TADASHI INABA

Person

MINAMI-ASHIGARA-SHI, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Removal liquid and method for removing oxide of group III-V element...
- Patent number 11,145,514
- Issue date Oct 12, 2021
- FUJIFILM Corporation
- Satomi Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for treating pattern structure, method for manufacturing ele...
- Patent number 10,403,491
- Issue date Sep 3, 2019
- FUJIFILM Corporation
- Atsushi Mizutani
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Etching method, and method of producing semiconductor substrate pro...
- Patent number 9,558,953
- Issue date Jan 31, 2017
- FUJIFILM Corporation
- Naotsugu Muro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method of semiconductor substrate, and method of producing...
- Patent number 9,548,217
- Issue date Jan 17, 2017
- FUJIFILM Corporation
- Naotsugu Muro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method of semiconductor substrate, and method of producing...
- Patent number 9,514,958
- Issue date Dec 6, 2016
- FUJIFILM Corporation
- Yoshinori Nishiwaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing liquid for metal and polishing method using the same
- Patent number 9,202,709
- Issue date Dec 1, 2015
- FUJIFILM Corporation
- Takamitsu Tomiga
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method of producing semiconductor substrate product, and etching me...
- Patent number 9,159,572
- Issue date Oct 13, 2015
- FUJIFILM Corporation
- Masashi Enokido
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching composition
- Patent number 8,889,025
- Issue date Nov 18, 2014
- Fujifilm Electronic Materials U.S.A., Inc.
- Tomonori Takahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Etching composition
- Patent number 8,647,523
- Issue date Feb 11, 2014
- Fujifilm Electronic Materials U.S.A., Inc.
- Tomonori Takahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cleaning composition, method for producing semiconductor device, an...
- Patent number 8,617,417
- Issue date Dec 31, 2013
- FUJIFILM Corporation
- Tadashi Inaba
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Metal polishing slurry and chemical mechanical polishing method
- Patent number 8,277,681
- Issue date Oct 2, 2012
- FUJIFILM Corporation
- Hiroshi Inada
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Metal polishing composition and chemical mechanical polishing method
- Patent number 8,202,445
- Issue date Jun 19, 2012
- FUJIFILM Corporation
- Sumi Takamiya
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Metal-polishing liquid and polishing method
- Patent number 8,083,964
- Issue date Dec 27, 2011
- FUJIFILM Corporation
- Toru Yamada
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Cleaning liquid for semiconductor device and cleaning method
- Patent number 7,888,300
- Issue date Feb 15, 2011
- FUJIFILM Corporation
- Hiroyuki Seki
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Silver halide color photographic light-sensitive material and image...
- Patent number 7,741,017
- Issue date Jun 22, 2010
- FUJIFILM Corporation
- Atsushi Matsunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metal polishing composition and method of polishing using the same
- Patent number 7,547,335
- Issue date Jun 16, 2009
- FUJIFILM Corporation
- Hiroyuki Seki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silver halide color photosensitive material
- Patent number 7,244,551
- Issue date Jul 17, 2007
- FUJIFILM Corporation
- Junichiro Hosokawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Silver halide emulsion and silver halide color photographic light-s...
- Patent number 7,238,468
- Issue date Jul 3, 2007
- FUJIFILM Corporation
- Naoto Ohshima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silver halide photographic lightsensitive material
- Patent number 7,186,500
- Issue date Mar 6, 2007
- Fuji Photo Film Co., Ltd.
- Yoichi Hosoya
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photothermographic material
- Patent number 7,147,999
- Issue date Dec 12, 2006
- FUJIFILM Corporation
- Tomoyuki Ohzeki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photothermographic material
- Patent number 7,026,109
- Issue date Apr 11, 2006
