Patent Application
20210003918
The present invention relates to a resist composition and a method of forming a resist pattern.
Priority is claimed on Japanese Patent Application No. 2019-117448, filed on Jun. 25, 2019, the content of which is incorporated herein by reference.
In lithography techniques, for example, a step of forming a resist pattern having a predetermined shape on a resist film is performed by forming a resist film formed of a resist material on a substrate, performing selective exposure on the resist film, and performing a developing treatment. A resist material whose characteristic is changed such that the exposed portion of the resist film is dissolved in a developing solution is referred to as a positive tone, and a resist material whose characteristic is changed such that the exposed portion of the resist film is not dissolved in a developing solution is referred to as a negative tone.
In recent years, in the manufacture of semiconductor elements and liquid crystal display elements, advances in lithography techniques have led to rapid progress in the field of pattern miniaturization. These pattern miniaturization techniques typically involve shortening the wavelength (increasing the energy) of the exposure light source. Specifically, ultraviolet rays typified by g-line and i-line have been used in the related art, but nowadays mass production of semiconductor elements using KrF excimer lasers and ArF excimer lasers has started. Further, examination has also been conducted on extreme ultraviolet (EUV) rays, electron beams (EB), and X rays, which have a wavelength shorter (energy higher) than these excimer lasers.
Resist materials require lithography characteristics such as a high resolution that enables reproduction of patterns with minute dimensions, and a high level of sensitivity to these kinds of exposure light sources.
As a resist material that satisfies these requirements, a chemically amplified resist composition which includes a base material component whose solubility in a developing solution is changed due to an action of an acid and an acid generator component that generates an acid upon exposure has been used.
For example, in a case where the developing solution is an alkali developing solution (alkali developing process), as a positive-tone chemically amplified resist composition, a composition which contains a resin component (base resin) whose solubility in an alkali developing solution is increased due to an action of an acid and an acid generator component has been typically used. In a case where a resist film formed using such a resist composition is selectively exposed at the time of forming a resist pattern, an acid is generated from the acid generator component, and the polarity of the base resin is increased due to the action of the acid in an exposed portion so that the exposed portion of the resist film becomes soluble in the alkali developing solution. Therefore, a positive-tone pattern in which the unexposed portion of the resist film remain as a pattern is formed by performing the alkali development.
Meanwhile, in a case where such a chemically amplified resist composition is applied to a solvent developing process using a developing solution containing an organic solvent (organic developing solution), since the solubility in an organic developing solution is relatively decreased in a case where the polarity of the base resin is increased, the unexposed portion of the resist film is dissolved and removed by the organic developing solution so that a negative-tone resist pattern in which the exposed portion of the resist film remains as a pattern is formed. Such a solvent developing process for forming a negative-tone resist pattern is also referred to as a “negative-tone developing process”.
Further, in the chemically amplified resist composition, a composition further containing a fluorine additive component is also used.
For example, Patent Literature 1 discloses a radiation-sensitive resin composition which contains a polymer having a constitutional unit in which a fluorine-containing group that is an alkali dissociable group is bonded to an adamantane skeleton. According to the radiation-sensitive resin composition, even in a case where the PEB temperature is set to be lower than the temperature of the related art, the undissolved residue in the surface layer of the resist film is significantly reduced. As the result, it is considered that the scum suppressing property and the bridge defect suppressing property are further improved, and an increase in LWR occurring due to the bridge defects is considered to be further suppressed.
PCT International Publication No. WO2012/002470
With further advances of the lithography technique and further miniaturization of resist patterns, for example, the purpose of the lithography using electron beam or EUV is to form a fine pattern having a size of several tens of nanometers. As the dimension of the resist pattern decreases as described above, the resist composition is required to have higher sensitivity to an exposure light source and to further improve lithography characteristics such as reduction in roughness.
However, the resist composition of the related art as described above is insufficient in terms of the resolution performance and the roughness reduction effect with respect to the above-described required characteristics.
The present invention has been made in consideration of the above-described circumstances, and an object thereof is to provide a resist composition which enables an increase of the sensitivity, has excellent lithography characteristics, and enables formation of a resist pattern with an excellent shape, and a method of forming a resist pattern using the resist composition.
In order to achieve the above-described object, the present invention employs the following configuration.
According to a first aspect of the present invention, there is provided a resist composition which generates an acid upon exposure and whose solubility in a developing solution is changed due to an action of the acid, the resist composition including: a resin component (A1) whose solubility in a developing solution is changed due to the action of an acid; and a fluorine additive component (F) which exhibits decomposability with respect to an alkali developing solution, in which the resin component (A1) contains a polymer compound having a constitutional unit (a01) represented by Formula (a01), and the fluorine additive component (F) contains a fluororesin component having a constitutional unit (f10) represented by Formula (f1-01) or (f1-02).
[In the formulae, R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms. Ra0 represents an acid dissociable group represented by Formula (a01-r-1).]
[In the formula, Ya0 represents a carbon atom. Xa0 represents a group that forms an aliphatic cyclic group with Ya0. Some or all hydrogen atoms in the aliphatic cyclic group may be substituted. RaX01 represents an aromatic hydrocarbon group which may have a substituent. The symbol * represents a bonding site.]
[In Formula (f1-01), R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms. Raf01 represents a divalent linking group that does not have an acid dissociable site. Raf02 represents a monovalent organic group. —O-Raf02 represents a group that is dissociated due to an action of a base. At least one of Raf01 and Raf02 represents a group in which some or all hydrogen atoms of a hydrocarbon group have been substituted with fluorine atoms. The total number of fluorine atoms in Raf01 and Raf02 is 3 or greater.
In Formula (f1-02), R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms. Raf03 represents a divalent linking group that does not have an acid dissociable site. Raf04 represents a monovalent organic group. —C(═O)Raf04 represents a group that is dissociated due to an action of a base. At least one of Raf03 and Raf04 represents a group in which some or all hydrogen atoms of a hydrocarbon group have been substituted with fluorine atoms. The total number of fluorine atoms in Raf03 and Raf04 is 3 or greater.]
According to a second aspect of the present invention, there is provided a method of forming a resist pattern, including: a step of forming a resist film on a support using the resist composition according to the first aspect; a step of exposing the resist film; and a step of developing the exposed resist film to form a resist pattern.
According to the resist composition of this invention, it is possible to provide a resist composition which enables an increase of the sensitivity, has excellent lithography characteristics, and enables formation of a resist pattern with an excellent shape, and a method of forming a resist pattern using the resist composition.
In the present description and the scope of the present patent claims, the term “aliphatic” is a relative concept used in relation to the term “aromatic”, and defines a group or compound that has no aromaticity.
The term “alkyl group” includes linear, branched, or cyclic monovalent saturated hydrocarbon, unless otherwise specified. The same applies to the alkyl group in an alkoxy group.
The term “alkylene group” includes linear, branched, or cyclic divalent saturated hydrocarbon, unless otherwise specified.
The “halogenated alkyl group” is a group in which some or all hydrogen atoms of an alkyl group have been substituted with halogen atoms. Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom.
The “fluorinated alkyl group” or a “fluorinated alkylene group” is a group in which some or all hydrogen atoms of an alkyl group or an alkylene group have been substituted with fluorine atoms.
The term “constitutional unit” indicates a monomer unit constituting a polymer compound (a resin, a polymer, or a copolymer).
The expression “may have a substituent” includes a case where a hydrogen atom (—H) is substituted with a monovalent group and a case where a methylene (—CH2—) group is substituted with a divalent group.
The term “exposure” is a general concept for irradiation with radiation.
The “base material component” is an organic compound having a film-forming ability, and an organic compound having a molecular weight of 500 or greater is preferably used. In a case where the molecular weight of the organic compound is 500 or greater, the film-forming ability is improved, and a nano-level resist pattern is easily formed. Organic compounds used as the base material component are classified into non-polymers and polymers. As the non-polymers, those having a molecular weight of 500 or greater and less than 4000 are typically used. Hereinafter, the “low-molecular-weight compound” indicates a non-polymer having a molecular weight of 500 or greater and less than 4000. As the polymer, those having a molecular weight of 1000 or greater are typically used. Hereinafter, the “resin”, the “polymer compound”, or the “polymer” indicates a polymer having a molecular weight of 1000 or greater. As the molecular weight of the polymer, the mass average molecular weight in terms of polystyrene according to gel permeation chromatography (GPC) is used.
The “constitutional unit derived from acrylic acid ester” indicates a constitutional unit that is formed by cleavage of an ethylenic double bond of acrylic acid ester.
The “acrylic acid ester” indicates a compound in which a hydrogen atom at the terminal of the carboxy group of acrylic acid (CH2═CH—COOH) has been substituted with an organic group.
In the acrylic acid ester, the hydrogen atom bonded to the carbon atom at the α-position may be substituted with a substituent. The substituent (Rα0) that substitutes the hydrogen atom bonded to the carbon atom at the α-position is a group or an atom other than a hydrogen atom, and examples thereof include an alkyl group having 1 to 5 carbon atoms and a halogenated alkyl group having 1 to 5 carbon atoms. Further, itaconic acid diester in which the substituent (Rα0) has been substituted with a substituent having an ester bond or α-hydroxyacryl ester in which the substituent (Rα0) has been substituted with a hydroxyalkyl group or a group obtained by modifying a hydroxyl group thereof can be exemplified as acrylic acid ester. Further, the carbon atom at the α-position of acrylic acid ester indicates the carbon atom to which the carbonyl group of acrylic acid is bonded, unless otherwise specified.
Hereinafter, acrylic acid ester in which the hydrogen atom bonded to the carbon atom at the α-position has been substituted with a substituent is also referred to as α-substituted acrylic acid ester. Further, acrylic acid ester and α-substituted acrylic acid ester are also collectively referred to as “(α-substituted) acrylic acid ester”.
The “constitutional unit derived from hydroxystyrene” indicates a constitutional unit that is formed by cleavage of an ethylenic double bond of hydroxystyrene. The “constitutional unit derived from a hydroxystyrene derivative” indicates a constitutional unit formed by cleavage of an ethylenic double bond of a hydroxystyrene derivative.
The term “hydroxystyrene derivative” includes compounds in which the hydrogen atom at the α-position of hydroxystyrene has been substituted with another substituent such as an alkyl group or a halogenated alkyl group; and derivatives thereof Examples of the derivatives thereof include those obtained by substituting a hydrogen atom of a hydroxyl group of hydroxystyrene, in which the hydrogen atom at the α-position may be substituted with a substituent, with an organic group; and those obtained by bonding a substituent other than a hydroxyl group to a benzene ring of hydroxystyrene in which the hydrogen atom at the α-position may be substituted with a substituent. Further, the α-position (the carbon atom at the α-position) indicates the carbon atom having a benzene ring bonded thereto, unless otherwise specified.
As the substituent which substitutes the hydrogen atom at the α-position of hydroxystyrene, the same substituents as those for the substituent at the α-position in the above-described α-substituted acrylic acid ester can be exemplified.
The “constitutional unit derived from vinylbenzoic acid or a vinylbenzoic acid derivative” indicates a constitutional unit that is formed by cleavage of the ethylenic double bond of vinylbenzoic acid or a vinylbenzoic acid derivative.
The term “vinylbenzoic acid derivative” includes compounds in which the hydrogen atom at the α-position of vinylbenzoic acid has been substituted with another substituent such as an alkyl group or a halogenated alkyl group; and derivatives thereof. Examples of the derivatives thereof include those obtained by substituting a hydrogen atom of a carboxy group of vinylbenzoic acid, in which the hydrogen atom at the α-position may be substituted with a substituent, with an organic group; and those obtained by bonding a substituent other than a hydroxyl group or a carboxy group to a benzene ring of vinylbenzoic acid in which the hydrogen atom at the α-position may be substituted with a substituent. Further, the α-position (the carbon atom at the α-position) indicates the carbon atom having a benzene ring bonded thereto, unless otherwise specified.
The concept “styrene derivative” includes those obtained by substituting a hydrogen atom at the α-position of styrene with another substituent such as an alkyl group or a halogenated alkyl group; and derivatives thereof. Examples of the derivatives thereof include those obtained by bonding a substituent to a benzene ring of hydroxystyrene in which the hydrogen atom at the α-position may be substituted with a substituent. Further, the α-position (the carbon atom at the α-position) indicates the carbon atom having a benzene ring bonded thereto, unless otherwise specified.
The “constitutional unit derived from styrene” or “constitutional unit derived from a styrene derivative” indicates a constitutional unit formed by cleavage of an ethylenic double bond of styrene or a styrene derivative.
As the alkyl group as the substituent at the α-position, a linear or branched alkyl group is preferable, and specific examples thereof include alkyl groups of 1 to 5 carbon atoms (such as a methyl group, an ethyl group, a propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a tert-butyl group, a pentyl group, an isopentyl group, and a neopentyl group).
Specific examples of the halogenated alkyl group as the substituent at the α-position include groups in which some or all hydrogen atoms in the above-described “alkyl group as the substituent at the α-position” have been substituted with halogen atoms. Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom. Among these, a fluorine atom is particularly preferable.
Specific examples of the hydroxyalkyl group as the substituent at the α-position include groups in which some or all hydrogen atoms in the above-described “alkyl group as the substituent at the α-position” have been substituted with a hydroxyl group. The number of hydroxyl groups in the hydroxyalkyl group is preferably in a range of 1 to 5 and most preferably 1.
In the present specification and the scope of the present patent claims, asymmetric carbons may be present and enantiomers or diastereomers may be present depending on the structures of the chemical formulae. In this case, these isomers are represented by one chemical formula. These isomers may be used alone or in the form of a mixture.
(Resist Composition)
A resist composition according to a first embodiment of the present invention is a resist composition which generates an acid upon exposure and whose solubility in a developing solution is changed due to an action of the acid, the resist composition including a resin component (A1) whose solubility in a developing solution is changed due to the action of an acid, and a fluorine additive component (F) which exhibits decomposability with respect to an alkali developing solution, in which the resin component (A1) contains a polymer compound having a constitutional unit (a01) represented by Formula (a01), and the fluorine additive component (F) contains a fluororesin component having a constitutional unit (f10) represented by Formula (f1-01) or (f1-02).
In a case where a resist film is formed using the resist composition and the formed resist film is subjected to selective exposure, an acid is generated at an exposed portion of the resist film, and the solubility of the component (A) in a developing solution is not changed at an unexposed portion of the resist film while the solubility of the component (A) in a developing solution is changed due to the action of the acid, and thus a difference in solubility in a developing solution occurs between the exposed portion and the unexposed portion of the resist film. Therefore, in a case where the resist film is developed, the exposed portion of the resist film is dissolved and removed to form a positive-tone resist pattern in a case where the resist composition is of a positive tone, whereas the unexposed portion of the resist film is dissolved and removed to form a negative-tone resist pattern in a case where the resist composition is of a negative tone.
