Takuya Hagiwara

Person

Kanagawa, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 10,121,678
- Issue date Nov 6, 2018
- Renesas Electronics Corporation
- Hirokazu Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method of semiconductor device
- Patent number 9,847,226
- Issue date Dec 19, 2017
- Renesas Electronics Corporation
- Takuya Hagiwara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Manufacturing method of semiconductor device
- Patent number 9,748,360
- Issue date Aug 29, 2017
- Renesas Electronics Corporation
- Takuya Hagiwara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method of semiconductor device
- Patent number 9,627,203
- Issue date Apr 18, 2017
- Renesas Electronics Corporation
- Takuya Hagiwara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of semiconductor manufacture utilizing layer arrangement to...
- Patent number 9,502,282
- Issue date Nov 22, 2016
- Renesas Electronics Corporation
- Takuya Hagiwara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Manufacturing method of semiconductor device
- Patent number 9,105,476
- Issue date Aug 11, 2015
- Renesas Electronics Corporation
- Takuya Hagiwara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Manufacturing method of semiconductor device
- Patent number 8,808,970
- Issue date Aug 19, 2014
- Renesas Electronics Corporation
- Takuya Hagiwara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Developing method for immersion lithography, solvent used for the d...
- Patent number 8,679,727
- Issue date Mar 25, 2014
- Renesas Electronics Corporation
- Mamoru Terai
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method for manufacturing a semiconductor device
- Patent number 8,530,145
- Issue date Sep 10, 2013
- Renesas Electronics Corporation
- Takuya Hagiwara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming resist pattern
- Patent number 8,323,879
- Issue date Dec 4, 2012
- Renesas Electronics Corporation
- Mamoru Terai
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Water repellant composition for substrate to be exposed, method for...
- Patent number 8,178,983
- Issue date May 15, 2012
- Renesas Electronics Corporation
- Takeo Ishibashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming pattern
- Patent number 7,883,834
- Issue date Feb 8, 2011
- Renesas Electronics Corporation
- Takuya Hagiwara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming pattern
- Patent number 7,666,577
- Issue date Feb 23, 2010
- Renesas Technology Corp.
- Takuya Hagiwara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming pattern
- Patent number 7,479,366
- Issue date Jan 20, 2009
- Renesas Technology Corp.
- Takuya Hagiwara
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
- Publication number 20230146858
- Publication date May 11, 2023
- RENESAS ELECTRONICS CORPORATION
- Takahiro MARUYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
- Publication number 20180068845
- Publication date Mar 8, 2018
- RENESAS ELECTRONICS CORPORATION
- Takuya HAGIWARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20180061664
- Publication date Mar 1, 2018
- RENESAS ELECTRONICS CORPORATION
- Hirokazu SAITO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
- Publication number 20170178897
- Publication date Jun 22, 2017
- RENESAS ELECTRONICS CORPORATION
- Takuya HAGIWARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
- Publication number 20160336173
- Publication date Nov 17, 2016
- RENESAS ELECTRONICS CORPORATION
- Takuya HAGIWARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
- Publication number 20160064403
- Publication date Mar 3, 2016
- RENESAS ELECTRONICS CORPORATION
- Takuya HAGIWARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE
- Publication number 20150194340
- Publication date Jul 9, 2015
- RENESAS ELECTRONICS CORPORATION
- Takuya Hagiwara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
- Publication number 20130052824
- Publication date Feb 28, 2013
- Renesas Electronics Corporation
- Takuya HAGIWARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WATER REPELLANT COMPOSITION FOR SUBSTRATE TO BE EXPOSED, METHOD FOR...
- Publication number 20110221077
- Publication date Sep 15, 2011
- Takeo Ishibashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FORMING PATTERN
- Publication number 20110091819
- Publication date Apr 21, 2011
- RENESAS ELECTRONICS CORPORATION
- Takuya Hagiwara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING RESIST PATTERN
- Publication number 20100233449
- Publication date Sep 16, 2010
- RENESAS TECHNOLOGY CORP.
- Mamoru TERAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FORMING PATTERN
- Publication number 20100104986
- Publication date Apr 29, 2010
- Renesas Technology Corp.
- Takuya Hagiwara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEVELOPING METHOD FOR IMMERSION LITHOGRAPHY, SOLVENT USED FOR THE D...
- Publication number 20100021703
- Publication date Jan 28, 2010
- Mamoru Terai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FORMING PATTERN
- Publication number 20090092932
- Publication date Apr 9, 2009
- Renesas Technology Corp.
- Takuya Hagiwara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of forming resist pattern and semiconductor device manufactu...
- Publication number 20080241489
- Publication date Oct 2, 2008
- RENESAS TECHNOLOGY CORP.
- Takeo Ishibashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of forming fine pattern
- Publication number 20050181304
- Publication date Aug 18, 2005
- Daikin Industries, Ltd.
- Takayuki Araki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask, and method for forming pattern
- Publication number 20050100799
- Publication date May 12, 2005
- Semiconductor Leading Edge Technologies, Inc.
- Takuya Hagiwara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Takuya Hagiwara

Person

Patents Grantslast 30 patents

Method of manufacturing semiconductor device

Manufacturing method of semiconductor device

Manufacturing method of semiconductor device

Manufacturing method of semiconductor device

Method of semiconductor manufacture utilizing layer arrangement to...

Manufacturing method of semiconductor device

Manufacturing method of semiconductor device

Developing method for immersion lithography, solvent used for the d...

Method for manufacturing a semiconductor device

Method of forming resist pattern

Water repellant composition for substrate to be exposed, method for...

Method for forming pattern

Method for forming pattern

Method for forming pattern

Patents Applicationslast 30 patents

MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

METHOD OF MANUFACTURING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE

MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

WATER REPELLANT COMPOSITION FOR SUBSTRATE TO BE EXPOSED, METHOD FOR...

METHOD FOR FORMING PATTERN

METHOD OF FORMING RESIST PATTERN

METHOD FOR FORMING PATTERN

DEVELOPING METHOD FOR IMMERSION LITHOGRAPHY, SOLVENT USED FOR THE D...

METHOD FOR FORMING PATTERN

Method of forming resist pattern and semiconductor device manufactu...

Method of forming fine pattern

Photomask, and method for forming pattern