Steven Scheer

Person

Austin, TX, US

People

Patents Grantslast 30 patents

Information Patent Grant
Line pattern collapse mitigation through gap-fill material application
- Patent number 9,454,081
- Issue date Sep 27, 2016
- Tokyo Electron Limited
- Mark H Somervell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and heat treatment apparatus for uniformly heating a substr...
- Patent number 9,383,138
- Issue date Jul 5, 2016
- Tokyo Electron Limited
- Steven Scheer
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Grant
Method and system for controlling a spike anneal process
- Patent number 9,085,045
- Issue date Jul 21, 2015
- Tokyo Electron Limited
- Steven Scheer
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Line pattern collapse mitigation through gap-fill material application
- Patent number 8,795,952
- Issue date Aug 5, 2014
- Tokyo Electron Limited
- Mark H. Somervell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dual tone development with a photo-activated acid enhancement compo...
- Patent number 8,574,810
- Issue date Nov 5, 2013
- Tokyo Electron Limited
- Carlos A. Fonseca
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Flood exposure process for dual tone development in lithographic ap...
- Patent number 8,568,964
- Issue date Oct 29, 2013
- Tokyo Electron Limited
- Carlos A. Fonseca
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate treatment to reduce pattern roughness
- Patent number 8,449,293
- Issue date May 28, 2013
- Tokyo Electron Limited
- Benjamin M. Rathsack
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electrostatic post exposure bake apparatus and method
- Patent number 8,288,174
- Issue date Oct 16, 2012
- Tokyo Electron Limited
- Benjamen M. Rathsack
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for creating gray-scale features for dual tone development p...
- Patent number 8,283,111
- Issue date Oct 9, 2012
- Tokyo Electron Limited
- Carlos A. Fonseca
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of process optimization for dual tone development
- Patent number 8,257,911
- Issue date Sep 4, 2012
- Tokyo Electron Limited
- Roel Gronheid
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dual tone development processes
- Patent number 8,197,996
- Issue date Jun 12, 2012
- Tokyo Electron Limited
- Carlos A. Fonseca
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Variable resist protecting groups
- Patent number 8,129,080
- Issue date Mar 6, 2012
- Tokyo Electron Limited
- Carlos A. Fonseca
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Using electric-field directed post-exposure bake for double-pattern...
- Patent number 8,097,402
- Issue date Jan 17, 2012
- Tokyo Electron Limited
- Steven Scheer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for patterning a semiconductor wafer
- Patent number 8,003,305
- Issue date Aug 23, 2011
- International Business Machines Corporation
- Steven Scheer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual tone development with plural photo-acid generators in lithogra...
- Patent number 7,829,269
- Issue date Nov 9, 2010
- Tokyo Electron Limited
- Carlos A. Fonseca
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Graded spin-on organic antireflective coating for photolithography
- Patent number 7,816,069
- Issue date Oct 19, 2010
- International Business Machines Corporation
- Colin J. Brodsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Enhanced process yield using a hot-spot library
- Patent number 7,673,278
- Issue date Mar 2, 2010
- Tokyo Electron Limited
- Benjamen M. Rathsack
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of preventing pinhole defects through co-polymerization
- Patent number 7,632,631
- Issue date Dec 15, 2009
- International Business Machines Corporation
- Steven A. Scheer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Graded spin-on organic antireflective coating for photolithography
- Patent number 7,588,879
- Issue date Sep 15, 2009
- International Business Machines Corporation
- Colin J. Brodsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming film stack having under layer for preventing pinh...
- Patent number 7,541,065
- Issue date Jun 2, 2009
- International Business Machines Corporation
- Colin J. Brodsky
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method of real time dynamic CD control
- Patent number 7,483,804
- Issue date Jan 27, 2009
- Tokyo Electron Limited
- Steven Scheer
- G01 - MEASURING TESTING
Information Patent Grant
Film stack having under layer for preventing pinhole defects
- Patent number 7,473,461
- Issue date Jan 6, 2009
- International Business Machines Corporation
- Colin J. Brodsky
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Optimized characterization of wafers structures for optical metrology
- Patent number 7,444,196
- Issue date Oct 28, 2008
- Timbre Technologies, Inc.
- Steven Scheer
- G01 - MEASURING TESTING
Information Patent Grant
Film stack having under layer for preventing pinhole defects
- Patent number 7,267,863
- Issue date Sep 11, 2007
- International Business Machines Corporation
- Colin J. Brodsky
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
After deposition method of thinning film to reduce pinhole defects
- Patent number 7,132,316
- Issue date Nov 7, 2006
- International Business Machines Corporation
- Wai-Kin Li
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
LINE PATTERN COLLAPSE MITIGATION THROUGH GAP-FILL MATERIAL APPLICATION
- Publication number 20160363868
- Publication date Dec 15, 2016
- TOKYO ELECTRON LIMITED
- Mark H. SOMERVELL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LINE PATTERN COLLAPSE MITIGATION THROUGH GAP-FILL MATERIAL APPLICATION
- Publication number 20150125791
- Publication date May 7, 2015
- TOKYO ELECTRON LIMITED
- Mark H. SOMERVELL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR CONTROLLING A SPIKE ANNEAL PROCESS
- Publication number 20130288487