In the present specification, a resist composition which forms a positive-tone resist pattern by dissolving and removing the exposed portion of the resist film is referred to as a positive-tone resist composition, and a resist composition which forms a negative-tone resist pattern by dissolving and removing the unexposed portion of the resist film is referred to as a negative-tone resist composition. The resist composition of the present embodiment may be a positive-tone resist composition or a negative-tone resist composition. Further, the resist composition of the present embodiment may be used in an alkali developing process using an alkali developing solution in the developing treatment in a case of forming a resist pattern or may be used in a solvent developing process using a developing solution containing an organic solvent (organic developing solution) in the developing treatment, but it is preferable that the resist composition is used in the alkali developing process.
The resist composition of the present embodiment has a function of generating an acid upon exposure, and the component (A) may generate an acid upon exposure or an additive component blended separately from the component (A) may generate an acid upon exposure.
Specifically, (1) the resist composition of the present embodiment may further contain an acid generator component (B) that generates an acid upon exposure (hereinafter, referred to as a “component (B)”); (2) the component (A) may be a component that generates an acid upon exposure; (3) the component (A) is a component that generates an acid upon exposure and may further contain the component (B).
That is, in cases of (2) and (3), the component (A) becomes a “base material component that generates an acid upon exposure and whose solubility in a developing solution is changed due to the action of an acid”. In a case where the component (A) is a base material component which generates an acid upon exposure and whose solubility in a developing solution is changed due to the action of the acid, it is preferable that a component (A1) described below is a polymer compound which generates an acid upon exposure and whose solubility in a developing solution is changed due to the action of the acid. As such a polymer compound, a resin having a constitutional unit that generates an acid upon exposure can be used. As the constitutional unit that generates an acid upon exposure, those which have been known can be used. Among these, the resist composition of the present embodiment in the case of (1) described above is preferable.
<Component (A)>
In the resist composition of the present embodiment, it is preferable that the component (A) has a resin component (A1) whose solubility in a developing solution is changed due to the action of an acid (hereinafter, also referred to as a “component (A1)”). Since the polarity of the base material component before and after the exposure is changed by using the component (A1), an excellent development contrast can be obtained not only in an alkali developing process but also in a solvent developing process.
As the component (A), at least the component (A1) is used, and other polymer compounds and/or low-molecular-weight compounds may be used in combination with the component (A1).
In a case of applying an alkali developing process, the base material component having the component (A1) is insoluble in an alkali developing solution before exposure, but in a case where an acid is generated from the component (B) upon exposure, the action of this acid causes an increase in the polarity of the base material component, thereby increasing the solubility of the component (A1) in an alkali developing solution. Therefore, in a case where selective exposure is performed on a resist film formed by coating a support with the resist composition in the formation of a resist pattern, the exposed portion of the resist film is changed from being insoluble to being soluble in an alkali developing solution, whereas the unexposed portion of the resist film remain insoluble in an alkali developing solution, and hence, a positive-tone resist pattern is formed by performing alkali development.
Meanwhile, in a case of a solvent developing process, the base material component having the component (A1) exhibits high solubility in an organic developing solution before exposure. For example, in a case where an acid is generated from the component (B) upon exposure, the polarity of the component (A1) is increased by the action of the generated acid, thereby decreasing the solubility of the component (A1) in an organic developing solution. Therefore, in a case where selective exposure is performed on a resist film formed by coating a support with the resist composition in the formation of a resist pattern, the exposed portion of the resist film is changed from being soluble to being insoluble in an organic developing solution, whereas the unexposed portion of the resist film remain soluble in an organic developing solution. Therefore, a negative-tone resist pattern is formed by performing development using an organic developing solution so that a contrast is imparted between the exposed portion and the unexposed portion.
In the resist composition according to the present embodiment, the component (A) may be used alone or in combination of two or more kinds thereof.
In Regard to Component (A1)
The component (A1) is a resin component whose solubility in a developing solution is changed due to the action of an acid.
The component (A1) contains a polymer compound having a constitutional unit (a01).
Further, the component (A1) may have other constitutional units as necessary in addition to the constitutional unit (a01).
<<Constitutional Unit (a01)>>
The constitutional unit (a01) is a constitutional unit represented by Formula (a01).
Since the constitutional unit (a01) contains an acid dissociable group represented by Formula (a01-r-1) which exhibits high reactivity with an acid, the lithography characteristics such as enhancement of the sensitivity and the resolution and reduction of the roughness can be improved. In addition, since Formula (a01-r-1) has a bulky aromatic hydrocarbon group, the glass transition point (Tg) of the polymer compound having the constitutional unit (a01) can be improved, and diffusion of an acid in the resist composition according to the present embodiment can be satisfactorily controlled.
[In the formulae, R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms. Ra0 represents an acid dissociable group represented by Formula (a01-r-1).]
[In the formula, Ya0 represents a carbon atom. Xa0 represents a group that forms an aliphatic cyclic group with Ya0. Some or all hydrogen atoms in the aliphatic cyclic group may be substituted. RaX01 represents an aromatic hydrocarbon group which may have a substituent. The symbol * represents a bonding site.]
In Formula (a01), R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms.
As the alkyl group having 1 to 5 carbon atoms represented by R, a linear or branched alkyl group having 1 to 5 carbon atoms is preferable, and specific examples thereof include a methyl group, an ethyl group, a propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a tert-butyl group, a pentyl group, an isopentyl group, and a neopentyl group.
The halogenated alkyl group having 1 to 5 carbon atoms as R is a group in which some or all hydrogen atoms of the above-described alkyl group having 1 to 5 carbon atoms have been substituted with halogen atoms. Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom. Among these, a fluorine atom is particularly preferable.
It is preferable that R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a fluorinated alkyl group having 1 to 5 carbon atoms. Further, from the viewpoint of the industrial availability, R represents more preferably a hydrogen atom, a methyl group, or a trifluoromethyl group, still more preferably a hydrogen atom or a methyl group, and particularly preferably a methyl group.
In Formula (a01-r-1), the aliphatic cyclic group formed by Xa0 and Ya0 may be a monocyclic group or a polycyclic group. Here, in a case where the aliphatic cyclic group is a polycyclic group, an aliphatic cyclic group that does not have a crosslinked structure is preferable from the viewpoint of improving the solubility in a developing solution.
Examples of the monocyclic aliphatic cyclic group include a group in which two or more hydrogen atoms have been removed from a monocycloalkane. It is preferable that the monocycloalkane has 3 to 8 carbon atoms, and specific examples thereof include cyclopropane, cyclobutane, cyclopentane, cyclohexane, cycloheptane, and cyclooctane.
Examples of the polycyclic aliphatic cyclic group include a group in which two or more hydrogen atoms have been removed from a polycycloalkane. Examples of the polycycloalkane include a polycycloalkane having a fused ring polycyclic skeleton such as decalin, perhydroazulene, perhydroanthracene, or a ring structure having a steroid skeleton.
Among these, a monocyclic aliphatic cyclic group is preferable, a group in which one or more hydrogen atoms have been removed from cyclopropane, cyclopentane, cyclohexane, or cyclooctane is more preferable, a group in which one or more hydrogen atoms have been removed from cyclopentane, cyclohexane, or cyclooctane is still more preferable, and a group in which one or more hydrogen atoms have been removed from cyclopentane is particularly preferred.
Some or all hydrogen atoms in the aliphatic cyclic group may be substituted, and examples of the substituent include —RP1, —RP2—O—RP1, —RP2—CO—RP1, —RP2—CO—ORP1, —RP2—O—CO—RP1, —RP2—OH, —RP2—CN, and —RP2—COOH (hereinafter, these substituents will also be collectively referred to as “Ra05”).
Here, RP1 represents a chain-like monovalent saturated hydrocarbon group having 1 to 10 carbon atoms, a monovalent aliphatic cyclic saturated hydrocarbon group having 3 to 20 carbon atoms, or a monovalent aromatic hydrocarbon group having 6 to 30 carbon atoms. Further, RP2 represents a single bond, a chain-like divalent saturated hydrocarbon group having 1 to 10 carbon atoms, a divalent aliphatic cyclic saturated hydrocarbon group having 3 to 20 carbon atoms, or a divalent aromatic hydrocarbon group having 6 to 30 carbon atoms. Some or all hydrogen atoms in the chain-like saturated hydrocarbon group, the aliphatic cyclic saturated hydrocarbon group, and the aromatic hydrocarbon group as RP1 and RP2 may be substituted with fluorine atoms. The aliphatic cyclic hydrocarbon group may have one or more of one kind of substituents or one or more of each of plural kinds of the substituents.
Examples of the chain-like monovalent saturated hydrocarbon group having 1 to 10 carbon atoms include a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group, and a decyl group.
Examples of the monovalent aliphatic cyclic saturated hydrocarbon group having 3 to 20 carbon atoms include a monocyclic aliphatic saturated hydrocarbon group such as a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, a cyclooctyl group, a cyclodecyl group, or a cyclododecyl group; and a polycyclic aliphatic saturated hydrocarbon group such as a bicycle[2.2.2]octanyl group, a tricycle[5.2.1.02,6] decanyl group, a tricycle[3.3.1.13,7]decanyl group, a tetracyclo[6.2.1.13,6.02,7] dodecanyl group, or an adamantyl group.
Examples of the monovalent aromatic hydrocarbon group having 6 to 30 carbon atoms include a group formed by removing one hydrogen atom from an aromatic hydrocarbon ring such as benzene, biphenyl, fluorene, naphthalene, anthracene, or phenanthrene.
In Formula (a01-r-1), RaX01 represents an aromatic hydrocarbon group which may have a substituent. Examples of the aromatic hydrocarbon group as RaX01 include a group in which one or more hydrogen atoms have been removed from an aromatic hydrocarbon ring having 5 to 30 carbon atoms. Among the examples, RaX01 represents preferably a group in which one or more hydrogen atoms have been removed from an aromatic hydrocarbon ring having 6 to 15 carbon atoms, more preferably a group in which one or more hydrogen atoms have been removed from benzene, naphthalene, anthracene, or phenanthrene, still more preferably a group in which one or more hydrogen atoms have been removed from benzene, naphthalene, or anthracene, particularly preferably a group in which one or more hydrogen atoms have been removed from benzene or naphthalene, and most preferably a group in which one or more hydrogen atoms have been removed from benzene.
In Formula (a01-r-1), examples of the substituent which may be included in RaX01 include a methyl group, an ethyl group, a propyl group, a hydroxy group, a carboxy group, a halogen atom (such as a fluorine atom, a chlorine atom, or a bromine atom), an alkoxy group (such as a methoxy group, an ethoxy group, a propoxy group, or a butoxy group), and an alkyloxycarbonyl group.
Specific examples of the acid dissociable group represented by Formula (a01-r-1) are described below.
Among the examples, from the viewpoints of high solubility in a developing solution and high reactivity with an acid, an acid dissociable group represented by any of Formulae (r-pr-sa1) to (r-pr-sa13) is preferable, and an acid dissociable group represented by any of Formulae (r-pr-sa1) to (r-pr-sa6) is more preferable as the acid dissociable group represented by Formula (a01-r-1).
Specific examples of the constitutional unit (a01) are described below.
Among the examples described above, as the constitutional unit (a01), at least one selected from the group consisting of constitutional units respectively represented by Chemical Formulae (a01-001) to (a01-1-006), (a01-008), (a01-009), and (a01-011) to (a01-014) is preferable; at least one selected from the group consisting of constitutional units respectively represented by Chemical Formulae (a01-001) to (a01-006) is more preferable; and at least one selected from the group consisting of constitutional units respectively represented by Chemical Formulae (a01-004) and (a01-005) is still more preferable.
The constitutional unit (a01) in the component (A1) may be used alone or in combination of two or more kinds thereof.
The proportion of the constitutional unit (a01) in the component (A1) is preferably in a range of 1% to 80% by mole, more preferably in a range of 30% to 70% by mole, and particularly preferably in a range of 40% to 60% by mole with respect to the total amount (100% by mole) of all constitutional units constituting the component (A1).
In a case where the proportion of the constitutional unit (a01) is set to be greater than or equal to the lower limit of the above-described preferable range, the lithography characteristics such as enhancement of the resolution and reduction of the roughness are improved. Further, in a case where the proportion thereof is set to be less than or equal to the upper limit of the above-described preferable range, the constitutional unit (a01) and other constitutional units can be balanced, and the lithography characteristics are improved.
<<Other Constitutional Units>>
The component (A1) may have constitutional units other than the constitutional unit (a01) described above.
Examples of other constitutional units include a constitutional unit (a1) containing an acid decomposable group whose polarity is increase due to the action of an acid (here, those corresponding to the constitutional unit (a01) are excluded); a constitutional unit (a2) containing a lactone-containing cyclic group, a cyclic anhydride-containing cyclic group, a —SO2-containing cyclic group, or a carbonate-containing cyclic group; a constitutional unit (a3) containing a polar group-containing aliphatic hydrocarbon group; a constitutional unit (a4) containing an acid non-dissociable aliphatic cyclic group; a constitutional unit (a10) represented by Formula (a10-1); a constitutional unit derived from styrene; a constitutional unit derived from a styrene derivative; and a constitutional unit (a6) derived from acrylic acid.
In Regard to Constitutional Unit (a1):
The constitutional unit (a1) is a constitutional unit that contains an acid decomposable group whose polarity is increased due to the action of an acid. Here, those corresponding to the constitutional unit (a01) described above are excluded.
The “acid decomposable group” indicates a group having acid decomposability in which at least a part of a bond in the structure of the acid decomposable group can be cleaved due to the action of an acid.
Examples of the acid decomposable group whose polarity is increased due to the action of an acid include groups which are decomposed due to the action of an acid to generate a polar group.
Examples of the polar group include a carboxy group, a hydroxyl group, an amino group, and a sulfo group (—SO3H). Among these, a polar group containing —OH in the structure thereof (hereinafter, also referred to as a “OH-containingFe polar group”) is preferable, a carboxy group or a hydroxyl group is more preferable, and a carboxy group is particularly preferable.
More specific examples of the acid decomposable group include a group in which the above-described polar group has been protected by an acid dissociable group (such as a group in which a hydrogen atom of the OH-containing polar group has been protected by an acid dissociable group).
Here, the “acid dissociable group” indicates both a group (i) having an acid dissociation property in which a bond between the acid dissociable group and an atom adjacent to the acid dissociable group can be cleaved due to the action of an acid; and a group (ii) in which some bonds are cleaved due to the action of an acid, a decarboxylation reaction occurs, and thus the bond between the acid dissociable group and the atom adjacent to the acid dissociable group can be cleaved.
It is necessary that the acid dissociable group that constitutes the acid decomposable group is a group which exhibits a lower polarity than that of the polar group generated by the dissociation of the acid dissociable group. Thus, in a case where the acid dissociable group is dissociated by the action of an acid, a polar group exhibiting a higher polarity than that of the acid dissociable group is generated so that the polarity is increased. As a result, the polarity of the entire component (A1) is increased. Due to the increase in the polarity, relatively, the solubility in a developing solution is changed such that the solubility is increased in a case where the developing solution is an alkali developing solution and the solubility is decreased in a case where the developing solution is an organic developing solution.
Examples of the acid dissociable group are the same as those which have been proposed as the acid dissociable groups of the base resin for a chemically amplified resist composition.
Specific examples of the acid dissociable group of the base resin for a chemically amplified resist composition include an “acetal type acid dissociable group”, a “tertiary alkyl ester type acid dissociable group”, and a “tertiary alkyloxycarbonyl acid dissociable group” described below.
