Tadashi Iino

Person

Nirasaki-Shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing apparatus and method for determining deteriora...
- Patent number 11,938,500
- Issue date Mar 26, 2024
- Tokyo Electron Limited
- Tadashi Iino
- G01 - MEASURING TESTING
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 11,574,827
- Issue date Feb 7, 2023
- Tokyo Electron Limited
- Tadashi Iino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus with resistance value varying mechanism
- Patent number 11,488,849
- Issue date Nov 1, 2022
- Tokyo Electron Limited
- Yosuke Hachiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 10,851,468
- Issue date Dec 1, 2020
- Tokyo Electron Limited
- Tadashi Iino
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 7,896,973
- Issue date Mar 1, 2011
- Tokyo Electron Limited
- Naoki Shindo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ozone processing apparatus and ozone processing method
- Patent number 7,767,006
- Issue date Aug 3, 2010
- Tokyo Electron Limited
- Yoshichika Tokuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method, substrate processing apparatus and com...
- Patent number 7,731,799
- Issue date Jun 8, 2010
- Tokyo Electron Limited
- Takayuki Toshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Computer readable storage medium for controlling substrate processi...
- Patent number 7,693,597
- Issue date Apr 6, 2010
- Tokyo Electron Limited
- Mitsunori Nakamori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist film removing method
- Patent number 7,691,210
- Issue date Apr 6, 2010
- Tokyo Electron Limited
- Takehiko Orii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate processing method
- Patent number 7,410,543
- Issue date Aug 12, 2008
- Tokyo Electron Limited
- Takayuki Toshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus for resist film removal
- Patent number 7,191,785
- Issue date Mar 20, 2007
- Tokyo Electron Limited
- Takayuki Toshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 7,086,410
- Issue date Aug 8, 2006
- Tokyo Electron Limited
- Yasuhiro Chouno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 6,869,499
- Issue date Mar 22, 2005
- Tokyo Electron Limited
- Takayuki Toshima
- B08 - CLEANING
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 6,817,368
- Issue date Nov 16, 2004
- Tokyo Electron Limited
- Takayuki Toshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 6,729,041
- Issue date May 4, 2004
- Tokyo Electron Limited
- Naoki Shindo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 6,688,020
- Issue date Feb 10, 2004
- Tokyo Electron Limited
- Takayuki Toshima
- B08 - CLEANING
Information Patent Grant
Substrate processing method and apparatus
- Patent number 6,613,692
- Issue date Sep 2, 2003
- Tokyo Electron Limited
- Takayuki Toshima
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND METHOD FOR DETERMINING DETERIORA...
- Publication number 20240189852
- Publication date Jun 13, 2024
- TOKYO ELECTRON LIMITED
- Tadashi IINO
- G01 - MEASURING TESTING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND METHOD FOR DETERMINING DETERIORA...
- Publication number 20210276031
- Publication date Sep 9, 2021
- TOKYO ELECTRON LIMITED
- Tadashi IINO
- G01 - MEASURING TESTING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20210229135
- Publication date Jul 29, 2021
- TOKYO ELECTRON LIMITED
- Tadashi Iino
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20200357667
- Publication date Nov 12, 2020
- TOKYO ELECTRON LIMITED
- Tadashi IINO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20200203189
- Publication date Jun 25, 2020
- TOKYO ELECTRON LIMITED
- Yosuke Hachiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20170283977
- Publication date Oct 5, 2017
- TOKYO ELECTRON LIMITED
- Tadashi IINO
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Substrate Processing Apparatus
- Publication number 20100163179
- Publication date Jul 1, 2010
- Shigeki Tozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate processing apparatus for resist film removal
- Publication number 20070204885
- Publication date Sep 6, 2007
- TOKYO ELECTRON LIMITED
- Takayuki Toshima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Ozone processing apparatus and ozone processing method
- Publication number 20070107751
- Publication date May 17, 2007
- TOKYO ELECTRON LIMITED
- Yoshichika Tokuno
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
Resist film removing method
- Publication number 20070082496
- Publication date Apr 12, 2007
- TOKYO ELECTRON LIMITED
- Takehiko Orii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Substrate processing method, substrate processing apparatus and com...
- Publication number 20070074747
- Publication date Apr 5, 2007
- Takayuki Toshima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Substrate processing method and substrate processing apparatus
- Publication number 20060079096
- Publication date Apr 13, 2006
- TOKYO ELECTRON LIMITED
- Mitsunori Nakamori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Substrate processing apparatus and substrate processing method
- Publication number 20050087133
- Publication date Apr 28, 2005
- TOKYO ELECTRON LIMITED
- Naoki Shindo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate processing method and substrate processing apparatus
- Publication number 20050051246
- Publication date Mar 10, 2005
- TOKYO ELECTRON LIMITED
- Takayuki Toshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate processing method and apparatus
- Publication number 20050011537
- Publication date Jan 20, 2005
- TOKYO ELECTRON LIMITED
- Takayuki Toshima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Substrate processing apparatus and substrate processing method
- Publication number 20030170949
- Publication date Sep 11, 2003
- TOKYO ELECTRON LIMITED
- Yasuhiro Chouno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate processing method and substrate processing apparatus
- Publication number 20020185225
- Publication date Dec 12, 2002
- TOKYO ELECTRON LIMITED
- Takayuki Toshima
- B08 - CLEANING
Information Patent Application
Substrate processing apparatus and substrate processing method
- Publication number 20020132480
- Publication date Sep 19, 2002
- TOKYO ELECTRON LIMITED
- Naoki Shindo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate processing method and substrate processing apparatus
- Publication number 20020045008
- Publication date Apr 18, 2002
- TOKYO ELECTRON LIMITED
- Takayuki Toshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate processing method and substrate processing apparatus
- Publication number 20010032396
- Publication date Oct 25, 2001
- Takayuki Toshima
- H01 - BASIC ELECTRIC ELEMENTS

Tadashi Iino

Person

Patents Grantslast 30 patents

Substrate processing apparatus and method for determining deteriora...

Substrate processing apparatus and substrate processing method

Substrate processing apparatus with resistance value varying mechanism

Substrate processing apparatus and substrate processing method

Substrate processing apparatus and substrate processing method

Ozone processing apparatus and ozone processing method

Substrate processing method, substrate processing apparatus and com...

Computer readable storage medium for controlling substrate processi...

Resist film removing method

Substrate processing method

Substrate processing apparatus for resist film removal

Substrate processing apparatus and substrate processing method

Substrate processing method and substrate processing apparatus

Substrate processing method and substrate processing apparatus

Substrate processing apparatus and substrate processing method

Substrate processing apparatus

Substrate processing method and apparatus

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING APPARATUS AND METHOD FOR DETERMINING DETERIORA...

SUBSTRATE PROCESSING APPARATUS AND METHOD FOR DETERMINING DETERIORA...

SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

Substrate Processing Apparatus

Substrate processing apparatus for resist film removal

Ozone processing apparatus and ozone processing method

Resist film removing method

Substrate processing method, substrate processing apparatus and com...

Substrate processing method and substrate processing apparatus

Substrate processing apparatus and substrate processing method

Substrate processing method and substrate processing apparatus

Substrate processing method and apparatus

Substrate processing apparatus and substrate processing method

Substrate processing method and substrate processing apparatus

Substrate processing apparatus and substrate processing method

Substrate processing method and substrate processing apparatus

Substrate processing method and substrate processing apparatus