Takafumi Shimoda

Person

Yamaguchi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Onium salt-containing treatment liquid for semiconductor wafers
- Patent number 12,024,663
- Issue date Jul 2, 2024
- Tokuyama Corporation
- Yuki Kikkawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inhibitor for RuO4 gas generation and method for inhibiting RuO4 ga...
- Patent number 11,932,590
- Issue date Mar 19, 2024
- Tokuyama Corporation
- Tomoaki Sato
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method and apparatus for producing halogen oxyacid solution
- Patent number 11,738,997
- Issue date Aug 29, 2023
- Tokuyama Corporation
- Takayuki Negishi
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Treatment liquid for semiconductor with ruthenium and method of pro...
- Patent number 11,674,230
- Issue date Jun 13, 2023
- Tokuyama Corporation
- Tomoaki Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Quaternary alkyl ammonium hypochlorite solution, method of producin...
- Patent number 11,572,331
- Issue date Feb 7, 2023
- Tokuyama Corporation
- Takafumi Shimoda
- B08 - CLEANING
Information Patent Grant
Quaternary alkylammonium hypochlorite solution, method for manufact...
- Patent number 11,572,533
- Issue date Feb 7, 2023
- Tokuyama Corporation
- Takafumi Shimoda
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Treatment liquid for semiconductor wafers, which contains hypochlor...
- Patent number 11,390,829
- Issue date Jul 19, 2022
- Tokuyama Corporation
- Takafumi Shimoda
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Quaternary alkyl ammonium hypochlorite solution, method of producin...
- Patent number 11,390,577
- Issue date Jul 19, 2022
- Tokuyama Corporation
- Takafumi Shimoda
- B08 - CLEANING

Patents Applicationslast 30 patents

Information Patent Application
INHIBITOR FOR RuO4 GAS GENERATION AND METHOD FOR INHIBITING RuO4 GA...
- Publication number 20240182404
- Publication date Jun 6, 2024
- Tokuyama Corporation
- Tomoaki SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR TREATING TRANSITION METAL SEMICONDUCTOR, AND REDUCING AG...
- Publication number 20240087911
- Publication date Mar 14, 2024
- Tokuyama Corporation
- Kohei SAITO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR WAFER PROCESSING LIQUID CONTAINING HYPOBROMITE IONS A...
- Publication number 20240014045
- Publication date Jan 11, 2024
- Tokuyama Corporation
- Takafumi SHIMODA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TREATMENT LIQUID FOR SEMICONDUCTOR WITH RUTHENIUM AND METHOD OF PRO...
- Publication number 20230257887
- Publication date Aug 17, 2023
- Tokuyama Corporation
- Tomoaki SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TREATMENT LIQUID FOR SEMICONDUCTOR WITH RUTHENIUM
- Publication number 20230207329
- Publication date Jun 29, 2023
- Tokuyama Corporation
- Tomoaki SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TREATMENT LIQUID FOR SEMICONDUCTORS AND METHOD FOR PRODUCING SAME
- Publication number 20230126771
- Publication date Apr 27, 2023
- Tokuyama Corporation
- Yuki KIKKAWA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SEMICONDUCTOR WAFER TREATMENT LIQUID AND PRODUTION METHOD THEREOF
- Publication number 20220411937
- Publication date Dec 29, 2022
- Tokuyama Corporation
- Tomoaki SATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR PRODUCING HALOGEN OXYACID SOLUTION
- Publication number 20220356061
- Publication date Nov 10, 2022
- Tokuyama Corporation
- Takayuki NEGISHI
- C01 - INORGANIC CHEMISTRY
Information Patent Application
Treatment Liquid for Semiconductor Wafers, Which Contains Hypochlor...
- Publication number 20220325205
- Publication date Oct 13, 2022
- Tokuyama Corporation
- Takafumi Shimoda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
QUATERNARY ALKYL AMMONIUM HYPOCHLORITE SOLUTION, METHOD OF PRODUCIN...
- Publication number 20220315522
- Publication date Oct 6, 2022
- Tokuyama Corporation
- Takafumi SHIMODA
- B08 - CLEANING
Information Patent Application
RUTHENIUM OXIDE GAS ABSORBENT LIQUID, ANALYSIS METHOD FOR RUTHENIUM...
- Publication number 20220316996
- Publication date Oct 6, 2022
- Tokuyama Corporation
- Tomoaki SATO
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
TREATMENT LIQUID FOR SEMICONDUCTOR WAFERS
- Publication number 20220298416
- Publication date Sep 22, 2022
- Tokuyama Corporation
- Yuki KIKKAWA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ONIUM SALT-CONTAINING TREATMENT LIQUID FOR SEMICONDUCTOR WAFERS
- Publication number 20220073820
- Publication date Mar 10, 2022
- Tokuyama Corporation
- Yuki KIKKAWA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SEMICONDUCTOR WAFER TREATMENT LIQUID CONTAINING HYPOCHLORITE IONS A...
- Publication number 20220010206
- Publication date Jan 13, 2022
- Tokuyama Corporation
- Takafumi SHIMODA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD AND APPARATUS FOR PRODUCING HALOGEN OXYACID SOLUTION
- Publication number 20210403323
- Publication date Dec 30, 2021
- Tokuyama Corporation
- Takayuki NEGISHI
- C01 - INORGANIC CHEMISTRY
Information Patent Application
TREATMENT LIQUID FOR SEMICONDUCTOR WITH RUTHENIUM AND METHOD OF PRO...
- Publication number 20210388508
- Publication date Dec 16, 2021
- Tokuyama Corporation
- Tomoaki SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INHIBITOR FOR RuO4 GAS GENERATION AND METHOD FOR INHIBITING RuO4 GA...
- Publication number 20210340095
- Publication date Nov 4, 2021
- Tokuyama Corporation
- Tomoaki SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Quaternary Alkylammonium Hypochlorite Solution, Method for Manufact...
- Publication number 20210309942
- Publication date Oct 7, 2021
- Tokuyama Corporation
- Takafumi Shimoda
- C07 - ORGANIC CHEMISTRY
Information Patent Application
QUATERNARY ALKYL AMMONIUM HYPOCHLORITE SOLUTION, METHOD OF PRODUCIN...
- Publication number 20210155878
- Publication date May 27, 2021
- Tokuyama Corporation
- Takafumi SHIMODA
- B08 - CLEANING
Information Patent Application
Treatment Liquid for Semiconductor Wafers, Which Contains Hypochlor...
- Publication number 20210062115
- Publication date Mar 4, 2021
- Tokuyama Corporation
- Takafumi Shimoda
- H01 - BASIC ELECTRIC ELEMENTS