Acetal Type Acid Dissociable Group:
Examples of the acid dissociable group that protects a carboxy group or a hydroxyl group in the polar groups include an acid dissociable group represented by Formula (a1-r-1) (hereinafter, also referred to as an “acetal type acid dissociable group”).
[In the formula, Ra′1 and Ra′2 represent a hydrogen atom or an alkyl group. Ra′3 represents a hydrocarbon group, and Ra′3 may be bonded to any of Ra′1 and Ra′2 to form a ring.]
In Formula (a1-r-1), it is preferable that at least one of Ra′1 and Ra′2 represents a hydrogen atom and more preferable that both Ra′1 and Ra′2 represent a hydrogen atom.
In a case where Ra′1 or Ra′2 represents an alkyl group, examples of the alkyl group include the same alkyl groups exemplified as the substituent which may be bonded to the carbon atom at the α-position in the description on α-substituted acrylic acid ester. Among these, an alkyl group having 1 to 5 carbon atoms is preferable. Specific preferred examples thereof include linear or branched alkyl groups. More specific examples thereof include a methyl group, an ethyl group, a propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a tert-butyl group, a pentyl group, an isopentyl group, and a neopentyl group. Among these, a methyl group or an ethyl group is more preferable, and a methyl group is particularly preferable.
In Formula (a1-r-1), examples of the hydrocarbon group as Ra′3 include a linear or branched alkyl group and a cyclic hydrocarbon group.
The linear alkyl group has preferably 1 to 5 carbon atoms, more preferably 1 to 4 carbon atoms, and still more preferably 1 or 2 carbon atoms. Specific examples thereof include a methyl group, an ethyl group, an n-propyl group, an n-butyl group, and an n-pentyl group. Among these, a methyl group, an ethyl group, or an n-butyl group is preferable, and a methyl group or an ethyl group is more preferable.
The branched alkyl group has preferably 3 to 10 carbon atoms and more preferably 3 to 5 carbon atoms. Specific examples thereof include an isopropyl group, an isobutyl group, a tert-butyl group, an isopentyl group, a neopentyl group a 1,1-diethylpropyl group, and a 2,2-dimethylbutyl group. Among these, an isopropyl group is preferable.
In a case where Ra′3 represents a cyclic hydrocarbon group, the hydrocarbon group may be an aliphatic hydrocarbon group or an aromatic hydrocarbon group and may be a polycyclic group or a monocyclic group.
As the aliphatic hydrocarbon group which is a monocyclic group, a group in which one hydrogen atom has been removed from a monocycloalkane is preferable. The monocycloalkane has preferably 3 to 6 carbon atoms, and specific examples thereof include cyclopentane and cyclohexane.
As the aliphatic hydrocarbon group which is a polycyclic group, a group in which one hydrogen atom has been removed from a polycycloalkane is preferable. As the polycycloalkane, a group having 7 to 12 carbon atoms is preferable, and specific examples thereof include adamantane, norbornane, isobornane, tricyclodecane, and tetracyclododecane.
In a case where the cyclic hydrocarbon group as Ra′3 becomes an aromatic hydrocarbon group, the aromatic hydrocarbon group is a hydrocarbon group having at least one aromatic ring.
The aromatic ring is not particularly limited as long as the aromatic ring is a cyclic conjugated system having (4n+2) π electrons and may be monocyclic or polycyclic. The aromatic ring has preferably 5 to 30 carbon atoms, more preferably 5 to 20 carbon atoms, still more preferably 6 to 15 carbon atoms, and particularly preferably 6 to 12 carbon atoms.
Specific examples of the aromatic ring include aromatic hydrocarbon rings such as benzene, naphthalene, anthracene, and phenanthrene; and aromatic hetero rings in which some carbon atoms constituting the above-described aromatic hydrocarbon rings have been substituted with hetero atoms. Examples of the hetero atom in the aromatic hetero rings include an oxygen atom, a sulfur atom, and a nitrogen atom. Specific examples of the aromatic hetero ring include a pyridine ring and a thiophene ring.
Specific examples of the aromatic hydrocarbon group as Ra′3 include a group in which one hydrogen atom has been removed from the above-described aromatic hydrocarbon ring or aromatic hetero ring (such as an aryl group or a heteroaryl group); a group in which one hydrogen atom has been removed from an aromatic compound having two or more aromatic rings (such as biphenyl or fluorene); and a group in which one hydrogen atom of the above-described aromatic hydrocarbon ring or aromatic hetero ring has been substituted with an alkylene group (for example, an arylalkyl group such as a benzyl group, a phenethyl group, a 1-naphthylmethyl group, a 2-naphthylmethyl group, a 1-naphthylethyl group, or a 2-naphthylethyl group). The number of carbon atoms in the alkylene group bonded to the aromatic hydrocarbon ring or aromatic hetero ring is preferably in a range of 1 to 4, more preferably 1 or 2, and particularly preferably 1.
The cyclic hydrocarbon group as Ra′3 may include a substituent. Examples of the substituent include —RP1, —RP2—O—RP1, —RP2—CO—RP1, —RP2—CO—ORP1, —RP2—O—CO—RP1, —RP2—OH, —RP2—CN, and —RP2—COOH (hereinafter, these substituents will also be collectively referred to as “Ra05”).
Here, RP1 represents a chain-like monovalent saturated hydrocarbon group having 1 to 10 carbon atoms, a monovalent aliphatic cyclic saturated hydrocarbon group having 3 to 20 carbon atoms, or a monovalent aromatic hydrocarbon group having 6 to 30 carbon atoms. Further, RP2 represents a single bond, a chain-like divalent saturated hydrocarbon group having 1 to 10 carbon atoms, a divalent aliphatic cyclic saturated hydrocarbon group having 3 to 20 carbon atoms, or a divalent aromatic hydrocarbon group having 6 to 30 carbon atoms. Some or all hydrogen atoms in the chain-like saturated hydrocarbon group, the aliphatic cyclic saturated hydrocarbon group, and the aromatic hydrocarbon group as RP1 and RP2 may be substituted with fluorine atoms. The aliphatic cyclic hydrocarbon group may have one or more of one kind of substituents or one or more of each of plural kinds of the substituents.
Examples of the chain-like monovalent saturated hydrocarbon group having 1 to 10 carbon atoms include a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group, and a decyl group.
Examples of the monovalent aliphatic cyclic saturated hydrocarbon group having 3 to 20 carbon atoms include a monocyclic aliphatic saturated hydrocarbon group such as a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, a cyclooctyl group, a cyclodecyl group, or a cyclododecyl group; and a polycyclic aliphatic saturated hydrocarbon group such as a bicycle[2.2.2]octanyl group, a tricycle[5.2.1.02,6] decanyl group, a tricycle[3.3.1.13,7]decanyl group, a tetracyclo[6.2.1.13,6.02,7] dodecanyl group, or an adamantyl group.
Examples of the monovalent aromatic hydrocarbon group having 6 to 30 carbon atoms include a group formed by removing one hydrogen atom from an aromatic hydrocarbon ring such as benzene, biphenyl, fluorene, naphthalene, anthracene, or phenanthrene.
In a case where Ra′3 is bonded to any of Ra′1 and Ra′2 to form a ring, the cyclic group is preferably a 4- to 7-membered ring and more preferably a 4- to 6-membered ring. Specific examples of the cyclic group include a tetrahydropyranyl group and a tetrahydrofuranyl group.
Tertiary Alkyl Ester Type Acid Dissociable Group:
Examples of the acid dissociable group that protects a carboxy group among the polar groups include an acid dissociable group represented by Formula (a1-r-2).
Among examples of the acid dissociable group represented by Formula (a1-r-2), for convenience, a group formed of an alkyl group is referred to as a “tertiary alkyl ester type acid dissociable group”.
[In the formula, Ra′4 to Ra′6 each independently represent a hydrocarbon group, and Ra′5 and Ra′6 may be bonded to each other to form a ring.]
Examples of the hydrocarbon group as Ra′4 include a linear or branched alkyl group, a chain-like or cyclic alkenyl group, and a cyclic hydrocarbon group.
Examples of the linear or branched alkyl group and the cyclic hydrocarbon group (an aliphatic hydrocarbon group which is a monocyclic group, an aliphatic hydrocarbon group which is a polycyclic group, or an aromatic hydrocarbon group) as Ra′4 include the same groups as those for Ra′3.
As the chain-like or cyclic alkenyl group as Ra′4, an alkenyl group having 2 to 10 carbon atoms is preferable.
Examples of the hydrocarbon group as Ra′5 or Ra′6 include the same groups as those for Ra′3.
In a case where Ra′5 and Ra′6 are bonded to each other to form a ring, suitable examples thereof include a group represented by Formula (a1-r2-1) and a group represented by Formula (a1-r2-2).
Meanwhile, in a case where Ra′4 to Ra′6 represent an independent hydrocarbon group without being bonded to one another, suitable examples thereof include a group represented by Formula (a1-r2-4).
[In Formula (a1-r2-1), Ra′10 represents an alkyl group having 1 to 10 carbon atoms or a group represented by Formula (a1-r2-r1). Ra′11 represents a group that forms an aliphatic cyclic group with the carbon atom to which Ra′10 has been bonded. In Formula (a1-r2-2), Ya represents a carbon atom. Xa represents a group that forms a cyclic hydrocarbon group with Ya. Some or all hydrogen atoms in this cyclic hydrocarbon group may be substituted. Ra01 to Ra03 each independently represent a hydrogen atom, a chain-like monovalent saturated hydrocarbon group having 1 to 10 carbon atoms, or a monovalent aliphatic cyclic saturated hydrocarbon group having 3 to 20 carbon atoms. Some or all hydrogen atoms in the chain-like saturated hydrocarbon group and the aliphatic cyclic saturated hydrocarbon group may be substituted. Two or more of Ra01 to Ra03 may be bonded to one another to form a cyclic structure. In Formula (a1-r2-4), Ra′12 and Ra′13 each independently represent a chain-like monovalent saturated hydrocarbon having 1 to 10 carbon atoms or a hydrogen atom. Some or all hydrogen atoms in this chain-like saturated hydrocarbon group may be substituted. Ra′14 represents a hydrocarbon group which may have a substituent. The symbol * represents a bonding site.]
[In the formula, Ya0 represents a quaternary carbon atom. Ra031, Ra032, and Ra033 each independently represent a hydrocarbon group which may have a substituent. Here, one or more of Ra031, Ra032, and Ra033 represent a hydrocarbon group containing at least one polar group.]
In Formula (a1-r2-1), as the alkyl group having 1 to 10 carbon atoms as Ra′10 the groups exemplified as the linear or branched alkyl group as Ra′3 in Formula (a1-r-1) are preferable. It is preferable that Ra′10 represents an alkyl group having 1 to 5 carbon atoms.
In Formula (a1-r2-r1), Ya0 represents a quaternary carbon atom. That is, the number of adjacent carbon atoms bonded to Ya0 (carbon atom) is 4.
In Formula (a1-r2-r1), Ra031, Ra032, and Ra033 each independently represent a hydrocarbon group which may have a substituent. The hydrocarbon groups as Ra031, Ra032, and Ra033 may each independently be a linear or branched alkyl group, a chain-like or cyclic alkenyl group, and a cyclic hydrocarbon group.
The number of carbon atoms in the linear alkyl group as Ra031, Ra032, and Ra033 is preferably in a range of 1 to 5, more preferably in a range of 1 to 4, and still more preferably 1 or 2. Specific examples thereof include a methyl group, an ethyl group, an n-propyl group, an n-butyl group, and an n-pentyl group. Among these, a methyl group, an ethyl group, or an n-butyl group is preferable, and a methyl group or an ethyl group is more preferable.
The number of carbon atoms in the branched alkyl group as Ra031, Ra032, and Ra033 is preferably in a range of 3 to 10 and more preferably in a range of 3 to 5. Specific examples thereof include an isopropyl group, an isobutyl group, a tert-butyl group, an isopentyl group, a neopentyl group a 1,1-diethylpropyl group, and a 2,2-dimethylbutyl group. Among these, an isopropyl group is preferable.
As the chain-like or cyclic alkenyl group as Ra031, Ra032, and Ra033, an alkenyl group having 2 to 10 carbon atoms is preferable.
The cyclic hydrocarbon group as Ra031, Ra032, and Ra033 may be an aliphatic hydrocarbon group or an aromatic hydrocarbon group and may be a polycyclic group or a monocyclic group.
As the aliphatic hydrocarbon group which is a monocyclic group, a group in which one hydrogen atom has been removed from a monocycloalkane is preferable. The monocycloalkane has preferably 3 to 6 carbon atoms, and specific examples thereof include cyclopentane and cyclohexane.
As the aliphatic hydrocarbon group which is a polycyclic group, a group in which one hydrogen atom has been removed from a polycycloalkane is preferable. As the polycycloalkane, a group having 7 to 12 carbon atoms is preferable, and specific examples thereof include adamantane, norbornane, isobornane, tricyclodecane, and tetracyclododecane.
The aromatic hydrocarbon group as Ra031, Ra032, and Ra033 is a hydrocarbon group having at least one aromatic ring. The aromatic ring is not particularly limited as long as the aromatic ring is a cyclic conjugated system having (4n+2) 1 electrons and may be monocyclic or polycyclic. The aromatic ring has preferably 5 to 30 carbon atoms, more preferably 5 to 20 carbon atoms, still more preferably 6 to 15 carbon atoms, and particularly preferably 6 to 12 carbon atoms. Specific examples of the aromatic ring include aromatic hydrocarbon rings such as benzene, naphthalene, anthracene, and phenanthrene; and aromatic hetero rings in which some carbon atoms constituting the above-described aromatic hydrocarbon rings have been substituted with hetero atoms. Examples of the hetero atom in the aromatic hetero rings include an oxygen atom, a sulfur atom, and a nitrogen atom. Specific examples of the aromatic hetero ring include a pyridine ring and a thiophene ring. Specific examples of the aromatic hydrocarbon group include a group in which one hydrogen atom has been removed from the above-described aromatic hydrocarbon ring or aromatic hetero ring (such as an aryl group or a heteroaryl group); a group in which one hydrogen atom has been removed from an aromatic compound having two or more aromatic rings (such as biphenyl or fluorene); and a group in which one hydrogen atom of the above-described aromatic hydrocarbon ring or aromatic hetero ring has been substituted with an alkylene group (for example, an arylalkyl group such as a benzyl group, a phenethyl group, a 1-naphthylmethyl group, a 2-naphthylmethyl group, a 1-naphthylethyl group, or a 2-naphthylethyl group). The number of carbon atoms in the alkylene group bonded to the aromatic hydrocarbon ring or aromatic hetero ring is preferably in a range of 1 to 4, more preferably 1 or 2, and particularly preferably 1.
In a case where the hydrocarbon group represented by Ra031, Ra032, and Ra033 is substituted, examples of the substituent include a hydroxy group, a carboxy group, a halogen atom (such as a fluorine atom, a chlorine atom, or a bromine atom), an alkoxy group (such as a methoxy group, an ethoxy group, a propoxy group, or a butoxy group), and an alkyloxycarbonyl group.
