Stephen Roux

Person

Purdys, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
On chip sensor for wafer overlay measurement
- Patent number 12,066,762
- Issue date Aug 20, 2024
- ASML Holding N.V. & ASML Netherlands B.V.
- Mohamed Swillam
- G02 - OPTICS
Information Patent Grant
Lithographic apparatus, metrology systems, phased array illuminatio...
- Patent number 11,994,808
- Issue date May 28, 2024
- ASML Holding N.V.
- Mohamed Swillam
- G01 - MEASURING TESTING
Information Patent Grant
Lithographic apparatus, metrology systems, phased array illuminatio...
- Patent number 11,966,169
- Issue date Apr 23, 2024
- ASML Holding N.V.
- Mohamed Swillam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reticle sub-field thermal control
- Patent number 11,500,298
- Issue date Nov 15, 2022
- ASML Holding N.V.
- Eric Justin Monkman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Assembly for use in semiconductor photolithography and method of ma...
- Patent number 11,415,893
- Issue date Aug 16, 2022
- ASML Holding N.V.
- Stephen Roux
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask assembly
- Patent number 11,009,803
- Issue date May 18, 2021
- ASML Netherlands B.V.
- Matthias Kruizinga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask assembly
- Patent number 10,558,129
- Issue date Feb 11, 2020
- ASML Netherlands B.V.
- Matthias Kruizinga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning device support and lithographic apparatus
- Patent number 9,740,112
- Issue date Aug 22, 2017
- ASML Holding N.V.
- Arindam Sinharoy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for controlling the position of a movable object, a control...
- Patent number 8,553,205
- Issue date Oct 8, 2013
- ASML Holdings N.V.
- Stephen Roux
- G05 - CONTROLLING REGULATING
Information Patent Grant
Systems and methods for lithographic reticle inspection
- Patent number 7,853,067
- Issue date Dec 14, 2010
- ASML Holding N.V.
- Stephen Roux
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical element damping systems
- Patent number 7,751,130
- Issue date Jul 6, 2010
- ASML Holding N.V.
- Stephen Roux
- G02 - OPTICS
Information Patent Grant
Lithographic apparatus
- Patent number 7,692,766
- Issue date Apr 6, 2010
- ASML Holding N.V.
- Stephen Roux
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatuses and methods for changing an intensity distribution of l...
- Patent number 7,633,599
- Issue date Dec 15, 2009
- ASML Holding N.V.
- Stephen Roux
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, device manufacturing method, and a projecti...
- Patent number 7,474,384
- Issue date Jan 6, 2009
- ASML Holding N.V.
- Arno Jan Bleeker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Levitated reticle-masking blade stage
- Patent number 7,372,548
- Issue date May 13, 2008
- ASML Holding N.V.
- Frederick M. Carter
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Drive for reticle-masking blade stage
- Patent number 7,359,037
- Issue date Apr 15, 2008
- ASML Hoding N.V.
- Frederick M. Carter
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Wafer handling method for use in lithography patterning
- Patent number 7,298,459
- Issue date Nov 20, 2007
- ASML Holding N.V.
- Santiago E. del Puerto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for creating a phase step in mirrors used in s...
- Patent number 7,279,110
- Issue date Oct 9, 2007
- ASML Holding N.V.
- Stephen Roux
- G02 - OPTICS
Information Patent Grant
Active faceted mirror system for lithography
- Patent number 7,136,214
- Issue date Nov 14, 2006
- ASML Holding N.V.
- Erik Loopstra
- G02 - OPTICS
Information Patent Grant
Method and apparatus for recycling gases used in a lithography tool
- Patent number 7,135,693
- Issue date Nov 14, 2006
- ASML Holding N.V.
- Stephen Roux
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reticle gripper barrier system for lithography use
- Patent number 7,136,151
- Issue date Nov 14, 2006
- ASML Holding N.V.
- Richard Lenox
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Correcting variations in the intensity of light within an illuminat...
- Patent number 7,119,883
- Issue date Oct 10, 2006
- ASML Holding N.V.
- Stephen Roux
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for cooling a reticle during lithographic expo...
- Patent number 7,105,836
- Issue date Sep 12, 2006
- ASML Holding N.V.
- Santiago del Puerto
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Grant
Method for recycling gases used in a lithography tool
- Patent number 7,087,911
- Issue date Aug 8, 2006
- ASML Holding N.V.
- Stephen Roux
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle focus measurement system using multiple interferometric beams
- Patent number 7,016,051
- Issue date Mar 21, 2006
- ASML Holding N.V.
- Stephen Roux
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle barrier system for extreme ultra-violet lithography
- Patent number 6,984,474
- Issue date Jan 10, 2006
- ASML Holding N.V.
- Stephen Roux
- B82 - NANO-TECHNOLOGY
Information Patent Grant
System, method, and apparatus for a magnetically levitated and driv...
- Patent number 6,950,175
- Issue date Sep 27, 2005
- ASML Holding N.V.
- Daniel N. Galburt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle focus measurement method using multiple interferometric beams
- Patent number 6,934,005
- Issue date Aug 23, 2005
- ASML Holding N.V.
- Stephen Roux
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wafer handling method for use in lithography patterning
- Patent number 6,927,842
- Issue date Aug 9, 2005
- ASML Holding N.V.
- Santiago E. del Puerto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for recycling gases used in a lithography tool
- Patent number 6,919,573
- Issue date Jul 19, 2005
- ASML Holding N.V.
- Stephen Roux
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
METROLOGY SYSTEMS WITH PHASED ARRAYS FOR CONTAMINANT DETECTION AND...
- Publication number 20240319617
- Publication date Sep 26, 2024
- ASML Holding N.V.
- Mohamed SWILLAM
