Takeyoshi Mimura

Person

Koza-gun, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 8,574,809
- Issue date Nov 5, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Takeyoshi Mimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition, method of forming resist pattern, and...
- Patent number 8,298,748
- Issue date Oct 30, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Takehiro Seshimo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 8,278,022
- Issue date Oct 2, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Takeyoshi Mimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 8,232,040
- Issue date Jul 31, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Iwashita
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 7,914,968
- Issue date Mar 29, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Takeyoshi Mimura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Chemical amplification type positive resist composition, resist lam...
- Patent number 7,150,956
- Issue date Dec 19, 2006
- Tokyo Ohka Kogyo Co., Ltd.
- Kazuyuki Nitta
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition of chemical amplification type, resist...
- Patent number 6,921,621
- Issue date Jul 26, 2005
- Tokyo Ohka Kogyo Co., Ltd.
- Kazuyuki Nitta
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20100304289
- Publication date Dec 2, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Takeyoshi Mimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND...
- Publication number 20100297560
- Publication date Nov 25, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Takehiro SESHIMO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20100143845
- Publication date Jun 10, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Iwashita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist composition and method of forming resist pattern
- Publication number 20100055606
- Publication date Mar 4, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Takeyoshi Mimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20090317745
- Publication date Dec 24, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Takeyoshi Mimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FORMING RESIST PATTERN
- Publication number 20090269706
- Publication date Oct 29, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Takeyoshi Mimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN
- Publication number 20090253075
- Publication date Oct 8, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Takeyoshi Mimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20080311515
- Publication date Dec 18, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Takeyoshi Mimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION FOR SUPERCRITICAL DEVELOPMENT
- Publication number 20070196764
- Publication date Aug 23, 2007
- Tokyo Ohka Kogyo Co., Ltd.
- Takako HIROSAKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Chemical amplification type positive resist composition, resist lam...
- Publication number 20050112498
- Publication date May 26, 2005
- Toyko Ohka Kogyo Co., Ltd.
- Kazuyuki Nitta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist composition of chemical amplification type, resist...
- Publication number 20030190550
- Publication date Oct 9, 2003
- Kazuyuki Nitta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Takeyoshi Mimura

Person

Patents Grantslast 30 patents

Positive resist composition and method of forming resist pattern

Positive resist composition, method of forming resist pattern, and...

Positive resist composition and method of forming resist pattern

Positive resist composition and method of forming resist pattern

Positive resist composition and method of forming resist pattern

Chemical amplification type positive resist composition, resist lam...

Positive resist composition of chemical amplification type, resist...

Patents Applicationslast 30 patents

POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND...

POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

Positive resist composition and method of forming resist pattern

POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

METHOD FOR FORMING RESIST PATTERN

POSITIVE RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN

POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION FOR SUPERCRITICAL DEVELOPMENT

Chemical amplification type positive resist composition, resist lam...

Positive resist composition of chemical amplification type, resist...