Among these, as the hydrocarbon group which may have a substituent as Ra031, Ra032, and Ra033, a linear or branched alkyl group which may have a substituent is preferable, and a linear alkyl group is more preferable.
Here, one or more of Ra031, Ra032, and Ra033 represent a hydrocarbon group containing at least a polar group.
The “hydrocarbon group containing a polar group” includes both a group in which a methylene group (—CH2—) constituting a hydrocarbon group is substituted with a polar group and a group in which at least one hydrogen atom constituting a hydrocarbon group is substituted with a polar group.
As such a “hydrocarbon group containing a polar group”, a functional group represented by Formula (a1-p1) is preferable.
[In the formula, Ra07 represents a divalent hydrocarbon group having 2 to 12 carbon atoms. Ra08 represents a divalent linking group having a hetero atom. Ra06 represents a monovalent hydrocarbon group having 1 to 12 carbon atoms. np0 represents an integer of 1 to6.]
In Formula (a1-p1), Ra07 represents a divalent hydrocarbon group having 2 to 12 carbon atoms.
The number of carbon atoms of Ra07 is in a range of 2 to 12, preferably in a range of 2 to 8, more preferably in a range of 2 to 6, still more preferably in a range of 2 to 4, and particularly preferably 2.
As the hydrocarbon group represented by Ra07, a chain-like or cyclic aliphatic hydrocarbon group is preferable, and a chain-like hydrocarbon group is more preferable.
Examples of Ra07 include a linear alkanediyl group such as an ethylene group, a propane-1,3-diyl group, a butane-1,4-diyl group, a pentane-1,5-diyl group, a hexane-1,6-diyl group, a heptane-1,7-diyl group, an octane-1,8-diyl group, a nonane-1,9-diyl group, a decane-1,10-diyl group, an undecane-1,11-diyl group, or a dodecane-1,12-diyl group; a branched alkanediyl group such as a propane-1,2-diyl group, a 1-methylbutane-1,3-diyl group, a 2-methylpropane-1,3-diyl group, a pentane-1,4-diyl group, or a 2-methylbutane-1,4-diyl group; a cycloalkanediyl group such as a cyclobutane-1,3-diyl group, a cyclopentane-1,3-diyl group, a cyclohexane-1,4-diyl group, or a cyclooctane-1,5-diyl group; and a polycyclic divalent alicyclic hydrocarbon group such as a norbomane-1,4-diyl group, a norbornane-2,5-diyl group, an adamantane-1,5-diyl group, or an adamantane-2,6-diyl group.
Among these, an alkanediyl group is preferable, and a linear alkanediyl group is more preferable.
In Formula (a1-p1), Ra08 represents a divalent linking group having a hetero atom.
Examples of Ra08 include —O—, —C(═O)—O—, —C(═O)—, —O—C(═O)—O—, —C(═O)—NH—, —NH—, —NH—C(═NH)— (H may be substituted with a substituent such as an alkyl group or an acyl group), —S—, —S(═O)2—, and —S(═O)2—O—.
Among these, from the viewpoint of the solubility in a developing solution, —O—, —C(═O)—O—, —C(═O)—, or —O—C(═O)—O— is preferable, and —O— or —C(═O)— is particularly preferable.
In Formula (a1-p1), Ra06 represents a monovalent hydrocarbon group having 1 to 12 carbon atoms.
The number of carbon atoms of Ra06 is in a range of 1 to 12. From the viewpoint of the solubility in a developing solution, the number of carbon atoms thereof is preferably in a range of 1 to 8, more preferably in a range of 1 to 5, still more preferably in a range of 1 to 3, particularly preferably 1 or 2, and most preferably 1.
Examples of the hydrocarbon group as Ra06 include a chain-like hydrocarbon group, a cyclic hydrocarbon group, and a hydrocarbon group obtained by combining a chain-like hydrocarbon group and a cyclic hydrocarbon group.
Examples of the chain-like hydrocarbon group include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, a sec-butyl group, a tert-butyl group, an n-pentyl group, an n-hexyl group, an n-heptyl group, a 2-ethylhexyl group, an n-octyl group, an n-nonyl group, an n-decyl group, an n-undecyl group, and an n-dodecyl group.
The cyclic hydrocarbon group may be an alicyclic hydrocarbon group or an aromatic hydrocarbon group.
The alicyclic hydrocarbon group may be monocyclic or polycyclic, and examples of the monocyclic alicyclic hydrocarbon group include a cycloalkyl group such as a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a methylcyclohexyl group, a dimethylcyclohexyl group, a cycloheptyl group, a cyclooctyl group, a cyclononyl group, or a cyclodecyl group. Examples of the polycyclic alicyclic hydrocarbon group include a decahydronaphthyl group, an adamantyl group, a 2-alkyladamantane-2-yl group, a 1-(adamantane-1-yl)alkane-1-yl group, a norbornyl group, a methylnorbonyl group, and an isobornyl group.
Examples of the aromatic hydrocarbon group include a phenyl group, a naphthyl group, an anthryl group, a p-methylphenyl group, a p-tert-butylphenyl group, a p-adamantylphenyl group, a tolyl group, a xylyl group, a cumenyl group, a mesityl group, a biphenyl group, a phenanthryl group, a 2,6-diethylphenyl group, and a 2-methyl-6-ethylphenyl group.
From the viewpoint of the solubility in a developing solution, Ra06 represents preferably a chain-like hydrocarbon group, more preferably an alkyl group, and still more preferably a linear alkyl group.
In Formula (a1-p1), np0 represents an integer of 1 to 6, preferably an integer of 1 to 3, more preferably 1 or 2, and still more preferably 1.
Hereinafter, specific examples of the hydrocarbon group containing at least a polar group will be described.
In the formula shown below, the symbol * represents a bonding site bonded to a quaternary carbon atom (Ya0).
In Formula (a1-r2-r1), among Ra031, Ra032, and Ra033 the number of hydrocarbon groups containing at least a polar group is 1 or more and may be appropriately determined in consideration of the solubility in a developing solution in a case of formation of a resist pattern. For example, the number of hydrocarbon groups among Ra031, Ra032, and Ra033 is preferably 1 or 2 and particularly preferably 1.
The hydrocarbon group containing at least a polar group may have a substituent other than the polar group. Examples of the substituent include a halogen atom (such as a fluorine atom, a chlorine atom, or a bromine atom) and a halogenated alkyl group having 1 to 5 carbon atoms.
In Formula (a1-r2-1), preferred examples of Ra′11 (an aliphatic cyclic group that is formed together with a carbon atom to which Ra′10 is bonded) include the groups exemplified as the aliphatic hydrocarbon group which is a monocyclic group or a polycyclic group as Ra′3 in Formula (a1-r-1).
In Formula (a1-r2-2), as the cyclic hydrocarbon group that is formed by Xa together with Ya, a group formed by further removing one or more hydrogen atoms from the cyclic monovalent hydrocarbon group (an aliphatic hydrocarbon group) as Ra′3 in Formula (a1-r-1) is exemplified.
The cyclic hydrocarbon group that is formed by Xa together with Ya may have a substituent. Examples of the substituent include those which are the same as the substituents which may be included in the cyclic hydrocarbon group as Ra′3.
In Formula (a1-r2-2), examples of the chain-like monovalent hydrocarbon group having 1 to 10 carbon atoms as Ra01 to Ra03 include a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group, and a decyl group.
Examples of the monovalent aliphatic cyclic saturated hydrocarbon group having 3 to 20 carbon atoms as Ra1 to Ra03 include a monocyclic aliphatic saturated hydrocarbon group such as a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, a cyclooctyl group, a cyclodecyl group, or a cyclododecyl group; and a polycyclic aliphatic saturated hydrocarbon group such as a bicycle[2.2.2] octanyl group, a tricycle [5.2.1.02,6] decanyl group, a tricycle[3.3.1.13,7]decanyl group, a tetracyclo[6.2.1.13,6.02,7] dodecanyl group, or an adamantyl group.
From the viewpoint of easily synthesizing a monomer compound from which the constitutional unit (a1) is derived, it is preferable that Ra1 to Ra03 represent a hydrogen atom or a chain-like monovalent saturated hydrocarbon group having 1 to 10 carbon atoms. Among these, a hydrogen atom, a methyl group, or an ethyl group is more preferable, and a hydrogen atom is particularly preferable.
Examples of the substituent included in the chain-like saturated hydrocarbon group or the aliphatic cyclic saturated hydrocarbon group represented by Ra1 to Ra03 are the same as those exemplified as Ra5.
Examples of the group having a carbon-carbon double bond generated by two or more of Ra01 to Ra03 being bonded to one another to form a cyclic structure include a cyclopentenyl group, a cyclohexenyl group, a methylcyclopentenyl group, a methylcyclohexenyl group, a cyclopentylidenethenyl group, and a cyclohexylidenethenyl group. Among these, from the viewpoint of easily synthesizing a monomer compound from which the constitutional unit (a1) is derived, a cyclopentenyl group, a cyclohexenyl group, or a cyclopentylidenethenyl group is preferable.
In Formula (a1-r2-4), Ra′12 and Ra′13 each independently represent a chain-like monovalent saturated hydrocarbon having 1 to 10 carbon atoms or a hydrogen atom. Examples of the chain-like monovalent saturated hydrocarbon group having 1 to 10 carbon atoms as Ra′12 and Ra′13 include the same groups as those for the chain-like monovalent saturated hydrocarbon group having 1 to 10 carbon atoms as Ra01 to Ra03. Some or all hydrogen atoms in this chain-like saturated hydrocarbon group may be substituted.
Ra′12 and Ra′13 represent preferably a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, more preferably an alkyl group having 1 to 5 carbon atoms, still more preferably a methyl group or an ethyl group, and particularly preferably a methyl group.
In a case where the chain-like saturated hydrocarbon group represented by Ra′12 and Ra′13 is substituted, examples of the substituent are the same as those exemplified as Ra05.
In Formula (a1-r2-4), Ra′14 represents a hydrocarbon group which may have a substituent. Examples of the hydrocarbon group as Ra′14 include a linear or branched alkyl group and a cyclic hydrocarbon group.
The linear alkyl group as Ra′14 has preferably 1 to 5 carbon atoms, more preferably 1 to 4 carbon atoms, and still more preferably 1 or 2 carbon atoms. Specific examples thereof include a methyl group, an ethyl group, an n-propyl group, an n-butyl group, and an n-pentyl group. Among these, a methyl group, an ethyl group, or an n-butyl group is preferable, and a methyl group or an ethyl group is more preferable.
The branched alkyl group as Ra′14 has preferably 3 to 10 carbon atoms and more preferably 3 to 5 carbon atoms. Specific examples thereof include an isopropyl group, an isobutyl group, a tert-butyl group, an isopentyl group, a neopentyl group a 1,1-diethylpropyl group, and a 2,2-dimethylbutyl group. Among these, an isopropyl group is preferable.
In a case where Ra′14 represents a cyclic hydrocarbon group, the hydrocarbon group may be an aliphatic hydrocarbon group or an aromatic hydrocarbon group and may be polycyclic or monocyclic.
As the aliphatic hydrocarbon group which is a monocyclic group, a group in which one hydrogen atom has been removed from a monocycloalkane is preferable. The monocycloalkane has preferably 3 to 6 carbon atoms, and specific examples thereof include cyclopentane and cyclohexane.
As the aliphatic hydrocarbon group which is a polycyclic group, a group in which one hydrogen atom has been removed from a polycycloalkane is preferable. As the polycycloalkane, a group having 7 to 12 carbon atoms is preferable, and specific examples thereof include adamantane, norbornane, isobornane, tricyclodecane, and tetracyclododecane.
Examples of the aromatic hydrocarbon group as Ra′14 include the same groups as those for the aromatic hydrocarbon group as Ra4. Among these, Ra′14 represents preferably a group in which one or more hydrogen atoms have been removed from an aromatic hydrocarbon ring having 6 to 15 carbon atoms, more preferably a group in which one or more hydrogen atoms have been removed from benzene, naphthalene, anthracene, or phenanthrene, still more preferably a group in which one or more hydrogen atoms have been removed from benzene, naphthalene, or anthracene, particularly preferably a group in which one or more hydrogen atoms have been removed from naphthalene or anthracene, and most preferably a group in which one or more hydrogen atoms have been removed from naphthalene.
Examples of the substituent which may be included in Ra′14 include the same groups as those for the substituent which may be included in Ra04.
In a case where Ra′14 in Formula (a1-r2-4) represents a naphthyl group, the position bonded to the tertiary carbon atom in Formula (a1-r2-4) may be the 1-position or the 2-position of the naphthyl group.
In a case where Ra′14 in Formula (a1-r2-4) represents an anthryl group, the position bonded to the tertiary carbon atom in Formula (a1-r2-4) may be the 1-position, the 2-position, or the 9-position of the anthryl group.
Specific examples of the group represented by Formula (a1-r2-1) are shown below.
Specific examples of the group represented by Formula (a1-r2-2) are shown below.
Specific examples of the group represented by Formula (a1-r2-4) are shown below.
Tertiary Alkyloxycarbonyl Acid Dissociable Group:
Examples of the acid dissociable group that protects a hydroxyl group among the polar groups include an acid dissociable group (hereinafter, for convenience, also referred to as a “tertiary alkyloxycarbonyl acid dissociable group”) represented by Formula (a1-r-3) shown below.
[In the formula, Ra′7 to Ra′9 each independently represent an alkyl group.]
In Formula (a1-r-3), Ra′7 to Ra′9 each independently represent preferably an alkyl group having 1 to 5 carbon atoms and more preferably an alkyl group having 1 to 3 carbon atoms.
Further, the total number of carbon atoms in each alkyl group is preferably in a range of 3 to 7, more preferably in a range of 3 to 5, and most preferably 3 or 4.
Examples of the constitutional unit (a1) include a constitutional unit derived from acrylic acid ester in which the hydrogen atom bonded to the carbon atom at the α-position may be substituted with a substituent; a constitutional unit derived from acrylamide; a constitutional unit in which at least some hydrogen atoms in a hydroxyl group of a constitutional unit derived from hydroxystyrene or a hydroxystyrene derivative are protected by a substituent containing the acid decomposable group; and a constitutional unit in which at least some hydrogen atoms in —C(═O)—OH of a constitutional unit derived from vinylbenzoic acid or a vinylbenzoic acid derivative are protected by a substituent containing the acid decomposable group.
Among the examples, as the constitutional unit (a1), a constitutional unit derived from acrylic acid ester in which the hydrogen atom bonded to the carbon atom at the α-position may be substituted with a substituent is preferable.
Specific preferred examples of such a constitutional unit (a1) include constitutional units represented by Formula (a1-1) or (a1-2) shown below.
[In the formulae, R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms. Va1 represents a divalent hydrocarbon group which may contain an ether bond. na1 represents an integer of 0 to 2. Ra1 represents an acid dissociable group represented by Formula (a1-r-1) or (a1-r-2). Wa1 represents a (na2+1)-valent hydrocarbon group, na2 represents an integer of 1 to 3, and Ra2 represents an acid dissociable group represented by Formula (a1-r-1) or (a1-r-3)].
