Suryadevara V. Babu

Person

Pottsdam, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Abrasive-free planarization for EUV mask substrates
- Patent number 9,097,994
- Issue date Aug 4, 2015
- Sematech, Inc.
- Suryadevara V. Babu
- B24 - GRINDING POLISHING
Information Patent Grant
Abrasive compositions for chemical mechanical polishing and methods...
- Patent number 8,822,340
- Issue date Sep 2, 2014
- Rhodia Operations
- Suryadevara V. Babu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Tunable polish rates by varying dissolved oxygen content
- Patent number 8,778,203
- Issue date Jul 15, 2014
- Clarkson University
- P. R. Veera Dandu
- B24 - GRINDING POLISHING
Information Patent Grant
Abrasive compositions for chemical mechanical polishing and methods...
- Patent number 8,366,959
- Issue date Feb 5, 2013
- Rhodia Operations
- Suryadevara V. Babu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method for selective CMP of polysilicon
- Patent number 7,723,234
- Issue date May 25, 2010
- Clarkson University
- Suryadevara V. Babu
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Method for one-to-one polishing of silicon nitride and silicon oxide
- Patent number 7,629,258
- Issue date Dec 8, 2009
- Clarkson University
- Suryadevara V. Babu
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Polishing slurries and methods for chemical mechanical polishing
- Patent number 7,553,430
- Issue date Jun 30, 2009
- Climax Engineered Materials, LLC
- Sunil Chandra
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Silica and silica-based slurry
- Patent number 7,279,119
- Issue date Oct 9, 2007
- PPG Industries Ohio, Inc.
- Stuart D. Hellring
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chemical-mechanical polishing slurry and method
- Patent number 7,101,800
- Issue date Sep 5, 2006
- Ferro Corporation
- Yie-Shein Her
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Slurry for chemical mechanical polishing silicon dioxide
- Patent number 7,091,164
- Issue date Aug 15, 2006
- Eastman Kodak Company
- Ramanathan Srinivasan
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polishing compositions comprising polymeric cores having inorganic...
- Patent number 6,918,820
- Issue date Jul 19, 2005
- Eastman Kodak Company
- Dennis E. Smith
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Chemical-mechanical polishing slurry and method
- Patent number 6,702,954
- Issue date Mar 9, 2004
- Ferro Corporation
- Yie-Shein Her
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Slurry for chemical mechanical polishing silicon dioxide
- Patent number 6,627,107
- Issue date Sep 30, 2003
- Eastman Kodak Company
- Ramanathan Srinivasan
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Slurry for chemical mechanical polishing silicon dioxide
- Patent number 6,544,892
- Issue date Apr 8, 2003
- Eastman Kodak Company
- Ramanathan Srinivasan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Slurry for chemical mechanical polishing silicon dioxide
- Patent number 6,491,843
- Issue date Dec 10, 2002
- Eastman Kodak Company
- Ramanathan Srinivasan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Slurry for chemical mechanical polishing silicon dioxide
- Patent number 6,468,910
- Issue date Oct 22, 2002
- Ramanathan Srinivasan
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Electrophotographic apparatus with improved blue sensitivity
- Patent number 6,007,954
- Issue date Dec 28, 1999
- Eastman Kodak Company
- Susan A. Visser
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multilayer photoconductive elements having low dark decay
- Patent number 5,849,445
- Issue date Dec 15, 1998
- Eastman Kodak Company
- Susan A. Visser
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of making multilayer electrophotographic elements
- Patent number 5,849,443
- Issue date Dec 15, 1998
- Eastman Kodak Company
- Susan A. Visser
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for making corrosion resistant electrical components
- Patent number 5,840,427
- Issue date Nov 24, 1998
- Teledyne Industries Incorporated
- Suryadevara V. Babu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Fuser members with an outermost layer of a fluorinated diamond like...
- Patent number 5,674,621
- Issue date Oct 7, 1997
- Eastman Kodak Company
- Susan Ann Visser
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Plasma processing apparatus including three bus structures
- Patent number 5,061,359
- Issue date Oct 29, 1991
- International Business Machines Corporation
- Suryadevara V. Babu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of plasma etching a substrate with a gaseous organohalide co...
- Patent number 5,053,104
- Issue date Oct 1, 1991
- International Business Machines Corporation
- Suryadevara V. Babu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Side source center sink plasma reactor
- Patent number 5,021,138
- Issue date Jun 4, 1991
- Suryadevara V. Babu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma conditioning of a substrate for electroless plating
- Patent number 4,956,197
- Issue date Sep 11, 1990
- International Business Machines Corporation
- Suryadevara V. Babu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Interlaminate adhesion between polymeric materials and electrolytic...
- Patent number 4,810,326
- Issue date Mar 7, 1989
- International Business Machines Corporation
- Suryadevara V. Babu
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Removal of residual catalyst from a dielectric substrate
