Sunil Srinivasan

Person

Milpitas, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Wafer edge ring lifting solution
- Patent number 12,094,752
- Issue date Sep 17, 2024
- Applied Materials, Inc.
- Michael R. Rice
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cryogenic atomic layer etch with noble gases
- Patent number 11,996,294
- Issue date May 28, 2024
- Applied Materials, Inc.
- Alvaro Garcia De Gorordo
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
In-situ deposition process
- Patent number 11,521,849
- Issue date Dec 6, 2022
- Applied Materials, Inc.
- Sang Wook Park
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Integrated cleaning process for substrate etching
- Patent number 11,521,838
- Issue date Dec 6, 2022
- Applied Materials, Inc.
- Yi Zhou
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cryogenic atomic layer etch with noble gases
- Patent number 11,515,166
- Issue date Nov 29, 2022
- Applied Materials, Inc.
- Alvaro Garcia De Gorordo
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Wafer edge ring lifting solution
- Patent number 11,393,710
- Issue date Jul 19, 2022
- Applied Materials, Inc.
- Michael R. Rice
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of controlling ion energy distribution using a pulse generator
- Patent number 11,284,500
- Issue date Mar 22, 2022
- APPLIED MATERIALS, INC.
- Leonid Dorf
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cryogenic atomic layer etch with noble gases
- Patent number 11,087,989
- Issue date Aug 10, 2021
- Applied Materials, Inc.
- Alvaro Garcia De Gorordo
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Universal process kit
- Patent number 11,049,760
- Issue date Jun 29, 2021
- Applied Materials, Inc.
- Olivier Joubert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adjustable extended electrode for edge uniformity control
- Patent number 10,991,556
- Issue date Apr 27, 2021
- Applied Materials, Inc.
- Olivier Luere
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of controlling ion energy distribution using a pulse generat...
- Patent number 10,791,617
- Issue date Sep 29, 2020
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adjustable extended electrode for edge uniformity control
- Patent number 10,553,404
- Issue date Feb 4, 2020
- Applied Materials, Inc.
- Olivier Luere
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of controlling ion energy distribution using a pulse generat...
- Patent number 10,555,412
- Issue date Feb 4, 2020
- Applied Materials, Inc.
- Leonid Dorf
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Adjustable extended electrode for edge uniformity control
- Patent number 10,504,702
- Issue date Dec 10, 2019
- Applied Materials, Inc.
- Olivier Luere
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of controlling ion energy distribution using a pulse generat...
- Patent number 10,448,495
- Issue date Oct 15, 2019
- Applied Materials, Inc.
- Leonid Dorf
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method of controlling ion energy distribution using a pulse generat...
- Patent number 10,448,494
- Issue date Oct 15, 2019
- Applied Materials, Inc.
- Leonid Dorf
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Adjustable extended electrode for edge uniformity control
- Patent number 10,103,010
- Issue date Oct 16, 2018
- Applied Materials, Inc.
- Olivier Luere
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adjustable extended electrode for edge uniformity control
- Patent number 9,947,517
- Issue date Apr 17, 2018
- Applied Materials, Inc.
- Olivier Luere
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composite edge ring
- Patent number D797691
- Issue date Sep 19, 2017
- Applied Materials, Inc.
- Olivier Joubert
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Multi-film stack etching with polymer passivation of an overlying e...
- Patent number 8,747,684
- Issue date Jun 10, 2014
- Applied Materials, Inc.
- Sunil Srinivasan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Shallow trench isolation etch process
- Patent number 8,133,817
- Issue date Mar 13, 2012
- Applied Materials, Inc.
- Hiroki Sasano
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
WAFER EDGE RING LIFTING SOLUTION
- Publication number 20240429088
- Publication date Dec 26, 2024
- Applied Materials, Inc.
- Michael R. RICE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADJUSTABLE EDGE RING TILT FOR EDGE OF WAFER SKEW COMPENSATION
- Publication number 20240429089
- Publication date Dec 26, 2024
- Applied Materials, Inc.