Takafumi Shimoda

Person

Patents Grantslast 30 patents

Onium salt-containing treatment liquid for semiconductor wafers

Inhibitor for RuO4 gas generation and method for inhibiting RuO4 ga...

Method and apparatus for producing halogen oxyacid solution

Treatment liquid for semiconductor with ruthenium and method of pro...

Quaternary alkyl ammonium hypochlorite solution, method of producin...

Quaternary alkylammonium hypochlorite solution, method for manufact...

Treatment liquid for semiconductor wafers, which contains hypochlor...

Quaternary alkyl ammonium hypochlorite solution, method of producin...

Patents Applicationslast 30 patents

INHIBITOR FOR RuO4 GAS GENERATION AND METHOD FOR INHIBITING RuO4 GA...

METHOD FOR TREATING TRANSITION METAL SEMICONDUCTOR, AND REDUCING AG...

SEMICONDUCTOR WAFER PROCESSING LIQUID CONTAINING HYPOBROMITE IONS A...

TREATMENT LIQUID FOR SEMICONDUCTOR WITH RUTHENIUM AND METHOD OF PRO...

TREATMENT LIQUID FOR SEMICONDUCTOR WITH RUTHENIUM

TREATMENT LIQUID FOR SEMICONDUCTORS AND METHOD FOR PRODUCING SAME

SEMICONDUCTOR WAFER TREATMENT LIQUID AND PRODUTION METHOD THEREOF

METHOD FOR PRODUCING HALOGEN OXYACID SOLUTION

Treatment Liquid for Semiconductor Wafers, Which Contains Hypochlor...

QUATERNARY ALKYL AMMONIUM HYPOCHLORITE SOLUTION, METHOD OF PRODUCIN...

RUTHENIUM OXIDE GAS ABSORBENT LIQUID, ANALYSIS METHOD FOR RUTHENIUM...

TREATMENT LIQUID FOR SEMICONDUCTOR WAFERS

ONIUM SALT-CONTAINING TREATMENT LIQUID FOR SEMICONDUCTOR WAFERS

SEMICONDUCTOR WAFER TREATMENT LIQUID CONTAINING HYPOCHLORITE IONS A...

METHOD AND APPARATUS FOR PRODUCING HALOGEN OXYACID SOLUTION

TREATMENT LIQUID FOR SEMICONDUCTOR WITH RUTHENIUM AND METHOD OF PRO...

INHIBITOR FOR RuO4 GAS GENERATION AND METHOD FOR INHIBITING RuO4 GA...

Quaternary Alkylammonium Hypochlorite Solution, Method for Manufact...

QUATERNARY ALKYL AMMONIUM HYPOCHLORITE SOLUTION, METHOD OF PRODUCIN...

Treatment Liquid for Semiconductor Wafers, Which Contains Hypochlor...