- Patent number 4,735,820
- Issue date Apr 5, 1988
- International Business Machines Corporation
- Peter A. Agostino
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Grant
Method of removing seed particles from circuit board substrate surface
- Patent number 4,718,972
- Issue date Jan 12, 1988
- International Business Machines Corporation
- Suryadevara V. Babu
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Uniform plasma for drill smear removal reactor
- Patent number 4,618,477
- Issue date Oct 21, 1986
- International Business Machines Corporation
- Suryadevara V. Babu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching with tracer
- Patent number 4,599,134
- Issue date Jul 8, 1986
- IBM Corporation
- Suryadevara V. Babu
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Information Patent Application
Tunable Polish Rates By Varying Dissolved Oxygen Content
- Publication number 20140299271
- Publication date Oct 9, 2014
- Clarkson University
- P.R. Veera Dandu
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
ABRASIVE-FREE PLANARIZATION FOR EUV MASK SUBSTRATES
- Publication number 20130209924
- Publication date Aug 15, 2013
- Suryadevara V. BABU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ABRASIVE COMPOSITIONS FOR CHEMICAL POLISHING AND METHODS FOR USING...
- Publication number 20130122705
- Publication date May 16, 2013
- Clarkson University
- Suryadevara V. BABU
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Abrasive Free Silicon Chemical Mechanical Planarization
- Publication number 20120190200
- Publication date Jul 26, 2012
- Clarkson University
- Naresh K. Penta
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Tunable Polish Rates By Varying Dissolved Oxygen Content
- Publication number 20110294404
- Publication date Dec 1, 2011
- Clarkson University
- P.R. Veera Dandu
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
Abrasive compositions for chemical mechanical polishing and methods...
- Publication number 20100081281
- Publication date Apr 1, 2010
- RHODIA OPERATIONS
- Suryadevara V. Babu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING SLURRIES FOR CHEMICAL-MECHANICAL POLISHING
- Publication number 20090224200
- Publication date Sep 10, 2009
- CLIMAX ENGINEERED MATERIALS, LLC
- Sunil Chandra Jha
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method For The Preferential Polishing Of Silicon Nitride Versus Sil...
- Publication number 20090176371
- Publication date Jul 9, 2009
- Clarkson University
- Suryadevara V. Babu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Method For The Preferential Polishing Of Silicon Nitride Versus Sil...
- Publication number 20080116171
- Publication date May 22, 2008
- Clarkson University
- Suryadevara V. Babu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Method For Selective CMP Of Polysilicon
- Publication number 20080119051
- Publication date May 22, 2008
- Clarkson University
- Suryadevara V. Babu
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
Method For One-To-One Polishing Of Silicon Nitride And Silicon Oxide
- Publication number 20080116172
- Publication date May 22, 2008
- Clarkson University
- Suryadevara V. Babu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Polishing compositions comprising polymeric cores having inorganic...
- Publication number 20040203324
- Publication date Oct 14, 2004
- Dennis E. Smith
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Chemical-mechanical polishing slurry and method
- Publication number 20040157454
- Publication date Aug 12, 2004
- Ferro Corporation
- Yie-Shein Her
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Chemical mechanical planarization of wafers or films using fixed po...
- Publication number 20040127045
- Publication date Jul 1, 2004
- Venkata R. K. Gorantla
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Silica and silica-based slurry
- Publication number 20040067649
- Publication date Apr 8, 2004
- Stuart D. Hellring
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Slurry for chemical mechanical polishing silicon dioxide
- Publication number 20040051077
- Publication date Mar 18, 2004
- Ramanathan Srinivasan
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Shallow trench isolation polishing using mixed abrasive slurries
- Publication number 20030211747
- Publication date Nov 13, 2003
- NYACOL NANO TECHNOLOGIES, INC
- Sharath Hegde
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Silica and a silica-based slurry
- Publication number 20030094593
- Publication date May 22, 2003
- Stuart D. Hellring
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Shallow trench isolation polishing using mixed abrasive slurries
- Publication number 20030092271
- Publication date May 15, 2003
- NYACOL NANO TECHNOLOGIES, INC
- Anurag Jindal
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Chemical-mechanical polishing
- Publication number 20030047710
- Publication date Mar 13, 2003
- NYACOL NANO TECHNOLOGIES, INC
- Suryadevara V. Babu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Slurry for chemical mechanical polishing silicon dioxide
- Publication number 20030006397
- Publication date Jan 9, 2003
- Ramanathan Srinivasan
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Slurry for chemical mechanical polishing silicon dioxide
- Publication number 20020195421
- Publication date Dec 26, 2002
- Ramanathan Srinivasan
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Suryadevara V. Babu

