Stefan Wiesner

Person

Lauchheim, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Projection exposure system for semiconductor lithography, comprisin...
- Patent number 10,712,677
- Issue date Jul 14, 2020
- Carl Zeiss SMT GmbH
- Irene Ament
- B08 - CLEANING
Information Patent Grant
Reflective optical element for EUV lithography
- Patent number 10,649,340
- Issue date May 12, 2020
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Method and device for connecting an optical element to a frame
- Patent number 9,604,299
- Issue date Mar 28, 2017
- Carl Zeiss SMT GmbH
- Armin Schoeppach
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Cleaning module, EUV lithography device and method for the cleaning...
- Patent number 9,046,794
- Issue date Jun 2, 2015
- Carl Zeiss SMT GmbH
- Stefan Hembacher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV lithography device and method for processing an optical element
- Patent number 8,885,141
- Issue date Nov 11, 2014
- Carl Zeiss SMT GmbH
- Wolfgang Singer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mirror for guiding a radiation bundle
- Patent number 8,717,531
- Issue date May 6, 2014
- Carl Zeiss SMT GmbH
- Severin Waldis
- G02 - OPTICS
Information Patent Grant
Method and device for connecting an optical element to a frame
- Patent number 8,705,006
- Issue date Apr 22, 2014
- Carl Zeiss SMT GmbH
- Armin Schoeppach
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method and device for decontaminating optical surfaces
- Patent number 6,796,664
- Issue date Sep 28, 2004
- Carl Zeiss SMT AG
- Jens Luedecke
- B08 - CLEANING

Patents Applicationslast 30 patents

Information Patent Application
PROJECTION EXPOSURE SYSTEM FOR SEMICONDUCTOR LITHOGRAPHY, COMPRISIN...
- Publication number 20190243258
- Publication date Aug 8, 2019
- Carl Zeiss SMT GMBH
- Irene AMENT
- B08 - CLEANING
Information Patent Application
REFLECTIVE OPTICAL ELEMENT FOR EUV LITHOGRAPHY
- Publication number 20190171108
- Publication date Jun 6, 2019
- Carl Zeiss SMT GMBH
- Dirk Heinrich EHM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND DEVICE FOR CONNECTING AN OPTICAL ELEMENT TO A FRAME
- Publication number 20150008215
- Publication date Jan 8, 2015
- Carl Zeiss SMT GMBH
- Armin Schoeppach
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
METHOD FOR PRODUCING FACET MIRRORS AND PROJECTION EXPOSURE APPARATUS
- Publication number 20130100426
- Publication date Apr 25, 2013
- Carl Zeiss SMT GMBH
- Berndt Warm
- G02 - OPTICS
Information Patent Application
METHOD FOR AVOIDING CONTAMINATION AND EUV-LITHOGRAPHY-SYSTEM
- Publication number 20120086925
- Publication date Apr 12, 2012
- Carl Zeiss SMT GMBH
- Dieter KRAUS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV Lithography Device and Method For Processing An Optical Element
- Publication number 20110279799
- Publication date Nov 17, 2011
- Carl Zeiss SMT GMBH
- Wolfgang Singer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CLEANING MODULE AND EUV LITHOGRAPHY DEVICE WITH CLEANING MODULE
- Publication number 20110058147
- Publication date Mar 10, 2011
- Carl Zeiss SMT AG
- Dirk Heinrich Ehm
- B08 - CLEANING
Information Patent Application
CLEANING MODULE, EUV LITHOGRAPHY DEVICE AND METHOD FOR THE CLEANING...
- Publication number 20110043774
- Publication date Feb 24, 2011
- Carl Zeiss SMT AG
- Stefan HEMBACHER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MIRROR FOR GUIDING A RADIATION BUNDLE
- Publication number 20100261120
- Publication date Oct 14, 2010
- Carl Zeiss SMT AG
- Severin Waldis
- G02 - OPTICS
Information Patent Application
METHOD AND SYSTEM FOR REMOVING CONTAMINANTS FROM A SURFACE
- Publication number 20100071720
- Publication date Mar 25, 2010
- Carl Zeiss SMT AG
- Dirk Heinrich Ehm
- B08 - CLEANING
Information Patent Application
METHOD FOR PRODUCING FACET MIRRORS AND PROJECTION EXPOSURE APPARATUS
- Publication number 20100007866
- Publication date Jan 14, 2010
- Carl Zeiss SMT AG
- Berndt Warm
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
METHOD AND DEVICE FOR CONNECTING AN OPTICAL ELEMENT TO A FRAME
- Publication number 20090244508
- Publication date Oct 1, 2009
- Carl Zeiss SMT AG
- Armin Schoeppach
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
Method and device for decontaminating optical surfaces
- Publication number 20030210458
- Publication date Nov 13, 2003
- Carl Zeiss SMT AG
- Jens Luedecke
- B08 - CLEANING

Stefan Wiesner

Person

Patents Grantslast 30 patents

Projection exposure system for semiconductor lithography, comprisin...

Reflective optical element for EUV lithography

Method and device for connecting an optical element to a frame

Cleaning module, EUV lithography device and method for the cleaning...

EUV lithography device and method for processing an optical element

Mirror for guiding a radiation bundle

Method and device for connecting an optical element to a frame

Method and device for decontaminating optical surfaces

Patents Applicationslast 30 patents

PROJECTION EXPOSURE SYSTEM FOR SEMICONDUCTOR LITHOGRAPHY, COMPRISIN...

REFLECTIVE OPTICAL ELEMENT FOR EUV LITHOGRAPHY

METHOD AND DEVICE FOR CONNECTING AN OPTICAL ELEMENT TO A FRAME

METHOD FOR PRODUCING FACET MIRRORS AND PROJECTION EXPOSURE APPARATUS

METHOD FOR AVOIDING CONTAMINATION AND EUV-LITHOGRAPHY-SYSTEM

EUV Lithography Device and Method For Processing An Optical Element

CLEANING MODULE AND EUV LITHOGRAPHY DEVICE WITH CLEANING MODULE

CLEANING MODULE, EUV LITHOGRAPHY DEVICE AND METHOD FOR THE CLEANING...

MIRROR FOR GUIDING A RADIATION BUNDLE

METHOD AND SYSTEM FOR REMOVING CONTAMINANTS FROM A SURFACE

METHOD FOR PRODUCING FACET MIRRORS AND PROJECTION EXPOSURE APPARATUS

METHOD AND DEVICE FOR CONNECTING AN OPTICAL ELEMENT TO A FRAME

Method and device for decontaminating optical surfaces