- Peter MURAOKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REDUCING ASPECT RATIO DEPENDENT ETCH WITH DIRECT CURRENT BIAS PULSING
- Publication number 20240162007
- Publication date May 16, 2024
- Applied Materials, Inc.
- Deyang LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED CLEANING PROCESS FOR SUBSTRATE ETCHING
- Publication number 20230086917
- Publication date Mar 23, 2023
- Applied Materials, Inc.
- Yi Zhou
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CRYOGENIC ATOMIC LAYER ETCH WITH NOBLE GASES
- Publication number 20230071505
- Publication date Mar 9, 2023
- Applied Materials, Inc.
- Alvaro GARCIA DE GORORDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER EDGE RING LIFTING SOLUTION
- Publication number 20220319904
- Publication date Oct 6, 2022
- Applied Materials, Inc.
- Michael R. RICE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CRYOGENIC ATOMIC LAYER ETCH WITH NOBLE GASES
- Publication number 20210398815
- Publication date Dec 23, 2021
- Applied Materials, Inc.
- Alvaro GARCIA DE GORORDO
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
IN-SITU ATOMIC LAYER DEPOSITION PROCESS
- Publication number 20200373149
- Publication date Nov 26, 2020
- Applied Materials, Inc.
- Sang Wook PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF CONTROLLING ION ENERGY DISTRIBUTION USING A PULSE GENERATOR
- Publication number 20200352017
- Publication date Nov 5, 2020
- Applied Materials, Inc.
- Leonid DORF
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTEGRATED CLEANING PROCESS FOR SUBSTRATE ETCHING
- Publication number 20200194242
- Publication date Jun 18, 2020
- Applied Materials, Inc.
- Yi Zhou
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF CONTROLLING ION ENERGY DISTRIBUTION USING A PULSE GENERAT...
- Publication number 20200154556
- Publication date May 14, 2020
- Applied Materials, Inc.
- Leonid DORF
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ADJUSTABLE EXTENDED ELECTRODE FOR EDGE UNIFORMITY CONTROL
- Publication number 20200118798
- Publication date Apr 16, 2020
- Applied Materials, Inc.
- Olivier LUERE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU DEPOSITION PROCESS
- Publication number 20200027717
- Publication date Jan 23, 2020
- Applied Materials, Inc.
- Sang Wook PARK
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF CONTROLLING ION ENERGY DISTRIBUTION USING A PULSE GENERAT...
- Publication number 20190350072
- Publication date Nov 14, 2019
- Applied Materials, Inc.
- Leonid DORF
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING WITH POWERED EDGE RING
- Publication number 20190228952
- Publication date Jul 25, 2019
- Applied Materials, Inc.
- Leonid DORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADJUSTABLE EXTENDED ELECTRODE FOR EDGE UNIFORMITY CONTROL
- Publication number 20180315583
- Publication date Nov 1, 2018
- Applied Materials, Inc.
- Olivier LUERE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADJUSTABLE EXTENDED ELECTRODE FOR EDGE UNIFORMITY CONTROL
- Publication number 20180233334
- Publication date Aug 16, 2018
- Applied Materials, Inc.
- Olivier LUERE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADJUSTABLE EXTENDED ELECTRODE FOR EDGE UNIFORMITY CONTROL
- Publication number 20180218933
- Publication date Aug 2, 2018
- Applied Materials, Inc.
- Olivier LUERE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR CONTROLLING A VOLTAGE WAVEFORM AT A SUBSTRA...
- Publication number 20170358431
- Publication date Dec 14, 2017
- LEONID DORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UNIVERSAL PROCESS KIT
- Publication number 20170256435
- Publication date Sep 7, 2017
- Applied Materials, Inc.
- Olivier JOUBERT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER EDGE RING LIFTING SOLUTION
- Publication number 20170213758
- Publication date Jul 27, 2017
- Applied Materials, Inc.
- Michael R. RICE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPONENT FOR SEMICONDUCTOR PROCESS CHAMBER HAVING SURFACE TREATMEN...
- Publication number 20160056059
- Publication date Feb 25, 2016
- Applied Materials, Inc.
- Jennifer SUN
- B28 - WORKING CEMENT, CLAY, OR STONE
Information Patent Application
MULTI-FILM STACK ETCHING WITH POLYMER PASSIVATION OF AN OVERLYING E...
- Publication number 20110045672
- Publication date Feb 24, 2011
- Applied Materials, Inc.
- Sunil Srinivasan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SHALLOW TRENCH ISOLATION ETCH PROCESS
- Publication number 20090170333
- Publication date Jul 2, 2009
- APPLIED MATERIALS, INC.
- Hiroki Sasano
- H01 - BASIC ELECTRIC ELEMENTS

