Sunao AYA

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Ion implantation apparatus
- Patent number 10,043,635
- Issue date Aug 7, 2018
- Mitsubishi Electric Corporation
- Sunao Aya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor device
- Patent number 9,188,872
- Issue date Nov 17, 2015
- Mitsubishi Electric Corporation
- Sunao Aya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor device
- Patent number 9,093,361
- Issue date Jul 28, 2015
- Mitsubishi Electric Corporation
- Shiro Hino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor device
- Patent number 9,063,428
- Issue date Jun 23, 2015
- Mitsubishi Electric Corporation
- Hideaki Yuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 9,059,086
- Issue date Jun 16, 2015
- Mitsubishi Electric Corporation
- Yuji Ebiike
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon carbide semiconductor device comprising silicon carbide lay...
- Patent number 8,252,672
- Issue date Aug 28, 2012
- Mitsubishi Electric Corporation
- Tomokatsu Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stress adjustment method of X-ray mask
- Patent number 6,265,113
- Issue date Jul 24, 2001
- Mitsubishi Denki Kabushiki Kaisha
- Hideki Yabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
X-ray mask provided with an alignment mark and method of manufactur...
- Patent number 6,212,252
- Issue date Apr 3, 2001
- Mitsubishi Denki Kabushiki Kaisha
- Koji Kise
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
X-ray mask and method of manufacturing the same
- Patent number 6,190,808
- Issue date Feb 20, 2001
- Mitsubishi Denki Kabushiki Kaisha
- Koji Kise
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing X-ray mask and heating apparatus
- Patent number 5,953,492
- Issue date Sep 14, 1999
- Mitsubishi Denki Kabushiki Kaisha
- Hideki Yabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing X-ray mask and heating apparatus
- Patent number 5,834,142
- Issue date Nov 10, 1998
- Mitsubishi Denki Kabushiki Kaisha
- Hideki Yabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of making X-ray mask having reduced stress
- Patent number 5,677,090
- Issue date Oct 14, 1997
- Mitsubishi Denki Kabushiki Kaisha
- Kenji Marumoto
- B81 - MICRO-STRUCTURAL TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR DEVICE
- Publication number 20240258423
- Publication date Aug 1, 2024
- Sanan Japan Technology Corporation
- Sunao Aya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTATION APPARATUS
- Publication number 20170133201
- Publication date May 11, 2017
- Mitsubishi Electric Corporation
- Sunao AYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20140377709
- Publication date Dec 25, 2014
- Mitsubishi Electric Corporation
- Hideaki YUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20140370445
- Publication date Dec 18, 2014
- Mitsubishi Electric Corporation
- Sunao AYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20140077232
- Publication date Mar 20, 2014
- Mitsubishi Electric Corporation
- Shiro Hino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20130288467
- Publication date Oct 31, 2013
- MITSUBISHI ELECTRIC CORPORATION
- Yuji Ebiike
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON CARBIDE SEMICONDUCTOR DEVICE COMPRISING SILICON CARBIDE LAY...
- Publication number 20090250705
- Publication date Oct 8, 2009
- MITSUBISHI ELECTRIC CORPORATION
- Tomokatsu WATANABE
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Ion implantation apparatus

Method for manufacturing semiconductor device

Semiconductor device

Method for manufacturing semiconductor device

Method of manufacturing semiconductor device

Silicon carbide semiconductor device comprising silicon carbide lay...

Stress adjustment method of X-ray mask

X-ray mask provided with an alignment mark and method of manufactur...

X-ray mask and method of manufacturing the same

Method of manufacturing X-ray mask and heating apparatus

Method of manufacturing X-ray mask and heating apparatus

Method of making X-ray mask having reduced stress

Patents Applicationslast 30 patents

SEMICONDUCTOR DEVICE

ION IMPLANTATION APPARATUS

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

SILICON CARBIDE SEMICONDUCTOR DEVICE COMPRISING SILICON CARBIDE LAY...