Ta-Ko Chuang

Person

Painted Post, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method for forming a glass substrate with a depleted surface layer...
- Patent number 9,722,084
- Issue date Aug 1, 2017
- Corning Incorporated
- Ta-Ko Chuang
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
High-speed micro-hole fabrication in glass
- Patent number 9,321,680
- Issue date Apr 26, 2016
- Corning Incorporated
- Ta-Ko Chuang
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Semiconductor on glass substrate with stiffening layer
- Patent number 8,772,875
- Issue date Jul 8, 2014
- Corning Incorporated
- Nadia Ben Mohamed
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Oxygen plasma conversion process for preparing a surface for bonding
- Patent number 8,557,679
- Issue date Oct 15, 2013
- Corning Incorporated
- Ta Ko Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process of making semiconductor on glass substrates with a stiffeni...
- Patent number 8,518,799
- Issue date Aug 27, 2013
- Corning Incorporated
- Nadia Ben Mohamed
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor on glass substrate with stiffening layer and process...
- Patent number 8,357,974
- Issue date Jan 22, 2013
- Corning Incorporated
- Nadia Ben Mohamed
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
HIGH RATE DEPOSITION SYSTEMS AND PROCESSES FOR FORMING HERMETIC BAR...
- Publication number 20170218503
- Publication date Aug 3, 2017
- Corning Incorporated
- Robert Alan Bellman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GLASS WITH DEPLETED LAYER AND POLYCRYSTALLINE-SILICON TFT BUILT THE...
- Publication number 20160071981
- Publication date Mar 10, 2016
- Corning Incorporated
- Ta-Ko Chuang
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
HIGH RATE DEPOSITION SYSTEMS AND PROCESSES FOR FORMING HERMETIC BAR...
- Publication number 20140144772
- Publication date May 29, 2014
- Robert Alan Bellman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH-SPEED MICRO-HOLE FABRICATION IN GLASS
- Publication number 20140116091
- Publication date May 1, 2014
- Corning Incorporated
- Ta-Ko Chuang
- G02 - OPTICS
Information Patent Application
SEMICONDUCTOR ON GLASS SUBSTRATE WITH STIFFENING LAYER AND PROCESS...
- Publication number 20130341756
- Publication date Dec 26, 2013
- SOITEC
- Nadia Ben Mohamed
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR ON GLASS SUBSTRATE WITH STIFFENING LAYER AND PROCESS...
- Publication number 20130130473
- Publication date May 23, 2013
- Nadia Ben Mohamed
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OXYGEN PLASMA CONVERSION PROCESS FOR PREPARING A SURFACE FOR BONDING
- Publication number 20120003813
- Publication date Jan 5, 2012
- Ta Ko Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR ON GLASS SUBSTRATE WITH STIFFENING LAYER AND PROCESS...
- Publication number 20120001293
- Publication date Jan 5, 2012
- Nadia Ben Mohamed
- H01 - BASIC ELECTRIC ELEMENTS

Ta-Ko Chuang

Person

Patents Grantslast 30 patents

Method for forming a glass substrate with a depleted surface layer...

High-speed micro-hole fabrication in glass

Semiconductor on glass substrate with stiffening layer

Oxygen plasma conversion process for preparing a surface for bonding

Process of making semiconductor on glass substrates with a stiffeni...

Semiconductor on glass substrate with stiffening layer and process...

Patents Applicationslast 30 patents

HIGH RATE DEPOSITION SYSTEMS AND PROCESSES FOR FORMING HERMETIC BAR...

GLASS WITH DEPLETED LAYER AND POLYCRYSTALLINE-SILICON TFT BUILT THE...

HIGH RATE DEPOSITION SYSTEMS AND PROCESSES FOR FORMING HERMETIC BAR...

HIGH-SPEED MICRO-HOLE FABRICATION IN GLASS

SEMICONDUCTOR ON GLASS SUBSTRATE WITH STIFFENING LAYER AND PROCESS...

SEMICONDUCTOR ON GLASS SUBSTRATE WITH STIFFENING LAYER AND PROCESS...

OXYGEN PLASMA CONVERSION PROCESS FOR PREPARING A SURFACE FOR BONDING

SEMICONDUCTOR ON GLASS SUBSTRATE WITH STIFFENING LAYER AND PROCESS...