Takashi NAGAMINE

Person

Kawasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 11,644,751
- Issue date May 9, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Junichi Miyakawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 11,635,687
- Issue date Apr 25, 2023
- TOKYO OHKA KOGYO, CO., LTD.
- Junichi Miyakawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition, method of forming resist pattern, polymeric com...
- Patent number 11,099,479
- Issue date Aug 24, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi Nagamine
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 11,067,888
- Issue date Jul 20, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi Nagamine
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition, method of forming resist pattern, and compound
- Patent number 11,036,131
- Issue date Jun 15, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi Nagamine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, method of forming resist pattern, compound, and...
- Patent number 11,036,132
- Issue date Jun 15, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi Nagamine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 10,866,514
- Issue date Dec 15, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi Nagamine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, method of forming resist pattern, compound, and...
- Patent number 10,514,600
- Issue date Dec 24, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi Nagamine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method for forming resist pattern
- Patent number 10,437,147
- Issue date Oct 8, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi Nagamine
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 10,401,727
- Issue date Sep 3, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi Nagamine
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist composition, method of forming resist pattern, compound, and...
- Patent number 10,180,625
- Issue date Jan 15, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi Nagamine
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition, method of forming resist pattern, compound, and...
- Patent number 9,851,637
- Issue date Dec 26, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi Nagamine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, method of forming resist pattern, acid generato...
- Patent number 9,682,951
- Issue date Jun 20, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi Nagamine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, method for forming resist pattern, acid generat...
- Patent number 9,678,423
- Issue date Jun 13, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi Nagamine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, method for forming resist pattern, photo-reacti...
- Patent number 9,671,690
- Issue date Jun 6, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi Nagamine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 9,557,647
- Issue date Jan 31, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshitaka Komuro
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, method of forming resist pattern, compound, and...
- Patent number 9,411,227
- Issue date Aug 9, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi Nagamine
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition, acid generator, polymeric compound and method o...
- Patent number 9,354,515
- Issue date May 31, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi Nagamine
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
- Publication number 20240329530
- Publication date Oct 3, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- TAKASHI NAGAMINE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20210181634
- Publication date Jun 17, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Junichi MIYAKAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20210181633
- Publication date Jun 17, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Junichi MIYAKAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20210157234
- Publication date May 27, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Rin Odashima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20210141307
- Publication date May 13, 2021
- TOKYO OHKA KYGYO CO., LTD.
- Mari Murata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20210063878
- Publication date Mar 4, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi Nagamine
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20200257197
- Publication date Aug 13, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi Nagamine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD
- Publication number 20190354011
- Publication date Nov 21, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Tomohiro OIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...
- Publication number 20190219920
- Publication date Jul 18, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi NAGAMINE
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND...
- Publication number 20190204735
- Publication date Jul 4, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi NAGAMINE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPOUND
- Publication number 20190204739
- Publication date Jul 4, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi NAGAMINE
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20190196329
- Publication date Jun 27, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi NAGAMINE
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND...
- Publication number 20180284610
- Publication date Oct 4, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi NAGAMINE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20180081271
- Publication date Mar 22, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi NAGAMINE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20180081269
- Publication date Mar 22, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi NAGAMINE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND...
- Publication number 20170293223
- Publication date Oct 12, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi NAGAMINE
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
- Publication number 20170285469
- Publication date Oct 5, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi NAGAMINE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ACID GENERAT...
- Publication number 20170176855
- Publication date Jun 22, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi NAGAMINE
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND...
- Publication number 20170097564
- Publication date Apr 6, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi NAGAMINE
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, PHOTO-REACTI...
- Publication number 20160282717
- Publication date Sep 29, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi NAGAMINE
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, ACID GENERATO...
- Publication number 20160280679
- Publication date Sep 29, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi NAGAMINE
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ACID GENERAT...
- Publication number 20160274458
- Publication date Sep 22, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi NAGAMINE
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND...
- Publication number 20150198881
- Publication date Jul 16, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi Nagamine
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION, ACID GENERATOR, POLYMERIC COMPOUND AND METHOD O...
- Publication number 20150037734
- Publication date Feb 5, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi Nagamine
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20140322652
- Publication date Oct 30, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshitaka Komuro
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Takashi NAGAMINE

Person

Patents Grantslast 30 patents

Resist composition and method of forming resist pattern

Resist composition and method of forming resist pattern

Resist composition, method of forming resist pattern, polymeric com...

Resist composition and method of forming resist pattern

Resist composition, method of forming resist pattern, and compound

Resist composition, method of forming resist pattern, compound, and...

Resist composition and method of forming resist pattern

Resist composition, method of forming resist pattern, compound, and...

Resist composition and method for forming resist pattern

Resist composition and method of forming resist pattern

Resist composition, method of forming resist pattern, compound, and...

Resist composition, method of forming resist pattern, compound, and...

Resist composition, method of forming resist pattern, acid generato...

Resist composition, method for forming resist pattern, acid generat...

Resist composition, method for forming resist pattern, photo-reacti...

Resist composition and method of forming resist pattern

Resist composition, method of forming resist pattern, compound, and...

Resist composition, acid generator, polymeric compound and method o...

Patents Applicationslast 30 patents

RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPOUND

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND...

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND...

RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ACID GENERAT...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND...

RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, PHOTO-REACTI...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, ACID GENERATO...

RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ACID GENERAT...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND...

RESIST COMPOSITION, ACID GENERATOR, POLYMERIC COMPOUND AND METHOD O...

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN