Suhail ANWAR

Person

Saratoga, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
High density plasma enhanced process chamber
- Patent number 12,080,516
- Issue date Sep 3, 2024
- Applied Materials, Inc.
- Zheng John Ye
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method and apparatus for controlling phase ang...
- Patent number 10,903,048
- Issue date Jan 26, 2021
- Applied Materials, Inc.
- Yui Lun Wu
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Shadow frame with sides having a varied profile for improved deposi...
- Patent number 10,468,221
- Issue date Nov 5, 2019
- Applied Materials, Inc.
- Gaku Furuta
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Slit valve door with moving mating part
- Patent number 10,453,718
- Issue date Oct 22, 2019
- Applied Materials, Inc.
- Mehran Behdjat
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Grant
Plasma uniformity control by gas diffuser hole design
- Patent number 10,312,058
- Issue date Jun 4, 2019
- Applied Materials, Inc.
- Soo Young Choi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
CVD thin film stress control method for display application
- Patent number 10,312,475
- Issue date Jun 4, 2019
- Applied Materials, Inc.
- Tae Kyung Won
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma uniformity control by gas diffuser hole design
- Patent number 10,262,837
- Issue date Apr 16, 2019
- Applied Materials, Inc.
- Soo Young Choi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Compact configurable modular radio frequency matching network assem...
- Patent number 10,043,638
- Issue date Aug 7, 2018
- Applied Materials, Inc.
- Jozef Kudela
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Vertical inline CVD system
- Patent number 9,922,854
- Issue date Mar 20, 2018
- Applied Materials, Inc.
- Shinichi Kurita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tightly fitted ceramic insulator on large area electrode
- Patent number 9,827,578
- Issue date Nov 28, 2017
- Applied Materials, Inc.
- Jozef Kudela
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Transmission line RF applicator for plasma chamber
- Patent number 9,818,580
- Issue date Nov 14, 2017
- Applied Materials, Inc.
- Jozef Kudela
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Anodized showerhead
- Patent number 9,758,869
- Issue date Sep 12, 2017
- Applied Materials, Inc.
- Soo Young Choi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate transfer robot with chamber and substrate monitoring capa...
- Patent number 9,691,650
- Issue date Jun 27, 2017
- Applied Materials, Inc.
- Shinichi Kurita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for sealing an opening of a processing chamber
- Patent number 9,458,538
- Issue date Oct 4, 2016
- Applied Materials, Inc.
- Shinichi Kurita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems and methods for improved radio frequency matching networks
- Patent number 9,425,026
- Issue date Aug 23, 2016
- Applied Materials, Inc.
- Suhail Anwar
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Guided wave applicator with non-gaseous dielectric for plasma chamber
- Patent number 9,397,380
- Issue date Jul 19, 2016
- Applied Materials, Inc.
- Jozef Kudela
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Ground return for plasma processes
- Patent number 9,382,621
- Issue date Jul 5, 2016
- Applied Materials, Inc.
- Soo Young Choi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vertical inline CVD system
- Patent number 9,324,597
- Issue date Apr 26, 2016
- Applied Materials, Inc.
- Shinichi Kurita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method of forming an indium gallium zinc oxide layer
- Patent number 9,214,340
- Issue date Dec 15, 2015
- APPLIED MATERIALS, INC.
- Shinichi Kurita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma uniformity control by gas diffuser hole design
- Patent number 9,200,368
- Issue date Dec 1, 2015
- Applied Materials, Inc.
- Soo Young Choi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate support with ceramic insulation
- Patent number 9,187,827