- G01 - MEASURING TESTING
Information Patent Application
SYSTEMS AND METHODS FOR MEASURING INTENSITY IN A LITHOGRAPHIC ALIGN...
- Publication number 20240077308
- Publication date Mar 7, 2024
- ASML Holding N.V.
- Mohamed SWILLAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS, METROLOGY SYSTEMS, AND METHODS THEREOF
- Publication number 20240036485
- Publication date Feb 1, 2024
- ASML Netheriands B. V.
- Arjan Johannes Anton BEUKMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SPECTROMETRIC METROLOGY SYSTEMS BASED ON MULTIMODE INTERFERENCE AND...
- Publication number 20230273531
- Publication date Aug 31, 2023
- ASML Holding N.V.
- Mohamed SWILLAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SELF-REFERENCING INTEGRATED ALIGNMENT SENSOR
- Publication number 20230266681
- Publication date Aug 24, 2023
- ASML Holding N.V.
- Mohamed SWILLAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MONOLITHIC PARTICLE INSPECTION DEVICE
- Publication number 20230266255
- Publication date Aug 24, 2023
- ASML NETHERLANDS B.V.
- Ilse VAN WEPEREN
- G01 - MEASURING TESTING
Information Patent Application
OPTICAL DESIGNS OF MINIATURIZED OVERLAY MEASUREMENT SYSTEM
- Publication number 20230059471
- Publication date Feb 23, 2023
- ASML Holding N.V.
- Mohamed SWILLAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY MARK STRUCTURE AND METHOD OF DETERMINING METROLOGY MARK S...
- Publication number 20220350268
- Publication date Nov 3, 2022
- ASML Holding N.V.
- Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY
- G01 - MEASURING TESTING
Information Patent Application
ON CHIP SENSOR FOR WAFER OVERLAY MEASUREMENT
- Publication number 20220283516
- Publication date Sep 8, 2022
- ASML Holding N.V.
- Mohamed SWILLAM
- G02 - OPTICS
Information Patent Application
RETICLE SUB-FIELD THERMAL CONTROL
- Publication number 20220057723
- Publication date Feb 24, 2022
- ASML Holding N.V.
- Eric Justin MONKMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Assembly for Use in Semiconductor Photolithography and Method of Ma...
- Publication number 20210181640
- Publication date Jun 17, 2021
- ASML Holding N.V.
- Stephen ROUX
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Lithographic Apparatus, Metrology Systems, Phased Array Illuminatio...
- Publication number 20210095957
- Publication date Apr 1, 2021
- ASML Holding N.V.
- Mohamed SWILLAM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Mask Assembly
- Publication number 20200057394
- Publication date Feb 20, 2020
- ASML NETHERLANDS B.V.
- Matthias KRUIZINGA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask Assembly
- Publication number 20180329314
- Publication date Nov 15, 2018
- Matthias KRUIZINGA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Patterning Device Support and Lithographic Apparatus
- Publication number 20150277240
- Publication date Oct 1, 2015
- ASML Holding N.V.
- Arindam Sinharoy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Quantitative Reticle Distortion Measurement System
- Publication number 20150212425
- Publication date Jul 30, 2015
- ASML Holding N.V.
- Michael Andrew Chieda
- G01 - MEASURING TESTING
Information Patent Application
Method for Controlling the Position of a Movable Object, a Control...
- Publication number 20110149263
- Publication date Jun 23, 2011
- ASML Holding N.V.
- Stephen ROUX
- G05 - CONTROLLING REGULATING
Information Patent Application
Lithographic apparatus
- Publication number 20080273180
- Publication date Nov 6, 2008
- ASML Holding N.V.
- Stephen Roux
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Systems and methods for lithographic reticle inspection
- Publication number 20080101684
- Publication date May 1, 2008
- ASML Holding N.V.
- Stephen Roux
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and Apparatus for Creating a Phase Step in Mirrors Used in S...
- Publication number 20080035057
- Publication date Feb 14, 2008
- ASML Holding N.V.
- Steven Roux
- G02 - OPTICS
Information Patent Application
Optical element damping systems
- Publication number 20070153348
- Publication date Jul 5, 2007
- ASML Holding N.V.
- Stephen Roux
- G02 - OPTICS
Information Patent Application
Apparatuses and methods for changing an intensity distribution of l...
- Publication number 20070013891
- Publication date Jan 18, 2007
- ASML Holding N.V.
- Stephen Roux
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and apparatus for creating a phase step in mirrors used in s...
- Publication number 20060139729
- Publication date Jun 29, 2006
- ASML Holding N.V.
- Steven Roux
- G02 - OPTICS
Information Patent Application
Lithographic apparatus, device manufacturing method, and a projecti...
- Publication number 20060110665
- Publication date May 25, 2006
- ASML Netherlands B.V.
- Arno Jan Bleeker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Active faceted mirror system for lithography
- Publication number 20060103908
- Publication date May 18, 2006
- ASML Holding N.V.
- Erik Loopstra
- G02 - OPTICS
Information Patent Application
Correcting variations in the intensity of light within an illuminat...
- Publication number 20060077372
- Publication date Apr 13, 2006
- ASML Holding N.V.
- Stephen Roux
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Levitated reticle-masking blade stage
- Publication number 20060023195
- Publication date Feb 2, 2006
- ASML Holding N.V.
- Frederick M. Carter
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reticle gripper barrier system for lithography use
- Publication number 20060023196
- Publication date Feb 2, 2006
- ASML Holding N.V.
- Richard Lenox
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Wafer handling method for use in lithography patterning
- Publication number 20050264791
- Publication date Dec 1, 2005
- ASML Holding N.V.
- Santiago E. del Puerto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and apparatus for recycling gases used in a lithography tool
- Publication number 20050263720
- Publication date Dec 1, 2005
- ASML Holding N.V.
- Stephen Roux
- B82 - NANO-TECHNOLOGY