In Formula (a1-1), as the alkyl group having 1 to 5 carbon atoms as R, a linear or branched alkyl group having 1 to 5 carbon atoms is preferable, and specific examples thereof include a methyl group, an ethyl group, a propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a tert-butyl group, a pentyl group, an isopentyl group, and a neopentyl group. The halogenated alkyl group having 1 to 5 carbon atoms is a group in which some or all hydrogen atoms in the alkyl group having 1 to 5 carbon atoms have been substituted with halogen atoms. Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom. Among these, a fluorine atom is particularly preferable.
As R, a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a fluorinated alkyl group having 1 to 5 carbon atoms is preferable, and a hydrogen atom or a methyl group is most preferable from the viewpoint of the industrial availability.
In Formula (a1-1), the divalent hydrocarbon group as Va1 may be an aliphatic hydrocarbon group or an aromatic hydrocarbon group.
The aliphatic hydrocarbon group as the divalent hydrocarbon group represented by Va1 may be saturated or unsaturated. In general, it is preferable that the aliphatic hydrocarbon group is saturated.
More specific examples of the aliphatic hydrocarbon group include a linear or branched aliphatic hydrocarbon group and an aliphatic hydrocarbon group having a ring in the structure thereof.
The linear aliphatic hydrocarbon group has preferably 1 to 10 carbon atoms, more preferably 1 to 6 carbon atoms, still more preferably 1 to 4 carbon atoms, and most preferably 1 to 3 carbon atoms.
As the linear aliphatic hydrocarbon group, a linear alkylene group is preferable. Specific examples thereof include a methylene group [—CH2—], an ethylene group [—(CH2)2—], a trimethylene group [—(CH2)3—], a tetramethylene group [—(CH2)4—], and a pentamethylene group [—(CH2)5—].
The branched aliphatic hydrocarbon group has preferably 2 to 10 carbon atoms, more preferably 3 to 6 carbon atoms, still more preferably 3 or 4 carbon atoms, and most preferably 3 carbon atoms.
As the branched aliphatic hydrocarbon group, a branched alkylene group is preferable, and specific examples thereof include alkylalkylene groups, for example, alkylmethylene groups such as —CH(CH3)—, —CH(CH2CH3)—, —C(CH3)2—, —C(CH3)(CH2CH3)—, —C(CH3)(CH2CH2CH3)—, and —C(CH2CH3)2—; alkylethylene groups such as —CH(CH3)CH2—, —CH(CH3)CH(CH3)—, —C(CH3)2CH2—, —CH(CH2CH3)CH2—, and —C(CH2CH3)2—CH2—; alkyltrimethylene groups such as —CH(CH3)CH2CH2—, and —CH2CH(CH3)CH2—; and alkyltetramethylene groups such as —CH(CH3)CH2CH2CH2—, and —CH2CH(CH3)CH2CH2—. As the alkyl group in the alkylalkylene group, a linear alkyl group having 1 to 5 carbon atoms is preferable.
Examples of the aliphatic hydrocarbon group having a ring in the structure thereof include an alicyclic hydrocarbon group (a group in which two hydrogen atoms have been removed from an aliphatic hydrocarbon ring), a group in which the alicyclic hydrocarbon group is bonded to the terminal of the linear or branched aliphatic hydrocarbon group, and a group in which the alicyclic hydrocarbon group is interposed in the linear or branched aliphatic hydrocarbon group. Examples of the linear or branched aliphatic hydrocarbon group include the same groups as those for the linear aliphatic hydrocarbon group or the branched aliphatic hydrocarbon group.
The alicyclic hydrocarbon group has preferably 3 to 20 carbon atoms and more preferably 3 to 12 carbon atoms.
The alicyclic hydrocarbon group may be monocyclic or polycyclic. As the monocyclic alicyclic hydrocarbon group, a group in which two hydrogen atoms have been removed from a monocycloalkane is preferable. The monocycloalkane has preferably 3 to 6 carbon atoms, and specific examples thereof include cyclopentane and cyclohexane. As the polycyclic alicyclic hydrocarbon group, a group in which two hydrogen atoms have been removed from a polycycloalkane is preferable. As the polycycloalkane, a group having 7 to 12 carbon atoms is preferable. Specific examples thereof include adamantane, norbornane, isobornane, tricyclodecane, and tetracyclododecane.
The aromatic hydrocarbon group as the divalent hydrocarbon group represented by Va1 is a hydrocarbon group having an aromatic ring.
The aromatic hydrocarbon group has preferably 3 to 30 carbon atoms, more preferably 5 to 30 carbon atoms, still more preferably 5 to 20 carbon atoms, particularly preferably 6 to 15 carbon atoms, and most preferably 6 to 12 carbon atoms. Here, the number of carbon atoms in a substituent is not included in the number of carbon atoms.
Specific examples of the aromatic ring contained in the aromatic hydrocarbon group include aromatic hydrocarbon rings such as benzene, biphenyl, fluorene, naphthalene, anthracene, and phenanthrene; and aromatic hetero rings in which some carbon atoms constituting the above-described aromatic hydrocarbon rings have been substituted with hetero atoms. Examples of the hetero atom in the aromatic hetero rings include an oxygen atom, a sulfur atom, and a nitrogen atom.
Specific examples of the aromatic hydrocarbon group include a group in which two hydrogen atoms have been removed from the above-described aromatic hydrocarbon ring (an arylene group); and a group in which one hydrogen atom of a group (an aryl group) formed by removing one hydrogen atom from the aromatic hydrocarbon ring has been substituted with an alkylene group (for example, a group formed by further removing one more hydrogen atom from an aryl group in an arylalkyl group such as a benzyl group, a phenethyl group, a 1-naphthylmethyl group, a 2-naphthylmethyl group, a 1-naphthylethyl group, or a 2-naphthylethyl group). The alkylene group (an alkyl chain in the arylalkyl group) has preferably 1 to 4 carbon atoms, more preferably 1 or 2 carbon atoms, and particularly preferably 1 carbon atom.
In Formula (a1-1), Ra1 represents an acid dissociable group represented by Formula (a1-r-1) or (a1-r-2).
In Formula (a1-2), the (na2+1)-valent hydrocarbon group as Wa1 may be an aliphatic hydrocarbon group or an aromatic hydrocarbon group. The aliphatic hydrocarbon group indicates a hydrocarbon group that has no aromaticity and may be saturated or unsaturated. In general, it is preferable that the aliphatic hydrocarbon group is saturated. Examples of the aliphatic hydrocarbon group include a linear or branched aliphatic hydrocarbon group, an aliphatic hydrocarbon group having a ring in the structure thereof, and a group obtained by combining the linear or branched aliphatic hydrocarbon group and the aliphatic hydrocarbon group having a ring in the structure thereof.
The valency of na2+1 is preferably divalent, trivalent, or tetravalent and more preferably divalent or trivalent.
In Formula (a1-2), Ra2 represents an acid dissociable group represented by Formula (a1-r-1) or (a1-r-3).
Specific examples of the constitutional unit represented by Formula (a1-1 are shown below. In the formulae shown below, Ra represents a hydrogen atom, a methyl group, or a trifluoromethyl group.
Specific examples of the constitutional unit represented by Formula (a1-2) are shown below.
The constitutional unit (a1) included in the component (A1) may be used alone or two or more kinds thereof.
Since the lithography characteristics (the sensitivity, the shape, and the like) are easily improved using electron beams or EUV, a constitutional unit represented by Formula (a1-1) is preferable as the constitutional unit (a1).
Among the examples, as the constitutional unit (a1), those having a constitutional unit represented by Formula (a1-1-1) are particularly preferable.
[In the formulae, Ra1″ represents an acid dissociable group represented by Formula (a1-r2-1) or (a1-r2-4).]
In Formula (a1-1-1), R, Va1, and na1 each have the same definition as that for R, Va1, and na1 in Formula (a1-1).
The description of the acid dissociable group represented by Formula (a1-r2-1) or (a1-r2-4) is the same as the description above. Among these, it is preferable to select those in which the acid dissociable group is a cyclic group because the reactivity is enhanced for EB or EUV, which is preferable.
The proportion of the constitutional unit (a1) in the component (A1) is preferably in a range of 1% to 80% by mole with respect to the total amount (100% by mole) of all constitutional units constituting the component (A1).
By setting the proportion of the constitutional unit (a1) to be greater than or equal to the lower limit of the above-described preferable range, lithography characteristics of enhancement of the sensitivity and the resolution and reduction of the roughness are improved. Further, in a case where the proportion of the constitutional unit (a1) is less than or equal to the upper limit of the above-described preferable range, the constitutional unit (a1) and other constitutional units can be balanced, and the lithography characteristics are improved.
In Regard to Constitutional Unit (a2):
The component (A1) may have a constitutional unit (a2) (here, those corresponding to the constitutional unit (a01) and the constitutional unit (a1) are excluded) containing a lactone-containing cyclic group, a cyclic anhydride-containing cyclic group, a —SO2-containing cyclic group, or a carbonate-containing cyclic group.
In a case where the component (A1) is used for forming a resist film, the lactone-containing cyclic group, the cyclic anhydride-containing cyclic group, the —SO2-containing cyclic group, or the carbonate-containing cyclic group in the constitutional unit (a2) is effective for improving the adhesiveness of the resist film to the substrate. Further, in a case where the component (A1) contains the constitutional unit (a2), the lithography characteristics and the like are improved due to the effects of appropriately adjusting the acid diffusion length, increasing the adhesiveness of the resist film to the substrate, and appropriately adjusting the solubility during the development.
The “lactone-containing cyclic group” indicates a cyclic group that has a ring (lactone ring) containing —O—C(═O)— in the ring skeleton. In a case where the lactone ring is counted as the first ring and the group contains only the lactone ring, the group is referred to as a monocyclic group. Further, in a case where the group has other ring structures, the group is referred to as a polycyclic group regardless of the structures. The lactone-containing cyclic group may be a monocyclic group or a polycyclic group.
The lactone-containing cyclic group in the constitutional unit (a2) is not particularly limited, and an optional constitutional unit can be used. Specific examples thereof include groups respectively represented by Formulae (a2-r-1) to (a2-r-8) described below.
[In the formulae, each Ra′21 independently represents a hydrogen atom, an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxyl group, —COOR″, —OC(═O)R″, a hydroxyalkyl group, or a cyano group; R″ represents a hydrogen atom, an alkyl group, a lactone-containing cyclic group, a carbonate-containing cyclic group, or a —SO2-containing cyclic group; A″ represents an alkylene group having 1 to 5 carbon atoms which may contain an oxygen atom (—O—) or a sulfur atom (—S—), an oxygen atom, or a sulfur atom; n′ represents an integer of 0 to 2; and m′ represents 0 or 1. In Formula (a2-r-8), “” represents a single bond or a double bond. The symbol * represents a bonding site.]
In Formulae (a2-r-1) to (a2-r-7), it is preferable that the alkyl group as Ra′21 is an alkyl group having 1 to 6 carbon atom. Further, it is preferable that the alkyl group is linear or branched. Specific examples thereof include a methyl group, an ethyl group, a propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a tert-butyl group, a pentyl group, an isopentyl group, a neopentyl group, and a hexyl group. Among these, a methyl group or ethyl group is preferable, and a methyl group is particularly preferable.
It is preferable that the alkoxy group as Ra′21 is an alkoxy group having 1 to 6 carbon atoms. Further, it is preferable that the alkoxy group is linear or branched. Specific examples of the alkoxy groups include a group formed by linking the above-described alkyl group exemplified as the alkyl group represented by Ra′21 to an oxygen atom (—O—).
Examples of the halogen atom as Ra′21 include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom. Among these, a fluorine atom is preferable.
Examples of the halogenated alkyl group as Ra′21 include groups in which some or all hydrogen atoms in the alkyl group as Ra′21 have been substituted with the halogen atoms. As the halogenated alkyl group, a fluorinated alkyl group is preferable, and a perfluoroalkyl group is particularly preferable.
In —COOR″ and —OC(═O)R″ as Ra′21, R″ represents a hydrogen atom, an alkyl group, a lactone-containing cyclic group, a carbonate-containing cyclic group, or a —SO2— containing cyclic group.
The alkyl group as R″ may be linear, branched, or cyclic and preferably has 1 to 15 carbon atoms.
In a case where R″ represents a linear or branched alkyl group, an alkyl group having 1 to 10 carbon atoms is preferable, an alkyl group having 1 to 5 carbon atoms is more preferable, and a methyl group or an ethyl group is particularly preferable.
In a case where R″ represents a cyclic alkyl group, the number of carbon atoms thereof is preferably in a range of 3 to 15, more preferably in a range of 4 to 12, and most preferably in a range of 5 to 10. Specific examples thereof include groups in which one or more hydrogen atoms have been removed from a monocycloalkane, which may or may not be substituted with a fluorine atom or a fluorinated alkyl group; and groups in which one or more hydrogen atoms have been removed from a polycycloalkane such as bicycloalkane, tricycloalkane, or tetracycloalkane. More specific examples thereof include groups in which one or more hydrogen atoms have been removed from a monocycloalkane such as cyclopentane or cyclohexane; and groups in which one or more hydrogen atoms have been removed from a polycycloalkane such as adamantane, norbornane, isobornane, tricyclodecane, or tetracyclododecane.
Examples of the lactone-containing cyclic group as R″ include those exemplified as the groups represented by Formulae (a2-r-1) to (a2-r-8).
The carbonate-containing cyclic group as R″ has the same definition as that for the carbonate-containing cyclic group described below. Specific examples of the carbonate-containing cyclic group include groups respectively represented by Formulae (ax3-r-1) to (ax3-r-3).
The —SO2-containing cyclic group as R″ has the same definition as that for the —SO2-containing cyclic group described below. Specific examples of the —SO2-containing cyclic group include groups respectively represented by Formulae (a5-r-1) to (a5-r-4).
As the hydroxyalkyl group as Ra′21, a hydroxyalkyl group having 1 to 6 carbon atoms is preferable, and specific examples thereof include a group in which at least one hydrogen atom in the alkyl group as Ra′21 has been substituted with a hydroxyl group.
In Formulae (a2-r-2), (a2-r-3) and (a2-r-5), as the alkylene group having 1 to 5 carbon atoms as A″, a linear or branched alkylene group is preferable, and examples thereof include a methylene group, an ethylene group, an n-propylene group, and an isopropylene group. In a case where the alkylene group has an oxygen atom or a sulfur atom, specific examples thereof include groups in which —O— or —S— is interposed in the terminal of the alkylene group or between the carbon atoms of the alkylene group. Further, examples thereof include —O—CH2—, —CH2—O—CH2—, —S—CH2—, and —CH2—S—CH2—. As A″, an alkylene group having 1 to 5 carbon atoms or —O— is preferable, an alkylene group having 1 to 5 carbon atoms is more preferable, and a methylene group is most preferable.
Specific examples of the groups respectively represented by Formulae (a2-r-1) to (a2-r-8) are described below.
The “cyclic anhydride-containing cyclic group” is a cyclic group that has a ring (cyclic anhydride) containing —C(═O)—OC(═O)— in a ring skeleton.
