Sungho Jo

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Chestnut Hill, MA, US

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Patents Grantslast 30 patents

Information Patent Grant
Plasma treatment process to densify oxide layers
- Patent number 12,094,709
- Issue date Sep 17, 2024
- Applied Materials, Inc.
- Jung Chan Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etch rate modulation through ion implantation
- Patent number 10,332,748
- Issue date Jun 25, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Rajesh Prasad
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Etch rate modulation through ion implantation
- Patent number 9,934,982
- Issue date Apr 3, 2018
- Varian Semiconductor Equipment Associates, Inc.
- Rajesh Prasad
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHODS FOR OXIDIZING A SILICON HARDMASK USING ION IMPLANT
- Publication number 20230268188
- Publication date Aug 24, 2023
- Applied Materials, Inc.
- Sungho Jo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA TREATMENT PROCESS TO DENSIFY OXIDE LAYERS
- Publication number 20230030436
- Publication date Feb 2, 2023
- Applied Materials, Inc.
- Jung Chan LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etch Rate Modulation Through Ion Implantation
- Publication number 20180182636
- Publication date Jun 28, 2018
- Varian Semiconductor Equipment Associates, Inc.
- Rajesh Prasad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etch Rate Modulation Through Ion Implantation
- Publication number 20170178914
- Publication date Jun 22, 2017
- Varian Semiconductor Equipment Associates, Inc.
- Rajesh Prasad
- H01 - BASIC ELECTRIC ELEMENTS