Takafumi Ueda

Person

Usui-gun, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Composition for forming a coating type BPSG film, substrate formed...
- Patent number 9,627,204
- Issue date Apr 18, 2017
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compositon for forming metal oxide-containing film and patterning p...
- Patent number 9,377,690
- Issue date Jun 28, 2016
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming titanium-containing resist underlayer film...
- Patent number 9,188,866
- Issue date Nov 17, 2015
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition for forming titanium-containing resist underlayer film...
- Patent number 9,176,382
- Issue date Nov 3, 2015
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Silicon-containing surface modifier, resist underlayer film composi...
- Patent number 9,075,309
- Issue date Jul 7, 2015
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Silicon-containing surface modifier, resist lower layer film-formin...
- Patent number 9,069,247
- Issue date Jun 30, 2015
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Patterning process
- Patent number 9,005,883
- Issue date Apr 14, 2015
- Shin-Estu Chemical Co., Ltd.
- Tsutomu Ogihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silicon-containing antireflective coatings including non-polymeric...
- Patent number 8,999,625
- Issue date Apr 7, 2015
- International Business Machines Corporation
- Martin Glodde
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming resist underlayer film and patterning proce...
- Patent number 8,951,917
- Issue date Feb 10, 2015
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Patterning process and composition for forming silicon-containing f...
- Patent number 8,951,711
- Issue date Feb 10, 2015
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Silicon-containing resist underlayer film-forming composition and p...
- Patent number 8,945,820
- Issue date Feb 3, 2015
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for forming a silicon-containing resist underlayer film...
- Patent number 8,932,953
- Issue date Jan 13, 2015
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning process
- Patent number 8,859,189
- Issue date Oct 14, 2014
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming silicon-containing film, silicon-containing...
- Patent number 8,852,844
- Issue date Oct 7, 2014
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Patterning process and composition for forming silicon-containing f...
- Patent number 8,835,102
- Issue date Sep 16, 2014
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Patterning process
- Patent number 8,759,220
- Issue date Jun 24, 2014
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silicon-containing resist underlayer film-forming composition and p...
- Patent number 8,715,913
- Issue date May 6, 2014
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition for forming a silicon-containing antireflection film, s...
- Patent number 8,697,330
- Issue date Apr 15, 2014
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Coated-type silicon-containing film stripping process
- Patent number 8,652,267
- Issue date Feb 18, 2014
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silicon-containing film-forming composition, silicon-containing fil...
- Patent number 8,501,386
- Issue date Aug 6, 2013
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning process
- Patent number 8,343,711
- Issue date Jan 1, 2013
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silicon-containing film-forming composition, silicon-containing fil...
- Patent number 8,329,376
- Issue date Dec 11, 2012
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Metal oxide-containing film-forming composition, metal oxide-contai...
- Patent number 8,029,974
- Issue date Oct 4, 2011
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Metal oxide-containing film-forming composition, metal oxide-contai...
- Patent number 8,026,038
- Issue date Sep 27, 2011
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Silicon-containing antireflective coating forming composition, sili...
- Patent number 7,910,283
- Issue date Mar 22, 2011
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Substrate comprising a lower silicone resin film and an upper silic...
- Patent number 7,868,407
- Issue date Jan 11, 2011
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silicon-containing film-forming composition, silicon-containing fil...
- Patent number 7,855,043
- Issue date Dec 21, 2010
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Silicon-containing film forming composition, silicon-containing fil...
- Patent number 7,678,529
- Issue date Mar 16, 2010
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Rework process for photoresist film
- Patent number 7,642,043
- Issue date Jan 5, 2010
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Rework process for photoresist film
- Patent number 7,638,268
- Issue date Dec 29, 2009
- Shin-Estu Chemical Co., Ltd.
- Tsutomu Ogihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
COMPOSITION FOR FORMING A COATING TYPE BPSG FILM, SUBSTRATE FORMED...
- Publication number 20150004791
- Publication date Jan 1, 2015
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERNING PROCESS AND COMPOSITION FOR FORMING SILICON-CONTAINING F...