Stephen Roux

Person

Patents Grantslast 30 patents

On chip sensor for wafer overlay measurement

Lithographic apparatus, metrology systems, phased array illuminatio...

Lithographic apparatus, metrology systems, phased array illuminatio...

Reticle sub-field thermal control

Assembly for use in semiconductor photolithography and method of ma...

Mask assembly

Mask assembly

Patterning device support and lithographic apparatus

Method for controlling the position of a movable object, a control...

Systems and methods for lithographic reticle inspection

Optical element damping systems

Lithographic apparatus

Apparatuses and methods for changing an intensity distribution of l...

Lithographic apparatus, device manufacturing method, and a projecti...

Levitated reticle-masking blade stage

Drive for reticle-masking blade stage

Wafer handling method for use in lithography patterning

Method and apparatus for creating a phase step in mirrors used in s...

Active faceted mirror system for lithography

Method and apparatus for recycling gases used in a lithography tool

Reticle gripper barrier system for lithography use

Correcting variations in the intensity of light within an illuminat...

Method and apparatus for cooling a reticle during lithographic expo...

Method for recycling gases used in a lithography tool

Reticle focus measurement system using multiple interferometric beams

Reticle barrier system for extreme ultra-violet lithography

System, method, and apparatus for a magnetically levitated and driv...

Reticle focus measurement method using multiple interferometric beams

Wafer handling method for use in lithography patterning

Method and apparatus for recycling gases used in a lithography tool

Patents Applicationslast 30 patents

METROLOGY SYSTEMS WITH PHASED ARRAYS FOR CONTAMINANT DETECTION AND...

SYSTEMS AND METHODS FOR MEASURING INTENSITY IN A LITHOGRAPHIC ALIGN...

LITHOGRAPHIC APPARATUS, METROLOGY SYSTEMS, AND METHODS THEREOF

SPECTROMETRIC METROLOGY SYSTEMS BASED ON MULTIMODE INTERFERENCE AND...

SELF-REFERENCING INTEGRATED ALIGNMENT SENSOR

MONOLITHIC PARTICLE INSPECTION DEVICE

OPTICAL DESIGNS OF MINIATURIZED OVERLAY MEASUREMENT SYSTEM

METROLOGY MARK STRUCTURE AND METHOD OF DETERMINING METROLOGY MARK S...

ON CHIP SENSOR FOR WAFER OVERLAY MEASUREMENT

RETICLE SUB-FIELD THERMAL CONTROL

Assembly for Use in Semiconductor Photolithography and Method of Ma...

Lithographic Apparatus, Metrology Systems, Phased Array Illuminatio...

Mask Assembly

Mask Assembly

Patterning Device Support and Lithographic Apparatus

Quantitative Reticle Distortion Measurement System

Method for Controlling the Position of a Movable Object, a Control...

Lithographic apparatus

Systems and methods for lithographic reticle inspection

Method and Apparatus for Creating a Phase Step in Mirrors Used in S...

Optical element damping systems

Apparatuses and methods for changing an intensity distribution of l...

Method and apparatus for creating a phase step in mirrors used in s...

Lithographic apparatus, device manufacturing method, and a projecti...

Active faceted mirror system for lithography

Correcting variations in the intensity of light within an illuminat...

Levitated reticle-masking blade stage

Reticle gripper barrier system for lithography use

Wafer handling method for use in lithography patterning

Method and apparatus for recycling gases used in a lithography tool