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Tae Seung CHO
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San Jose, CA, US
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Patents Grants
last 30 patents
Information
Patent Grant
Low temperature chuck for plasma processing systems
Patent number
12,009,228
Issue date
Jun 11, 2024
Applied Materials, Inc.
Toan Q. Tran
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Apparatus for generating etchants for remote plasma processes
Patent number
12,002,659
Issue date
Jun 4, 2024
Applied Materials, Inc.
Tae Seung Cho
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Two piece electrode assembly with gap for plasma control
Patent number
11,915,911
Issue date
Feb 27, 2024
Applied Materials, Inc.
Tien Fak Tan
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Methods and apparatus for symmetrical hollow cathode electrode and...
Patent number
11,901,161
Issue date
Feb 13, 2024
Applied Materials, Inc.
Tae Seung Cho
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Low temperature chuck for plasma processing systems
Patent number
11,594,428
Issue date
Feb 28, 2023
Applied Materials, Inc.
Toan Q. Tran
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Methods and apparatus for symmetrical hollow cathode electrode and...
Patent number
11,373,845
Issue date
Jun 28, 2022
Applied Materials, Inc.
Tae Seung Cho
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Methods and apparatus for processing a substrate
Patent number
11,361,941
Issue date
Jun 14, 2022
Applied Materials, Inc.
Junghoon Kim
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma health determination in semiconductor substrate processing r...
Patent number
10,920,320
Issue date
Feb 16, 2021
Applied Materials, Inc.
Junghoon Kim
B81 - MICRO-STRUCTURAL TECHNOLOGY
Information
Patent Grant
Apparatus and method for depositing a coating on a substrate at atm...
Patent number
10,752,994
Issue date
Aug 25, 2020
The Board of Trustees of the University of Illinois
David N. Ruzic
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Two piece electrode assembly with gap for plasma control
Patent number
10,699,879
Issue date
Jun 30, 2020
Applied Materials, Inc.
Tien Fak Tan
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Magnetic induction plasma source for semiconductor processes and eq...
Patent number
10,593,560
Issue date
Mar 17, 2020
Applied Materials, Inc.
Tae Seung Cho
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
High temperature chuck for plasma processing systems
Patent number
10,468,285
Issue date
Nov 5, 2019
Applied Materials, Inc.
Toan Q. Tran
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Optical emission spectroscopy (OES) for remote plasma monitoring
Patent number
10,319,649
Issue date
Jun 11, 2019
Applied Materials, Inc.
Tae Seung Cho
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Apparatus and method for depositing a coating on a substrate at atm...
Patent number
10,167,556
Issue date
Jan 1, 2019
The Board of Trustees of the University of Illinois
David N. Ruzic
H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information
Patent Grant
In-situ spatially resolved plasma monitoring by using optical emiss...
Patent number
9,874,524
Issue date
Jan 23, 2018
Applied Materials, Inc.
Tae Seung Cho
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Dual discharge modes operation for remote plasma
Patent number
9,773,648
Issue date
Sep 26, 2017
Applied Materials, Inc.
Tae Seung Cho
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
High temperature chuck for plasma processing systems
Patent number
9,728,437
Issue date
Aug 8, 2017
Applied Materials, Inc.
Toan Q. Tran
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Grooved insulator to reduce leakage current
Patent number
9,659,753
Issue date
May 23, 2017
Applied Materials, Inc.
Tae Cho
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma uniformity control by arrays of unit cell plasmas
Patent number
9,528,185
Issue date
Dec 27, 2016
Applied Materials, Inc.
Sang Ki Nam
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Polarity control for remote plasma
Patent number
9,117,855
Issue date
Aug 25, 2015
Applied Materials, Inc.
Tae Seung Cho
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
Information
Patent Application
APPARATUS FOR GENERATING ETCHANTS FOR REMOTE PLASMA PROCESSES
Publication number
20230402262
Publication date
Dec 14, 2023
Tae Seung CHO
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
LOW TEMPERATURE CHUCK FOR PLASMA PROCESSING SYSTEMS
Publication number
20230223281
Publication date
Jul 13, 2023
Applied Materials, Inc.
Toan Q. Tran
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHODS AND APPARATUS FOR SYMMETRICAL HOLLOW CATHODE ELECTRODE AND...
Publication number
20220293396
Publication date
Sep 15, 2022
Applied Materials, Inc.
Tae Seung CHO
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
Publication number
20210398778
Publication date
Dec 23, 2021
Applied Materials, Inc.
