Taejoon Han

Person

Clifton Park, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Generation of a map of a substrate using iterative calculations of...
- Patent number 10,503,850
- Issue date Dec 10, 2019
- Tokyo Electron Limited
- Daniel Morvay
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Computed tomography using intersecting views of plasma using optica...
- Patent number 10,215,704
- Issue date Feb 26, 2019
- Tokyo Electron Limited
- Taejoon Han
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Feature etching using varying supply of power pulses
- Patent number 9,401,263
- Issue date Jul 26, 2016
- GLOBALFOUNDRIES Inc.
- Xiang Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structures with coplanar recessed gate layers and fab...
- Patent number 9,252,238
- Issue date Feb 2, 2016
- Lam Research Corporation
- Kristina Trevino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated circuits having replacement metal gates with improved th...
- Patent number 9,147,680
- Issue date Sep 29, 2015
- GLOBALFOUNDRIES, INC.
- Kristina Trevino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated circuits having laterally confined epitaxial material ov...
- Patent number 9,040,380
- Issue date May 26, 2015
- GLOBALFOUNDRIES, INC.
- Xiang Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Facilitating mask pattern formation
- Patent number 9,034,767
- Issue date May 19, 2015
- GLOBALFOUNDRIES Inc.
- Xiang Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for fabricating integrated circuits with improved patternin...
- Patent number 8,940,641
- Issue date Jan 27, 2015
- GLOBALFOUNDRIES, INC.
- Xiang Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ photoresist strip during plasma etching of active hard mask
- Patent number 8,912,633
- Issue date Dec 16, 2014
- Lam Research Corporation
- Sangjun Cho
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
In-situ photoresist strip during plasma etching of active hard mask
- Patent number 8,283,255
- Issue date Oct 9, 2012
- Lam Research Corporation
- Sangjun Cho
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Trilayer resist organic layer etch
- Patent number 8,124,516
- Issue date Feb 28, 2012
- Lam Research Corporation
- Sean S. Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of and apparatus for reducing amounts of particles on a waf...
- Patent number 7,782,591
- Issue date Aug 24, 2010
- Lam Research Corporation
- Sangjun Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer area pressure control for plasma confinement
- Patent number 7,470,627
- Issue date Dec 30, 2008
- Lam Research Corporation
- Taejoon Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Waferless automatic cleaning after barrier removal
- Patent number 7,211,518
- Issue date May 1, 2007
- Lam Research Corporation
- Xiaoqiang Sean Yao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pre-endpoint techniques in photoresist etching
- Patent number 7,001,529
- Issue date Feb 21, 2006
- Lam Research Corporation
- Taejoon Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer area pressure control for plasma confinement
- Patent number 6,823,815
- Issue date Nov 30, 2004
- Lam Research Corporation
- Taejoon Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer area pressure control for plasma confinement
- Patent number 6,492,774
- Issue date Dec 10, 2002
- Lam Research Corporation
- Taejoon Han
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Computed Tomography using Intersecting Views of Plasma using Optica...
- Publication number 20180252650
- Publication date Sep 6, 2018
- TOKYO ELECTRON LIMITED
- Daniel Morvay
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
GENERATION OF A MAP OF A SUBSTRATE USING ITERATIVE CALCULATIONS OF...
- Publication number 20180144078
- Publication date May 24, 2018
- TOKYO ELECTRON LIMITED
- Daniel Morvay
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SEMICONDUCTOR STRUCTURES WITH COPLANAR RECESSED GATE LAYERS AND FAB...
- Publication number 20160049495
- Publication date Feb 18, 2016
- LAM RESEARCH CORPORATION
- Kristina TREVINO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FACILITATING MASK PATTERN FORMATION
- Publication number 20150132962
- Publication date May 14, 2015
- GLOBALFOUNDRIES INC.
- Xiang HU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FEATURE ETCHING USING VARYING SUPPLY OF POWER PULSES
- Publication number 20150076111
- Publication date Mar 19, 2015
- GLOBALFOUNDRIES INC.
- Xiang HU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED CIRCUITS HAVING LATERALLY CONFINED EPITAXIAL MATERIAL OV...
- Publication number 20150069515
- Publication date Mar 12, 2015
- GLOBALFOUNDRIES, INC.
- Xiang Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED CIRCUITS HAVING REPLACEMENT METAL GATES WITH IMPROVED TH...
- Publication number 20150021694
- Publication date Jan 22, 2015
- GLOBALFOUNDRIES, INC.
- Kristina Trevino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING INTEGRATED CIRCUITS WITH REDUCED REPLACEMENT ME...
- Publication number 20150024584
- Publication date Jan 22, 2015
- GLOBAL FOUNDRIES, INC.
- Gabriel Padron Wells
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU PHOTORESIST STRIP DURING PLASMA ETCHING OF ACTIVE HARD MASK
- Publication number 20130001754
- Publication date Jan 3, 2013
- LAM RESEARCH CORPORATION
- Sangjun Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of and apparatus for reducing amounts of particles on a waf...
- Publication number 20080314733
- Publication date Dec 25, 2008
- LAM RESEARCH CORPORATION
- Sangjun Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
In-situ photoresist strip during plasma etching of active hard mask
- Publication number 20080293249
- Publication date Nov 27, 2008
- Lam Research Corporation
- Sangjun Cho
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR PROCESSING INCLUDING ETCHED LAYER PASSIVATION USING S...
- Publication number 20080064214
- Publication date Mar 13, 2008
- LAM RESEARCH CORPORATION
- Taejoon Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Trilayer resist organic layer etch
- Publication number 20080044995
- Publication date Feb 21, 2008
- Lam Research Corporation
- Sean S. Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFERLESS AUTOMATIC CLEANING AFTER BARRIER REMOVAL
- Publication number 20070128849
- Publication date Jun 7, 2007
- LAM RESEARCH CORPORATION
- Xiaoqiang Sean Yao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Waferless automatic cleaning after barrier removal
- Publication number 20050233590
- Publication date Oct 20, 2005
- Lam Research Corporation
- Xiaoqiang Sean Yao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Wafer area pressure control for plasma confinement
- Publication number 20050051268
- Publication date Mar 10, 2005
- Lam Research Corporation
- Taejoon Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pre-endpoint techniques in photoresist etching
- Publication number 20040074867
- Publication date Apr 22, 2004
- LAM RESEARCH CORPORATION
- Taejoon Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Wafer area pressure control for plasma confinement
- Publication number 20020190657
- Publication date Dec 19, 2002
- Lam Research Corporation
- Taejoon Han
- H01 - BASIC ELECTRIC ELEMENTS

Taejoon Han

Person

Patents Grantslast 30 patents

Generation of a map of a substrate using iterative calculations of...

Computed tomography using intersecting views of plasma using optica...

Feature etching using varying supply of power pulses

Semiconductor structures with coplanar recessed gate layers and fab...

Integrated circuits having replacement metal gates with improved th...

Integrated circuits having laterally confined epitaxial material ov...

Facilitating mask pattern formation

Methods for fabricating integrated circuits with improved patternin...

In-situ photoresist strip during plasma etching of active hard mask

In-situ photoresist strip during plasma etching of active hard mask

Trilayer resist organic layer etch

Methods of and apparatus for reducing amounts of particles on a waf...

Wafer area pressure control for plasma confinement

Waferless automatic cleaning after barrier removal

Pre-endpoint techniques in photoresist etching

Wafer area pressure control for plasma confinement

Wafer area pressure control for plasma confinement

Patents Applicationslast 30 patents

Computed Tomography using Intersecting Views of Plasma using Optica...

GENERATION OF A MAP OF A SUBSTRATE USING ITERATIVE CALCULATIONS OF...

SEMICONDUCTOR STRUCTURES WITH COPLANAR RECESSED GATE LAYERS AND FAB...

FACILITATING MASK PATTERN FORMATION

FEATURE ETCHING USING VARYING SUPPLY OF POWER PULSES

INTEGRATED CIRCUITS HAVING LATERALLY CONFINED EPITAXIAL MATERIAL OV...

INTEGRATED CIRCUITS HAVING REPLACEMENT METAL GATES WITH IMPROVED TH...

METHODS FOR FORMING INTEGRATED CIRCUITS WITH REDUCED REPLACEMENT ME...

IN-SITU PHOTORESIST STRIP DURING PLASMA ETCHING OF ACTIVE HARD MASK

Methods of and apparatus for reducing amounts of particles on a waf...

In-situ photoresist strip during plasma etching of active hard mask

SEMICONDUCTOR PROCESSING INCLUDING ETCHED LAYER PASSIVATION USING S...

Trilayer resist organic layer etch

WAFERLESS AUTOMATIC CLEANING AFTER BARRIER REMOVAL

Waferless automatic cleaning after barrier removal

Wafer area pressure control for plasma confinement

Pre-endpoint techniques in photoresist etching

Wafer area pressure control for plasma confinement