Steve H. Kim

Person

Union City, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Integrated apparatus for efficient removal of halogen residues from...
- Patent number 9,735,002
- Issue date Aug 15, 2017
- Applied Materials, Inc.
- Mark Naoshi Kawaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ chamber treatment and deposition process
- Patent number 8,491,967
- Issue date Jul 23, 2013
- Applied Materials, Inc.
- Paul F. Ma
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Integrated method for removal of halogen residues from etched subst...
- Patent number 7,846,845
- Issue date Dec 7, 2010
- Applied Materials, Inc.
- Kenneth J. Bahng
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Thermal management of inductively coupled plasma reactors
- Patent number 7,811,411
- Issue date Oct 12, 2010
- Applied Materials, Inc.
- Siqing Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vortex chamber lids for atomic layer deposition
- Patent number 7,780,789
- Issue date Aug 24, 2010
- Applied Materials, Inc.
- Dien-Yeh Wu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Integrated method and apparatus for efficient removal of halogen re...
- Patent number 7,655,571
- Issue date Feb 2, 2010
- Applied Materials, Inc.
- Mark Naoshi Kawaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Two-piece dome with separate RF coils for inductively coupled plasm...
- Patent number 7,651,587
- Issue date Jan 26, 2010
- Applied Materials, Inc.
- Siqing Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Upper chamber for high density plasma CVD
- Patent number 7,354,501
- Issue date Apr 8, 2008
- Applied Materials, Inc.
- Sudhir Gondhalekar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Use of enhanced turbomolecular pump for gapfill deposition using hi...
- Patent number 7,183,227
- Issue date Feb 27, 2007
- Applied Materials, Inc.
- Muhammad M. Rasheed
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate support with extended radio frequency electrode upper sur...
- Patent number 6,682,603
- Issue date Jan 27, 2004
- Applied Materials Inc.
- Sudhir Gondhalekar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
IN-SITU CHAMBER TREATMENT AND DEPOSITION PROCESS
- Publication number 20100062614
- Publication date Mar 11, 2010
- Paul F. Ma
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTEGRATED APPARATUS FOR EFFICIENT REMOVAL OF HALOGEN RESIDUES FROM...
- Publication number 20090014324
- Publication date Jan 15, 2009
- Mark Naoshi Kawaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VORTEX CHAMBER LIDS FOR ATOMIC LAYER DEPOSITION
- Publication number 20080107809
- Publication date May 8, 2008
- Dien-Yeh Wu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VORTEX CHAMBER LIDS FOR ATOMIC LAYER DEPOSITION
- Publication number 20080102208
- Publication date May 1, 2008
- Dien-Yeh Wu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTEGRATED METHOD AND APPARATUS FOR EFFICIENT REMOVAL OF HALOGEN RE...
- Publication number 20080102646
- Publication date May 1, 2008
- Mark Naoshi Kawaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED METHOD FOR REMOVAL OF HALOGEN RESIDUES FROM ETCHED SUBST...
- Publication number 20080099040
- Publication date May 1, 2008
- Kenneth J. Bahng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VORTEX CHAMBER LIDS FOR ATOMIC LAYER DEPOSITION
- Publication number 20080102203
- Publication date May 1, 2008
- Dien-Yeh Wu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Two-piece dome with separate RF coils for inductively coupled plasm...
- Publication number 20070037397
- Publication date Feb 15, 2007
- Applied Materials, Inc.
- Siqing Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Thermal management of inductively coupled plasma reactors
- Publication number 20070034153
- Publication date Feb 15, 2007
- Applied Materials, Inc.
- Siqing Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
USE OF ENHANCED TURBOMOLECULAR PUMP FOR GAPFILL DEPOSITION USING HI...
- Publication number 20060225648
- Publication date Oct 12, 2006
- Applied Materials, Inc.
- Muhammad M. Rasheed
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Magnetic-field concentration in inductively coupled plasma reactors
- Publication number 20060075967
- Publication date Apr 13, 2006
- Applied Materials, Inc.
- Siqing Lu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Upper chamber for high density plasma CVD
- Publication number 20030213434
- Publication date Nov 20, 2003
- Applied Materials, Inc.
- Sudhir Gondhalekar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE SUPPORT WITH EXTENDED RADIO FREQUENCY ELECTRODE UPPER SUR...
- Publication number 20030211757
- Publication date Nov 13, 2003
- Applied Materials, Inc.
- Sudhir Gondhalekar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Steve H. Kim

Person

Patents Grantslast 30 patents

Integrated apparatus for efficient removal of halogen residues from...

In-situ chamber treatment and deposition process

Integrated method for removal of halogen residues from etched subst...

Thermal management of inductively coupled plasma reactors

Vortex chamber lids for atomic layer deposition

Integrated method and apparatus for efficient removal of halogen re...

Two-piece dome with separate RF coils for inductively coupled plasm...

Upper chamber for high density plasma CVD

Use of enhanced turbomolecular pump for gapfill deposition using hi...

Substrate support with extended radio frequency electrode upper sur...

Patents Applicationslast 30 patents

IN-SITU CHAMBER TREATMENT AND DEPOSITION PROCESS

INTEGRATED APPARATUS FOR EFFICIENT REMOVAL OF HALOGEN RESIDUES FROM...

VORTEX CHAMBER LIDS FOR ATOMIC LAYER DEPOSITION

VORTEX CHAMBER LIDS FOR ATOMIC LAYER DEPOSITION

INTEGRATED METHOD AND APPARATUS FOR EFFICIENT REMOVAL OF HALOGEN RE...

INTEGRATED METHOD FOR REMOVAL OF HALOGEN RESIDUES FROM ETCHED SUBST...

VORTEX CHAMBER LIDS FOR ATOMIC LAYER DEPOSITION

Two-piece dome with separate RF coils for inductively coupled plasm...

Thermal management of inductively coupled plasma reactors

USE OF ENHANCED TURBOMOLECULAR PUMP FOR GAPFILL DEPOSITION USING HI...

Magnetic-field concentration in inductively coupled plasma reactors

Upper chamber for high density plasma CVD

SUBSTRATE SUPPORT WITH EXTENDED RADIO FREQUENCY ELECTRODE UPPER SUR...