Takamichi Kikuchi

Person

Nirasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Film forming apparatus
- Patent number 12,027,344
- Issue date Jul 2, 2024
- Tokyo Electron Limited
- Shinya Iwashita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 11,450,512
- Issue date Sep 20, 2022
- Tokyo Electron Limited
- Shinya Iwashita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming method
- Patent number 10,872,764
- Issue date Dec 22, 2020
- Tokyo Electron Limited
- Shinya Iwashita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of performing a surface treatment on a mounting table, the m...
- Patent number 10,738,374
- Issue date Aug 11, 2020
- Tokyo Electron Limited
- Shinya Okabe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Processing method
- Patent number 10,665,431
- Issue date May 26, 2020
- Tokyo Electron Limited
- Kazuyuki Tezuka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of removing silicon oxide film
- Patent number 10,546,753
- Issue date Jan 28, 2020
- Tokyo Electron Limited
- Hideaki Yamasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of removing silicon oxide film
- Patent number 10,504,740
- Issue date Dec 10, 2019
- Tokyo Electron Limited
- Hideaki Yamasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resistive random accress memory containing a conformal titanium alu...
- Patent number 10,361,366
- Issue date Jul 23, 2019
- Tokyo Electron Limited
- Takahiro Hakamata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Oxide film removing method, oxide film removing apparatus, contact...
- Patent number 9,984,892
- Issue date May 29, 2018
- Tokyo Electron Limited
- Takashi Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching apparatus and plasma cleaning method
- Patent number 9,659,756
- Issue date May 23, 2017
- Tokyo Electron Limited
- Takamichi Kikuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, substrate processing method and sto...
- Patent number 7,736,942
- Issue date Jun 15, 2010
- Tokyo Electron Limited
- Eiichi Nishimura
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Cyclic Film Deposition Using Reductant Gas
- Publication number 20230399743
- Publication date Dec 14, 2023
- TOKYO ELECTRON LIMITED
- Ryota Yonezawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING APPARATUS AND FILM FORMING METHOD
- Publication number 20230250530
- Publication date Aug 10, 2023
- TOKYO ELECTRON LIMITED
- Takamichi KIKUCHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20230243031
- Publication date Aug 3, 2023
- TOKYO ELECTRON LIMITED
- Sena FUJITA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING APPARATUS
- Publication number 20230051432
- Publication date Feb 16, 2023
- TOKYO ELECTRON LIMITED
- Shinya IWASHITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20220020568
- Publication date Jan 20, 2022
- TOKYO ELECTRON LIMITED
- Takahiro SHINDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Method
- Publication number 20210142982
- Publication date May 13, 2021
- TOKYO ELECTRON LIMITED
- Shinya IWASHITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Forming RuSi Film and Film and Film-Forming Apparatus
- Publication number 20200208260
- Publication date Jul 2, 2020
- TOKYO ELECTRON LIMITED
- Takamichi KIKUCHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING APPARATUS
- Publication number 20190385815
- Publication date Dec 19, 2019
- TOKYO ELECTRON LIMITED
- Shinya IWASHITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING METHOD
- Publication number 20190088475
- Publication date Mar 21, 2019
- TOKYO ELECTRON LIMITED
- Shinya Iwashita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RESISTIVE RANDOM ACCRESS MEMORY CONTAINING A CONFORMAL TITANIUM ALU...
- Publication number 20190044064
- Publication date Feb 7, 2019
- TOKYO ELECTRON LIMITED
- Takahiro Hakamata
- G11 - INFORMATION STORAGE
Information Patent Application
Method of Removing Silicon Oxide Film
- Publication number 20190027371
- Publication date Jan 24, 2019
- TOKYO ELECTRON LIMITED
- Hideaki YAMASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING METHOD
- Publication number 20180294145
- Publication date Oct 11, 2018
- TOKYO ELECTRON LIMITED
- Kazuyuki Tezuka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
OXIDE FILM REMOVING METHOD, OXIDE FILM REMOVING APPARATUS, CONTACT...
- Publication number 20170338120
- Publication date Nov 23, 2017
- TOKYO ELECTRON LIMITED
- Takashi Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PERFORMING A SURFACE TREATMENT ON A MOUNTING TABLE, THE M...
- Publication number 20170204505
- Publication date Jul 20, 2017
- TOKYO ELECTRON LIMITED
- Shinya OKABE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA ETCHING APPARATUS AND PLASMA CLEANING METHOD
- Publication number 20140020709
- Publication date Jan 23, 2014
- TOKYO ELECTRON LIMITED
- Takamichi KIKUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING APPARATUS
- Publication number 20120132367
- Publication date May 31, 2012
- TOKYO ELECTRON LIMITED
- Kazuyuki Tezuka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ST...
- Publication number 20110033636
- Publication date Feb 10, 2011
- TOKYO ELECTRON LIMITED
- Eiichi NISHIMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING APPARATUS AND PLASMA CLEANING METHOD
- Publication number 20100140221
- Publication date Jun 10, 2010
- TOKYO ELECTRON LIMITED
- Takamichi KIKUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND STO...
- Publication number 20080305632
- Publication date Dec 11, 2008
- TOYOTA ELECTRON LIMITED
- Eiichi NISHIMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, CLEANING METHOD THEREOF, CONTROL PROGR...
- Publication number 20080216957
- Publication date Sep 11, 2008
- TOKYO ELECTRON LIMITED
- Kosuke Ogasawara
- B08 - CLEANING
Information Patent Application
ETCHING METHOD
- Publication number 20070184657
- Publication date Aug 9, 2007
- TOKYO ELECTRON LIMITED
- Etsuo IIJIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ST...
- Publication number 20070175393
- Publication date Aug 2, 2007
- TOKYO ELECTRON LIMITED
- Eiichi NISHIMURA
- H01 - BASIC ELECTRIC ELEMENTS

Takamichi Kikuchi

Person

Patents Grantslast 30 patents

Film forming apparatus

Plasma processing method

Film forming method

Method of performing a surface treatment on a mounting table, the m...

Processing method

Method of removing silicon oxide film

Method of removing silicon oxide film

Resistive random accress memory containing a conformal titanium alu...

Oxide film removing method, oxide film removing apparatus, contact...

Plasma etching apparatus and plasma cleaning method

Substrate processing apparatus, substrate processing method and sto...

Patents Applicationslast 30 patents

Cyclic Film Deposition Using Reductant Gas

FILM FORMING APPARATUS AND FILM FORMING METHOD

FILM FORMING METHOD AND FILM FORMING APPARATUS

FILM FORMING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

Plasma Processing Method

Method of Forming RuSi Film and Film and Film-Forming Apparatus

FILM FORMING APPARATUS

FILM FORMING METHOD

RESISTIVE RANDOM ACCRESS MEMORY CONTAINING A CONFORMAL TITANIUM ALU...

Method of Removing Silicon Oxide Film

PROCESSING METHOD

OXIDE FILM REMOVING METHOD, OXIDE FILM REMOVING APPARATUS, CONTACT...

METHOD OF PERFORMING A SURFACE TREATMENT ON A MOUNTING TABLE, THE M...

PLASMA ETCHING APPARATUS AND PLASMA CLEANING METHOD

PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ST...

PLASMA ETCHING APPARATUS AND PLASMA CLEANING METHOD

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND STO...

PLASMA PROCESSING APPARATUS, CLEANING METHOD THEREOF, CONTROL PROGR...

ETCHING METHOD

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ST...