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Takanobu TAKEDA
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Kyoto, JP
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Patents Grants
last 30 patents
Information
Patent Grant
Chemically amplified negative resist composition and patterning pro...
Patent number
9,075,306
Issue date
Jul 7, 2015
Shin-Etsu Chemical Co., Ltd.
Takanobu Takeda
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Adhesive composition and adhesive dry film
Patent number
8,889,810
Issue date
Nov 18, 2014
Shin-Etsu Chemical Co., Ltd.
Takanobu Takeda
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Grant
Photocurable dry film, method for preparing same, patterning method...
Patent number
8,729,148
Issue date
May 20, 2014
Shin-Etsu Chemical Co., Ltd.
Satoshi Asai
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Grant
Photocurable resin composition, dry film thereof, pattern forming m...
Patent number
8,697,333
Issue date
Apr 15, 2014
Shin-Etsu Chemical Co., Ltd.
Kyoko Soga
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Epoxy-containing polymer, photo-curable resin composition, patterni...
Patent number
8,481,244
Issue date
Jul 9, 2013
Shin-Etsu Chemical Co., Ltd.
Takanobu Takeda
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Grant
Silphenylene skeleton-containing silicone type polymer and method f...
Patent number
8,476,379
Issue date
Jul 2, 2013
Shin-Etsu Chemical Co., Ltd.
Hiroyuki Yasuda
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Grant
Alcoholic hydroxyl-containing compounds and making method
Patent number
8,378,148
Issue date
Feb 19, 2013
Shin-Etsu Chemical Co., Ltd.
Takato Sakurai
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Preparation process of chemically amplified resist composition
Patent number
8,367,295
Issue date
Feb 5, 2013
Shin-Etsu Chemical Co., Ltd.
Keiichi Masunaga
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Photomask blank, resist pattern forming process, and photomask prep...
Patent number
8,343,694
Issue date
Jan 1, 2013
Shin-Etsu Chemical Co., Ltd.
Ryuji Koitabashi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Polyimide silicone, photosensitive resin composition containing the...
Patent number
8,263,308
Issue date
Sep 11, 2012
Shin-Etsu Chemical Co., Ltd.
Shohei Tagami
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Chemically amplified positive resist composition and resist pattern...
Patent number
8,252,518
Issue date
Aug 28, 2012
Shin-Etsu Chemical Co., Ltd.
Akinobu Tanaka
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Chemically-amplified positive resist composition and patterning pro...
Patent number
8,202,677
Issue date
Jun 19, 2012
Shin-Etsu Chemical Co., Ltd.
Takanobu Takeda
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Synthesis of photoresist polymer
Patent number
8,193,307
Issue date
Jun 5, 2012
Shin-Etsu Chemical Co., Ltd.
Takanobu Takeda
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Resist patterning process and manufacturing photo mask
Patent number
8,110,335
Issue date
Feb 7, 2012
Shin-Etsu Chemical Co., Ltd.
Takanobu Takeda
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist composition and patterning process
Patent number
7,977,027
Issue date
Jul 12, 2011
Shin-Etsu Chemical Co., Ltd.
Takanobu Takeda
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Positive resist composition and patterning process using the same
Patent number
7,923,195
Issue date
Apr 12, 2011
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Positive resist composition and patterning process using the same
Patent number
7,887,991
Issue date
Feb 15, 2011
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Bottom resist layer composition and patterning process using the same
Patent number
7,745,104
Issue date
Jun 29, 2010
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Negative resist composition and patterning process using the same
Patent number
7,655,378
Issue date
Feb 2, 2010
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Resist composition and patterning process
Patent number
7,618,763
Issue date
Nov 17, 2009
Shin-Etsu Chemical Co., Ltd.
Takanobu Takeda
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Polymer, resist composition and patterning process using the same
Patent number
7,501,223
Issue date
Mar 10, 2009
Shin-Etsu Chemical Co., Ltd.
Takanobu Takeda
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Polymers, positive resist compositions and patterning process
Patent number
7,491,483
Issue date
Feb 17, 2009
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Resist composition and patterning process
Patent number
7,476,486
Issue date
Jan 13, 2009
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
B82 - NANO-TECHNOLOGY
Information
Patent Grant
Positive resist compositions and patterning process
Patent number
7,449,277
Issue date
Nov 11, 2008
Shin-Etsu Chemical C., Ltd
Jun Hatakeyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Photoresist undercoat-forming material and patterning process
Patent number
7,416,833
Issue date
Aug 26, 2008
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist composition and patterning process
Patent number
7,267,923
Issue date
Sep 11, 2007
Shin-Etsu Chemical Co., Ltd.
Takanobu Takeda
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist composition and patterning process
Patent number
7,232,638
Issue date
Jun 19, 2007
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Polymer, resist composition and patterning process
Patent number
7,135,269
Issue date
Nov 14, 2006
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Silicon-containing polymer, resist composition and patterning process
Patent number
6,994,945
Issue date
Feb 7, 2006
Shin-Etsu Chemical Co., Ltd.
Takanobu Takeda
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Silicon-containing polymer, resist composition and patterning process
Patent number
6,994,946
Issue date
Feb 7, 2006
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Patents Applications
last 30 patents
Information
Patent Application
CONTINUOUS REACTION APPARATUS AND METHOD OF CONTINUOUS POLYMERIZATI...
