Stanley F. Wanat

Person

Scotch Plains, NJ, US

People

Patents Grantslast 30 patents

Information Patent Grant
Photoresist compositions comprising acetals and ketals as solvents
- Patent number 6,911,293
- Issue date Jun 28, 2005
- Clariant Finance (BVI) Limited
- Stanley F. Wanat
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Fractionation of resins using a static mixer and a liquid-liquid ce...
- Patent number 6,512,087
- Issue date Jan 28, 2003
- Clariant Finance (BVI) Limited
- Stanley F. Wanat
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Aqueous developable negative acting photosensitive composition havi...
- Patent number 6,451,491
- Issue date Sep 17, 2002
- Agfa Corporation
- Major S. Dhillon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of reducing metal ion content of film-forming resins using a...
- Patent number 6,297,352
- Issue date Oct 2, 2001
- Clariant Finance (BVI) Limited
- Stanley F. Wanat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Preparation of fractionated novolak resins by a novel extraction te...
- Patent number 6,121,412
- Issue date Sep 19, 2000
- Clariant Finance (BVI) Limited
- Stanley F. Wanat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition containing a novel polymer
- Patent number 6,103,443
- Issue date Aug 15, 2000
- Clariant Finance Lmited
- Stanley F. Wanat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fractionated novolak resin copolymer and photoresist composition th...
- Patent number 5,928,836
- Issue date Jul 27, 1999
- Clariant Finance (BVI) Limited
- M. Dalil Rahman
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Quinonediazide positive photoresist utilizing mixed solvent consist...
- Patent number 5,853,947
- Issue date Dec 29, 1998
- Clariant Finance (BVI) Limited
- Stanley F. Wanat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for preparing improved lithographic printing plates by brus...
- Patent number 5,432,046
- Issue date Jul 11, 1995
- Hoechst Celanese Corporation
- Stanley F. Wanat
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Water developable, negative working overlay or transfer type diazo...
- Patent number 5,429,903
- Issue date Jul 4, 1995
- Hoechst Celanese Corporation
- Stanley F. Wanat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Water developable, negative working overlay color proofing system u...
- Patent number 5,348,834
- Issue date Sep 20, 1994
- Hoechst Celanese Corporation
- Stanley F. Wanat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Water developable, negative working overlay color proofing system u...
- Patent number 5,212,041
- Issue date May 18, 1993
- Hoechst Celanese Corporation
- Stanley F. Wanat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive diazonium resin, element made therefrom, method of p...
- Patent number 5,200,291
- Issue date Apr 6, 1993
- Hoechst Celanese Corporation
- Stanley F. Wanat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Protected color image on substrate with thermal adhesive and antibl...
- Patent number 4,999,266
- Issue date Mar 12, 1991
- Hoechst Celanese Corporation
- Stephan J. W. Platzer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pigment transfer to photopolymerizable positive-working imaging system
- Patent number 4,935,331
- Issue date Jun 19, 1990
- Hoechst Celanese Corporation
- Stephan J. W. Platzer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Water developable, negative working overlay or transfer type diazo...
- Patent number 4,914,039
- Issue date Apr 3, 1990
- Hoechst Celanese Corporation
- Stanley F. Wanat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Protective coating for images
- Patent number 4,719,169
- Issue date Jan 12, 1988
- Hoechst Celanese Corporation
- Stephan J. W. Platzer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electrolytes for electrochemically treated metal plates
- Patent number 4,452,674
- Issue date Jun 5, 1984
- American Hoechst Corporation
- Thomas N. Gillich
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Electrochemically treated metal plates
- Patent number 4,448,647
- Issue date May 15, 1984
- American Hoechst Corporation
- Thomas N. Gillich
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Novel electrolytes for electrochemically treated metal plates
- Patent number 4,399,021
- Issue date Aug 16, 1983
- American Hoechst Corporation
- Thomas N. Gillich
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Electrochemically treated metal plates
- Patent number 4,383,897
- Issue date May 17, 1983
- American Hoechst Corporation
- Thomas N. Gillich
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Positive developer containing non-ionic surfactants
- Patent number 4,374,920
- Issue date Feb 22, 1983
- American Hoechst Corporation
- Stanley F. Wanat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Light sensitive film composition
- Patent number 4,157,918
- Issue date Jun 12, 1979
- American Hoechst Corporation
- Stanley F. Wanat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Photoresist compositions comprising acetals and ketals as solvents
- Publication number 20030194636
- Publication date Oct 16, 2003
- Stanley F. Wanat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for the production of anhydride modified polyvinyl acetals u...
- Publication number 20030166750
- Publication date Sep 4, 2003
- Gabor I. Koletar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Assembly system for stationing semiconductor wafer suitable for pro...
- Publication number 20030092246
- Publication date May 15, 2003
- Stanley F. Wanat
- B24 - GRINDING POLISHING

Stanley F. Wanat

Person

Patents Grantslast 30 patents

Photoresist compositions comprising acetals and ketals as solvents

Fractionation of resins using a static mixer and a liquid-liquid ce...

Aqueous developable negative acting photosensitive composition havi...

Method of reducing metal ion content of film-forming resins using a...

Preparation of fractionated novolak resins by a novel extraction te...

Photoresist composition containing a novel polymer

Fractionated novolak resin copolymer and photoresist composition th...

Quinonediazide positive photoresist utilizing mixed solvent consist...

Process for preparing improved lithographic printing plates by brus...

Water developable, negative working overlay or transfer type diazo...

Water developable, negative working overlay color proofing system u...

Water developable, negative working overlay color proofing system u...

Photosensitive diazonium resin, element made therefrom, method of p...

Protected color image on substrate with thermal adhesive and antibl...

Pigment transfer to photopolymerizable positive-working imaging system

Water developable, negative working overlay or transfer type diazo...

Protective coating for images

Electrolytes for electrochemically treated metal plates

Electrochemically treated metal plates

Novel electrolytes for electrochemically treated metal plates

Electrochemically treated metal plates

Positive developer containing non-ionic surfactants

Light sensitive film composition

Patents Applicationslast 30 patents

Photoresist compositions comprising acetals and ketals as solvents

Method for the production of anhydride modified polyvinyl acetals u...

Assembly system for stationing semiconductor wafer suitable for pro...