Tamae Haruki

Person

Kawasaki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Optical exposure method
- Patent number 6,420,094
- Issue date Jul 16, 2002
- Fujitsu Limited
- Tamae Haruki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Automatic revision of semiconductor device layout for solving contr...
- Patent number 6,099,582
- Issue date Aug 8, 2000
- Fujitsu Limited
- Tamae Haruki
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optical exposure method
- Patent number 6,045,976
- Issue date Apr 4, 2000
- Fujitsu, Limited
- Tamae Haruki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shifter arranging method and computer readable medium storing...
- Patent number 5,867,401
- Issue date Feb 2, 1999
- Fujitsu Limited
- Tamae Haruki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fine pattern lithography with positive use of interference
- Patent number 5,637,424
- Issue date Jun 10, 1997
- Fujitsu Limited
- Tamae Haruki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical exposure method
- Patent number 5,607,821
- Issue date Mar 4, 1997
- Fujitsu Limited
- Tamae Haruki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern exposing method using phase shift and mask used therefor
- Patent number 5,472,813
- Issue date Dec 5, 1995
- Fujitsu Limited
- Kenji Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical exposure method
- Patent number 5,465,220
- Issue date Nov 7, 1995
- Fujitsu Limited
- Tamae Haruki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fine pattern lithography with positive use of interference
- Patent number 5,415,952
- Issue date May 16, 1995
- Fujitsu Limited
- Tamae Haruki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern exposing method using phase shift and mask used therefor
- Patent number 5,364,716
- Issue date Nov 15, 1994
- Fujitsu Limited
- Kenji Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Tamae Haruki

Person

Patents Grantslast 30 patents

Optical exposure method

Automatic revision of semiconductor device layout for solving contr...

Optical exposure method

Phase shifter arranging method and computer readable medium storing...

Fine pattern lithography with positive use of interference

Optical exposure method

Pattern exposing method using phase shift and mask used therefor

Optical exposure method

Fine pattern lithography with positive use of interference

Pattern exposing method using phase shift and mask used therefor