Takenao Nemoto

Person

Miyagi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method of processing workpiece
- Patent number 10,553,410
- Issue date Feb 4, 2020
- Tokyo Electron Limited
- Yasuhiko Saito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and film formation method
- Patent number 9,765,430
- Issue date Sep 19, 2017
- Tokyo Electron Limited
- Takehisa Saito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wiring structure having interlayer insulating film and wiring line...
- Patent number 9,543,191
- Issue date Jan 10, 2017
- Zeon Corporation
- Takenao Nemoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pulsed gas plasma doping method and apparatus
- Patent number 9,165,771
- Issue date Oct 20, 2015
- Tokyo Electron Limited
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for removing material from chamber and wafer s...
- Patent number 6,992,011
- Issue date Jan 31, 2006
- Tokyo Electron Limited
- Takenao Nemoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF PROCESSING WORKPIECE
- Publication number 20170069473
- Publication date Mar 9, 2017
- TOKYO ELECTRON LIMITED
- Yasuhiko SAITO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND FILM FORMATION METHOD
- Publication number 20170009338
- Publication date Jan 12, 2017
- TOKYO ELECTRON LIMITED
- Takehisa SAITO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND SUBSTRATE PROCESSING APPARATUS PROV...
- Publication number 20150255258
- Publication date Sep 10, 2015
- TOKYO ELECTRON LIMITED
- Toshihisa Nozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR INJECTING DOPANT INTO SUBSTRATE TO BE PROCESSED, AND PLA...
- Publication number 20150132929
- Publication date May 14, 2015
- TOKYO ELECTRON LIMITED
- Masahiro Horigome
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20150110973
- Publication date Apr 23, 2015
- TOKYO ELECTRON LIMITED
- Takenao NEMOTO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR-DEVICE MANUFACTURING METHOD AND SEMICONDUCTOR DEVICE
- Publication number 20150041983
- Publication date Feb 12, 2015
- TOKYO ELECTRON LIMITED
- Takenao Nemoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PULSED GAS PLASMA DOPING METHOD AND APPARATUS
- Publication number 20140302666
- Publication date Oct 9, 2014
- TOKYO ELECTRON LIMITED
- Peter VENTZEK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20140225263
- Publication date Aug 14, 2014
- TOHOKU UNIVERSITY
- Takenao Nemoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTERLAYER INSULATING LAYER FORMING METHOD AND SEMICONDUCTOR DEVICE
- Publication number 20130130513
- Publication date May 23, 2013
- TOKYO ELECTRON LIMITED
- Kotaro Miyatani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
WET PROCESSING APPARATUS AND WET PROCESSING METHOD
- Publication number 20120125376
- Publication date May 24, 2012
- TOKYO ELECTRON LIMITED
- Tadahiro Ohmi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Chemical Mechanical Polishing
- Publication number 20100240283
- Publication date Sep 23, 2010
- ARACA Incorporation
- Takenao Nemoto
- B24 - GRINDING POLISHING
Information Patent Application
METHOD OF OBSERVING PATTERN EVOLUTION USING VARIANCE AND FOURIER TR...
- Publication number 20100159804
- Publication date Jun 24, 2010
- ARACA, Inc.
- Yasa Sampurno
- B24 - GRINDING POLISHING
Information Patent Application
Semiconductor device and method for manufacturing the same
- Publication number 20090108452
- Publication date Apr 30, 2009
- TOKYO ELECTRON LIMITED
- Takenao Nemoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and apparatus for removing material from chamber and wafer s...
- Publication number 20040137750
- Publication date Jul 15, 2004
- TOKYO ELECTRON LIMITED
- Takenao Nemoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Takenao Nemoto

Person

Patents Grantslast 30 patents

Method of processing workpiece

Plasma processing apparatus and film formation method

Wiring structure having interlayer insulating film and wiring line...

Pulsed gas plasma doping method and apparatus

Method and apparatus for removing material from chamber and wafer s...

Patents Applicationslast 30 patents

METHOD OF PROCESSING WORKPIECE

PLASMA PROCESSING APPARATUS AND FILM FORMATION METHOD

PLASMA PROCESSING APPARATUS AND SUBSTRATE PROCESSING APPARATUS PROV...

METHOD FOR INJECTING DOPANT INTO SUBSTRATE TO BE PROCESSED, AND PLA...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

SEMICONDUCTOR-DEVICE MANUFACTURING METHOD AND SEMICONDUCTOR DEVICE

PULSED GAS PLASMA DOPING METHOD AND APPARATUS

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

INTERLAYER INSULATING LAYER FORMING METHOD AND SEMICONDUCTOR DEVICE

WET PROCESSING APPARATUS AND WET PROCESSING METHOD

Method of Chemical Mechanical Polishing

METHOD OF OBSERVING PATTERN EVOLUTION USING VARIANCE AND FOURIER TR...

Semiconductor device and method for manufacturing the same

Method and apparatus for removing material from chamber and wafer s...