Takaaki Matsuoka

Person

Minato-ku, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Welding method of diffusion bonded structure
- Patent number 11,498,145
- Issue date Nov 15, 2022
- IHI Corporation
- Kunitaka Masaki
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
High-temperature object observation device
- Patent number 10,412,323
- Issue date Sep 10, 2019
- IHI Corporation
- Yu Murakami
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Magnetron sputtering apparatus
- Patent number 9,812,302
- Issue date Nov 7, 2017
- National University Corporation Tohoku University
- Tadahiro Ohmi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Shower plate sintered integrally with gas release hole member and m...
- Patent number 9,767,994
- Issue date Sep 19, 2017
- Tokyo Electron Limited
- Masahiro Okesaku
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Etching method, substrate processing method, pattern forming method...
- Patent number 9,117,764
- Issue date Aug 25, 2015
- Tokyo Electron Limited
- Takaaki Matsuoka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Shower plate sintered integrally with gas release hole member and m...
- Patent number 8,915,999
- Issue date Dec 23, 2014
- Tokyo Electron Limited
- Masahiro Okesaku
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Pattern-forming method and method for manufacturing semiconductor d...
- Patent number 8,809,207
- Issue date Aug 19, 2014
- Tokyo Electron Limited
- Hiraku Ishikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface treatment for a fluorocarbon film
- Patent number 8,765,605
- Issue date Jul 1, 2014
- Tokyo Electron Limited
- Masahiro Horigome
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device manufacturing method and semiconductor device
- Patent number 8,716,114
- Issue date May 6, 2014
- National University Corporation Tohoku University
- Tadahiro Ohmi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma processing apparatus, dielectric window for use in...
- Patent number 8,573,151
- Issue date Nov 5, 2013
- Tokyo Electron Limited
- Tadahiro Ohmi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetron sputtering apparatus
- Patent number 8,568,577
- Issue date Oct 29, 2013
- National University Corporation Tohoku University
- Tadahiro Ohmi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Rotary magnet sputtering apparatus
- Patent number 8,535,494
- Issue date Sep 17, 2013
- National University Corporation Tohoku University
- Tadahiro Ohmi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device manufacturing method
- Patent number 8,497,214
- Issue date Jul 30, 2013
- Tokyo Electron Limited
- Hirokazu Ueda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Rotary magnet sputtering apparatus
- Patent number 8,496,792
- Issue date Jul 30, 2013
- National University Corporation Tohoku University
- Tadahiro Ohmi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming method of silicon oxide film, silicon oxide film, semi...
- Patent number 8,486,792
- Issue date Jul 16, 2013
- Tokyo Electron Limited
- Hirokazu Ueda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for processing amorphous carbon film, and semiconductor devi...
- Patent number 8,461,047
- Issue date Jun 11, 2013
- Tokyo Electron Limited
- Hiraku Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming method for a semiconductor
- Patent number 8,435,882
- Issue date May 7, 2013
- Tokyo Electron Limited
- Takaaki Matsuoka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion implanting apparatus and ion implanting method
- Patent number 8,399,862
- Issue date Mar 19, 2013
- National University Corporation Tohoku University
- Tadahiro Ohmi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming apparatus, film forming system, film forming method, a...
- Patent number 8,383,194
- Issue date Feb 26, 2013
- TOHOKU UNIVERSITY
- Tadahiro Ohmi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device and manufacturing method therefor
- Patent number 8,334,204
- Issue date Dec 18, 2012
- Tokyo Electron Limited
- Takaaki Matsuoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 8,278,205
- Issue date Oct 2, 2012
- Tokyo Electron Limited
- Takaaki Matsuoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming method for a semiconductor
- Patent number 8,197,913
- Issue date Jun 12, 2012
- Tokyo Electron Limited
- Takaaki Matsuoka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Fabrication method of a semiconductor device and a semiconductor de...
- Patent number 8,124,523
- Issue date Feb 28, 2012
- Tokyo Electron Limited
- Kohei Kawamura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method for forming a film and an electronic compo...
- Patent number 8,021,975
- Issue date Sep 20, 2011
- Tokyo Electron Limited
- Kotaro Miyatani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Interlayer insulating film, wiring structure and electronic device...
- Patent number 7,923,819
- Issue date Apr 12, 2011
- National Iniversity Corporation Tohoku University
- Tadahiro Ohmi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 7,874,781
- Issue date Jan 25, 2011
- Tokyo Electron Limited
- Toshihisa Nozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method of semiconductor device and film deposition sy...
- Patent number 7,803,705
- Issue date Sep 28, 2010
- Tokyo Electron Limited
- Yasuo Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing device
- Patent number 7,780,391
- Issue date Aug 24, 2010
- Tokyo Electron Limited
- Takaaki Matsuoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and device for heat treatment
- Patent number 7,313,931
- Issue date Jan 1, 2008
- Tokyo Electron Limited
- Takaaki Matsuoka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and device for heat treatment
- Patent number 6,951,815
- Issue date Oct 4, 2005
- Tokyo Electron Limited
- Takaaki Matsuoka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
WELDING METHOD OF DIFFUSION BONDED STRUCTURE
- Publication number 20190337078
- Publication date Nov 7, 2019
- IHI Corporation
- Kunitaka MASAKI
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
HIGH-TEMPERATURE OBJECT OBSERVATION DEVICE
- Publication number 20180176485
- Publication date Jun 21, 2018
- IHI Corporation
- Yu MURAKAMI
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
ETCHING METHOD, SUBSTRATE PROCESSING METHOD, PATTERN FORMING METHOD...
- Publication number 20150325448
- Publication date Nov 12, 2015
- TOKYO ELECTRON LIMITED
- Takaaki MATSUOKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHOWER PLATE SINTERED INTEGRALLY WITH GAS RELEASE HOLE MEMBER AND M...
- Publication number 20150069674
- Publication date Mar 12, 2015
- TOKYO ELECTRON LIMITED
- Masahiro OKESAKU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN-FORMING METHOD AND METHOD FOR MANUFACTURING SEMICONDUCTOR D...
- Publication number 20140080307
- Publication date Mar 20, 2014
- TOKYO ELECTRON LIMITED
- Hiraku Ishikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MAGNETRON SPUTTERING APPARATUS
- Publication number 20140027278
- Publication date Jan 30, 2014
- TOKYO ELECTRON LIMITED
- Tadahiro Ohmi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING DEVICE, SUBSTRATE PROCESSING SYSTEM AND SEMICONDUCTOR...
- Publication number 20130330928
- Publication date Dec 12, 2013
- TOKYO ELECTRON LIMITED
- Hiraku Ishikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SEMICONDUCTOR DEVICE
- Publication number 20130154059
- Publication date Jun 20, 2013
- NATIONAL UNIVERSITY CORP TOHOKU UNIVERSITY
- Tadahiro Ohmi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD, SUBSTRATE PROCESSING METHOD, PATTERN FORMING METHOD...
- Publication number 20130157468
- Publication date Jun 20, 2013
- TOKYO ELECTRON LIMITED
- Takaaki Matsuoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20130065399
- Publication date Mar 14, 2013
- TOKYO ELECTRON LIMITED
- Hirokazu Udea
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
WET PROCESSING APPARATUS AND WET PROCESSING METHOD
- Publication number 20120125376
- Publication date May 24, 2012
- TOKYO ELECTRON LIMITED
- Tadahiro Ohmi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PRINTED WIRING BOARD MANUFACTURING...
- Publication number 20120125765
- Publication date May 24, 2012
- TOKYO ELECTRON LIMITED
- Tadahiro Ohmi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ROTARY MAGNET SPUTTERING APPARATUS
- Publication number 20120064259
- Publication date Mar 15, 2012
- TOKYO ELECTRON LIMITED
- Tadahiro Ohmi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SURFACE TREATMENT FOR A FLUOROCARBON FILM
- Publication number 20110318919
- Publication date Dec 29, 2011
- Tokyo Electron Limited
- Masahiro Horigome
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING APPARATUS AND FILM FORMING METHOD
- Publication number 20110268870
- Publication date Nov 3, 2011
- TOHOKU UNIVERSITY
- Tadahiro Ohmi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20110215384
- Publication date Sep 8, 2011
- NATIONAL UNIVERSITY CORPORATION TOHOKU UNIVERSITY
- Tadahiro Ohmi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL MECHANICAL POLISHING APPARATUS, CHEMICAL MECHANICAL POLISH...
- Publication number 20110189857
- Publication date Aug 4, 2011
- TOKYO ELECTRON LIMITED
- Takaaki Matsuoka
- B24 - GRINDING POLISHING
Information Patent Application
MAGNETRON SPUTTERING METHOD, AND MAGNETRON SPUTTERING APPARATUS
- Publication number 20110186425
- Publication date Aug 4, 2011
- TOKYO ELECTRON LIMITED
- Tadahiro Ohmi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTERLAYER INSULATING FILM, WIRING STRUCTURE, AND METHODS OF MANUFA...
- Publication number 20110127075
- Publication date Jun 2, 2011
- NATIONAL UNIVERSITY CORPORATION TOHOKU UNIVERSITY
- Tadahiro Ohmi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING METHOD OF SILICON OXIDE FILM, SILICON OXIDE FILM, SEMI...
- Publication number 20110074013
- Publication date Mar 31, 2011
- TOKYO ELECTRON LIMITED
- Hirokazu Ueda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR PROCESSING AMORPHOUS CARBON FILM, AND SEMICONDUCTOR DEVI...
- Publication number 20110053375
- Publication date Mar 3, 2011
- TOKYO ELECTRON LIMITED
- Hiraku Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ROTARY MAGNET SPUTTERING APPARATUS
- Publication number 20110000783
- Publication date Jan 6, 2011
- NATIONAL UNIVERSITY CORPORATION TOHOKU UNIVERSITY
- Tadahiro Ohmi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD FOR PLASMA-PROCESSING SEMICO...
- Publication number 20100279512
- Publication date Nov 4, 2010
- TOKYO ELECTRON LIMITED
- Hirokazu Udea
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING SYSTEM AND PLASMA PROCESSING METHOD
- Publication number 20100264117
- Publication date Oct 21, 2010
- TOHOKU UNIVERSITY
- Tadahiro Ohmi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING METHOD, FILM FORMING APPARATUS, STORAGE MEDIUM AND SEM...
- Publication number 20100244204
- Publication date Sep 30, 2010
- TOKYO ELECTRON LIMITED
- Takaaki Matsuoka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD
- Publication number 20100216300
- Publication date Aug 26, 2010
- TOKYO ELECTRON LIMITED
- Hirokazu Ueda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SHOWER PLATE SINTERED INTEGRALLY WITH GAS RELEASE HOLE MEMBER AND M...
- Publication number 20100178775
- Publication date Jul 15, 2010
- TOKYO ELECTRON LIMITED
- Masahiro Okesaku
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ROTARY MAGNET SPUTTERING APPARATUS
- Publication number 20100126852
- Publication date May 27, 2010
- NATIONAL UNIVERSITY CORPORATION TOHOKU UNIVERSITY
- Tadahiro Ohmi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MAGNETRON SPUTTERING APPARATUS
- Publication number 20100126848
- Publication date May 27, 2010
- TOHOKU UNIVERSITY
- Tadahiro Ohmi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING METHOD FOR A SEMICONDUCTOR
- Publication number 20100117204
- Publication date May 13, 2010
- TOKYO ELECTRON LIMITED
- Takaaki Matsuoka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Takaaki Matsuoka