- Publication number 20140342289
- Publication date Nov 20, 2014
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION FOR FORMING TITANIUM-CONTAINING RESIST UNDERLAYER FILM...
- Publication number 20140273448
- Publication date Sep 18, 2014
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION FOR FORMING TITANIUM-CONTAINING RESIST UNDERLAYER FILM...
- Publication number 20140273447
- Publication date Sep 18, 2014
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SILICON-CONTAINING ANTIREFLECTIVE COATINGS INCLUDING NON-POLYMERIC...
- Publication number 20140227641
- Publication date Aug 14, 2014
- SHIN-ETSU CHEMICAL CO., LTD.
- Martin Glodde
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITON FOR FORMING METAL OXIDE-CONTAINING FILM AND PATTERNING P...
- Publication number 20140193757
- Publication date Jul 10, 2014
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING TITANIUM-CONTAINING RESIST UNDERLAYER FILM...
- Publication number 20140193975
- Publication date Jul 10, 2014
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PATTERNING PROCESS
- Publication number 20140093825
- Publication date Apr 3, 2014
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SILICON COMPOUND, SILICON-CONTAINING COMPOUND, COMPOSITION FOR FORM...
- Publication number 20130280912
- Publication date Oct 24, 2013
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SILICON-CONTAINING SURFACE MODIFIER, RESIST LOWER LAYER FILM-FORMIN...
- Publication number 20130210229
- Publication date Aug 15, 2013
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SILICON-CONTAINING SURFACE MODIFIER, RESIST UNDERLAYER FILM COMPOSI...
- Publication number 20130210236
- Publication date Aug 15, 2013
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION AND P...
- Publication number 20130137271
- Publication date May 30, 2013
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION AND P...
- Publication number 20130137041
- Publication date May 30, 2013
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION FOR FORMING A SILICON-CONTAINING RESIST UNDERLAYER FILM...
- Publication number 20130045601
- Publication date Feb 21, 2013
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING RESIST UNDERLAYER FILM AND PATTERNING PROCE...
- Publication number 20130005150
- Publication date Jan 3, 2013
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PATTERNING PROCESS
- Publication number 20120276483
- Publication date Nov 1, 2012
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNING PROCESS AND COMPOSITION FOR FORMING SILICON-CONTAINING F...
- Publication number 20120238095
- Publication date Sep 20, 2012
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SILICON-CONTAINING FILM-FORMING COMPOSITION, SILICON-CONTAINING FIL...
- Publication number 20120052685
- Publication date Mar 1, 2012
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Composition for forming a silicon-containing antireflection film, s...
- Publication number 20100285407
- Publication date Nov 11, 2010
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Patterning process
- Publication number 20100273110
- Publication date Oct 28, 2010
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Coated-type silicon-containing film stripping process
- Publication number 20100147334
- Publication date Jun 17, 2010
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metal oxide-containing film-forming composition, metal oxide-contai...
- Publication number 20100086872
- Publication date Apr 8, 2010
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Composition for forming silicon-containing film, silicon-containing...
- Publication number 20100086870
- Publication date Apr 8, 2010
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METAL OXIDE-CONTAINING FILM-FORMING COMPOSITION, METAL OXIDE-CONTAI...
- Publication number 20090136869
- Publication date May 28, 2009
- Tsutomu OGIHARA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Silicon-containing film-forming composition, silicon-containing fil...
- Publication number 20080026322
- Publication date Jan 31, 2008
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Silicon-containing film-forming composition, silicon-containing fil...
- Publication number 20070238300
- Publication date Oct 11, 2007
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Antireflection film composition, substrate, and patterning process
- Publication number 20070172759
- Publication date Jul 26, 2007
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Antireflection film composition, patterning process and substrate u...
- Publication number 20070134916
- Publication date Jun 14, 2007
- Shin-Etsu Chemical Co., Ltd.
- Motoaki Iwabuchi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Substrate, method for producing the same, and patterning process us...
- Publication number 20070128886
- Publication date Jun 7, 2007
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Silicon-containing antireflective coating forming composition, sili...
- Publication number 20070117252
- Publication date May 24, 2007
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Takafumi Ueda

Person

Patents Grantslast 30 patents

Composition for forming a coating type BPSG film, substrate formed...

