Stanislav Kadlec

Person

Prague, CZ

People

Patents Grantslast 30 patents

Information Patent Grant
Low voltage MEMS relay filled with alternative gas mixture to SF6
- Patent number 11,842,871
- Issue date Dec 12, 2023
- EATON INTELLIGENT POWER LIMITED
- Stanislav Kadlec
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Arc suppression and pulsing in high power impulse magnetron sputter...
- Patent number 11,211,234
- Issue date Dec 28, 2021
- EVATEC AG
- Stanislav Kadlec
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF substrate bias with high power impulse magnetron sputtering (HIP...
- Patent number 10,692,707
- Issue date Jun 23, 2020
- EVATEC AG
- Jürgen Weichart
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Target shaping
- Patent number 9,611,537
- Issue date Apr 4, 2017
- EVATEC AG
- Stanislav Kadlec
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for producing a directional layer by cathode sputtering, and...
- Patent number 9,587,306
- Issue date Mar 7, 2017
- EVATEC AG
- Hartmut Rohrmann
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Arc suppression and pulsing in high power impulse magnetron sputter...
- Patent number 9,355,824
- Issue date May 31, 2016
- EVATEC AG
- Stanislav Kadlec
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of magnetron sputtering and a method for determining a power...
- Patent number 8,574,409
- Issue date Nov 5, 2013
- OC Oerlikon Balzers AG
- Stanislav Kadlec
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Application of HIPIMS to through silicon via metallization in three...
- Patent number 8,475,634
- Issue date Jul 2, 2013
- OC Oerlikon Balzers AF
- Jurgen Weichart
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
RF substrate bias with high power impulse magnetron sputtering (HIP...
- Patent number 8,435,389
- Issue date May 7, 2013
- OC Oerlikon Balzers AG
- Stanislav Kadlec
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of magnetron sputtering and a method for determining a power...
- Patent number 8,246,794
- Issue date Aug 21, 2012
- OC Oerlikon Blazers Ag
- Stanislav Kadlec
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ELECTRICAL CONTACT SYSTEM WITH LIQUID METAL LAYER AND DIFFUSION BAR...
- Publication number 20240274373
- Publication date Aug 15, 2024
- Eaton Intelligent Power Limited
- Stanislav Kadlec
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW VOLTAGE MEMS RELAY FILLED WITH ALTERNATIVE GAS MIXTURE TO SF6
- Publication number 20230082203
- Publication date Mar 16, 2023
- Eaton Intelligent Power Limited
- Stanislav Kadlec
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
ARC SUPPRESSION AND PULSING IN HIGH POWER IMPULSE MAGNETRON SPUTTER...
- Publication number 20160237554
- Publication date Aug 18, 2016
- Evatec AG
- Stanislav Kadlec
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RF SUBSTRATE BIAS WITH HIGH POWER IMPULSE MAGNETRON SPUTTERING (HIP...
- Publication number 20130220802
- Publication date Aug 29, 2013
- OC OERLIKON BALZERS AG
- Jurgen Weichart
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF MAGNETRON SPUTTERING AND A METHOD FOR DETERMINING A POWER...
- Publication number 20120279851
- Publication date Nov 8, 2012
- OC OERLIKON BALZERS AG
- Stanislav Kadlec
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TARGET SHAPING
- Publication number 20110203920
- Publication date Aug 25, 2011
- OC OERLIKON BALZERS AG
- Stanislav Kadlec
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REACTIVE SPUTTERING WITH HIPIMS
- Publication number 20090173622
- Publication date Jul 9, 2009
- OC OERLIKON BALZERS AG
- Juergen Weichart
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF MAGNETRON SPUTTERING AND A METHOD FOR DETERMINING A POWER...
- Publication number 20090173621
- Publication date Jul 9, 2009
- OC OERLIKON BALZERS AG
- Stanislav Kadlec
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for producing a directional layer by cathode sputtering, and...
- Publication number 20090134011
- Publication date May 28, 2009
- OC Oerlikon Balzers AG
- Hartmut Rohrmann
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPLICATION OF HIPIMS TO THROUGH SILICON VIA METALLIZATION IN THREE...
- Publication number 20090111216
- Publication date Apr 30, 2009
- OC OERLIKON BALZERS AG
- Jurgen Weichart
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ARC SUPPRESSION AND PULSING IN HIGH POWER IMPULSE MAGNETRON SPUTTER...
- Publication number 20080135400
- Publication date Jun 12, 2008
- OC OERLIKON BALZERS AG
- Stanislav Kadlec
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RF SUBSTRATE BIAS WITH HIGH POWER IMPULSE MAGNETRON SPUTTERING (HIP...
- Publication number 20080135401
- Publication date Jun 12, 2008
- OC OERLIKON BALZERS AG
- Stanislav Kadlec
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF MANUFACTURING AT LEAST ONE SPUTTER-COATED SUBSTRATE AND S...
- Publication number 20070175748
- Publication date Aug 2, 2007
- OC OERLIKON BALZERS AG
- Fachri Atamny
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Stanislav Kadlec

Person

Patents Grantslast 30 patents

Low voltage MEMS relay filled with alternative gas mixture to SF6

Arc suppression and pulsing in high power impulse magnetron sputter...

RF substrate bias with high power impulse magnetron sputtering (HIP...

Target shaping

Method for producing a directional layer by cathode sputtering, and...

Arc suppression and pulsing in high power impulse magnetron sputter...

Method of magnetron sputtering and a method for determining a power...

Application of HIPIMS to through silicon via metallization in three...

RF substrate bias with high power impulse magnetron sputtering (HIP...

Method of magnetron sputtering and a method for determining a power...

Patents Applicationslast 30 patents

ELECTRICAL CONTACT SYSTEM WITH LIQUID METAL LAYER AND DIFFUSION BAR...

LOW VOLTAGE MEMS RELAY FILLED WITH ALTERNATIVE GAS MIXTURE TO SF6

ARC SUPPRESSION AND PULSING IN HIGH POWER IMPULSE MAGNETRON SPUTTER...

RF SUBSTRATE BIAS WITH HIGH POWER IMPULSE MAGNETRON SPUTTERING (HIP...

METHOD OF MAGNETRON SPUTTERING AND A METHOD FOR DETERMINING A POWER...

TARGET SHAPING

REACTIVE SPUTTERING WITH HIPIMS

METHOD OF MAGNETRON SPUTTERING AND A METHOD FOR DETERMINING A POWER...

Method for producing a directional layer by cathode sputtering, and...

APPLICATION OF HIPIMS TO THROUGH SILICON VIA METALLIZATION IN THREE...

ARC SUPPRESSION AND PULSING IN HIGH POWER IMPULSE MAGNETRON SPUTTER...

RF SUBSTRATE BIAS WITH HIGH POWER IMPULSE MAGNETRON SPUTTERING (HIP...

METHOD OF MANUFACTURING AT LEAST ONE SPUTTER-COATED SUBSTRATE AND S...