Person

Patents Grantslast 30 patents

Welding method of diffusion bonded structure

High-temperature object observation device

Magnetron sputtering apparatus

Shower plate sintered integrally with gas release hole member and m...

Etching method, substrate processing method, pattern forming method...

Shower plate sintered integrally with gas release hole member and m...

Pattern-forming method and method for manufacturing semiconductor d...

Surface treatment for a fluorocarbon film

Semiconductor device manufacturing method and semiconductor device

Microwave plasma processing apparatus, dielectric window for use in...

Magnetron sputtering apparatus

Rotary magnet sputtering apparatus

Semiconductor device manufacturing method

Rotary magnet sputtering apparatus

Film forming method of silicon oxide film, silicon oxide film, semi...

Method for processing amorphous carbon film, and semiconductor devi...

Film forming method for a semiconductor

Ion implanting apparatus and ion implanting method

Film forming apparatus, film forming system, film forming method, a...

Semiconductor device and manufacturing method therefor

Semiconductor device and method for manufacturing the same

Film forming method for a semiconductor

Fabrication method of a semiconductor device and a semiconductor de...

Plasma processing method for forming a film and an electronic compo...

Interlayer insulating film, wiring structure and electronic device...

Substrate processing apparatus

Manufacturing method of semiconductor device and film deposition sy...

Substrate processing device

Method and device for heat treatment

Method and device for heat treatment

Patents Applicationslast 30 patents

WELDING METHOD OF DIFFUSION BONDED STRUCTURE

HIGH-TEMPERATURE OBJECT OBSERVATION DEVICE

ETCHING METHOD, SUBSTRATE PROCESSING METHOD, PATTERN FORMING METHOD...

SHOWER PLATE SINTERED INTEGRALLY WITH GAS RELEASE HOLE MEMBER AND M...

PATTERN-FORMING METHOD AND METHOD FOR MANUFACTURING SEMICONDUCTOR D...

MAGNETRON SPUTTERING APPARATUS

FILM FORMING DEVICE, SUBSTRATE PROCESSING SYSTEM AND SEMICONDUCTOR...

SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SEMICONDUCTOR DEVICE

ETCHING METHOD, SUBSTRATE PROCESSING METHOD, PATTERN FORMING METHOD...

PLASMA PROCESSING METHOD

WET PROCESSING APPARATUS AND WET PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PRINTED WIRING BOARD MANUFACTURING...

ROTARY MAGNET SPUTTERING APPARATUS

SURFACE TREATMENT FOR A FLUOROCARBON FILM

FILM FORMING APPARATUS AND FILM FORMING METHOD

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

CHEMICAL MECHANICAL POLISHING APPARATUS, CHEMICAL MECHANICAL POLISH...

MAGNETRON SPUTTERING METHOD, AND MAGNETRON SPUTTERING APPARATUS

INTERLAYER INSULATING FILM, WIRING STRUCTURE, AND METHODS OF MANUFA...

FILM FORMING METHOD OF SILICON OXIDE FILM, SILICON OXIDE FILM, SEMI...

METHOD FOR PROCESSING AMORPHOUS CARBON FILM, AND SEMICONDUCTOR DEVI...

ROTARY MAGNET SPUTTERING APPARATUS

PLASMA PROCESSING APPARATUS AND METHOD FOR PLASMA-PROCESSING SEMICO...

PLASMA PROCESSING SYSTEM AND PLASMA PROCESSING METHOD

FILM FORMING METHOD, FILM FORMING APPARATUS, STORAGE MEDIUM AND SEM...

SEMICONDUCTOR DEVICE MANUFACTURING METHOD

SHOWER PLATE SINTERED INTEGRALLY WITH GAS RELEASE HOLE MEMBER AND M...

ROTARY MAGNET SPUTTERING APPARATUS

MAGNETRON SPUTTERING APPARATUS

FILM FORMING METHOD FOR A SEMICONDUCTOR