The cyclic anhydride-containing cyclic group may be a monocyclic group or a polycyclic group. In a case where the cyclic anhydride is counted as the first ring and the cyclic group contains only the cyclic anhydride, the group is referred to as a monocyclic group. Further, in a case where the cyclic group has other ring structures, the group is referred to as a polycyclic group regardless of the structures thereof.
Specific examples of the cyclic anhydride-containing cyclic group include a group represented by the following formula (r-aa-1). The symbol * represents a bonding site.
The “—SO2-containing cyclic group” indicates a cyclic group that has a ring containing —SO2— in the ring skeleton thereof. Specifically, the —SO2-containing cyclic group is a cyclic group in which the sulfur atom (S) in —SO2— forms a part of the ring skeleton of the cyclic group. In a case where the ring containing —SO2— in the ring skeleton thereof is counted as the first ring and the group contains only the ring, the group is referred to as a monocyclic group. Further, in a case where the group has other ring structures, the group is referred to as a polycyclic group regardless of the structures. The —SO2-containing cyclic group may be a monocyclic group or a polycyclic group.
As the —SO2-containing cyclic group, a cyclic group containing —O—SO2— in the ring skeleton thereof, that is, a cyclic group having a sultone ring in which —O—S— in —O—SO2— forms a part of the ring skeleton thereof is particularly preferable.
More specific examples of the —SO2-containing cyclic group include groups respectively represented by Formulae (a5-r-1) to (a5-r-4) shown below.
[In the formulae, each Ra′51 independently represents a hydrogen atom, an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxyl group, —COOR″, —OC(═O)R″, a hydroxyalkyl group, or a cyano group, R″ represents a hydrogen atom, an alkyl group, a lactone-containing cyclic group, a carbonate-containing cyclic group, or a —SO2-containing cyclic group, A″ represents an alkylene group having 1 to 5 carbon atoms which may contain an oxygen atom or a sulfur atom, an oxygen atom, or a sulfur atom, and n′ represents an integer of 0 to 2.]
In Formulae (a5-r-1) and (a5-r-2), A″ has the same definition as that for A″ in Formulae (a2-r-2), (a2-r-3) and (a2-r-5).
Examples of the alkyl group, the alkoxy group, the halogen atom, the halogenated alkyl group, —COOR″, —OC(═O)R″, and the hydroxyalkyl group as Ra′51 include the same groups as those for Ra′21 in Formulae (a2-r-1) to (a2-r-7).
Specific examples of the groups respectively represented by Formulae (a5-r-1) to (a5-r-4) are shown below. In the formulae shown below, “Ac” represents an acetyl group.
The “carbonate-containing cyclic group” indicates a cyclic group that has a ring (a carbonate ring) containing —O—C(═O)—O— in the ring skeleton thereof. In a case where the carbonate ring is counted as the first ring and the group has only the carbonate ring, the group is referred to as a monocyclic group. Further, in a case where the group has other ring structures, the group is referred to as a polycyclic group regardless of the structures. The carbonate-containing cyclic group may be a monocyclic group or a polycyclic group.
The carbonate ring-containing cyclic group is not particularly limited, and an optional group can be used. Specific examples thereof include groups respectively represented by Formulae (ax3-r-1) to (ax3-r-3) shown below.
[In the formulae, each Ra′x31 independently represents a hydrogen atom, an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxyl group, —COOR″, —OC(═O)R″, a hydroxyalkyl group, or a cyano group, R″ represents a hydrogen atom, an alkyl group, a lactone-containing cyclic group, a carbonate-containing cyclic group, or a —SO2-containing cyclic group, A″ represents an alkylene group having 1 to 5 carbon atoms which may contain an oxygen atom or a sulfur atom, an oxygen atom, or a sulfur atom, p′ represents an integer of 0 to 3, and q′ represents 0 or 1.]
In Formulae (ax3-r-2) and (ax3-r-3), A″ has the same definition as that for A″ in Formulae (a2-r-2), (a2-r-3) and (a2-r-5).
Examples of the alkyl group, the alkoxy group, the halogen atom, the halogenated alkyl group, —COOR″, —OC(═O)R″, and the hydroxyalkyl group as Ra′31 include the same groups as those for Ra′21 in Formulae (a2-r-1) to (a2-r-7).
Specific examples of the groups respectively represented by Formulae (ax3-r-1) to (ax3-r-3) are shown below.
As the constitutional unit (a2), a constitutional unit derived from acrylic acid ester in which the hydrogen atom bonded to the carbon atom at the α-position may be substituted with a substituent is preferable.
It is preferable that such a constitutional unit (a2) is a constitutional unit represented by Formula (a2-1).
[In the formula, R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms. Ya21 represents a single bond or a divalent linking group. La21 represents —O—, —COO—, —CON(R′)—, —OCO—, —CONHCO—, or —CONHCS—, and R′ represents a hydrogen atom or a methyl group. In a case where La21 represents —O—, Ya21 does not represents —CO—. Ra21 represents a lactone-containing cyclic group, a cyclic anhydride-containing cyclic group, a carbonate-containing cyclic group, or a —SO2-containing cyclic group.]
In Formula (a2-1), R has the same definition as described above. As R, a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a fluorinated alkyl group having 1 to 5 carbon atoms is preferable, and a hydrogen atom or a methyl group is particularly preferable from the viewpoint of the industrial availability.
In Formula (a2-1), the divalent linking group as Ya21 is not particularly limited, and suitable examples thereof include a divalent hydrocarbon group which may have a substituent and a divalent linking group having hetero atoms.
Divalent Hydrocarbon Group which May have Substituent:
In a case where Ya21 represents a divalent hydrocarbon group which may have a substituent, the hydrocarbon group may be an aliphatic hydrocarbon group or an aromatic hydrocarbon group.
Aliphatic Hydrocarbon Group as Ya21
The aliphatic hydrocarbon group indicates a hydrocarbon group that has no aromaticity. The aliphatic hydrocarbon group may be saturated or unsaturated. In general, it is preferable that the aliphatic hydrocarbon group is saturated.
Examples of the aliphatic hydrocarbon group include a linear or branched aliphatic hydrocarbon group, and an aliphatic hydrocarbon group having a ring in the structure thereof.
Linear or Branched Aliphatic Hydrocarbon Group
The linear aliphatic hydrocarbon group has preferably 1 to 10 carbon atoms, more preferably 1 to 6 carbon atoms, still more preferably 1 to 4 carbon atoms, and most preferably 1 to 3 carbon atoms.
As the linear aliphatic hydrocarbon group, a linear alkylene group is preferable. Specific examples thereof include a methylene group [—CH2—], an ethylene group [—(CH2)2—], a trimethylene group [—(CH2)3—], a tetramethylene group [—(CH2)4—], and a pentamethylene group [—(CH2)5—].
The branched aliphatic hydrocarbon group has preferably 2 to 10 carbon atoms, more preferably 3 to 6 carbon atoms, still more preferably 3 or 4 carbon atoms, and most preferably 3 carbon atoms.
As the branched aliphatic hydrocarbon group, a branched alkylene group is preferable, and specific examples thereof include alkylalkylene groups, for example, alkylmethylene groups such as —CH(CH3)—, —CH(CH2CH3)—, —C(CH3)2—, —C(CH3)(CH2CH3)—, —C(CH3)(CH2CH2CH3)—, and —C(CH2CH3)2—; alkylethylene groups such as —CH(CH3)CH2—, —CH(CH3)CH(CH3)—, —C(CH3)2CH2—, —CH(CH2CH3)CH2—, and —C(CH2CH3)2—CH2—; alkyltrimethylene groups such as —CH(CH3)CH2CH2—, and —CH2CH(CH3)CH2—; and alkyltetramethylene groups such as —CH(CH3)CH2CH2CH2—, and —CH2CH(CH3)CH2CH2—. As the alkyl group in the alkylalkylene group, a linear alkyl group having 1 to 5 carbon atoms is preferable.
The linear or branched aliphatic hydrocarbon group may or may not have a substituent. Examples of the substituent include a fluorine atom, a fluorinated alkyl group having 1 to 5 carbon atoms which has been substituted with a fluorine atom, and a carbonyl group.
Aliphatic Hydrocarbon Group Having Ring in Structure Thereof
Examples of the aliphatic hydrocarbon group having a ring in the structure thereof include a cyclic aliphatic hydrocarbon group which may have a substituent having a hetero atom in the ring structure thereof (a group in which two hydrogen atoms have been removed from an aliphatic hydrocarbon ring), a group in which the cyclic aliphatic hydrocarbon group is bonded to the terminal of a linear or branched aliphatic hydrocarbon group, and a group in which the cyclic aliphatic hydrocarbon group is interposed in a linear or branched aliphatic hydrocarbon group. Examples of the linear or branched aliphatic hydrocarbon group include the same groups as those described above.
The cyclic aliphatic hydrocarbon group has preferably 3 to 20 carbon atoms and more preferably 3 to 12 carbon atoms.
The cyclic aliphatic hydrocarbon group may be a polycyclic group or a monocyclic group. As the monocyclic alicyclic hydrocarbon group, a group in which two hydrogen atoms have been removed from a monocycloalkane is preferable. The monocycloalkane has preferably 3 to 6 carbon atoms, and specific examples thereof include cyclopentane and cyclohexane. As the polycyclic alicyclic hydrocarbon group, a group in which two hydrogen atoms have been removed from a polycycloalkane is preferable. As the polycycloalkane, a group having 7 to 12 carbon atoms is preferable. Specific examples of the polycycloalkane include adamantane, norbornane, isobornane, tricyclodecane, and tetracyclododecane.
The cyclic aliphatic hydrocarbon group may or may not have a substituent. Examples of the substituent include an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxyl group, and a carbonyl group.
As the alkyl group as the substituent, an alkyl group having 1 to 5 carbon atoms is preferable, and a methyl group, an ethyl group, a propyl group, an n-butyl group, or a tert-butyl group is more preferable.
As the alkoxy group as the substituent, an alkoxy group having 1 to 5 carbon atoms is preferable, and a methoxy group, an ethoxy group, an n-propoxy group, an iso-propoxy group, an n-butoxy group, or a tert-butoxy group is more preferable, and a methoxy group or an ethoxy group is still more preferable.
Examples of the halogen atom as the substituent include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom. Among these, a fluorine atom is preferable.
Examples of the halogenated alkyl group as the substituent include groups in which some or all hydrogen atoms in the above-described alkyl groups have been substituted with the above-described halogen atoms.
In the cyclic aliphatic hydrocarbon group, some carbon atoms constituting the ring structure thereof may be substituted with a substituent having a hetero atom. As the substituent having a hetero atom, —O—, —C(═O)—O—, —S—, —S(═O)2—, or —S(═O)2—O— is preferable.
Aromatic Hydrocarbon Group as Ya21
The aromatic hydrocarbon group is a hydrocarbon group having at least one aromatic ring.
The aromatic ring is not particularly limited as long as the aromatic ring is a cyclic conjugated system having (4n+2) π electrons and may be monocyclic or polycyclic. The aromatic ring has preferably 5 to 30 carbon atoms, more preferably 5 to 20 carbon atoms, still more preferably 6 to 15 carbon atoms, and particularly preferably 6 to 12 carbon atoms. Here, the number of carbon atoms in a substituent is not included in the number of carbon atoms.
Specific examples of the aromatic ring include aromatic hydrocarbon rings such as benzene, naphthalene, anthracene, and phenanthrene; and aromatic hetero rings in which some carbon atoms constituting the above-described aromatic hydrocarbon rings have been substituted with hetero atoms. Examples of the hetero atom in the aromatic hetero rings include an oxygen atom, a sulfur atom, and a nitrogen atom. Specific examples of the aromatic hetero ring include a pyridine ring and a thiophene ring.
Specific examples of the aromatic hydrocarbon group include a group in which two hydrogen atoms have been removed from the above-described aromatic hydrocarbon ring or aromatic hetero ring (an arylene group or a heteroarylene group); a group in which two hydrogen atoms have been removed from an aromatic compound having two or more aromatic rings (such as biphenyl or fluorene); and a group in which one hydrogen atom of a group (an aryl group or a heteroaryl group) obtained by removing one hydrogen atom from the above-described aromatic hydrocarbon ring or aromatic hetero ring has been substituted with an alkylene group (for example, a group obtained by further removing one hydrogen atom from an aryl group in an arylalkyl group such as a benzyl group, a phenethyl group, a 1-naphthylmethyl group, a 2-naphthylmethyl group, a 1-naphthylethyl group, or a 2-naphthylethyl group). The number of carbon atoms in the alkylene group bonded to the aryl group or the heteroaryl group is preferably in a range of 1 to 4, more preferably 1 or 2, and particularly preferably 1.
In the aromatic hydrocarbon group, the hydrogen atom in the aromatic hydrocarbon group may be substituted with a substituent. For example, the hydrogen atom bonded to the aromatic ring in the aromatic hydrocarbon group may be substituted with a substituent. Examples of substituents include an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, and a hydroxyl group.
As the alkyl group as the substituent, an alkyl group having 1 to 5 carbon atoms is preferable, and a methyl group, an ethyl group, a propyl group, an n-butyl group, or a tert-butyl group is more preferable.
As the alkoxy group, the halogen atom, and the halogenated alkyl group as the substituents, the same groups as the above-described substituent groups that substitute a hydrogen atom in the cyclic aliphatic hydrocarbon group can be exemplified.
Divalent Linking Group Having Hetero Atom:
In a case where Ya21 represents a divalent linking group having a hetero atom, preferred examples of the linking group include —O—, —C(═O)—O—, —O—C(═O)—, —C(═O)—, —O—C(═O)—O—, —C(═O)—NH—, —NH—, —NH—C(═NH)— (H may be substituted with a substituent such as an alkyl group, an acyl group, or the like), —S—, —S(═O)2—, —S(═O)2—O—, and a group represented by Formula: —Y2—O—Y22, —Y21—O—, —Y21—C(═O)—O—, —C(═O)—O—Y2—, —[Y21—C(═O)—O]m″—Y22—, —Y21—O—C(═O)—Y22—, or —Y2—S(═O)2—O—Y22— [in the formulae, Y21 and Y22 each independently represent a divalent hydrocarbon group which may have a substituent, O represents an oxygen atom, and m″ represents an integer of 0 to 3].
In a case where the divalent linking group containing a hetero atom is —C(═O)—NH—, —C(═O)—NH—C(═O)—, —NH—, or —NH—C(═NH)—, H may be substituted with a substituent such as an alkyl group, an acyl group, or the like. The substituent (an alkyl group, an acyl group, or the like) has preferably 1 to 10 carbon atoms, more preferably 1 to 8 carbon atoms, and particularly preferably 1 to 5 carbon atoms.
In Formula —Y21—O—Y22—, —Y21—O, —Y21—C(═O)—O—, —C(═O)—O—Y21—, —Y21—C(═O)—O]m″—Y22, —Y21—O—C(═O)—Y22—, or —Y21—S(═O)2—O—Y22—Y21 and Y22 each independently represent a divalent hydrocarbon group which may have a substituent. Examples of the divalent hydrocarbon group include the same groups (the divalent hydrocarbon groups which may have a substituent) as those for the above-described divalent linking group as Ya21.
