Takahiro Okubo

Person

Kumamoto, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Pump, pump device, and liquid supply system
- Patent number 10,655,619
- Issue date May 19, 2020
- Tokyo Electron Limited
- Takashi Sasa
- F04 - POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS PUMPS FOR LIQUIDS OR ELASTIC...
Information Patent Grant
Substrate processing system and method of controlling the same
- Patent number 7,985,448
- Issue date Jul 26, 2011
- Tokyo Electron Limited
- Yoshio Kimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing solution supply system, processing solution supply metho...
- Patent number 7,918,242
- Issue date Apr 5, 2011
- Tokyo Electron Limited
- Junya Minamida
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Substrate processing system and method of controlling the same
- Patent number 7,694,649
- Issue date Apr 13, 2010
- Tokyo Electron Limited
- Yoshio Kimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing device, substrate processing method, and devel...
- Patent number 7,387,455
- Issue date Jun 17, 2008
- Tokyo Electron Limited
- Tetsutoshi Awamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for changing concentration of treatment solution and trea...
- Patent number 7,323,063
- Issue date Jan 29, 2008
- Tokyo Electron Limited
- Takahiro Okubo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing unit
- Patent number 6,682,629
- Issue date Jan 27, 2004
- Tokyo Electron Limited
- Hiroyuki Kudo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process solution supply system, substrate processing apparatus empl...
- Patent number 6,183,147
- Issue date Feb 6, 2001
- Tokyo Electron Limited
- Yoshio Kimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PUMP, PUMP DEVICE, AND LIQUID SUPPLY SYSTEM
- Publication number 20160115952
- Publication date Apr 28, 2016
- TOKYO ELECTRON LIMITED
- Takashi Sasa
- F04 - POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS PUMPS FOR LIQUIDS OR ELASTIC...
Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND METHOD OF CONTROLLING THE SAME
- Publication number 20100116293
- Publication date May 13, 2010
- TOKYO ELECTRON LIMITED
- Yoshio Kimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CHANGING CONCENTRATION OF TREATMENT SOLUTION AND TREATME...
- Publication number 20080063786
- Publication date Mar 13, 2008
- TOKYO ELECTRON LIMITED
- Takahiro Okubo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Processing solution supply system, processing solution supply metho...
- Publication number 20070269207
- Publication date Nov 22, 2007
- TOKYO ELECTRON LIMITED
- Junya Minamida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Substrate processing system and method of controlling the same
- Publication number 20070095278
- Publication date May 3, 2007
- TOKYO ELECTRON LIMITED
- Yoshio Kimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate processing device, substrate processing method, and devel...
- Publication number 20050223980
- Publication date Oct 13, 2005
- TOKYO ELECTRON LIMITED
- Tetsutoshi Awamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for changing concentration of treatment solution and treatme...
- Publication number 20020164414
- Publication date Nov 7, 2002
- TOKYO ELECTRON LIMITED
- Takahiro Okubo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate processing unit
- Publication number 20020079056
- Publication date Jun 27, 2002
- Hiroyuki Kudo
- H01 - BASIC ELECTRIC ELEMENTS

Takahiro Okubo

Person

Patents Grantslast 30 patents

Pump, pump device, and liquid supply system

Substrate processing system and method of controlling the same

Processing solution supply system, processing solution supply metho...

Substrate processing system and method of controlling the same

Substrate processing device, substrate processing method, and devel...

Apparatus for changing concentration of treatment solution and trea...

Substrate processing unit

Process solution supply system, substrate processing apparatus empl...

Patents Applicationslast 30 patents

PUMP, PUMP DEVICE, AND LIQUID SUPPLY SYSTEM

SUBSTRATE PROCESSING SYSTEM AND METHOD OF CONTROLLING THE SAME

METHOD FOR CHANGING CONCENTRATION OF TREATMENT SOLUTION AND TREATME...

Processing solution supply system, processing solution supply metho...

Substrate processing system and method of controlling the same

Substrate processing device, substrate processing method, and devel...

Method for changing concentration of treatment solution and treatme...

Substrate processing unit