Steven C. Shannon

Person

People

Patents Grantslast 30 patents

Information Patent Grant
Very high frequency (VHF) driven atmospheric plasma sources and poi...
- Patent number 9,475,710
- Issue date Oct 25, 2016
- North Carolina State University
- Steven C. Shannon
- C02 - TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
Information Patent Grant
Substrate cleaning chamber and cleaning and conditioning methods
- Patent number 8,435,379
- Issue date May 7, 2013
- Applied Materials, Inc.
- Vineet Mehta
- B08 - CLEANING
Information Patent Grant
Plasma reactor with plasma load impedance tuning for engineered tra...
- Patent number 8,357,264
- Issue date Jan 22, 2013
- Applied Materials, Inc.
- Steven C. Shannon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor with plasma load impedance tuning for engineered tra...
- Patent number 8,337,661
- Issue date Dec 25, 2012
- Applied Materials, Inc.
- Steven C. Shannon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of plasma load impedance tuning for engineered transients by...
- Patent number 8,324,525
- Issue date Dec 4, 2012
- Applied Materials, Inc.
- Steven C. Shannon
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Apparatus for multiple frequency power application
- Patent number 8,237,517
- Issue date Aug 7, 2012
- Applied Materials, Inc.
- Steven C. Shannon
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Magnetic confinement of a plasma
- Patent number 8,092,605
- Issue date Jan 10, 2012
- Applied Materials, Inc.
- Steven C. Shannon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma process uniformity across a wafer by controlling a variable...
- Patent number 8,080,479
- Issue date Dec 20, 2011
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma process uniformity across a wafer by controlling RF phase be...
- Patent number 8,076,247
- Issue date Dec 13, 2011
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma reactor with high speed plasma load impedance tuning by modu...
- Patent number 8,018,164
- Issue date Sep 13, 2011
- Applied Materials, Inc.
- Steven C. Shannon
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method of plasma load impedance tuning for engineered transients by...
- Patent number 8,002,945
- Issue date Aug 23, 2011
- Applied Materials, Inc.
- Steven C. Shannon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for multiple frequency power application
- Patent number 7,994,872
- Issue date Aug 9, 2011
- Applied Materials, Inc.
- Steven C. Shannon
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Plasma reactor with reduced electrical skew using electrical bypass...
- Patent number 7,988,815
- Issue date Aug 2, 2011
- Applied Materials, Inc.
- Shahid Rauf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method to confine plasma and reduce flow resistance i...
- Patent number 7,972,467
- Issue date Jul 5, 2011
- Applied Materials Inc.
- Kallol Bera
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of plasma load impedance tuning by modulation of an unmatche...
- Patent number 7,967,944
- Issue date Jun 28, 2011
- Applied Materials, Inc.
- Steven C. Shannon
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method of processing a workpiece in a plasma reactor with variable...
- Patent number 7,968,469
- Issue date Jun 28, 2011
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma process uniformity across a wafer by apportioning ground ret...
- Patent number 7,884,025
- Issue date Feb 8, 2011
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Improving plasma process uniformity across a wafer by apportioning...
- Patent number 7,879,731
- Issue date Feb 1, 2011
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual frequency RF match
- Patent number 7,879,185
- Issue date Feb 1, 2011
- Applied Materials, Inc.
- Steven C. Shannon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for monitoring process drift using plasma characteristics
- Patent number 7,848,898
- Issue date Dec 7, 2010
- Applied Materials Inc.
- Steven C. Shannon
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma control using dual cathode frequency mixing
- Patent number 7,838,430
- Issue date Nov 23, 2010
- Applied Materials, Inc.
- Steven C. Shannon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for testing plasma reactor multi-frequency impedance match n...
- Patent number 7,812,278
- Issue date Oct 12, 2010
- Applied Materials, Inc.
- Steven C. Shannon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Time-based wafer de-chucking from an electrostatic chuck having sep...
- Patent number 7,813,103
- Issue date Oct 12, 2010
- Applied Materials, Inc.
- Steven C. Shannon
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Method of plasma confinement for enhancing magnetic control of plas...
- Patent number 7,780,866
- Issue date Aug 24, 2010
- Applied Materials, Inc.
- Matthew L. Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for controlling characteristics of a plasma
- Patent number 7,777,599
- Issue date Aug 17, 2010
- Applied Materials, Inc.
- Steven C. Shannon
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Apparatus and method to confine plasma and reduce flow resistance i...
- Patent number 7,754,997
- Issue date Jul 13, 2010
- Applied Materials, Inc.
- Kallol Bera
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for determining plasma characteristics
- Patent number 7,620,511
- Issue date Nov 17, 2009
- Applied Materials, Inc.
- Steven C. Shannon
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Apparatus and method to confine plasma and reduce flow resistance i...
- Patent number 7,585,384
- Issue date Sep 8, 2009
- Applied Materials, Inc.
- Kallol Bera
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Matching network characterization using variable impedance analysis
- Patent number 7,554,334
- Issue date Jun 30, 2009
- Applied Marterials, Inc.
- Steven C. Shannon
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Plasma generation and control using dual frequency RF signals
- Patent number 7,510,665
- Issue date Mar 31, 2009
- Applied Materials, Inc.
- Steven C. Shannon
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
VERY HIGH FREQUENCY (VHF) DRIVEN ATMOSPHERIC PLASMA SOURCES AND POI...
- Publication number 20140262789
- Publication date Sep 18, 2014
- North Carolina State University
- Steven C. Shannon
- C02 - TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
Information Patent Application
SUBSTRATE CLEANING CHAMBER AND CLEANING AND CONDITIONING METHODS
- Publication number 20130192629
- Publication date Aug 1, 2013
- Vineet Mehta
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
APPARATUS FOR MULTIPLE FREQUENCY POWER APPLICATION
- Publication number 20110291771
- Publication date Dec 1, 2011
- Applied Materials, Inc.
- Steven C. Shannon
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
APPARATUS FOR MULTIPLE FREQUENCY POWER APPLICATION
- Publication number 20100013572
- Publication date Jan 21, 2010
- Applied Materials, Inc.
- STEVEN C. SHANNON
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
METHOD OF PLASMA LOAD IMPEDANCE TUNING BY MODULATION OF A SOURCE PO...
- Publication number 20090294275
- Publication date Dec 3, 2009
- Applied Materials, Inc.
- Steven C. Shannon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PLASMA LOAD IMPEDANCE TUNING FOR ENGINEERED TRANSIENTS BY...
- Publication number 20090294414
- Publication date Dec 3, 2009
- Applied Materials, Inc.
- Steven C. Shannon
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PLASMA REACTOR WITH HIGH SPEED PLASMA LOAD IMPEDANCE TUNING BY MODU...
- Publication number 20090295295
- Publication date Dec 3, 2009
- Applied Materials, Inc.
- Steven C. Shannon
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PLASMA REACTOR WITH PLASMA LOAD IMPEDANCE TUNING FOR ENGINEERED TRA...
- Publication number 20090294062
- Publication date Dec 3, 2009
- Applied Materials, Inc.
- Steven C. Shannon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PLASMA LOAD IMPEDANCE TUNING FOR ENGINEERED TRANSIENTS BY...
- Publication number 20090298287
- Publication date Dec 3, 2009
- Applied Materials, Inc.
- Steven C. Shannon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PLASMA LOAD IMPEDANCE TUNING BY MODULATION OF AN UNMATCHE...
- Publication number 20090295296