As Y21, a linear aliphatic hydrocarbon group is preferable, a linear alkylene group is more preferable, a linear alkylene group having 1 to 5 carbon atoms is still more preferable, and a methylene group or an ethylene group is particularly preferable.
As Y22, a linear or branched aliphatic hydrocarbon group is preferable, and a methylene group, an ethylene group, or an alkylmethylene group is more preferable. The alkyl group in the alkylmethylene group is preferably a linear alkyl group having 1 to 5 carbon atoms, more preferably a linear alkyl group having 1 to 3 carbon atoms, and most preferably a methyl group.
In the group represented by Formula —[Y21—C(═O)—O]m″—Y22—, m″ represents an integer of 0 to 3, preferably an integer of 0 to 2, more preferably 0 or 1, and particularly preferably 1. That is, a group represented by Formula —Y21—C(═O)—O—Y22— is preferable as the group represented by Formula —[Y21—C(═O)—O]m″—Y22—. Among these, a group represented by Formula —(CH2)a′—C(═O)—O—(CH2)b′— is preferable. In the formula, a′ represents an integer of 1 to 10, preferably an integer of 1 to 8, more preferably an integer of 1 to 5, still more preferably 1 or 2, and most preferably 1. b′ represents an integer of 1 to 10, preferably an integer of 1 to 8, more preferably an integer of 1 to 5, still more preferably 1 or 2, and most preferably 1.
It is preferable that Ya21 represents a single bond, an ester bond [—C(═O)—O—], an ether bond (—O—), a linear or branched alkylene group, or a combination thereof.
In Formula (a2-1), Ra21 represents a lactone-containing cyclic group, a cyclic anhydride-containing cyclic group, a —SO2-containing cyclic group, or a carbonate-containing cyclic group.
Suitable examples of the lactone-containing cyclic group, the cyclic anhydride-containing cyclic group, the —SO2-containing cyclic group, and the carbonate-containing cyclic group as Ra21 include groups respectively represented by Formulae (a2-r-1) to (a2-r-8), groups represented by Formula (r-aa-1), groups respectively represented by Formulae (a5-r-1) to (a5-r-4), and groups respectively represented by Formulae (ax3-r-1) to (ax3-r-3).
Among the examples, Ra21 represents preferably a lactone-containing cyclic group or a —SO2-containing cyclic group and more preferably a group represented by Formula (a2-r-1), (a2-r-2), (a2-r-6) or (a5-r-1). Specifically, a group represented by any of Chemical Formulae (r-lc-1-1) to (r-lc-1-7), (r-lc-2-1) to (r-lc-2-18), (r-lc-6-1), (r-sl-1-1), and (r-sl-1-18) is more preferable.
The constitutional unit (a2) included in the component (A1) may be used alone or two or more kinds thereof.
In a case where the component (A1) has the constitutional unit (a2), the proportion of the constitutional unit (a2) in the component (A1) is preferably in a range of 5% to 60% by mole, more preferably in a range of 10% to 60% by mole, still more preferably in a range of 20% to 55% by mole, and particularly preferably in a range of 30% to 50% by mole with respect to the total amount (100% by mole) of all constitutional units constituting the component (A1).
In a case where the proportion of the constitutional unit (a2) is set to be greater than or equal to the lower limit of the above-described preferable range, the effect to be obtained by allowing the component (A1) to have the constitutional unit (a2) is sufficiently obtained by the above-described effects. Further, in a case where the proportion thereof is set to be less than or equal to the upper limit of the above-described preferable range, the constitutional unit (a2) and other constitutional units can be balanced, and the lithography characteristics are improved.
In Regard to Constitutional Unit (a3):
The component (A1) may further have a constitutional unit (a3) containing a polar group-containing aliphatic hydrocarbon group (here, those corresponding to the constitutional unit (a0), the constitutional unit (a1), or the constitutional unit (a2) are excluded). In a case where the component (A1) has the constitutional unit (a3), the hydrophilicity of the component (A) is increased, which contributes to improvement of the resolution. Further, the acid diffusion length can be appropriately adjusted.
Examples of the polar group include a hydroxyl group, a cyano group, a carboxy group, or a hydroxyalkyl group in which some hydrogen atoms in the alkyl group have been substituted with fluorine atoms. Among these, a hydroxyl group is particularly preferable.
Examples of the aliphatic hydrocarbon group include a linear or branched hydrocarbon group (preferably an alkylene group) having 1 to 10 carbon atoms and a cyclic aliphatic hydrocarbon group (a cyclic group). The cyclic group may be a monocyclic group or a polycyclic group. For example, the cyclic group can be appropriately selected from the plurality of groups that have been proposed in the resins for resist compositions for ArF excimer lasers.
In a case where the cyclic group is a monocyclic group, the number of carbon atoms is preferably in a range of 3 to 10. Among the examples, constitutional units derived from acrylic acid ester that include an aliphatic monocyclic group containing a hydroxyl group, a cyano group, a carboxy group, or a hydroxyalkyl group in which some hydrogen atoms in the alkyl group have been substituted with fluorine atoms are more preferable. Examples of the monocyclic group include groups obtained by removing two or more hydrogen atoms from a monocycloalkane. Specific examples include groups obtained by removing two or more hydrogen atoms from monocycloalkanes such as cyclopentane, cyclohexane, and cyclooctane. Among these monocyclic groups, a group obtained by removing two or more hydrogen atoms from cyclopentane and a group obtained by removing two or more hydrogen atoms from cyclohexane are industrially preferable.
In a case where the cyclic group is a polycyclic group, the number of carbon atoms in the polycyclic group is more preferably in a range of 7 to 30. Among the examples, constitutional units derived from acrylic acid ester that include an aliphatic polycyclic group containing a hydroxyl group, a cyano group, a carboxy group, or a hydroxyalkyl group in which some hydrogen atoms in the alkyl group have been substituted with fluorine atoms are more preferable. Examples of the polycyclic group include groups in which two or more hydrogen atoms have been removed from bicycloalkane, tricycloalkane, tetracycloalkane, or the like. Specific examples thereof include groups in which two or more hydrogen atoms have been removed from a polycycloalkane such as adamantane, norbornane, isobornane, tricyclodecane, or tetracyclododecane. Among these polycyclic groups, a group in which two or more hydrogen atoms have been removed from adamantane, a group in which two or more hydrogen atoms have been removed from norbornane, or a group in which two or more hydrogen atoms have been removed from tetracyclododecane is industrially preferable.
The constitutional unit (a3) is not particularly limited as long as the constitutional unit contains a polar group-containing aliphatic hydrocarbon group, and an optional constitutional unit can be used.
As the constitutional unit (a3), a constitutional unit derived from acrylic acid ester in which the hydrogen atom bonded to the carbon atom at the α-position may be substituted with a substituent, which is a constitutional unit containing a polar group-containing aliphatic hydrocarbon group is preferable.
In a case where the hydrocarbon group in the polar group-containing aliphatic hydrocarbon group is a linear or branched hydrocarbon group having 1 to 10 carbon atoms, a constitutional unit derived from hydroxyethyl ester of acrylic acid is preferable as the constitutional unit (a3).
Further, in a case where the hydrocarbon group in the polar group-containing aliphatic hydrocarbon group is a polycyclic group, a constitutional unit represented by Formula (a3-1), a constitutional unit represented by Formula (a3-2), or a constitutional unit represented by Formula (a3-3) is preferable as the constitutional unit (a3). Further, in a case where the hydrocarbon group in the polar group-containing aliphatic hydrocarbon group is a monocyclic group, a constitutional unit represented by Formula (a3-4) is preferable as the constitutional unit (a3).
[In the formulae, R has the same definition as described above, j represents an integer of 1 to 3, k represents an integer of 1 to 3, t′ represents an integer of 1 to 3, 1 represents an integer of 0 to 5, and s represents an integer of 1 to 3.]
In Formula (a3-1), j represents preferably 1 or 2 and more preferably 1. In a case where j represents 2, it is preferable that the hydroxyl groups is bonded to the 3- and 5-positions of the adamantyl group. In a case where j represents 1, it is preferable that the hydroxyl group is bonded to the 3-position of the adamantyl group.
It is preferable that j represents 1, and it is particularly preferable that the hydroxyl group is bonded to the 3-position of the adamantyl group.
In Formula (a3-2), it is preferable that k represents 1. It is preferable that the cyano group is bonded to the 5th or 6th position of the norbomyl group.
In Formula (a3-3), it is preferable that t′ represents 1. It is preferable that 1 represents 1. It is preferable that s represents 1. Further, it is preferable that a 2-norbomyl group or 3-norbomyl group is bonded to the terminal of the carboxy group of the acrylic acid. It is preferable that the fluorinated alkyl alcohol is bonded to the 5- or 6-position of the norbornyl group.
In Formula (a3-4), it is preferable that t′ represents 1 or 2. It is preferable that 1 represents 0 or 1. It is preferable that s represents 1. It is preferable that the fluorinated alkyl alcohol is bonded to the 3- or 5-position of the cyclohexyl group.
The constitutional unit (a3) included in the component (A1) may be used alone or two or more kinds thereof.
In a case where the component (A1) has the constitutional unit (a3), the proportion of the constitutional unit (a3) is preferably in a range of 1% to 30% by mole, more preferably in a range of 2% to 25% by mole, and still more preferably in a range of 5% to 20% by mole with respect to the total amount (100% by mole) of all constitutional units constituting the component (A1).
In a case where the proportion of the constitutional unit (a3) is set to be greater than or equal to the lower limit of the above-described preferable range, the effect to be obtained by allowing the component (A1) to have the constitutional unit (a3) is sufficiently obtained by the above-described effects. Further, in a case where the proportion thereof is set to be less than or equal to the upper limit of the above-described preferable range, the constitutional unit (a3) and other constitutional units can be balanced, and the lithography characteristics are improved.
In Regard to Constitutional Unit (a4):
The component (A1) may further have a constitutional unit (a4) containing an acid non-dissociable aliphatic cyclic group.
In a case where the component (A1) has the constitutional unit (a4), the dry etching resistance of a resist pattern to be formed is improved. Further, the hydrophobicity of the component (A) is increased. The improvement of the hydrophobicity contributes to improvement of the resolution, the resist pattern shape, and the like particularly in a case of the solvent developing process.
The “acid non-dissociable cyclic group” in the constitutional unit (a4) is a cyclic group remaining in the constitutional unit without being dissociated due to the action of an acid in a case of generation of an acid in the resist composition upon exposure (for example, an acid is generated from the component (B) or a constitutional unit that generates an acid upon exposure).
As the constitutional unit (a4), for example, a constitutional unit derived from acrylic acid ester containing an acid non-dissociable aliphatic cyclic group is preferable. As the cyclic group, a plurality of cyclic groups which have been known in the related art as those used for resin components of resist compositions for an ArF excimer laser, a KrF excimer laser (preferably an ArF excimer laser), and the like can be used.
It is preferable that the cyclic group is at least one selected from a tricyclodecyl group, an adamantyl group, a tetracyclododecyl group, an isobornyl group, and a norbornyl group from the viewpoint of the industrial availability. These polycyclic groups may have a linear or branched alkyl group having 1 to 5 carbon atoms as a substituent.
Specific examples of the constitutional unit (a4) include constitutional units respectively represented by Formulae (a4-1) to (a4-7).
[In the formulae, Rα has the same definition as described above.]
The constitutional unit (a4) included in the component (A1) may be used alone or two or more kinds thereof.
In a case where the component (A1) contains the constitutional unit (a4), the proportion of the constitutional unit (a4) is preferably in a range of 1% to 40% by mole and more preferably in a range of 5% to 20% by mole with respect to the total amount (100% by mole) of all constitutional units constituting the component (A1).
In a case where the proportion of the constitutional unit (a4) is set to be greater than or equal to the lower limit of the above-described preferable range, the effect to be obtained by allowing the component (A1) to have the constitutional unit (a4) is sufficiently obtained by the above-described effects. Further, in a case where the proportion thereof is set to be less than or equal to the upper limit of the above-described preferable range, the constitutional unit (a4) and other constitutional units can be balanced.
In regard to constitutional unit (a10):
The constitutional unit (a10) is a constitutional unit represented by Formula (a10-1).
[In the Formula, R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms. Yax1 represents a single bond or a divalent linking group. Wax1 represents an (nax1+1)-valent aromatic hydrocarbon group. nax1 represents an integer of 1 or greater.]
In Formula (a10-1), R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms.
As the alkyl group having 1 to 5 carbon atoms represented by R, a linear or branched alkyl group having 1 to 5 carbon atoms is preferable, and specific examples thereof include a methyl group, an ethyl group, a propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a tert-butyl group, a pentyl group, an isopentyl group, and a neopentyl group.
The halogenated alkyl group having 1 to 5 carbon atoms as R is a group in which some or all hydrogen atoms of the above-described alkyl group having 1 to 5 carbon atoms have been substituted with halogen atoms. Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom. Among these, a fluorine atom is particularly preferable.
It is preferable that R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a fluorinated alkyl group having 1 to 5 carbon atoms. Further, from the viewpoint of the industrial availability, R represents more preferably a hydrogen atom, a methyl group, or a trifluoromethyl group, still more preferably a hydrogen atom or a methyl group, and particularly preferably a methyl group.
In Formula (a10-1), Yax1 represents a single bond or a divalent linking group.
In the chemical formula, the divalent linking group as Yax1 is not particularly limited, and suitable examples thereof include a divalent hydrocarbon group which may have a substituent and a divalent linking group having a hetero atom.
Divalent Hydrocarbon Group which May have Substituent:
In a case where Yax1 represents a divalent hydrocarbon group which may have a substituent, the hydrocarbon group may be an aliphatic hydrocarbon group or an aromatic hydrocarbon group.
Aliphatic Hydrocarbon Group as Yax1
The aliphatic hydrocarbon group indicates a hydrocarbon group that has no aromaticity. The aliphatic hydrocarbon group may be saturated or unsaturated. In general, it is preferable that the aliphatic hydrocarbon group is saturated.
Examples of the aliphatic hydrocarbon group include a linear or branched aliphatic hydrocarbon group, and an aliphatic hydrocarbon group having a ring in the structure thereof.
Linear or Branched Aliphatic Hydrocarbon Group
The linear aliphatic hydrocarbon group has preferably 1 to 10 carbon atoms, more preferably 1 to 6 carbon atoms, still more preferably 1 to 4 carbon atoms, and most preferably 1 to 3 carbon atoms.
As the linear aliphatic hydrocarbon group, a linear alkylene group is preferable. Specific examples thereof include a methylene group [—CH2—], an ethylene group [—(CH2)2—], a trimethylene group [—(CH2)3—], a tetramethylene group [—(CH2)4—], and a pentamethylene group [—(CH2)5—].
The branched aliphatic hydrocarbon group has preferably 2 to 10 carbon atoms, more preferably 3 to 6 carbon atoms, still more preferably 3 or 4 carbon atoms, and most preferably 3 carbon atoms.