- Publication date Oct 31, 2013
- TOKYO ELECTRON LIMITED
- STEVEN A. SCHEER
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
ELECTROSTATIC POST EXPOSURE BAKE APPARATUS AND METHOD
- Publication number 20120244645
- Publication date Sep 27, 2012
- TOKYO ELECTRON LIMITED
- Benjamen M. Rathsack
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUE TO FORM A SELF-ALIGNED DOUBLE PATTERN
- Publication number 20120045722
- Publication date Feb 23, 2012
- Wallace P. Printz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FORMING A SELF-ALIGNED DOUBLE PATTERN
- Publication number 20120045721
- Publication date Feb 23, 2012
- TOKYO ELECTRON LIMITED
- Wallace P. Printz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE TREATMENT TO REDUCE PATTERN ROUGHNESS
- Publication number 20110269078
- Publication date Nov 3, 2011
- TOKYO ELECTRON LIMITED
- Benjamin M. Rathsack
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LINE PATTERN COLLAPSE MITIGATION THROUGH GAP-FILL MATERIAL APPLICATION
- Publication number 20110205505
- Publication date Aug 25, 2011
- TOKYO ELECTRON LIMITED
- Mark H. SOMERVELL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Dual tone development with a photo-activated acid enhancement compo...
- Publication number 20100273107
- Publication date Oct 28, 2010
- TOKYO ELECTRON LIMITED
- Carlos A. FONSECA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Dual tone development with plural photo-acid generators in lithogra...
- Publication number 20100273111
- Publication date Oct 28, 2010
- TOKYO ELECTRON LIMITED
- Carlos A. FONSECA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Flood exposure process for dual tone development in lithographic ap...
- Publication number 20100273099
- Publication date Oct 28, 2010
- TOKYO ELECTRON LIMITED
- Carlos A. Fonseca
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Using Electric-Field Directed Post-Exposure Bake for Double-Pattern...
- Publication number 20100248152
- Publication date Sep 30, 2010
- TOKYO ELECTRON LIMITED
- Steven Scheer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dual Tone Development Processes
- Publication number 20100119960
- Publication date May 13, 2010
- TOKYO ELECTRON LIMITED
- Carlos A. Fonseca
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Variable Resist Protecting Groups
- Publication number 20100075238
- Publication date Mar 25, 2010
- TOKYO ELECTRON LIMITED
- Carlos A. Fonseca
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR CREATING GRAY-SCALE FEATURES FOR DUAL TONE DEVELOPMENT P...
- Publication number 20100068654
- Publication date Mar 18, 2010
- TOKYO ELECTRON LIMITED
- Carlos A. Fonseca
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF PATTERNING A SUBSTRATE USING DUAL TONE DEVELOPMENT
- Publication number 20100055624
- Publication date Mar 4, 2010
- TOKYO ELECTRON LIMITED
- Roel Gronheid
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF PROCESS OPTIMIZATION FOR DUAL TONE DEVELOPMENT
- Publication number 20100055625
- Publication date Mar 4, 2010
- TOKYO ELECTRON LIMITED
- Roel Gronheid
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for Patterning a Semiconductor Wafer
- Publication number 20090220893
- Publication date Sep 3, 2009
- Steven Scheer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Enhanced Process Yield Using a Hot-Spot Library
- Publication number 20090144691
- Publication date Jun 4, 2009
- TOKYO ELECTRON LIMITED
- Benjamen M. Rathsack
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND HEAT TREATMENT APPARATUS FOR UNIFORMLY HEATING A SUBSTR...
- Publication number 20080237214
- Publication date Oct 2, 2008
- TOKYO ELECTRON LIMITED
- Steven Scheer
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Application
VACUUM ASSIST METHOD AND SYSTEM FOR REDUCING INTERMIXING OF LITHOGR...
- Publication number 20080241400
- Publication date Oct 2, 2008
- TOKYO ELECTRON LIMITED
- Steven Scheer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Graded Spin-on Organic Antireflective Coating for Photolithography
- Publication number 20080213707
- Publication date Sep 4, 2008
- International Business Machines Corporation
- Colin J. Brodsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF REAL TIME DYNAMIC CD CONTROL
- Publication number 20080079934
- Publication date Apr 3, 2008
- TOKYO ELECTRON LIMITED
- Steven Scheer
- G01 - MEASURING TESTING
Information Patent Application
Graded spin-on organic antireflective coating for photolithography
- Publication number 20080008955
- Publication date Jan 10, 2008
- International Business Machines Corporation
- Colin J. Brodsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Film stack having under layer for preventing pinhole defects
- Publication number 20070259162
- Publication date Nov 8, 2007
- Colin J. Brodsky
- B32 - LAYERED PRODUCTS
Information Patent Application
Optimized characterization of wafers structures for optical metrology
- Publication number 20070250200
- Publication date Oct 25, 2007
- Timbre Technologies, Inc.
- Steven Scheer
- G01 - MEASURING TESTING
Information Patent Application
Method of forming film stack having under layer for preventing pinh...
- Publication number 20070243333
- Publication date Oct 18, 2007
- Colin J. Brodsky
- B32 - LAYERED PRODUCTS
Information Patent Application
System and method for semiconductor device fabrication using modeling
- Publication number 20070226674
- Publication date Sep 27, 2007
- Henning Haffner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF PREVENTING DEFECTS IN ANTIREFLECTIVE COATINGS
- Publication number 20070178404
- Publication date Aug 2, 2007
- International Business Machines Corporation
- Colin J. Brodsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
After deposition method of thinning film to reduce pinhole defects
- Publication number 20070037325
- Publication date Feb 15, 2007
- Wai-Kin Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Steven Scheer