- Issue date Nov 17, 2015
- Applied Materials, Inc.
- Gaku Furuta
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tightly fitted ceramic insulator on large area electrode
- Patent number 9,068,262
- Issue date Jun 30, 2015
- Applied Materials, Inc.
- Jozef Kudela
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Transmission line RF applicator for plasma chamber
- Patent number 9,048,518
- Issue date Jun 2, 2015
- Applied Materials, Inc.
- Jozef Kudela
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
RF bus and RF return bus for plasma chamber electrode
- Patent number 8,992,723
- Issue date Mar 31, 2015
- Applied Material, Inc.
- Carl A. Sorensen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thin film deposition using microwave plasma
- Patent number 8,883,269
- Issue date Nov 11, 2014
- Applied Materials, Inc.
- Tae Kyung Won
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Susceptor with heater
- Patent number D717113
- Issue date Nov 11, 2014
- Applied Materials, Inc.
- Gaku Furuta
- D07 - Equipment for preparing or serving food or drink not elsewhere specified
Information Patent Grant
Susceptor with heater
- Patent number D716098
- Issue date Oct 28, 2014
- Applied Materials, Inc.
- Gaku Furuta
- D07 - Equipment for preparing or serving food or drink not elsewhere specified
Information Patent Grant
Plasma source with vertical gradient
- Patent number 8,872,428
- Issue date Oct 28, 2014
- Applied Materials, Inc.
- Jozef Kudela
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Susceptor with heater
- Patent number D713200
- Issue date Sep 16, 2014
- Applied Materials, Inc.
- Gaku Furuta
- D07 - Equipment for preparing or serving food or drink not elsewhere specified
Information Patent Grant
Detecting plasma chamber malfunction
- Patent number 8,674,844
- Issue date Mar 18, 2014
- Applied Materials, Inc.
- Beom Soo Park
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
IMPEDANCE CONTROL OF LOCAL AREAS OF A SUBSTRATE DURING PLASMA DEPOS...
- Publication number 20240234105
- Publication date Jul 11, 2024
- Applied Materials, Inc.
- Zheng John YE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IMPEDANCE CONTROL OF LOCAL AREAS OF A SUBSTRATE DURING PLASMA DEPOS...
- Publication number 20240136160
- Publication date Apr 25, 2024
- Applied Materials, Inc.
- Zheng John YE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYMMETRIC ANTENNA ARRAYS FOR HIGH DENSITY PLASMA ENHANCED PROCESS C...
- Publication number 20240087847
- Publication date Mar 14, 2024
- Applied Materials, Inc.
- Zheng John YE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LARGE-AREA HIGH-DENSITY PLASMA PROCESSING CHAMBER FOR FLAT PANEL DI...
- Publication number 20230272530
- Publication date Aug 31, 2023
- Applied Materials, Inc.
- Suhail ANWAR
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH DENSITY PLASMA ENHANCED PROCESS CHAMBER
- Publication number 20230162947
- Publication date May 25, 2023
- Applied Materials, Inc.
- Zheng John YE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LARGE-AREA HIGH-DENSITY PLASMA PROCESSING CHAMBER FOR FLAT PANEL DI...
- Publication number 20200347499
- Publication date Nov 5, 2020
- Applied Materials, Inc.
- Suhail ANWAR
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SHADOW FRAME WITH SIDES HAVING A VARIED PROFILE FOR IMPROVED DEPOSI...
- Publication number 20190096624
- Publication date Mar 28, 2019
- Applied Materials, Inc.
- Gaku FURUTA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND APPARATUS
- Publication number 20190043695
- Publication date Feb 7, 2019
- Applied Materials, Inc.
- Yui Lun WU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CVD THIN FILM STRESS CONTROL METHOD FOR DISPLAY APPLICATION
- Publication number 20180331328
- Publication date Nov 15, 2018
- Applied Materials, Inc.
- Tae Kyung WON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA UNIFORMITY CONTROL BY GAS DIFFUSER HOLE DESIGN
- Publication number 20180025890
- Publication date Jan 25, 2018
- Applied Materials, Inc.