Compositon for forming metal oxide-containing film and patterning p...

Composition for forming titanium-containing resist underlayer film...

Composition for forming titanium-containing resist underlayer film...

Silicon-containing surface modifier, resist underlayer film composi...

Silicon-containing surface modifier, resist lower layer film-formin...

Patterning process

Silicon-containing antireflective coatings including non-polymeric...

Composition for forming resist underlayer film and patterning proce...

Patterning process and composition for forming silicon-containing f...

Silicon-containing resist underlayer film-forming composition and p...

Composition for forming a silicon-containing resist underlayer film...

Patterning process

Composition for forming silicon-containing film, silicon-containing...

Patterning process and composition for forming silicon-containing f...

Patterning process

Silicon-containing resist underlayer film-forming composition and p...

Composition for forming a silicon-containing antireflection film, s...

Coated-type silicon-containing film stripping process

Silicon-containing film-forming composition, silicon-containing fil...

Patterning process

Silicon-containing film-forming composition, silicon-containing fil...

Metal oxide-containing film-forming composition, metal oxide-contai...

Metal oxide-containing film-forming composition, metal oxide-contai...

Silicon-containing antireflective coating forming composition, sili...

Substrate comprising a lower silicone resin film and an upper silic...

Silicon-containing film-forming composition, silicon-containing fil...

Silicon-containing film forming composition, silicon-containing fil...

Rework process for photoresist film

Rework process for photoresist film

Patents Applicationslast 30 patents

COMPOSITION FOR FORMING A COATING TYPE BPSG FILM, SUBSTRATE FORMED...

PATTERNING PROCESS AND COMPOSITION FOR FORMING SILICON-CONTAINING F...

COMPOSITION FOR FORMING TITANIUM-CONTAINING RESIST UNDERLAYER FILM...

COMPOSITION FOR FORMING TITANIUM-CONTAINING RESIST UNDERLAYER FILM...

SILICON-CONTAINING ANTIREFLECTIVE COATINGS INCLUDING NON-POLYMERIC...

COMPOSITON FOR FORMING METAL OXIDE-CONTAINING FILM AND PATTERNING P...

COMPOSITION FOR FORMING TITANIUM-CONTAINING RESIST UNDERLAYER FILM...

PATTERNING PROCESS

SILICON COMPOUND, SILICON-CONTAINING COMPOUND, COMPOSITION FOR FORM...

SILICON-CONTAINING SURFACE MODIFIER, RESIST LOWER LAYER FILM-FORMIN...

SILICON-CONTAINING SURFACE MODIFIER, RESIST UNDERLAYER FILM COMPOSI...

SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION AND P...

SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION AND P...

COMPOSITION FOR FORMING A SILICON-CONTAINING RESIST UNDERLAYER FILM...

COMPOSITION FOR FORMING RESIST UNDERLAYER FILM AND PATTERNING PROCE...

PATTERNING PROCESS

PATTERNING PROCESS AND COMPOSITION FOR FORMING SILICON-CONTAINING F...

SILICON-CONTAINING FILM-FORMING COMPOSITION, SILICON-CONTAINING FIL...

Composition for forming a silicon-containing antireflection film, s...

Patterning process

Coated-type silicon-containing film stripping process

Metal oxide-containing film-forming composition, metal oxide-contai...

Composition for forming silicon-containing film, silicon-containing...

METAL OXIDE-CONTAINING FILM-FORMING COMPOSITION, METAL OXIDE-CONTAI...

Silicon-containing film-forming composition, silicon-containing fil...

Silicon-containing film-forming composition, silicon-containing fil...

Antireflection film composition, substrate, and patterning process

Antireflection film composition, patterning process and substrate u...

Substrate, method for producing the same, and patterning process us...

Silicon-containing antireflective coating forming composition, sili...