Person

Patents Grantslast 30 patents

Line pattern collapse mitigation through gap-fill material application

Methods and heat treatment apparatus for uniformly heating a substr...

Method and system for controlling a spike anneal process

Line pattern collapse mitigation through gap-fill material application

Dual tone development with a photo-activated acid enhancement compo...

Flood exposure process for dual tone development in lithographic ap...

Substrate treatment to reduce pattern roughness

Electrostatic post exposure bake apparatus and method

Method for creating gray-scale features for dual tone development p...

Method of process optimization for dual tone development

Dual tone development processes

Variable resist protecting groups

Using electric-field directed post-exposure bake for double-pattern...

Method for patterning a semiconductor wafer

Dual tone development with plural photo-acid generators in lithogra...

Graded spin-on organic antireflective coating for photolithography

Enhanced process yield using a hot-spot library

Method of preventing pinhole defects through co-polymerization

Graded spin-on organic antireflective coating for photolithography

Method of forming film stack having under layer for preventing pinh...

Method of real time dynamic CD control

Film stack having under layer for preventing pinhole defects

Optimized characterization of wafers structures for optical metrology

Film stack having under layer for preventing pinhole defects

After deposition method of thinning film to reduce pinhole defects

Patents Applicationslast 30 patents

LINE PATTERN COLLAPSE MITIGATION THROUGH GAP-FILL MATERIAL APPLICATION

LINE PATTERN COLLAPSE MITIGATION THROUGH GAP-FILL MATERIAL APPLICATION

METHOD AND SYSTEM FOR CONTROLLING A SPIKE ANNEAL PROCESS

ELECTROSTATIC POST EXPOSURE BAKE APPARATUS AND METHOD

TECHNIQUE TO FORM A SELF-ALIGNED DOUBLE PATTERN

METHOD FOR FORMING A SELF-ALIGNED DOUBLE PATTERN

SUBSTRATE TREATMENT TO REDUCE PATTERN ROUGHNESS

LINE PATTERN COLLAPSE MITIGATION THROUGH GAP-FILL MATERIAL APPLICATION

Dual tone development with a photo-activated acid enhancement compo...

Dual tone development with plural photo-acid generators in lithogra...

Flood exposure process for dual tone development in lithographic ap...

Using Electric-Field Directed Post-Exposure Bake for Double-Pattern...

Dual Tone Development Processes

Variable Resist Protecting Groups

METHOD FOR CREATING GRAY-SCALE FEATURES FOR DUAL TONE DEVELOPMENT P...

METHOD OF PATTERNING A SUBSTRATE USING DUAL TONE DEVELOPMENT

METHOD OF PROCESS OPTIMIZATION FOR DUAL TONE DEVELOPMENT

Method for Patterning a Semiconductor Wafer

Enhanced Process Yield Using a Hot-Spot Library

METHODS AND HEAT TREATMENT APPARATUS FOR UNIFORMLY HEATING A SUBSTR...

VACUUM ASSIST METHOD AND SYSTEM FOR REDUCING INTERMIXING OF LITHOGR...

Graded Spin-on Organic Antireflective Coating for Photolithography

METHOD OF REAL TIME DYNAMIC CD CONTROL

Graded spin-on organic antireflective coating for photolithography

Film stack having under layer for preventing pinhole defects

Optimized characterization of wafers structures for optical metrology

Method of forming film stack having under layer for preventing pinh...

System and method for semiconductor device fabrication using modeling

METHODS OF PREVENTING DEFECTS IN ANTIREFLECTIVE COATINGS

After deposition method of thinning film to reduce pinhole defects