Tasuku MATSUMIYA

Person

Koza-gun, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Resin composition for forming a phase-separated structure, and meth...
- Patent number 10,179,866
- Issue date Jan 15, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of producing structure containing phase-separated structure,...
- Patent number 10,100,221
- Issue date Oct 16, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Hitoshi Yamano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming patterns of semiconductor devices
- Patent number 10,101,660
- Issue date Oct 16, 2018
- Samsung Electronics Co., Ltd.
- Jeong-Ju Park
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Method of producing structure containing phase-separated structure...
- Patent number 10,066,096
- Issue date Sep 4, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Kurosawa
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Resin composition for forming a phase-separated structure, and meth...
- Patent number 9,914,847
- Issue date Mar 13, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Undercoat agent and method of forming pattern of layer containing b...
- Patent number 9,834,696
- Issue date Dec 5, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Senzaki
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resin composition for forming a phase-separated structure, and meth...
- Patent number 9,828,519
- Issue date Nov 28, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method of producing structure containing phase-separated structure...
- Patent number 9,821,338
- Issue date Nov 21, 2017
- TOKYO OHKA KOGYO., LTD.
- Hitoshi Yamano
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of producing structure containing phase-separated structure
- Patent number 9,816,003
- Issue date Nov 14, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Kurosawa
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Brush composition, and method of producing structure containing pha...
- Patent number 9,776,208
- Issue date Oct 3, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Masahito Yahagi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Undercoat agent and method of producing structure containing phase-...
- Patent number 9,567,477
- Issue date Feb 14, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Takehiro Seshimo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method of producing structure containing phase-separated structure,...
- Patent number 9,475,088
- Issue date Oct 25, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Kurosawa
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Method of producing structure containing phase-separated structure,...
- Patent number 9,442,371
- Issue date Sep 13, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Takehiro Seshimo
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Method of producing structure containing phase-separated structure,...
- Patent number 9,206,307
- Issue date Dec 8, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Tasuku Matsumiya
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of producing structure containing phase-separated structure,...
- Patent number 9,169,421
- Issue date Oct 27, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Tasuku Matsumiya
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Fluorine-containing block copolymeric compound
- Patent number 8,846,838
- Issue date Sep 30, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Tasuku Matsumiya
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Positive resist composition, method of forming resist pattern, and...
- Patent number 8,541,529
- Issue date Sep 24, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Dazai
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 8,487,056
- Issue date Jul 16, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Tasuku Matsumiya
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition, method of forming resist pattern using...
- Patent number 8,404,428
- Issue date Mar 26, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Tasuku Matsumiya
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Positive resist composition, method of forming resist pattern, and...
- Patent number 8,367,296
- Issue date Feb 5, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki Hirano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive resist composition, method of forming resist pattern, and...
- Patent number 8,329,378
- Issue date Dec 11, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki Hirano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive resist composition, method of forming resist pattern using...
- Patent number 8,268,529
- Issue date Sep 18, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Dazai
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 8,236,477
- Issue date Aug 7, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Tasuku Matsumiya
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition, method of forming resist pattern, and...
- Patent number 8,232,041
- Issue date Jul 31, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Dazai
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition, method of forming resist pattern, polymeric com...
- Patent number 8,227,170
- Issue date Jul 24, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Dazai
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist composition, method of forming resist pattern, and...
- Patent number 8,192,915
- Issue date Jun 5, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Dazai
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive resist composition, method of forming resist pattern, and...
- Patent number 8,182,976
- Issue date May 22, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Dazai
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method of forming fine patterns
- Patent number 8,043,798
- Issue date Oct 25, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Base material for pattern-forming material, positive resist composi...
- Patent number 7,923,192
- Issue date Apr 12, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 7,871,753
- Issue date Jan 18, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Tasuku Matsumiya
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20210003918
- Publication date Jan 7, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Yuki FUKUMURA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIN COMPOSITION FOR FORMING PHASE-SEPARATED STRUCTURE AND METHOD...
- Publication number 20180171172
- Publication date Jun 21, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Hitoshi YAMANO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIN COMPOSITION FOR FORMING A PHASE-SEPARATED STRUCTURE, AND METH...
- Publication number 20170362460
- Publication date Dec 21, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya KAWAUE
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
RESIN COMPOSITION FOR FORMING A PHASE-SEPARATED STRUCTURE, AND METH...
- Publication number 20170240766
- Publication date Aug 24, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya KAWAUE
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIN COMPOSITION FOR FORMING A PHASE-SEPARATED STRUCTURE, AND METH...
- Publication number 20170240767
- Publication date Aug 24, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya KAWAUE
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
METHODS OF FORMING PATTERNS OF SEMICONDUCTOR DEVICES
- Publication number 20170129972
- Publication date May 11, 2017
- Jeong-Ju PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE,...
- Publication number 20160333217
- Publication date Nov 17, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Hitoshi YAMANO
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE...
- Publication number 20160280906
- Publication date Sep 29, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi KUROSAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
UNDERCOAT AGENT AND METHOD OF FORMING PATTERN OF LAYER CONTAINING B...
- Publication number 20160257838
- Publication date Sep 8, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro SENZAKI
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
BRUSH COMPOSITION AND METHOD OF PRODUCING STRUCTURE CONTAINING PHAS...
- Publication number 20160194524
- Publication date Jul 7, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Hitoshi YAMANO
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
BRUSH COMPOSITION, AND METHOD OF PRODUCING STRUCTURE CONTAINING PHA...
- Publication number 20160194751
- Publication date Jul 7, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Masahito YAHAGI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE,...
- Publication number 20150205207
- Publication date Jul 23, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Takehiro Seshimo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE
- Publication number 20150118397
- Publication date Apr 30, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Kurosawa
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE,...
- Publication number 20150093507
- Publication date Apr 2, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Kurosawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE,...
- Publication number 20150044371
- Publication date Feb 12, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Kurosawa
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE,...
- Publication number 20150034593
- Publication date Feb 5, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Tasuku Matsumiya
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
UNDERCOAT AGENT AND METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-...
- Publication number 20150030773
- Publication date Jan 29, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Takehiro Seshimo
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE,...
- Publication number 20140238954
- Publication date Aug 28, 2014
- TOKYO INSTITUTE OF TECHNOLOGY
- Tasuku Matsumiya
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
UNDERCOAT AGENT AND METHOD OF FORMING PATTERN OF LAYER CONTAINING B...
- Publication number 20130243958
- Publication date Sep 19, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Senzaki
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN USING...
- Publication number 20130053518
- Publication date Feb 28, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Tasuku MATSUMIYA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20120329969
- Publication date Dec 27, 2012
- Tasuku Matsumiya
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND...
- Publication number 20120202151
- Publication date Aug 9, 2012
- Takahiro Dazai
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN USING...
- Publication number 20110117499
- Publication date May 19, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Tasuku MATSUMIYA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND...
- Publication number 20100233625
- Publication date Sep 16, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki HIRANO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND...
- Publication number 20100209848
- Publication date Aug 19, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Dazai
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN USING...
- Publication number 20100196821
- Publication date Aug 5, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Dazai
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Positive resist composition and method of forming resist pattern
- Publication number 20100183981
- Publication date Jul 22, 2010
- Tasuku Matsumiya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...
- Publication number 20100178609
- Publication date Jul 15, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Dazai
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND...
- Publication number 20100081086
- Publication date Apr 1, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki HIRANO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Positive resist composition, method of forming resist pattern, and...
- Publication number 20100062369
- Publication date Mar 11, 2010
- Takahiro Dazai
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Tasuku MATSUMIYA