- Fuji Photo Film Co., Ltd.
- Tomoyuki Ohzeki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silver halide photographic lightsensitive material
- Patent number 6,924,091
- Issue date Aug 2, 2005
- Fuji Photo Film Co., Ltd.
- Yoichi Hosoya
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Light-sensitive silver halide grain
- Patent number 6,911,303
- Issue date Jun 28, 2005
- Fuji Photo Film, Co., Ltd.
- Tadanobu Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silver halide photographic emulsion, silver halide photosensitive m...
- Patent number 6,902,879
- Issue date Jun 7, 2005
- Fuji Photo Film Co., Ltd.
- Tadashi Inaba
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Light-sensitive silver halide grain and silver halide emulsion
- Patent number 6,808,870
- Issue date Oct 26, 2004
- Fuji Photo Film Co., Ltd.
- Tadanobu Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silver halide emulsion, production process thereof and novel pyridi...
- Patent number 6,773,876
- Issue date Aug 10, 2004
- Fuji Photo Film Co., Ltd.
- Shigeharu Urabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silver halide photographic material
- Patent number 6,723,496
- Issue date Apr 20, 2004
- Fuji Photo Film Co., Ltd.
- Tadanobu Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silver halide photosensitive material and isothiazolidine-3-one der...
- Patent number 6,696,234
- Issue date Feb 24, 2004
- Fuji Photo Film Co., Ltd.
- Tadashi Inaba
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
SILVER HALIDE COLOR PHOTOGRAPHIC LIGHT-SENSITIVE MATERIAL AND IMAGE...
- Patent number 6,689,555
- Issue date Feb 10, 2004
- Fuji Photo Film Co., Ltd.
- Atsushi Matsunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silver halide emulsion and chemical sensitization method thereof
- Patent number 6,638,705
- Issue date Oct 28, 2003
- Fuji Photo Film Co., Ltd.
- Hiroyuki Suzuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
CLEANING COMPOSITION, CLEANING METHOD OF SEMICONDUCTOR SUBSTRATE, A...
- Publication number 20240209284
- Publication date Jun 27, 2024
- FUJIFILM CORPORATION
- Naotsugu MURO
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
CLEANING COMPOSITION, CLEANING METHOD OF SEMICONDUCTOR SUBSTRATE, A...
- Publication number 20240067901
- Publication date Feb 29, 2024
- FUJIFILM CORPORATION
- Naotsugu MURO
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
METHOD FOR TREATING PATTERN STRUCTURE, METHOD FOR MANUFACTURING ELE...
- Publication number 20180122628
- Publication date May 3, 2018
- FUJIFILM CORPORATION
- Atsushi MIZUTANI
- B08 - CLEANING
Information Patent Application
REMOVAL LIQUID AND METHOD FOR REMOVING OXIDE OF GROUP III-V ELEMENT...
- Publication number 20170309492
- Publication date Oct 26, 2017
- FUJIFILM CORPORATION
- Satomi TAKAHASHI
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
ETCHING METHOD OF SEMICONDUCTOR SUBSTRATE, AND METHOD OF PRODUCING...
- Publication number 20150255309
- Publication date Sep 10, 2015
- FUJIFILM CORPORATION
- Yoshinori NISHIWAKI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ETCHING LIQUID FOR SEMICONDUCTOR SUBSTRATE, ETCHING METHOD USING TH...
- Publication number 20150247087
- Publication date Sep 3, 2015
- FUJIFILM CORPORATION
- Tetsuya KAMIMURA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ETCHING METHOD OF SEMICONDUCTOR SUBSTRATE, AND METHOD OF PRODUCING...
- Publication number 20150243527
- Publication date Aug 27, 2015
- FUJIFILM CORPORATION
- Naotsugu MURO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ETCHING LIQUID, ETCHING METHOD USING THE SAME, AND METHOD OF PRODUC...
- Publication number 20150225645
- Publication date Aug 13, 2015
- FUJIFILM CORPORATION
- Tetsuya KAMIMURA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ETCHING METHOD, AND METHOD OF PRODUCING SEMICONDUCTOR SUBSTRATE PRO...
- Publication number 20150118860
- Publication date Apr 30, 2015
- FUJIFILM CORPORATION
- Naotsugu MURO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD, AND METHOD OF PRODUCING SEMICONDUCTOR SUBSTRATE PRO...
- Publication number 20150087156
- Publication date Mar 26, 2015
- FUJIFILM CORPORATION
- Tetsuya KAMIMURA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ETCHING METHOD AND ETCHING LIQUID USED THEREIN