Publication number
20170022300
Publication date
Jan 26, 2017
Horiba Stec, Co., Ltd.
Kazuhiro HIRAHARA
B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information
Patent Application
ADHESIVE COMPOSITION AND ADHESIVE DRY FILM
Publication number
20120213993
Publication date
Aug 23, 2012
Takanobu TAKEDA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
PHOTOCURABLE RESIN COMPOSITION, DRY FILM THEREOF, PATTERN FORMING M...
Publication number
20120094222
Publication date
Apr 19, 2012
Kyoko SOGA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PHOTOMASK BLANK, RESIST PATTERN FORMING PROCESS, AND PHOTOMASK PREP...
Publication number
20110294047
Publication date
Dec 1, 2011
Shin-Etsu Chemical Co., Ltd.
Ryuji Koitabashi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
NOVEL SILPHENYLENE SKELETON-CONTAINING SILICONE TYPE POLYMER AND ME...
Publication number
20110275768
Publication date
Nov 10, 2011
Shin-Etsu Chemical Co., Ltd.
Hiroyuki YASUDA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PRO...
Publication number
20110177464
Publication date
Jul 21, 2011
Shin-Etsu Chemical Co., Ltd.
Takanobu TAKEDA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PHOTOCURABLE DRY FILM, METHOD FOR PREPARING SAME, PATTERNING METHOD...
Publication number
20110143092
Publication date
Jun 16, 2011
Satoshi ASAI
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
ALCOHOLIC HYDROXYL-CONTAINING COMPOUNDS AND MAKING METHOD
Publication number
20110082321
Publication date
Apr 7, 2011
Takato SAKURAI
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
EPOXY-CONTAINING POLYMER, PHOTO-CURABLE RESIN COMPOSITION, PATTERNI...
Publication number
20110076465
Publication date
Mar 31, 2011
Shin-Etsu Chemical Co., Ltd.
Takanobu Takeda
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
NOVEL POLYIMIDE SILICONE, PHOTOSENSITIVE RESIN COMPOSITION CONTAINI...
Publication number
20100233619
Publication date
Sep 16, 2010
Shohei TAGAMI
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
Chemically amplified positive resist composition and resist pattern...
Publication number
20100167207
Publication date
Jul 1, 2010
Shin-Etsu Chemical Co., Ltd.
Akinobu Tanaka
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Chemically-amplified positive resist composition and patterning pro...
Publication number
20100009286
Publication date
Jan 14, 2010
Shin-Etsu Chemical Co., Ltd.
Takanobu Takeda
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Resist patterning process and manufacturing photo mask
Publication number
20100009271
Publication date
Jan 14, 2010
Shin-Etsu Chemical Co., Ltd.
Takanobu Takeda
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
Publication number
20090214960
Publication date
Aug 27, 2009
Shin-Etsu Chemical Co., Ltd.
Takanobu Takeda
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Positive resist composition and patterning process using the same
Publication number
20090202940
Publication date
Aug 13, 2009
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Positive resist composition and patterning process using the same
Publication number
20090202947
Publication date
Aug 13, 2009
SHIN-ETSU CHEMICAL CO.,LTD.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
SYNTHESIS OF PHOTORESIST POLYMER
Publication number
20090030177
Publication date
Jan 29, 2009
Shin-Etsu Chemical Co., Ltd.
Takanobu TAKEDA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
PHOTOMASK BLANK, RESIST PATTERN FORMING PROCESS, AND PHOTOMASK PREP...
Publication number
20080305411
Publication date
Dec 11, 2008
Shin-Etsu Chemical Co., Ltd.
Ryuji KOITABASHI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PREPARATION PROCESS OF CHEMICALLY AMPLIFIED RESIST COMPOSITION
Publication number
20080274422
Publication date
Nov 6, 2008
Shin-Etsu Chemical Co., Ltd.
Keiichi Masunaga
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PRO...
Publication number
20080241751
Publication date
Oct 2, 2008
Shin-Etsu Chemical Co., Ltd.
Takanobu TAKEDA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
Publication number
20080096128
Publication date
Apr 24, 2008
Shin-Etsu Chemical Co., Ltd.
Takanobu TAKEDA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Novel polymer, resist composition and patterning process using the...
Publication number
20080090179
Publication date
Apr 17, 2008
Shin-Etsu Chemical Co., Ltd.
Takanobu Takeda
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Bottom resist layer composition and patterning process using the same
Publication number
20080038662
Publication date
Feb 14, 2008
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Novel polymer, positive resist composition and patterning process u...
Publication number
20080020289
Publication date
Jan 24, 2008
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
Negative resist composition and patterning process using the same
Publication number
20080020290
Publication date
Jan 24, 2008
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
Self-assembling polymer film material, self-assembled pattern, and...
Publication number
20070219338
Publication date
Sep 20, 2007
Shin-Etsu Chemical Co., Ltd.
Takanobu Takeda
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
Polymers, positive resist compositions and patterning process
Publication number
20070207408
Publication date
Sep 6, 2007
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
Publication number
20070148584
Publication date
Jun 28, 2007
Takanobu Takeda
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS
Publication number
20070111139
Publication date
May 17, 2007
Shin-Etsu Chemical Co., Ltd.
Takanobu TAKEDA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
Publication number
20070105042
Publication date
May 10, 2007
Shin-Etsu Chemical Co., Ltd.
Takanobu TAKEDA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY