Takahiro Senda

Person

Sendai-City, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus
- Patent number 11,869,753
- Issue date Jan 9, 2024
- Tokyo Electron Limited
- Takahiro Senda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 11,705,346
- Issue date Jul 18, 2023
- Tokyo Electron Limited
- Yusei Kuwabara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Antenna device, radiation method of electromagnetic waves, plasma p...
- Patent number 10,896,811
- Issue date Jan 19, 2021
- Tokyo Electron Limited
- Ayako Ito
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Antenna, plasma processing device and plasma processing method
- Patent number 10,832,892
- Issue date Nov 10, 2020
- Tokyo Electron Limited
- Kazuki Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Antenna device and plasma processing apparatus
- Patent number 10,553,402
- Issue date Feb 4, 2020
- Tokyo Electron Limited
- Yuki Kawada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature measuring method and plasma processing system
- Patent number 9,412,565
- Issue date Aug 9, 2016
- Tokyo Electron Limited
- Yusuke Yoshida
- G01 - MEASURING TESTING
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 9,324,542
- Issue date Apr 26, 2016
- Tokyo Electron Limited
- Naoki Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma treatment device and optical monitor device
- Patent number 8,974,628
- Issue date Mar 10, 2015
- Tokyo Electron Limited
- Toshihisa Nozawa
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
UPPER ELECTRODE AND PLASMA PROCESSING APPARATUS
- Publication number 20230187183
- Publication date Jun 15, 2023
- TOKYO ELECTRON LIMITED
- Torai IWASA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20220122814
- Publication date Apr 21, 2022
- TOKYO ELECTRON LIMITED
- Takahiro Senda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20210313201
- Publication date Oct 7, 2021
- TOKYO ELECTRON LIMITED
- Yusei Kuwabara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STAGE, PLASMA PROCESSING APPARATUS, AND CLEANING METHOD
- Publication number 20210249236
- Publication date Aug 12, 2021
- TOKYO ELECTRON LIMITED
- Takahiro SENDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANTENNA DEVICE, RADIATION METHOD OF ELECTROMAGNETIC WAVES, PLASMA P...
- Publication number 20200075292
- Publication date Mar 5, 2020
- TOKYO ELECTRON LIMITED
- Ayako ITO
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
ANTENNA, PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD
- Publication number 20200058468
- Publication date Feb 20, 2020
- TOKYO ELECTRON LIMITED
- Kazuki TAKAHASHI
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
ANTENNA DEVICE AND PLASMA PROCESSING APPARATUS
- Publication number 20190333736
- Publication date Oct 31, 2019
- TOKYO ELECTRON LIMITED
- Yuki KAWADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANTENNA DEVICE AND PLASMA PROCESSING APPARATUS
- Publication number 20190279845
- Publication date Sep 12, 2019
- TOKYO ELECTRON LIMITED
- Naoki MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20150228459
- Publication date Aug 13, 2015
- TOKYO ELECTRON LIMITED
- Naoki Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TEMPERATURE MEASURING METHOD AND PLASMA PROCESSING SYSTEM
- Publication number 20150221482
- Publication date Aug 6, 2015
- TOKYO ELECTRON LIMITED
- Yusuke YOSHIDA
- G01 - MEASURING TESTING
Information Patent Application
MICROWAVE PLASMA PROCESSING APPARATUS, SLOT ANTENNA, AND SEMICONDUC...
- Publication number 20150013907
- Publication date Jan 15, 2015
- TOKYO ELECTRON LIMITED
- Toru FUJII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS MONITORING DEVICE FOR USE IN SUBSTRATE PROCESS APPARATUS, P...
- Publication number 20140166205
- Publication date Jun 19, 2014
- TOKYO ELECTRON LIMITED
- Caizhong Tian
- G01 - MEASURING TESTING
Information Patent Application
PLASMA TREATMENT DEVICE AND OPTICAL MONITOR DEVICE
- Publication number 20130180660
- Publication date Jul 18, 2013
- TOKYO ELECTRON LIMITED
- Toshihisa Nozawa
- G01 - MEASURING TESTING

Takahiro Senda

Person

Patents Grantslast 30 patents

Plasma processing apparatus

Substrate processing apparatus

Antenna device, radiation method of electromagnetic waves, plasma p...

Antenna, plasma processing device and plasma processing method

Antenna device and plasma processing apparatus

Temperature measuring method and plasma processing system

Plasma processing method and plasma processing apparatus

Plasma treatment device and optical monitor device

Patents Applicationslast 30 patents

UPPER ELECTRODE AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS

STAGE, PLASMA PROCESSING APPARATUS, AND CLEANING METHOD

ANTENNA DEVICE, RADIATION METHOD OF ELECTROMAGNETIC WAVES, PLASMA P...

ANTENNA, PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD

ANTENNA DEVICE AND PLASMA PROCESSING APPARATUS

ANTENNA DEVICE AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

TEMPERATURE MEASURING METHOD AND PLASMA PROCESSING SYSTEM

MICROWAVE PLASMA PROCESSING APPARATUS, SLOT ANTENNA, AND SEMICONDUC...

PROCESS MONITORING DEVICE FOR USE IN SUBSTRATE PROCESS APPARATUS, P...

PLASMA TREATMENT DEVICE AND OPTICAL MONITOR DEVICE