- Publication number 20140332713
- Publication date Nov 13, 2014
- FUJIFILM CORPORATION
- Atsushi MIZUTANI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF PRODUCING SEMICONDUCTOR SUBSTRATE PRODUCT, AND ETCHING ME...
- Publication number 20140308819
- Publication date Oct 16, 2014
- FUJIFILM CORPORATION
- Masashi ENOKIDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Novel Etching Composition
- Publication number 20140120734
- Publication date May 1, 2014
- Fujifilm Electronic Materials U.S.A., Inc.
- Tomonori Takahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FORMING A CAPACITOR STRUCTURE, AND A SILICON ETCHING LIQU...
- Publication number 20140001145
- Publication date Jan 2, 2014
- FUJIFILM CORPORATION
- Atsushi MIZUTANI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Novel Etching Composition
- Publication number 20120231632
- Publication date Sep 13, 2012
- FUJIFILM CORPORATION
- Tomonori Takahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CLEANING COMPOSITION, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AN...
- Publication number 20110281436
- Publication date Nov 17, 2011
- FUJIFILM CORPORATION
- Tadashi INABA
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
POLISHING LIQUID FOR METALS
- Publication number 20100330809
- Publication date Dec 30, 2010
- FUJIFILM CORPORATION
- Tadashi Inaba
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Cleaning liquid for semiconductor device and cleaning method
- Publication number 20100160200
- Publication date Jun 24, 2010
- FUJIFILM CORPORATION
- Hiroyuki Seki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Metal polishing slurry and chemical mechanical polishing method
- Publication number 20100075500
- Publication date Mar 25, 2010
- FUJIFILM CORPORATION
- Masaru Yoshikawa
- B24 - GRINDING POLISHING
Information Patent Application
METAL POLISHING COMPOSITION AND CHEMICAL MECHANICAL POLISHING METHOD
- Publication number 20090246956
- Publication date Oct 1, 2009
- FUJIFILM CORPORATION
- Sumi TAKAMIYA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING LIQUID FOR METAL AND POLISHING METHOD USING THE SAME
- Publication number 20090239380
- Publication date Sep 24, 2009
- FUJIFILM CORPORATION
- Takamitsu TOMIGA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METAL POLISHING SLURRY AND CHEMICAL MECHANICAL POLISHING METHOD
- Publication number 20090221145
- Publication date Sep 3, 2009
- FUJIFILM CORPORATION
- Hiroshi INADA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METAL POLISHING SLURRY AND CHEMICAL MECHANICAL POLISHING METHOD
- Publication number 20090203215
- Publication date Aug 13, 2009
- FUJIFILM CORPORATION
- Masaru YOSHIKAWA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
STRIPPING LIQUID FOR SEMICONDUCTOR DEVICE, AND STRIPPING METHOD
- Publication number 20090082240
- Publication date Mar 26, 2009
- FUJIFILM CORPORATION
- Katsuyuki NUKUI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SILVER HALIDE COLOR PHOTOGRAPHIC LIGHT-SENSITIVE MATERIAL AND IMAGE...
- Publication number 20080242860
- Publication date Oct 2, 2008
- FUJIFILM CORPORATION
- Atsushi Matsunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METAL-POLISHING LIQUID AND POLISHING METHOD
- Publication number 20080242090
- Publication date Oct 2, 2008
- FUJIFILM CORPORATION
- Toru YAMADA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Polishing liquid for metals
- Publication number 20070200089
- Publication date Aug 30, 2007
- FUJIFILM Corporation
- Tadashi Inaba
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Silver halide color photosensitive material
- Publication number 20060147851
- Publication date Jul 6, 2006
- Fuji Photo Film Co., Ltd.
- Naoharu Kiyoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Silver halide color photosensitive material
- Publication number 20060141401
- Publication date Jun 29, 2006
- Fuji Photo Film Co., Ltd.
- Junichiro Hosokawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Silver halide photographic light-sensitive material
- Publication number 20060134566
- Publication date Jun 22, 2006
- Fuji Photo Film Co., Ltd.
- Takashi Hoshimiya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

