- Bin Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Real time immersion medium control using scatterometry
- Patent number 7,158,896
- Issue date Jan 2, 2007
- Advanced Micro Devices, Inc.
- Bhanwar Singh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Using supercritical fluids to clean lenses and monitor defects
- Patent number 7,156,925
- Issue date Jan 2, 2007
- Advanced Micro Devices, Inc.
- Ramkumar Subramanian
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for imprint lithography to facilitate dual damasc...
- Patent number 7,148,142
- Issue date Dec 12, 2006
- Advanced Micro Devices, Inc.
- Srikanteswara Dakshina-Murthy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming isolation trench with spacer formation
- Patent number 7,144,785
- Issue date Dec 5, 2006
- Advanced Micro Devices, Inc.
- Srikanteswara Dakshina-Murthy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Patterning with rigid organic under-layer
- Patent number 7,122,455
- Issue date Oct 17, 2006
- Advanced Micro Devices, Inc.
- Christopher F. Lyons
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Capping layer for reducing amorphous carbon contamination of photor...
- Patent number 7,109,101
- Issue date Sep 19, 2006
- AMD, Inc.
- Marilyn I. Wright
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
MASK FOR FORMING INTEGRATED CIRCUIT
- Publication number 20120007221
- Publication date Jan 12, 2012
- GLOBALFOUNDRIES INC.
- Richard J. Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR IMPRINT LITHOGRAPHY TO FACILITATE DUAL DAMASC...
- Publication number 20070283883
- Publication date Dec 13, 2007
- Advanced Micro Devices, Inc.
- Srikanteswara Dakshina-Murthy
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method for forming a semiconductor arrangement with gate sidewall s...
- Publication number 20060121711
- Publication date Jun 8, 2006
- Advanced Micro Devices, Inc.
- Mark C. Kelling
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming isolation trench with spacer formation
- Publication number 20060094205
- Publication date May 4, 2006
- Advanced Micro Devices, Inc.
- Srikanteswara Dakshina-Murthy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of reducing STI divot formation during semiconductor device...
- Publication number 20050196928
- Publication date Sep 8, 2005
- Advanced Micro Devices, Inc.
- Douglas J. Bonser
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for forming rectangular-shaped spacers for semiconductor dev...
- Publication number 20050146059
- Publication date Jul 7, 2005
- Huicai Zhong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Self aligned damascene gate
- Publication number 20050104091
- Publication date May 19, 2005
- Cyrus E. Tabery
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for semiconductor gate line dimension reduction
- Publication number 20050020019
- Publication date Jan 27, 2005
- Advanced Micro Devices, Inc.
- Douglas J. Bonser
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of manufacturing a semiconductor device having a U-shaped ga...
- Publication number 20050006666
- Publication date Jan 13, 2005
- Bin Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Narrow fin finfet
- Publication number 20040197975
- Publication date Oct 7, 2004
- Zoran Krivokapic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Strained channel FinFET
- Publication number 20040195627
- Publication date Oct 7, 2004
- Srikanteswara Dakshina-Murthy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STRAINED CHANNEL FINFET
- Publication number 20040145019
- Publication date Jul 29, 2004
- Srikanteswara Dakshina-Murthy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device having a U-shaped gate structure
- Publication number 20040075121
- Publication date Apr 22, 2004
- Bin Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Post etch overlay metrology to avoid absorbing layers preventing me...
- Publication number 20040063008
- Publication date Apr 1, 2004
- Advanced Micro Devices, Inc.
- Cyrus E. Tabery
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for reducing pattern deformation and photoresist poisoning i...
- Publication number 20040023475
- Publication date Feb 5, 2004
- Advanced Micro Devices, Inc.
- Douglas J. Bonser
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Metal gate stack with etch stop layer having implanted metal species
- Publication number 20030003645
- Publication date Jan 2, 2003
- Advanced Micro Devices, Inc.
- Paul R. Besser
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL GATE STACK WITH ETCH STOP LAYER HAVING IMPLANTED METAL SPECIES
- Publication number 20020132415
- Publication date Sep 19, 2002
- Advanced Micro Devices, Inc.
- Paul R. Besser
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Resist trim process to define small openings in dielectric layers
- Publication number 20020068436
- Publication date Jun 6, 2002
- Srikanteswara Dakshina-Murthy
- H01 - BASIC ELECTRIC ELEMENTS

Srikanteswara Dakshina-Murthy

Person

Patents Grantslast 30 patents

Mask for forming integrated circuit

Systems and methods that control liquid temperature in immersion li...

System and method for imprint lithography to facilitate dual damasc...

Methods for forming small contacts

Resist trim process to define small openings in dielectric layers

System and method for imprint lithography to facilitate dual damasc...

Mask having sidewall absorbers to enable the printing of finer feat...

Method for forming integrated circuit

Feedback control of imprint mask feature profile using scatterometr...

Formation of semiconductor devices to achieve <100> channel orienta...

Combination of non-lithographic shrink techniques and trim process...

Post fabrication CD modification on imprint lithography mask

Imprint lithography mask trimming for imprint mask using etch

Using supercritical fluids to clean lenses and monitor defects

Topography compensation of imprint lithography patterning

Method for forming a semiconductor arrangement with gate sidewall s...

Method for semiconductor gate line dimension reduction

System and method for imprint lithography to facilitate dual damasc...

Method of forming a semiconductor arrangement with reduced field-to...

Flash memory device

Control of bottom dimension of tapered contact via variation(s) of...

Methods for forming small contacts

Epitaxially grown fin for FinFET

Method of manufacturing a semiconductor device having a fin structure

Real time immersion medium control using scatterometry

Using supercritical fluids to clean lenses and monitor defects

System and method for imprint lithography to facilitate dual damasc...

Method of forming isolation trench with spacer formation

Patterning with rigid organic under-layer

Capping layer for reducing amorphous carbon contamination of photor...

Patents Applicationslast 30 patents

MASK FOR FORMING INTEGRATED CIRCUIT

SYSTEM AND METHOD FOR IMPRINT LITHOGRAPHY TO FACILITATE DUAL DAMASC...

Method for forming a semiconductor arrangement with gate sidewall s...

Method of forming isolation trench with spacer formation

Method of reducing STI divot formation during semiconductor device...

Method for forming rectangular-shaped spacers for semiconductor dev...

Self aligned damascene gate

Method for semiconductor gate line dimension reduction

Method of manufacturing a semiconductor device having a U-shaped ga...

Narrow fin finfet

Strained channel FinFET

STRAINED CHANNEL FINFET

Semiconductor device having a U-shaped gate structure

Post etch overlay metrology to avoid absorbing layers preventing me...

Method for reducing pattern deformation and photoresist poisoning i...

Metal gate stack with etch stop layer having implanted metal species

METAL GATE STACK WITH ETCH STOP LAYER HAVING IMPLANTED METAL SPECIES

Resist trim process to define small openings in dielectric layers