Junghoon KIM
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHODS AND APPARATUS FOR SYMMETRICAL HOLLOW CATHODE ELECTRODE AND...
Publication number
20210384011
Publication date
Dec 9, 2021
Applied Materials, Inc.
Tae Seung CHO
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHODS, APPARATUS, AND SYSTEMS FOR PROCESSING A SUBSTRATE
Publication number
20210005435
Publication date
Jan 7, 2021
Applied Materials, Inc.
Soonwook Jung
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
TWO PIECE ELECTRODE ASSEMBLY WITH GAP FOR PLASMA CONTROL
Publication number
20200328065
Publication date
Oct 15, 2020
Applied Materials, Inc.
Tien Fak Tan
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
SYSTEMS AND PROCESSES FOR PLASMA TUNING
Publication number
20200090907
Publication date
Mar 19, 2020
Applied Materials, Inc.
Junghoon Kim
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
TWO PIECE ELECTRODE ASSEMBLY WITH GAP FOR PLASMA CONTROL
Publication number
20190318911
Publication date
Oct 17, 2019
Applied Materials, Inc.
Tien Fak Tan
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
MAGNETIC INDUCTION PLASMA SOURCE FOR SEMICONDUCTOR PROCESSES AND EQ...
Publication number
20190272999
Publication date
Sep 5, 2019
Applied Materials, Inc.
Tae Seung Cho
H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information
Patent Application
OPTICAL EMISSION SPECTROSCOPY (OES) FOR REMOTE PLASMA MONITORING
Publication number
20190259580
Publication date
Aug 22, 2019
Applied Materials, Inc.
Tae Seung Cho
G01 - MEASURING TESTING
Information
Patent Application
APPARATUS AND METHOD FOR DEPOSITING A COATING ON A SUBSTRATE AT ATM...
Publication number
20190093229
Publication date
Mar 28, 2019
THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ILLINOIS
David N. Ruzic
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
PLASMA HEALTH DETERMINATION IN SEMICONDUCTOR SUBSTRATE PROCESSING R...
Publication number
20180366378
Publication date
Dec 20, 2018
Applied Materials, Inc.
Junghoon Kim
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
OPTICAL EMISSION SPECTROSCOPY (OES) FOR REMOTE PLASMA MONITORING
Publication number
20180294198
Publication date
Oct 11, 2018
Applied Materials, Inc.
Tae Seung Cho
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
HIGH TEMPERATURE CHUCK FOR PLASMA PROCESSING SYSTEMS
Publication number
20170309509
Publication date
Oct 26, 2017
Applied Materials, Inc.
Toan Q. Tran
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
IN-SITU SPATIALLY RESOLVED PLASMA MONITORING BY USING OPTICAL EMISS...
Publication number
20170254755
Publication date
Sep 7, 2017
Applied Materials, Inc.
Tae Seung CHO
G01 - MEASURING TESTING
Information
Patent Application
LOW TEMPERATURE CHUCK FOR PLASMA PROCESSING SYSTEMS
Publication number
20170229326
Publication date
Aug 10, 2017
Applied Materials, Inc.
Toan Q. Tran
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
LOW TEMPERATURE CHUCK FOR PLASMA PROCESSING SYSTEMS
Publication number
20160225652
Publication date
Aug 4, 2016
Applied Materials, Inc.
Toan Q. Tran
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
HIGH TEMPERATURE CHUCK FOR PLASMA PROCESSING SYSTEMS
Publication number
20160225651
Publication date
Aug 4, 2016
Applied Materials, Inc.
Toan Q. Tran
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA UNIFORMITY CONTROL BY ARRAYS OF UNIT CELL PLASMAS
Publication number
20160053376
Publication date
Feb 25, 2016
Applied Materials, Inc.
Sang Ki NAM
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
GROOVED INSULATOR TO REDUCE LEAKAGE CURRENT
Publication number
20160042920
Publication date
Feb 11, 2016
Applied Materials, Inc.
TAE CHO
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
APPARATUS AND METHOD FOR DEPOSITING A COATING ON A SUBSTRATE AT ATM...
Publication number
20150259802
Publication date
Sep 17, 2015
THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ILLINOIS
David N. Ruzic
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
POLARITY CONTROL FOR REMOTE PLASMA
Publication number
20150155189
Publication date
Jun 4, 2015
Tae Seung Cho
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
DUAL DISCHARGE MODES OPERATION FOR REMOTE PLASMA
Publication number
20150060265
Publication date
Mar 5, 2015
Applied Materials, Inc.
Tae Seung Cho
H01 - BASIC ELECTRIC ELEMENTS