TADASHI INABA

Person

Patents Grantslast 30 patents

Removal liquid and method for removing oxide of group III-V element...

Method for treating pattern structure, method for manufacturing ele...

Etching method, and method of producing semiconductor substrate pro...

Etching method of semiconductor substrate, and method of producing...

Etching method of semiconductor substrate, and method of producing...

Polishing liquid for metal and polishing method using the same

Method of producing semiconductor substrate product, and etching me...

Etching composition

Etching composition

Cleaning composition, method for producing semiconductor device, an...

Metal polishing slurry and chemical mechanical polishing method

Metal polishing composition and chemical mechanical polishing method

Metal-polishing liquid and polishing method

Cleaning liquid for semiconductor device and cleaning method

Silver halide color photographic light-sensitive material and image...

Metal polishing composition and method of polishing using the same

Silver halide color photosensitive material

Silver halide emulsion and silver halide color photographic light-s...

Silver halide photographic lightsensitive material

Photothermographic material

Photothermographic material

Silver halide photographic lightsensitive material

Light-sensitive silver halide grain

Silver halide photographic emulsion, silver halide photosensitive m...

Light-sensitive silver halide grain and silver halide emulsion

Silver halide emulsion, production process thereof and novel pyridi...

Silver halide photographic material

Silver halide photosensitive material and isothiazolidine-3-one der...

SILVER HALIDE COLOR PHOTOGRAPHIC LIGHT-SENSITIVE MATERIAL AND IMAGE...

Silver halide emulsion and chemical sensitization method thereof

Patents Applicationslast 30 patents

CLEANING COMPOSITION, CLEANING METHOD OF SEMICONDUCTOR SUBSTRATE, A...

CLEANING COMPOSITION, CLEANING METHOD OF SEMICONDUCTOR SUBSTRATE, A...

METHOD FOR TREATING PATTERN STRUCTURE, METHOD FOR MANUFACTURING ELE...

REMOVAL LIQUID AND METHOD FOR REMOVING OXIDE OF GROUP III-V ELEMENT...

ETCHING METHOD OF SEMICONDUCTOR SUBSTRATE, AND METHOD OF PRODUCING...

ETCHING LIQUID FOR SEMICONDUCTOR SUBSTRATE, ETCHING METHOD USING TH...

ETCHING METHOD OF SEMICONDUCTOR SUBSTRATE, AND METHOD OF PRODUCING...

ETCHING LIQUID, ETCHING METHOD USING THE SAME, AND METHOD OF PRODUC...

ETCHING METHOD, AND METHOD OF PRODUCING SEMICONDUCTOR SUBSTRATE PRO...

ETCHING METHOD, AND METHOD OF PRODUCING SEMICONDUCTOR SUBSTRATE PRO...

ETCHING METHOD AND ETCHING LIQUID USED THEREIN

METHOD OF PRODUCING SEMICONDUCTOR SUBSTRATE PRODUCT, AND ETCHING ME...

Novel Etching Composition

METHOD OF FORMING A CAPACITOR STRUCTURE, AND A SILICON ETCHING LIQU...

Novel Etching Composition

CLEANING COMPOSITION, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AN...

POLISHING LIQUID FOR METALS

Cleaning liquid for semiconductor device and cleaning method

Metal polishing slurry and chemical mechanical polishing method

METAL POLISHING COMPOSITION AND CHEMICAL MECHANICAL POLISHING METHOD

POLISHING LIQUID FOR METAL AND POLISHING METHOD USING THE SAME

METAL POLISHING SLURRY AND CHEMICAL MECHANICAL POLISHING METHOD

METAL POLISHING SLURRY AND CHEMICAL MECHANICAL POLISHING METHOD

STRIPPING LIQUID FOR SEMICONDUCTOR DEVICE, AND STRIPPING METHOD

SILVER HALIDE COLOR PHOTOGRAPHIC LIGHT-SENSITIVE MATERIAL AND IMAGE...

METAL-POLISHING LIQUID AND POLISHING METHOD

Polishing liquid for metals

Silver halide color photosensitive material

Silver halide color photosensitive material

Silver halide photographic light-sensitive material