Takayuki Fujiwara

Person

Joetsu, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Resist composition and patterning process
- Patent number 12,072,627
- Issue date Aug 27, 2024
- Shin-Etsu Chemical Co., Ltd.
- Teppei Adachi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and patterning process
- Patent number 12,050,402
- Issue date Jul 30, 2024
- Shin-Etsu Chemical Co., Ltd.
- Teppei Adachi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 11,914,291
- Issue date Feb 27, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 11,822,239
- Issue date Nov 21, 2023
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and patterning process
- Patent number 11,774,853
- Issue date Oct 3, 2023
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Onium salt compound, chemically amplified resist composition and pa...
- Patent number 11,762,287
- Issue date Sep 19, 2023
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Fujiwara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and pattern forming process
- Patent number 11,709,426
- Issue date Jul 25, 2023
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and patterning process
- Patent number 11,693,314
- Issue date Jul 4, 2023
- Shin-Etsu Chemical Co., Ltd.
- Teppei Adachi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and patterning process
- Patent number 11,635,690
- Issue date Apr 25, 2023
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and patterning process
- Patent number 11,635,685
- Issue date Apr 25, 2023
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and patterning process
- Patent number 11,614,688
- Issue date Mar 28, 2023
- Shin-Etsu Chemical Co., Ltd.
- Ryosuke Taniguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 11,604,411
- Issue date Mar 14, 2023
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and patterning process
- Patent number 11,506,977
- Issue date Nov 22, 2022
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and patterning process
- Patent number 11,493,843
- Issue date Nov 8, 2022
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 11,480,875
- Issue date Oct 25, 2022
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 11,460,773
- Issue date Oct 4, 2022
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and patterning process
- Patent number 11,448,962
- Issue date Sep 20, 2022
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Fujiwara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Iodonium salt, resist composition, and pattern forming process
- Patent number 11,448,961
- Issue date Sep 20, 2022
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Fujiwara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and patterning process
- Patent number 11,435,665
- Issue date Sep 6, 2022
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and patterning process
- Patent number 11,415,887
- Issue date Aug 16, 2022
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 11,409,194
- Issue date Aug 9, 2022
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Biomedical electrode composition, biomedical electrode and method f...
- Patent number 11,357,970
- Issue date Jun 14, 2022
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Resist composition and patterning process
- Patent number 11,340,527
- Issue date May 24, 2022
- Shin-Etsu Chemical Co., Ltd.
- Teppei Adachi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and patterning process
- Patent number 11,281,101
- Issue date Mar 22, 2022
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and patterning process
- Patent number 11,269,253
- Issue date Mar 8, 2022
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sulfonium compound, resist composition, and patterning process
- Patent number 11,215,926
- Issue date Jan 4, 2022
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Fujiwara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polymer compound for conductive polymer and method for producing same
- Patent number 11,208,509
- Issue date Dec 28, 2021
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist composition and patterning process
- Patent number 11,181,823
- Issue date Nov 23, 2021
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and patterning process
- Patent number 11,175,580
- Issue date Nov 16, 2021
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Bio-electrode and methods for manufacturing the bio-electrode
- Patent number 11,135,422
- Issue date Oct 5, 2021
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250028243
- Publication date Jan 23, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20240337938
- Publication date Oct 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SULFONIUM SALT, RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20240302740
- Publication date Sep 12, 2024
- Shin-Etsu Chemical Co., Ltd.
- Tatsuya Yamahira
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20240192591
- Publication date Jun 13, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20240176235
- Publication date May 30, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ONIUM SALT COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PR...
- Publication number 20230384677
- Publication date Nov 30, 2023
- Shin-Etsu Chemical Co., Ltd.
- Tomomi Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20230280651
- Publication date Sep 7, 2023
- Shin-Etsu Chemical Co., Ltd.
- Teppei ADACHI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SALT COMPOUND, RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20230205083
- Publication date Jun 29, 2023
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Fujiwara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND P...
- Publication number 20230123180
- Publication date Apr 20, 2023
- Shin-Etsu Chemical Co., Ltd.
- Tomomi Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20230023593
- Publication date Jan 26, 2023
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST MATERIAL AND PATTERNING PROCESS
- Publication number 20230019681
- Publication date Jan 19, 2023
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20220236643
- Publication date Jul 28, 2022
- Shin-Etsu Chemical Co., Ltd.
- Teppei Adachi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING...
- Publication number 20220127225
- Publication date Apr 28, 2022
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Fujiwara
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20210232048
- Publication date Jul 29, 2021
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20210200083
- Publication date Jul 1, 2021
- Shin-Etsu Chemical Co., Ltd.
- Teppei ADACHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PA...
- Publication number 20210188770
- Publication date Jun 24, 2021
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Fujiwara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PA...
- Publication number 20210179554
- Publication date Jun 17, 2021
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Fujiwara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20210149300
- Publication date May 20, 2021
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PA...
- Publication number 20210149301
- Publication date May 20, 2021
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Fujiwara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20210141306
- Publication date May 13, 2021
- Shin-Etsu Chemical Co., Ltd.
- Teppei ADACHI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20210055652
- Publication date Feb 25, 2021
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20210048746
- Publication date Feb 18, 2021
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20210048748
- Publication date Feb 18, 2021
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20210033970
- Publication date Feb 4, 2021
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20210003916
- Publication date Jan 7, 2021
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20200393760
- Publication date Dec 17, 2020
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING...
- Publication number 20200369605
- Publication date Nov 26, 2020
- Shin-Etsu Chemical Co., Ltd.
- Masayoshi Sagehashi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20200301275
- Publication date Sep 24, 2020
- Shin-Etsu Chemical Co., Ltd.
- Ryosuke TANIGUCHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMER COMPOUND FOR CONDUCTIVE POLYMER AND METHOD FOR PRODUCING SAME
- Publication number 20200291145
- Publication date Sep 17, 2020
- Shin-Etsu Chemical Co., Ltd.
- Jun HATAKEYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20200285149
- Publication date Sep 10, 2020
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Takayuki Fujiwara

