Stephan Wege

Person

Weissig, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Method of preparing a coating solution and a corresponding use of t...
- Patent number 7,879,395
- Issue date Feb 1, 2011
- Qimonda AG
- Andreas Klipp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of preventing etch profile bending and bowing in high aspect...
- Patent number 7,846,846
- Issue date Dec 7, 2010
- Applied Materials, Inc.
- Kallol Bera
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming a structure on a substrate and device
- Patent number 7,737,049
- Issue date Jun 15, 2010
- Qimonda AG
- Dirk Manger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for processing a substrate
- Patent number 7,544,270
- Issue date Jun 9, 2009
- Infineon Technologies AG
- Stephan Wege
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photolithographic patterning process using a carbon hard mask layer...
- Patent number 7,368,390
- Issue date May 6, 2008
- Infineon Technologies AG
- Guenther Czech
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fabrication method for a semiconductor structure
- Patent number 7,265,023
- Issue date Sep 4, 2007
- Infineon Technologies AG
- Moritz Haupt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for production of a semiconductor structure
- Patent number 7,141,507
- Issue date Nov 28, 2006
- Infineon Technologies AG
- Oliver Genz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating a semiconductor structure
- Patent number 7,105,404
- Issue date Sep 12, 2006
- Infineon Technologies AG
- Mihel Seitz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for producing an etching mask on a microstructure, in parti...
- Patent number 7,037,777
- Issue date May 2, 2006
- Infineon Technologies AG
- Hans-Peter Moll
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Production method for a semiconductor component
- Patent number 6,919,269
- Issue date Jul 19, 2005
- Infineon Technologies AG
- Manfred Schneegans
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for etching high-aspect-ratio features
- Patent number 6,897,155
- Issue date May 24, 2005
- Applied Materials, Inc.
- Ajay Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CMP process
- Patent number 6,821,894
- Issue date Nov 23, 2004
- Infineon Technologies AG
- Peter Lahnor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CVD method of producing in situ-doped polysilicon layers and polysi...
- Patent number 6,693,022
- Issue date Feb 17, 2004
- Infineon Technologies AG
- Joerg Dreybrodt
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and device for producing a metal/metal contact in a multilay...
- Patent number 6,596,625
- Issue date Jul 22, 2003
- Infineon Technologies AG
- Martin Schneegans
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating a trench isolation for electrically active c...
- Patent number 6,583,020
- Issue date Jun 24, 2003
- Infineon Technologies AG
- Ines Uhlig
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing a conductor structure for an integrated ci...
- Patent number 6,541,372
- Issue date Apr 1, 2003
- Infineon Technologies AG
- Stephan Wege
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of structuring a metal-containing layer
- Patent number 6,511,918
- Issue date Jan 28, 2003
- Infineon Technologies AG
- Stephan Wege
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of structuring layers with a polysilicon layer and an overly...
- Patent number 6,479,373
- Issue date Nov 12, 2002
- Infineon Technologies AG
- Joerg Dreybrodt
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of producing a semiconductor device comprising a cleaning pr...
- Patent number 6,436,731
- Issue date Aug 20, 2002
- Infineon Technologies AG
- Achim Neu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition of various base layers for selective layer growth in sem...
- Patent number 6,380,074
- Issue date Apr 30, 2002
- Infineon Technologies AG
- Markus Kirchhoff
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dielectric filling of electrical wiring planes
- Patent number 6,380,076
- Issue date Apr 30, 2002
- Infineon Technologies AG
- Markus Kirchhoff
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for improving the readability of alignment marks
- Patent number 6,153,492
- Issue date Nov 28, 2000
- Infineon Technologies AG
- Stephan Wege
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHODS FOR FORMING HIGH ASPECT RATIO FEATURES ON A SUBSTRATE
- Publication number 20100330805
- Publication date Dec 30, 2010
- KENNY LINH DOAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Manufacturing Contact Openings, Method for Manufacturing...
- Publication number 20090321940
- Publication date Dec 31, 2009
- Gerhard Kunkel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of Manufacturing a Semiconductor Device
- Publication number 20090239314
- Publication date Sep 24, 2009
- Martin Haberjahn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of Double Patterning, Photo Sensitive Layer Stack for Doubl...
- Publication number 20090219496
- Publication date Sep 3, 2009
- Frank-Michael Kamm
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of Fabricating an Integrated Circuit
- Publication number 20090166318
- Publication date Jul 2, 2009
- Mihel Seitz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Processing a Spacer Structure, Method of Manufacturing a...
- Publication number 20090127722
- Publication date May 21, 2009
- Christoph Noelscher
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
Method of Fabricating an Integrated Circuit
- Publication number 20090115027
- Publication date May 7, 2009
- Stephan Wege
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Manufacturing a Structure, Semiconductor Device and Stru...
- Publication number 20090102023
- Publication date Apr 23, 2009
- Stephan Wege
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
METHOD OF PREVENTING ETCH PROFILE BENDING AND BOWING IN HIGH ASPECT...
- Publication number 20090081876
- Publication date Mar 26, 2009
- Applied Materials, Inc.
- Kallol BERA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Forming a Structure on a Substrate and Device
- Publication number 20090033362
- Publication date Feb 5, 2009
- Dirk Manger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of preparing a coating solution and a corresponding use of t...
- Publication number 20080090101
- Publication date Apr 17, 2008
- Andreas Klipp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and device for depositing a protective layer during an etchi...
- Publication number 20070232070
- Publication date Oct 4, 2007
- Stephan Wege
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for the treatment of material, in particular in the fabricat...
- Publication number 20070123045
- Publication date May 31, 2007
- Stephan Wege
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus for processing a substrate
- Publication number 20070111339
- Publication date May 17, 2007
- Stephan Wege
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fabrication method for a semiconductor structure
- Publication number 20050245042
- Publication date Nov 3, 2005
- Moritz Haupt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and device for monitoring the etching operation for a regula...
- Publication number 20050239223
- Publication date Oct 27, 2005
- Infineon Technologies AG
- Ulrich Mantz
- G01 - MEASURING TESTING
Information Patent Application
Method for fabricating a semiconductor structure
- Publication number 20050202626
- Publication date Sep 15, 2005
- Infineon Technologies AG
- Mihel Seitz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for production of a semiconductor structure
- Publication number 20050196952
- Publication date Sep 8, 2005
- Infineon Technologies AG
- Oliver Genz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Photolithographic method for forming a structure in a semiconductor...
- Publication number 20050148193
- Publication date Jul 7, 2005
- Infineon Technologies AG
- Markus Kirchhoff
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Photolithographic patterning process using a carbon hard mask layer...
- Publication number 20050112506
- Publication date May 26, 2005
- Gunter Czech
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process for producing an etching mask on a microstructure, in parti...
- Publication number 20040203238
- Publication date Oct 14, 2004
- Hans-Peter Moll
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for fabricating a semiconductor structure
- Publication number 20040192060
- Publication date Sep 30, 2004
- Maik Stegemann
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Production method for a semiconductor component
- Publication number 20040147102
- Publication date Jul 29, 2004
- Manfred Schneegans
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for etching high-aspect-ratio features
- Publication number 20040033697
- Publication date Feb 19, 2004
- APPLIED MATERIALS, INC.
- Ajay Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of producing doped polysilicon layers and polysilicon layere...
- Publication number 20030017684
- Publication date Jan 23, 2003
- Infineon Technologies AG
- Joerg Dreybrodt
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for fabricating a trench isolation for electrically active c...
- Publication number 20020086478
- Publication date Jul 4, 2002
- Ines Uhlig
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CMP process
- Publication number 20020036181
- Publication date Mar 28, 2002
- Peter Lahnor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and device for producing a metal/metal contact in a multilay...
- Publication number 20020022342
- Publication date Feb 21, 2002
- Manfred Schneegans
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of producing doped polysilicon layers and polysilicon layere...
- Publication number 20020016044
- Publication date Feb 7, 2002
- Joerg Dreybrodt
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of structuring a metal-containing layer
- Publication number 20020011461
- Publication date Jan 31, 2002
- Stephan Wege
- H01 - BASIC ELECTRIC ELEMENTS

Stephan Wege

Person

Patents Grantslast 30 patents

Method of preparing a coating solution and a corresponding use of t...

Method of preventing etch profile bending and bowing in high aspect...

Method for forming a structure on a substrate and device

Apparatus for processing a substrate

Photolithographic patterning process using a carbon hard mask layer...

Fabrication method for a semiconductor structure

Method for production of a semiconductor structure

Method for fabricating a semiconductor structure

Process for producing an etching mask on a microstructure, in parti...

Production method for a semiconductor component

Method for etching high-aspect-ratio features

CMP process

CVD method of producing in situ-doped polysilicon layers and polysi...

Method and device for producing a metal/metal contact in a multilay...

Method for fabricating a trench isolation for electrically active c...

Method for manufacturing a conductor structure for an integrated ci...

Method of structuring a metal-containing layer

Method of structuring layers with a polysilicon layer and an overly...

Method of producing a semiconductor device comprising a cleaning pr...

Deposition of various base layers for selective layer growth in sem...

Dielectric filling of electrical wiring planes

Method for improving the readability of alignment marks

Patents Applicationslast 30 patents

METHODS FOR FORMING HIGH ASPECT RATIO FEATURES ON A SUBSTRATE

Method for Manufacturing Contact Openings, Method for Manufacturing...

Methods of Manufacturing a Semiconductor Device

Methods of Double Patterning, Photo Sensitive Layer Stack for Doubl...

Method of Fabricating an Integrated Circuit

Method for Processing a Spacer Structure, Method of Manufacturing a...

Method of Fabricating an Integrated Circuit

Method for Manufacturing a Structure, Semiconductor Device and Stru...

METHOD OF PREVENTING ETCH PROFILE BENDING AND BOWING IN HIGH ASPECT...

Method for Forming a Structure on a Substrate and Device

Method of preparing a coating solution and a corresponding use of t...

Method and device for depositing a protective layer during an etchi...

Method for the treatment of material, in particular in the fabricat...

Apparatus for processing a substrate

Fabrication method for a semiconductor structure

Method and device for monitoring the etching operation for a regula...

Method for fabricating a semiconductor structure

Method for production of a semiconductor structure

Photolithographic method for forming a structure in a semiconductor...

Photolithographic patterning process using a carbon hard mask layer...

Process for producing an etching mask on a microstructure, in parti...

Method for fabricating a semiconductor structure

Production method for a semiconductor component

Method for etching high-aspect-ratio features

Method of producing doped polysilicon layers and polysilicon layere...

Method for fabricating a trench isolation for electrically active c...

CMP process

Method and device for producing a metal/metal contact in a multilay...

Method of producing doped polysilicon layers and polysilicon layere...

Method of structuring a metal-containing layer