Takashi Enomoto

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Salem, MA, US

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Patents Grantslast 30 patents

Information Patent Grant
Differential metal gate etching process
- Patent number 8,501,628
- Issue date Aug 6, 2013
- Tokyo Electron Limited
- Vinh Hoang Luong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reduced contaminant gas injection system and method of using
- Patent number 7,743,731
- Issue date Jun 29, 2010
- Tokyo Electron Limited
- Takashi Enomoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 7,473,377
- Issue date Jan 6, 2009
- Tokyo Electron Limited
- Tomoyo Yamaguchi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Differential metal gate etching process
- Publication number 20110237084
- Publication date Sep 29, 2011
- TOKYO ELECTRON LIMITED
- Vinh Hoang LUONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR ETCHING A HAFNIUM CONTAINING MATERIAL
- Publication number 20080217294
- Publication date Sep 11, 2008
- TOKYO ELECTRON LIMITED
- Akiteru Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Reduced contaminant gas injection system and method of using
- Publication number 20070235136
- Publication date Oct 11, 2007
- Takashi Enomoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing method
- Publication number 20050103748
- Publication date May 19, 2005
- TOKYO ELECTRON LIMITED
- Tomoyo Yamaguchi
- H01 - BASIC ELECTRIC ELEMENTS