Takaaki Kaiho

Person

Kawasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 11,977,330
- Issue date May 7, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Takaaki Kaiho
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, method of forming resist pattern, fluorine-cont...
- Patent number 10,838,301
- Issue date Nov 17, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki Hirano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, compound, polymeric compound and method of form...
- Patent number 9,244,347
- Issue date Jan 26, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshitaka Komuro
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition, method of forming resist pattern and polymeric...
- Patent number 9,133,102
- Issue date Sep 15, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Daichi Takaki
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Sulfonium salt and photo-acid generator
- Patent number 9,045,398
- Issue date Jun 2, 2015
- San-Apro Limited
- Issei Suzuki
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition, method of forming resist pattern and compound
- Patent number 9,040,224
- Issue date May 26, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method of producing polymeric compound, resist composition, and met...
- Patent number 8,987,386
- Issue date Mar 24, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiyuki Utsumi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition, method of forming resist pattern and polymeric...
- Patent number 8,685,620
- Issue date Apr 1, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Daichi Takaki
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
- Publication number 20240427244
- Publication date Dec 26, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Yasuo SOMEYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
- Publication number 20230107966
- Publication date Apr 6, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Yasuo SOMEYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20220214615
- Publication date Jul 7, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Takaaki KAIHO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20220179315
- Publication date Jun 9, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Yasuo SOMEYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20210181632
- Publication date Jun 17, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Takaaki KAIHO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20200257197
- Publication date Aug 13, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi Nagamine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, FLUORINE-CONT...
- Publication number 20180284606
- Publication date Oct 4, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki HIRANO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SULFONIUM SALT AND PHOTO-ACID GENERATOR
- Publication number 20140357896
- Publication date Dec 4, 2014
- SAN-APRO LTD.
- Issei Suzuki
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION, COMPOUND, POLYMERIC COMPOUND AND METHOD OF FORM...
- Publication number 20140356787
- Publication date Dec 4, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshitaka Komuro
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION, POLYMERIC COMPOUND, COMPOUND AND METHOD OF FORM...
- Publication number 20140220492
- Publication date Aug 7, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Takaaki Kaiho
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC...
- Publication number 20140221673
- Publication date Aug 7, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Daichi Takaki
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND HIGH-MOL...
- Publication number 20140186769
- Publication date Jul 3, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Takaaki Kaiho
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND COMPOUND
- Publication number 20140178821
- Publication date Jun 26, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC...
- Publication number 20130115554
- Publication date May 9, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Daichi Takaki
- C07 - ORGANIC CHEMISTRY
Information Patent Application
METHOD OF PRODUCING POLYMERIC COMPOUND, RESIST COMPOSITION, AND MET...
- Publication number 20120328993
- Publication date Dec 27, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiyuki Utsumi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Takaaki Kaiho

Person

Patents Grantslast 30 patents

Resist composition and method of forming resist pattern

Resist composition, method of forming resist pattern, fluorine-cont...

Resist composition, compound, polymeric compound and method of form...

Resist composition, method of forming resist pattern and polymeric...

Sulfonium salt and photo-acid generator

Resist composition, method of forming resist pattern and compound

Method of producing polymeric compound, resist composition, and met...

Resist composition, method of forming resist pattern and polymeric...

Patents Applicationslast 30 patents

RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, FLUORINE-CONT...

SULFONIUM SALT AND PHOTO-ACID GENERATOR

RESIST COMPOSITION, COMPOUND, POLYMERIC COMPOUND AND METHOD OF FORM...

RESIST COMPOSITION, POLYMERIC COMPOUND, COMPOUND AND METHOD OF FORM...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC...

RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND HIGH-MOL...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND COMPOUND

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC...

METHOD OF PRODUCING POLYMERIC COMPOUND, RESIST COMPOSITION, AND MET...