Person

Patents Grantslast 30 patents

Resin composition for forming a phase-separated structure, and meth...

Method of producing structure containing phase-separated structure,...

Methods of forming patterns of semiconductor devices

Method of producing structure containing phase-separated structure...

Resin composition for forming a phase-separated structure, and meth...

Undercoat agent and method of forming pattern of layer containing b...

Resin composition for forming a phase-separated structure, and meth...

Method of producing structure containing phase-separated structure...

Method of producing structure containing phase-separated structure

Brush composition, and method of producing structure containing pha...

Undercoat agent and method of producing structure containing phase-...

Method of producing structure containing phase-separated structure,...

Method of producing structure containing phase-separated structure,...

Method of producing structure containing phase-separated structure,...

Method of producing structure containing phase-separated structure,...

Fluorine-containing block copolymeric compound

Positive resist composition, method of forming resist pattern, and...

Positive resist composition and method of forming resist pattern

Positive resist composition, method of forming resist pattern using...

Positive resist composition, method of forming resist pattern, and...

Positive resist composition, method of forming resist pattern, and...

Positive resist composition, method of forming resist pattern using...

Positive resist composition and method of forming resist pattern

Positive resist composition, method of forming resist pattern, and...

Resist composition, method of forming resist pattern, polymeric com...

Positive resist composition, method of forming resist pattern, and...

Positive resist composition, method of forming resist pattern, and...

Method of forming fine patterns

Base material for pattern-forming material, positive resist composi...

Positive resist composition and method of forming resist pattern

Patents Applicationslast 30 patents

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIN COMPOSITION FOR FORMING PHASE-SEPARATED STRUCTURE AND METHOD...

RESIN COMPOSITION FOR FORMING A PHASE-SEPARATED STRUCTURE, AND METH...

RESIN COMPOSITION FOR FORMING A PHASE-SEPARATED STRUCTURE, AND METH...

RESIN COMPOSITION FOR FORMING A PHASE-SEPARATED STRUCTURE, AND METH...

METHODS OF FORMING PATTERNS OF SEMICONDUCTOR DEVICES

METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE,...

METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE...

UNDERCOAT AGENT AND METHOD OF FORMING PATTERN OF LAYER CONTAINING B...

BRUSH COMPOSITION AND METHOD OF PRODUCING STRUCTURE CONTAINING PHAS...

BRUSH COMPOSITION, AND METHOD OF PRODUCING STRUCTURE CONTAINING PHA...

METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE,...

METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE

METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE,...

METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE,...

METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE,...

UNDERCOAT AGENT AND METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-...

METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE,...

UNDERCOAT AGENT AND METHOD OF FORMING PATTERN OF LAYER CONTAINING B...

POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN USING...

POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND...

POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN USING...

POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND...

POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND...

POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN USING...

Positive resist composition and method of forming resist pattern

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...

POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND...

Positive resist composition, method of forming resist pattern, and...