- Soo Young CHOI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DODECADON TRANSFER CHAMBER AND PROCESSING SYSTEM HAVING THE SAME
- Publication number 20170352562
- Publication date Dec 7, 2017
- Applied Materials, Inc.
- Shinichi KURITA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
NON-SHADOW FRAME PLASMA PROCESSING CHAMBER
- Publication number 20170335459
- Publication date Nov 23, 2017
- Applied Materials, Inc.
- Young-jin CHOI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS DIFFUSER HAVING GROOVED HOLLOW CATHODES
- Publication number 20170178867
- Publication date Jun 22, 2017
- Applied Materials, Inc.
- Jozef KUDELA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GROUND RETURN FOR PLASMA PROCESSES
- Publication number 20160305025
- Publication date Oct 20, 2016
- Applied Materials, Inc.
- Soo Young CHOI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS DELIVERY AND DISTRIBUTION FOR UNIFORM PROCESS IN LINEAR-TYPE LA...
- Publication number 20160208380
- Publication date Jul 21, 2016
- Applied Materials, Inc.
- John M. WHITE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA UNIFORMITY CONTROL BY GAS DIFFUSER HOLE DESIGN
- Publication number 20160056019
- Publication date Feb 25, 2016
- Applied Materials, Inc.
- Soo Young CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR IMPROVED RADIO FREQUENCY MATCHING NETWORKS
- Publication number 20160049917
- Publication date Feb 18, 2016
- Applied Materials, Inc.
- Suhail Anwar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPACT CONFIGURABLE MODULAR RADIO FREQUENCY MATCHING NETWORK ASSEM...
- Publication number 20160049280
- Publication date Feb 18, 2016
- Applied Materials, Inc.
- Jozef Kudela
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REMOTE PLASMA CLEAN SOURCE FEED BETWEEN BACKING PLATE AND DIFFUSER
- Publication number 20160032451
- Publication date Feb 4, 2016
- Applied Materials, Inc.
- Shinichi KURITA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Transmission Line RF Applicator for Plasma Chamber
- Publication number 20150340204
- Publication date Nov 26, 2015
- Applied Materials, Inc.
- Jozef Kudela
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TIGHTLY FITTED CERAMIC INSULATOR ON LARGE AREA ELECTRODE
- Publication number 20150273490
- Publication date Oct 1, 2015
- Applied Materials, Inc.
- Jozef KUDELA
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
APPARATUS AND METHOD OF FORMING AN INDIUM GALLIUM ZINC OXIDE LAYER
- Publication number 20150221508
- Publication date Aug 6, 2015
- Applied Materials, Inc.
- Shinichi KURITA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SLIT VALVE DOOR WITH MOVING MATING PART
- Publication number 20140023460
- Publication date Jan 23, 2014
- Applied Materials, Inc.
- Mehran BEHDJAT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT WITH CERAMIC INSULATION
- Publication number 20130228124
- Publication date Sep 5, 2013
- Gaku FURUTA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Transmission line RF applicator for plasma chamber
- Publication number 20130221833
- Publication date Aug 29, 2013
- Jozef Kudela
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LINEAR PECVD APPARATUS
- Publication number 20130206068
- Publication date Aug 15, 2013
- Jozef KUDELA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Guided Wave Applicator with Non-Gaseous Dielectric for Plasma Chamber
- Publication number 20130126331
- Publication date May 23, 2013
- Jozef Kudela
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS DELIVERY AND DISTRIBUTION FOR UNIFORM PROCESS IN LINEAR-TYPE LA...
- Publication number 20130068161
- Publication date Mar 21, 2013
- Applied Materials, Inc.
- John M. White
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Transmission Line RF Applicator for Plasma Chamber
- Publication number 20120326592
- Publication date Dec 27, 2012
- Jozef Kudela
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INSULATION COVERAGE OF CVD ELECTRODE
- Publication number 20120231181
- Publication date Sep 13, 2012
- Applied Materials, Inc.
- Suhail Anwar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Suhail ANWAR