Person

Patents Grantslast 30 patents

Resist composition and patterning process

Resist composition and patterning process

Resist composition and patterning process

Resist composition and patterning process

Resist composition and patterning process

Onium salt compound, chemically amplified resist composition and pa...

Resist composition and pattern forming process

Resist composition and patterning process

Positive resist composition and patterning process

Resist composition and patterning process

Resist composition and patterning process

Resist composition and patterning process

Positive resist composition and patterning process

Resist composition and patterning process

Resist composition and patterning process

Resist composition and patterning process

Resist composition and patterning process

Iodonium salt, resist composition, and pattern forming process

Resist composition and patterning process

Resist composition and patterning process

Resist composition and patterning process

Biomedical electrode composition, biomedical electrode and method f...

Resist composition and patterning process

Resist composition and patterning process

Resist composition and patterning process

Sulfonium compound, resist composition, and patterning process

Polymer compound for conductive polymer and method for producing same

Resist composition and patterning process

Resist composition and patterning process

Bio-electrode and methods for manufacturing the bio-electrode

Patents Applicationslast 30 patents

RESIST COMPOSITION AND PATTERN FORMING PROCESS

RESIST COMPOSITION AND PATTERN FORMING PROCESS

SULFONIUM SALT, RESIST COMPOSITION AND PATTERN FORMING PROCESS

RESIST COMPOSITION AND PATTERN FORMING PROCESS

RESIST COMPOSITION AND PATTERN FORMING PROCESS

ONIUM SALT COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PR...

RESIST COMPOSITION AND PATTERNING PROCESS

SALT COMPOUND, RESIST COMPOSITION AND PATTERNING PROCESS

PHOTOACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND P...

POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS

POSITIVE RESIST MATERIAL AND PATTERNING PROCESS

RESIST COMPOSITION AND PATTERNING PROCESS

ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING...

RESIST COMPOSITION AND PATTERN FORMING PROCESS

RESIST COMPOSITION AND PATTERNING PROCESS

ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PA...

ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PA...

RESIST COMPOSITION AND PATTERNING PROCESS

ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PA...

RESIST COMPOSITION AND PATTERNING PROCESS

RESIST COMPOSITION AND PATTERNING PROCESS

RESIST COMPOSITION AND PATTERNING PROCESS

RESIST COMPOSITION AND PATTERNING PROCESS

RESIST COMPOSITION AND PATTERNING PROCESS

POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS

POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS

ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING...

RESIST COMPOSITION AND PATTERNING PROCESS

POLYMER COMPOUND FOR CONDUCTIVE POLYMER AND METHOD FOR PRODUCING SAME

RESIST COMPOSITION AND PATTERNING PROCESS