- Publication date Dec 3, 2009
- Applied Materials, Inc.
- Steven C. Shannon
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PLASMA REACTOR WITH HIGH SPEED PLASMA IMPEDANCE TUNING BY MODULATIO...
- Publication number 20090297404
- Publication date Dec 3, 2009
- Applied Materials, Inc.
- Steven C. Shannon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA REACTOR WITH PLASMA LOAD IMPEDANCE TUNING FOR ENGINEERED TRA...
- Publication number 20090294061
- Publication date Dec 3, 2009
- Applied Materials, Inc.
- Steven C. Shannon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR CONTROLLING CENTER-TO-EDGE DISTRIBUTION OF SP...
- Publication number 20090218315
- Publication date Sep 3, 2009
- Steven Shannon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR CONTROLLING CHARACTERISTICS OF A PLASMA
- Publication number 20090140828
- Publication date Jun 4, 2009
- Applied Materials, Inc.
- Steven C. Shannon
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
METHOD FOR DETERMINING PLASMA CHARACTERISTICS
- Publication number 20090132189
- Publication date May 21, 2009
- Steven C. Shannon
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
METHOD FOR MONITORING PROCESS DRIFT USING PLASMA CHARACTERISTICS
- Publication number 20090130856
- Publication date May 21, 2009
- Steven C. Shannon
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Time-based wafer de-chucking from an electrostatic chuck having sep...
- Publication number 20090097185
- Publication date Apr 16, 2009
- Steven C. Shannon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA REACTOR WITH REDUCED ELECTRICAL SKEW USING ELECTRICAL BYPASS...
- Publication number 20090025878
- Publication date Jan 29, 2009
- Shahid Rauf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA REACTOR WITH REDUCED ELECTRICAL SKEW USING A CONDUCTIVE BAFFLE
- Publication number 20090025879
- Publication date Jan 29, 2009
- Shahid Rauf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD TO CONFINE PLASMA AND REDUCE FLOW RESISTANCE I...
- Publication number 20080314522
- Publication date Dec 25, 2008
- Kallol Bera
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE CLEANING CHAMBER AND CLEANING AND CONDITIONING METHODS
- Publication number 20080276958
- Publication date Nov 13, 2008
- APPLIED MATERIALS, INC.
- Vineet Mehta
- B08 - CLEANING
Information Patent Application
PLASMA PROCESS UNIFORMITY ACROSS A WAFER BY APPORTIONING GROUND RET...
- Publication number 20080182417
- Publication date Jul 31, 2008
- KENNETH S. COLLINS
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESS UNIFORMITY ACROSS A WAFER BY CONTROLLING A VARIABLE...
- Publication number 20080182418
- Publication date Jul 31, 2008
- KENNETH S. COLLINS
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESS UNIFORMITY ACROSS A WAFER BY CONTROLLING RF PHASE BE...
- Publication number 20080180028
- Publication date Jul 31, 2008
- KENNETH S. COLLINS
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF PROCESSING A WORKPIECE IN A PLASMA REACTOR WITH VARIABLE...
- Publication number 20080179181
- Publication date Jul 31, 2008
- KENNETH S. COLLINS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESS UNIFORMITY ACROSS A WAFER BY APPORTIONING POWER AMON...
- Publication number 20080182416
- Publication date Jul 31, 2008
- KENNETH S. COLLINS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA REACTOR WITH ION DISTRIBUTION UNIFORMITY CONTROLLER EMPLOYIN...
- Publication number 20080178803
- Publication date Jul 31, 2008
- KENNETH S. COLLINS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA REACTOR WITH WIDE PROCESS WINDOW EMPLOYING PLURAL VHF SOURCES
- Publication number 20080179011
- Publication date Jul 31, 2008
- KENNETH S. COLLINS
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MAGNETIC CONFINEMENT OF A PLASMA
- Publication number 20080121345
- Publication date May 29, 2008
- Applied Materials, Inc.
- Steven C. Shannon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA CONFINEMENT BAFFLE AND FLOW EQUALIZER FOR ENHANCED MAGNETIC...
- Publication number 20080110567
- Publication date May 15, 2008
- Matthew L. Miller
- H01 - BASIC ELECTRIC ELEMENTS

Steven C. Shannon

Person

Patents Grantslast 30 patents

Very high frequency (VHF) driven atmospheric plasma sources and poi...

Substrate cleaning chamber and cleaning and conditioning methods

Plasma reactor with plasma load impedance tuning for engineered tra...

Plasma reactor with plasma load impedance tuning for engineered tra...

Method of plasma load impedance tuning for engineered transients by...

Apparatus for multiple frequency power application

Magnetic confinement of a plasma

Plasma process uniformity across a wafer by controlling a variable...

Plasma process uniformity across a wafer by controlling RF phase be...

Plasma reactor with high speed plasma load impedance tuning by modu...

Method of plasma load impedance tuning for engineered transients by...

Apparatus for multiple frequency power application

Plasma reactor with reduced electrical skew using electrical bypass...

Apparatus and method to confine plasma and reduce flow resistance i...

Method of plasma load impedance tuning by modulation of an unmatche...

Method of processing a workpiece in a plasma reactor with variable...

Plasma process uniformity across a wafer by apportioning ground ret...

Improving plasma process uniformity across a wafer by apportioning...

Dual frequency RF match

Method for monitoring process drift using plasma characteristics

Plasma control using dual cathode frequency mixing

Method for testing plasma reactor multi-frequency impedance match n...

Time-based wafer de-chucking from an electrostatic chuck having sep...

Method of plasma confinement for enhancing magnetic control of plas...

Methods and apparatus for controlling characteristics of a plasma

Apparatus and method to confine plasma and reduce flow resistance i...

Method for determining plasma characteristics

Apparatus and method to confine plasma and reduce flow resistance i...

Matching network characterization using variable impedance analysis

Plasma generation and control using dual frequency RF signals

Patents Applicationslast 30 patents

VERY HIGH FREQUENCY (VHF) DRIVEN ATMOSPHERIC PLASMA SOURCES AND POI...

SUBSTRATE CLEANING CHAMBER AND CLEANING AND CONDITIONING METHODS

APPARATUS FOR MULTIPLE FREQUENCY POWER APPLICATION

APPARATUS FOR MULTIPLE FREQUENCY POWER APPLICATION

METHOD OF PLASMA LOAD IMPEDANCE TUNING BY MODULATION OF A SOURCE PO...

METHOD OF PLASMA LOAD IMPEDANCE TUNING FOR ENGINEERED TRANSIENTS BY...

PLASMA REACTOR WITH HIGH SPEED PLASMA LOAD IMPEDANCE TUNING BY MODU...

PLASMA REACTOR WITH PLASMA LOAD IMPEDANCE TUNING FOR ENGINEERED TRA...

METHOD OF PLASMA LOAD IMPEDANCE TUNING FOR ENGINEERED TRANSIENTS BY...

METHOD OF PLASMA LOAD IMPEDANCE TUNING BY MODULATION OF AN UNMATCHE...

PLASMA REACTOR WITH HIGH SPEED PLASMA IMPEDANCE TUNING BY MODULATIO...

PLASMA REACTOR WITH PLASMA LOAD IMPEDANCE TUNING FOR ENGINEERED TRA...

METHOD AND SYSTEM FOR CONTROLLING CENTER-TO-EDGE DISTRIBUTION OF SP...

METHODS AND APPARATUS FOR CONTROLLING CHARACTERISTICS OF A PLASMA

METHOD FOR DETERMINING PLASMA CHARACTERISTICS

METHOD FOR MONITORING PROCESS DRIFT USING PLASMA CHARACTERISTICS

Time-based wafer de-chucking from an electrostatic chuck having sep...

PLASMA REACTOR WITH REDUCED ELECTRICAL SKEW USING ELECTRICAL BYPASS...

PLASMA REACTOR WITH REDUCED ELECTRICAL SKEW USING A CONDUCTIVE BAFFLE

APPARATUS AND METHOD TO CONFINE PLASMA AND REDUCE FLOW RESISTANCE I...

SUBSTRATE CLEANING CHAMBER AND CLEANING AND CONDITIONING METHODS

PLASMA PROCESS UNIFORMITY ACROSS A WAFER BY APPORTIONING GROUND RET...

PLASMA PROCESS UNIFORMITY ACROSS A WAFER BY CONTROLLING A VARIABLE...

PLASMA PROCESS UNIFORMITY ACROSS A WAFER BY CONTROLLING RF PHASE BE...

METHOD OF PROCESSING A WORKPIECE IN A PLASMA REACTOR WITH VARIABLE...

PLASMA PROCESS UNIFORMITY ACROSS A WAFER BY APPORTIONING POWER AMON...

PLASMA REACTOR WITH ION DISTRIBUTION UNIFORMITY CONTROLLER EMPLOYIN...

PLASMA REACTOR WITH WIDE PROCESS WINDOW EMPLOYING PLURAL VHF SOURCES

MAGNETIC CONFINEMENT OF A PLASMA

PLASMA CONFINEMENT BAFFLE AND FLOW EQUALIZER FOR ENHANCED MAGNETIC...