Person

Patents Grantslast 30 patents

Abrasive-free planarization for EUV mask substrates

Abrasive compositions for chemical mechanical polishing and methods...

Tunable polish rates by varying dissolved oxygen content

Abrasive compositions for chemical mechanical polishing and methods...

Method for selective CMP of polysilicon

Method for one-to-one polishing of silicon nitride and silicon oxide

Polishing slurries and methods for chemical mechanical polishing

Silica and silica-based slurry

Chemical-mechanical polishing slurry and method

Slurry for chemical mechanical polishing silicon dioxide

Polishing compositions comprising polymeric cores having inorganic...

Chemical-mechanical polishing slurry and method

Slurry for chemical mechanical polishing silicon dioxide

Slurry for chemical mechanical polishing silicon dioxide

Slurry for chemical mechanical polishing silicon dioxide

Slurry for chemical mechanical polishing silicon dioxide

Electrophotographic apparatus with improved blue sensitivity

Multilayer photoconductive elements having low dark decay

Method of making multilayer electrophotographic elements

Method for making corrosion resistant electrical components

Fuser members with an outermost layer of a fluorinated diamond like...

Plasma processing apparatus including three bus structures

Method of plasma etching a substrate with a gaseous organohalide co...

Side source center sink plasma reactor

Plasma conditioning of a substrate for electroless plating

Interlaminate adhesion between polymeric materials and electrolytic...

Removal of residual catalyst from a dielectric substrate

Method of removing seed particles from circuit board substrate surface

Uniform plasma for drill smear removal reactor

Plasma etching with tracer

Patents Applicationslast 30 patents

Tunable Polish Rates By Varying Dissolved Oxygen Content

ABRASIVE-FREE PLANARIZATION FOR EUV MASK SUBSTRATES

ABRASIVE COMPOSITIONS FOR CHEMICAL POLISHING AND METHODS FOR USING...

Abrasive Free Silicon Chemical Mechanical Planarization

Tunable Polish Rates By Varying Dissolved Oxygen Content

Abrasive compositions for chemical mechanical polishing and methods...

POLISHING SLURRIES FOR CHEMICAL-MECHANICAL POLISHING

Method For The Preferential Polishing Of Silicon Nitride Versus Sil...

Method For The Preferential Polishing Of Silicon Nitride Versus Sil...

Method For Selective CMP Of Polysilicon

Method For One-To-One Polishing Of Silicon Nitride And Silicon Oxide

Polishing compositions comprising polymeric cores having inorganic...

Chemical-mechanical polishing slurry and method

Chemical mechanical planarization of wafers or films using fixed po...

Silica and silica-based slurry

Slurry for chemical mechanical polishing silicon dioxide

Shallow trench isolation polishing using mixed abrasive slurries

Silica and a silica-based slurry

Shallow trench isolation polishing using mixed abrasive slurries

Chemical-mechanical polishing

Slurry for chemical mechanical polishing silicon dioxide

Slurry for chemical mechanical polishing silicon dioxide