Person

Patents Grantslast 30 patents

High density plasma enhanced process chamber

Substrate processing method and apparatus for controlling phase ang...

Shadow frame with sides having a varied profile for improved deposi...

Slit valve door with moving mating part

Plasma uniformity control by gas diffuser hole design

CVD thin film stress control method for display application

Plasma uniformity control by gas diffuser hole design

Compact configurable modular radio frequency matching network assem...

Vertical inline CVD system

Tightly fitted ceramic insulator on large area electrode

Transmission line RF applicator for plasma chamber

Anodized showerhead

Substrate transfer robot with chamber and substrate monitoring capa...

Method and apparatus for sealing an opening of a processing chamber

Systems and methods for improved radio frequency matching networks

Guided wave applicator with non-gaseous dielectric for plasma chamber

Ground return for plasma processes

Vertical inline CVD system

Apparatus and method of forming an indium gallium zinc oxide layer

Plasma uniformity control by gas diffuser hole design

Substrate support with ceramic insulation

Tightly fitted ceramic insulator on large area electrode

Transmission line RF applicator for plasma chamber

RF bus and RF return bus for plasma chamber electrode

Thin film deposition using microwave plasma

Susceptor with heater

Susceptor with heater

Plasma source with vertical gradient

Susceptor with heater

Detecting plasma chamber malfunction

Patents Applicationslast 30 patents

IMPEDANCE CONTROL OF LOCAL AREAS OF A SUBSTRATE DURING PLASMA DEPOS...

IMPEDANCE CONTROL OF LOCAL AREAS OF A SUBSTRATE DURING PLASMA DEPOS...

SYMMETRIC ANTENNA ARRAYS FOR HIGH DENSITY PLASMA ENHANCED PROCESS C...

LARGE-AREA HIGH-DENSITY PLASMA PROCESSING CHAMBER FOR FLAT PANEL DI...

HIGH DENSITY PLASMA ENHANCED PROCESS CHAMBER

LARGE-AREA HIGH-DENSITY PLASMA PROCESSING CHAMBER FOR FLAT PANEL DI...

SHADOW FRAME WITH SIDES HAVING A VARIED PROFILE FOR IMPROVED DEPOSI...

SUBSTRATE PROCESSING METHOD AND APPARATUS

CVD THIN FILM STRESS CONTROL METHOD FOR DISPLAY APPLICATION

PLASMA UNIFORMITY CONTROL BY GAS DIFFUSER HOLE DESIGN

DODECADON TRANSFER CHAMBER AND PROCESSING SYSTEM HAVING THE SAME

NON-SHADOW FRAME PLASMA PROCESSING CHAMBER

GAS DIFFUSER HAVING GROOVED HOLLOW CATHODES

GROUND RETURN FOR PLASMA PROCESSES

GAS DELIVERY AND DISTRIBUTION FOR UNIFORM PROCESS IN LINEAR-TYPE LA...

PLASMA UNIFORMITY CONTROL BY GAS DIFFUSER HOLE DESIGN

SYSTEMS AND METHODS FOR IMPROVED RADIO FREQUENCY MATCHING NETWORKS

COMPACT CONFIGURABLE MODULAR RADIO FREQUENCY MATCHING NETWORK ASSEM...

REMOTE PLASMA CLEAN SOURCE FEED BETWEEN BACKING PLATE AND DIFFUSER

Transmission Line RF Applicator for Plasma Chamber

TIGHTLY FITTED CERAMIC INSULATOR ON LARGE AREA ELECTRODE

APPARATUS AND METHOD OF FORMING AN INDIUM GALLIUM ZINC OXIDE LAYER

SLIT VALVE DOOR WITH MOVING MATING PART

SUBSTRATE SUPPORT WITH CERAMIC INSULATION

Transmission line RF applicator for plasma chamber

LINEAR PECVD APPARATUS

Guided Wave Applicator with Non-Gaseous Dielectric for Plasma Chamber

GAS DELIVERY AND DISTRIBUTION FOR UNIFORM PROCESS IN LINEAR-TYPE LA...

Transmission Line RF Applicator for Plasma Chamber

INSULATION COVERAGE OF CVD ELECTRODE