Sunil Srinivasan

Person

Patents Grantslast 30 patents

Wafer edge ring lifting solution

Cryogenic atomic layer etch with noble gases

In-situ deposition process

Integrated cleaning process for substrate etching

Cryogenic atomic layer etch with noble gases

Wafer edge ring lifting solution

Method of controlling ion energy distribution using a pulse generator

Cryogenic atomic layer etch with noble gases

Universal process kit

Adjustable extended electrode for edge uniformity control

Method of controlling ion energy distribution using a pulse generat...

Adjustable extended electrode for edge uniformity control

Method of controlling ion energy distribution using a pulse generat...

Adjustable extended electrode for edge uniformity control

Method of controlling ion energy distribution using a pulse generat...

Method of controlling ion energy distribution using a pulse generat...

Adjustable extended electrode for edge uniformity control

Adjustable extended electrode for edge uniformity control

Composite edge ring

Multi-film stack etching with polymer passivation of an overlying e...

Shallow trench isolation etch process

Patents Applicationslast 30 patents

WAFER EDGE RING LIFTING SOLUTION

ADJUSTABLE EDGE RING TILT FOR EDGE OF WAFER SKEW COMPENSATION

REDUCING ASPECT RATIO DEPENDENT ETCH WITH DIRECT CURRENT BIAS PULSING

INTEGRATED CLEANING PROCESS FOR SUBSTRATE ETCHING

CRYOGENIC ATOMIC LAYER ETCH WITH NOBLE GASES

WAFER EDGE RING LIFTING SOLUTION

CRYOGENIC ATOMIC LAYER ETCH WITH NOBLE GASES

IN-SITU ATOMIC LAYER DEPOSITION PROCESS

METHOD OF CONTROLLING ION ENERGY DISTRIBUTION USING A PULSE GENERATOR

INTEGRATED CLEANING PROCESS FOR SUBSTRATE ETCHING

METHOD OF CONTROLLING ION ENERGY DISTRIBUTION USING A PULSE GENERAT...

ADJUSTABLE EXTENDED ELECTRODE FOR EDGE UNIFORMITY CONTROL

IN-SITU DEPOSITION PROCESS

METHOD OF CONTROLLING ION ENERGY DISTRIBUTION USING A PULSE GENERAT...

PROCESSING WITH POWERED EDGE RING

ADJUSTABLE EXTENDED ELECTRODE FOR EDGE UNIFORMITY CONTROL

ADJUSTABLE EXTENDED ELECTRODE FOR EDGE UNIFORMITY CONTROL

ADJUSTABLE EXTENDED ELECTRODE FOR EDGE UNIFORMITY CONTROL

SYSTEMS AND METHODS FOR CONTROLLING A VOLTAGE WAVEFORM AT A SUBSTRA...

UNIVERSAL PROCESS KIT

WAFER EDGE RING LIFTING SOLUTION

COMPONENT FOR SEMICONDUCTOR PROCESS CHAMBER HAVING SURFACE TREATMEN...

MULTI-FILM STACK ETCHING WITH POLYMER PASSIVATION OF AN OVERLYING E...

SHALLOW TRENCH ISOLATION ETCH PROCESS