As the branched aliphatic hydrocarbon group, a branched alkylene group is preferable, and specific examples thereof include alkylalkylene groups, for example, alkylmethylene groups such as —CH(CH3)—, —CH(CH2CH3)—, —C(CH3)2—, —C(CH3)(CH2CH3)—, —C(CH3)(CH2CH2CH3)—, and —C(CH2CH3)2—; alkylethylene groups such as —CH(CH3)CH2—, —CH(CH3)CH(CH3)—, —C(CH3)2CH2—, —CH(CH2CH3)CH2—, and —C(CH2CH3)2—CH2—; alkyltrimethylene groups such as —CH(CH3)CH2CH2—, and —CH2CH(CH3)CH2—; and alkyltetramethylene groups such as —CH(CH3)CH2CH2CH2—, and —CH2CH(CH3)CH2CH2—. As the alkyl group in the alkylalkylene group, a linear alkyl group having 1 to 5 carbon atoms is preferable.
The linear or branched aliphatic hydrocarbon group may or may not have a substituent. Examples of the substituent include a fluorine atom, a fluorinated alkyl group having 1 to 5 carbon atoms which has been substituted with a fluorine atom, and a carbonyl group.
Aliphatic Hydrocarbon Group Having Ring in Structure Thereof
Examples of the aliphatic hydrocarbon group having a ring in the structure thereof include a cyclic aliphatic hydrocarbon group which may have a substituent having a hetero atom in the ring structure thereof (a group in which two hydrogen atoms have been removed from an aliphatic hydrocarbon ring), a group in which the cyclic aliphatic hydrocarbon group is bonded to the terminal of a linear or branched aliphatic hydrocarbon group, and a group in which the cyclic aliphatic hydrocarbon group is interposed in a linear or branched aliphatic hydrocarbon group. Examples of the linear or branched aliphatic hydrocarbon group include the same groups as those described above.
The cyclic aliphatic hydrocarbon group has preferably 3 to 20 carbon atoms and more preferably 3 to 12 carbon atoms.
The cyclic aliphatic hydrocarbon group may be a polycyclic group or a monocyclic group. As the monocyclic alicyclic hydrocarbon group, a group in which two hydrogen atoms have been removed from a monocycloalkane is preferable. The monocycloalkane has preferably 3 to 6 carbon atoms, and specific examples thereof include cyclopentane and cyclohexane. As the polycyclic alicyclic hydrocarbon group, a group in which two hydrogen atoms have been removed from a polycycloalkane is preferable. As the polycycloalkane, a group having 7 to 12 carbon atoms is preferable. Specific examples of the polycycloalkane include adamantane, norbornane, isobornane, tricyclodecane, and tetracyclododecane.
The cyclic aliphatic hydrocarbon group may or may not have a substituent. Examples of the substituent include an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxyl group, and a carbonyl group.
As the alkyl group as the substituent, an alkyl group having 1 to 5 carbon atoms is preferable, and a methyl group, an ethyl group, a propyl group, an n-butyl group, or a tert-butyl group is more preferable.
As the alkoxy group as the substituent, an alkoxy group having 1 to 5 carbon atoms is preferable, and a methoxy group, an ethoxy group, an n-propoxy group, an iso-propoxy group, an n-butoxy group, or a tert-butoxy group is more preferable, and a methoxy group or an ethoxy group is still more preferable.
Examples of the halogen atom as the substituent include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom. Among these, a fluorine atom is preferable.
Examples of the halogenated alkyl group as the substituent include groups in which some or all hydrogen atoms in the above-described alkyl groups have been substituted with the above-described halogen atoms.
In the cyclic aliphatic hydrocarbon group, some carbon atoms constituting the ring structure thereof may be substituted with a substituent having a hetero atom. As the substituent having a hetero atom, —O—, —C(═O)—O—, —S—, —S(═O)2—, or —S(═O)2—O— is preferable.
Aromatic Hydrocarbon Group as Yax1
The aromatic hydrocarbon group is a hydrocarbon group having at least one aromatic ring.
The aromatic ring is not particularly limited as long as the aromatic ring is a cyclic conjugated system having (4n+2) 1 electrons and may be monocyclic or polycyclic. The aromatic ring has preferably 5 to 30 carbon atoms, more preferably 5 to 20 carbon atoms, still more preferably 6 to 15 carbon atoms, and particularly preferably 6 to 12 carbon atoms. Here, the number of carbon atoms in a substituent is not included in the number of carbon atoms.
Specific examples of the aromatic ring include aromatic hydrocarbon rings such as benzene, naphthalene, anthracene, and phenanthrene; and aromatic hetero rings in which some carbon atoms constituting the above-described aromatic hydrocarbon rings have been substituted with hetero atoms. Examples of the hetero atom in the aromatic hetero rings include an oxygen atom, a sulfur atom, and a nitrogen atom. Specific examples of the aromatic hetero ring include a pyridine ring and a thiophene ring.
Specific examples of the aromatic hydrocarbon group include a group in which two hydrogen atoms have been removed from the above-described aromatic hydrocarbon ring or aromatic hetero ring (an arylene group or a heteroarylene group); a group in which two hydrogen atoms have been removed from an aromatic compound having two or more aromatic rings (such as biphenyl or fluorene); and a group in which one hydrogen atom of a group (an aryl group or a heteroaryl group) obtained by removing one hydrogen atom from the above-described aromatic hydrocarbon ring or aromatic hetero ring has been substituted with an alkylene group (for example, a group obtained by further removing one hydrogen atom from an aryl group in an arylalkyl group such as a benzyl group, a phenethyl group, a 1-naphthylmethyl group, a 2-naphthylmethyl group, a 1-naphthylethyl group, or a 2-naphthylethyl group). The number of carbon atoms in the alkylene group bonded to the aryl group or the heteroaryl group is preferably in a range of 1 to 4, more preferably 1 or 2, and particularly preferably 1.
In the aromatic hydrocarbon group, the hydrogen atom in the aromatic hydrocarbon group may be substituted with a substituent. For example, the hydrogen atom bonded to the aromatic ring in the aromatic hydrocarbon group may be substituted with a substituent. Examples of substituents include an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, and a hydroxyl group.
As the alkyl group as the substituent, an alkyl group having 1 to 5 carbon atoms is preferable, and a methyl group, an ethyl group, a propyl group, an n-butyl group, or a tert-butyl group is more preferable.
As the alkoxy group, the halogen atom, and the halogenated alkyl group as the substituents, the same groups as the above-described substituent groups that substitute a hydrogen atom in the cyclic aliphatic hydrocarbon group can be exemplified.
Divalent Linking Group Having Hetero Atom:
In a case where Yax1 represents a divalent linking group having a hetero atom, preferred examples of the linking group include —O—, —C(═O)—O—, —O—C(═O)—, —C(═O)—, —O—C(═O)—O—, —C(═O)—NH—, —NH—, —NH—C(═NH)— (H may be substituted with a substituent such as an alkyl group or an acyl group), —S—, —S(═O)2—, —S(═O)2—O—, and a group represented by Formula: —Y2—O—Y22, —Y21—O—, —Y21—C(═O)—O—, —C(═O)—O—Y2—, —[Y21—C(═O)—O]m″—Y22—, —Y21—O—C(═O)—Y22—, or —Y2—S(═O)2—O—Y22— [in the formulae, Y21 and Y22 each independently represent a divalent hydrocarbon group which may have a substituent, O represents an oxygen atom, and m″ represents an integer of 0 to 3].
In a case where the divalent linking group having a hetero atom is —C(═O)—NH—, —C(═O)—NH—C(═O)—, —NH—, or —NH—C(═NH)—, H may be substituted with a substituent such as an alkyl group or an acyl group. The substituent (an alkyl group, an acyl group, or the like) has preferably 1 to 10 carbon atoms, more preferably 1 to 8 carbon atoms, and particularly preferably 1 to 5 carbon atoms.
In Formula —Y21—O—Y22—, —Y21—O—, —Y21—C(═O)—O—, —C(═O)—O—Y21—, —[Y21-C(═O)—O]m″, —Y22—, —Y21—O—C(═O)—Y22—, or —Y21—S(═O)2—O—Y22—, Y21 and Y22 each independently represent a divalent hydrocarbon group which may have a substituent. Examples of the divalent hydrocarbon group include those for (the divalent hydrocarbon group which may have a substituent) described in the section of the divalent linking group as Yax1.
As Y21, a linear aliphatic hydrocarbon group is preferable, a linear alkylene group is more preferable, a linear alkylene group having 1 to 5 carbon atoms is still more preferable, and a methylene group or an ethylene group is particularly preferable.
As Y22, a linear or branched aliphatic hydrocarbon group is preferable, and a methylene group, an ethylene group, or an alkylmethylene group is more preferable. The alkyl group in the alkylmethylene group is preferably a linear alkyl group having 1 to 5 carbon atoms, more preferably a linear alkyl group having 1 to 3 carbon atoms, and most preferably a methyl group.
In the group represented by Formula —[Y21—C(═O)—O]m″—Y22—, m″ represents an integer of 0 to 3, preferably an integer of 0 to 2, more preferably 0 or 1, and particularly preferably 1. That is, a group represented by Formula —Y2—C(═O)—O—Y22— is preferable as the group represented by Formula —[Y2—C(═O)—O]m″—Y22—. Among these, a group represented by Formula —(CH2)a′—C(═O)—O—(CH2)b′— is preferable. In the formula, a′ represents an integer of 1 to 10, preferably an integer of 1 to 8, more preferably an integer of 1 to 5, still more preferably 1 or 2, and most preferably 1. b′ represents an integer of 1 to 10, preferably an integer of 1 to 8, more preferably an integer of 1 to 5, still more preferably 1 or 2, and most preferably 1.
Among these, Yax1 represents preferably a single bond, an ester bond [—C(═O)—O— or —O—C(═O)—], an ether bond (—O—), a linear or branched alkylene group, or a combination thereof and more preferably a single bond or an ester bond [—C(═O)—O— or —O—C(═O)—].
In Formula (a10-1), Wax1 represents an (nax1+1)-valent aromatic hydrocarbon group.
Examples of the aromatic hydrocarbon group as Wax1 include a group in which (nax1+1) hydrogen atoms have been removed from an aromatic ring. The aromatic ring is not particularly limited as long as the aromatic ring is a cyclic conjugated system having (4n+2) 1 electrons and may be monocyclic or polycyclic. The aromatic ring has preferably 5 to 30 carbon atoms, more preferably 5 to 20 carbon atoms, still more preferably 6 to 15 carbon atoms, and particularly preferably 6 to 12 carbon atoms. Specific examples of the aromatic ring include aromatic hydrocarbon rings such as benzene, naphthalene, anthracene, and phenanthrene; and aromatic hetero rings in which some carbon atoms constituting the above-described aromatic hydrocarbon rings have been substituted with hetero atoms. Examples of the hetero atom in the aromatic hetero rings include an oxygen atom, a sulfur atom, and a nitrogen atom. Specific examples of the aromatic hetero ring include a pyridine ring and a thiophene ring. Further, examples of the aromatic hydrocarbon group as Wax1 include a group in which (nax1+1) hydrogen atoms have been removed from an aromatic compound (such as biphenyl or fluorene) having two or more aromatic rings.
Among these, Wax1 represents preferably a group in which (nax1+1) hydrogen atoms have been removed from benzene, naphthalene, anthracene, or biphenyl, more preferably a group in which (nax1+1) hydrogen atoms have been removed from benzene or naphthalene, and still more preferably a group in which (nax1+1) hydrogen atoms have been removed from benzene.
In Formula (a10-1), nax1 represents an integer of 1 or greater, preferably an integer of 1 to 10, more preferably an integer of 1 to 5, still more preferably 1, 2, or 3, and particularly preferably 1 or 2.
Specific examples of the constitutional unit (a10) represented by Formula (a10-1) are described below.
In the formulae shown below, Rα represents a hydrogen atom, a methyl group, or a trifluoromethyl group.
The constitutional unit (a10) included in the component (A1) may be used alone or two or more kinds thereof.
In a case where the component (A1) contains the constitutional unit (a10), the proportion of the constitutional unit (a10) in the component (A1) is preferably in a range of 5% to 80% by mole, more preferably in a range of 10% to 70% by mole, and still more preferably in a range of 30% to 60% by mole with respect to the total amount (100% by mole) of all constitutional units constituting the component (A1).
In a case where the proportion of the constitutional unit (a10) is set to be greater than or equal to the lower limit, the sensitivity is likely to be enhanced. On the contrary, in a case where the proportion thereof is set to be less than or equal to the upper limit, the constitutional unit (a10) and other constitutional units are likely to be balanced.
In regard to constitutional unit derived from styrene or derivative thereof (constitutional unit (st)):
The “styrene” is a concept including those in which styrene and a hydrogen atom at the α-position of styrene have been substituted with substituents such as an alkyl group and a halogenated alkyl group. Examples of the alkyl group as the substituent includes an alkyl group having 1 to 5 carbon atoms, and examples of the halogenated alkyl group as the substituent includes a halogenated alkyl group having 1 to 5 carbon atoms.
Examples of the “styrene derivatives” include those obtained by bonding a substituent to a benzene ring of styrene in which a hydrogen atom at the α-position may be substituted with a substituent.
Further, the α-position (the carbon atom at the α-position) indicates the carbon atom having a benzene ring bonded thereto, unless otherwise specified.
The “constitutional unit derived from styrene” or “constitutional unit derived from a styrene derivative” indicates a constitutional unit formed by cleavage of an ethylenic double bond of styrene or a styrene derivative.
The constitutional unit (st) included in the component (A1) may be used alone or two or more kinds thereof.
In a case where the component (A1) has the constitutional unit (st), the proportion of the constitutional unit (st) is preferably in a range of 1% to 30% by mole and more preferably in a range of 3% to 20% by mole with respect to the total amount (100% by mole) of all constitutional units constituting the component (A1).
The component (A1) contained in the resist composition may be used alone or in combination of two or more kinds thereof.
In the resist composition of the present embodiment, examples of the component (A1) includes a polymer compound having a repeating structure of the constitutional unit (a01).
Preferred examples of the component (A1) include a polymer compound having a repeating structure of the constitutional unit (a01) and the constitutional unit (a10).
Such a component (A1) can be produced by dissolving a monomer, from which each constitutional unit is derived, in a polymerization solvent and adding a radical polymerization initiator such as azobisisobutylonitrile (AIBN) or dimethyl azobisisobutyrate (for example, V-601) to the solution so that the polymerization is carried out.
Alternatively, such a component (A1) can be produced by dissolving a monomer from which the constitutional unit (a01) is derived and a monomer from which constitutional units other than the constitutional unit (a01) are derived as necessary in a polymerization solvent, adding the above-described radical polymerization initiator to the solution, and performing a deprotection reaction.
Further, a —C(CF3)2—OH group may be introduced into the terminal of the component (A1) during the polymerization using a combination of chain transfer agents such as HS—CH2—CH2—CH2—C(CF3)2—OH. As described above, a copolymer into which a hydroxyalkyl group, formed by substitution of some hydrogen atoms in the alkyl group with fluorine atoms, has been introduced is effective for reducing development defects and reducing line edge roughness (LER: uneven irregularities of a line side wall).
The mass average molecular weight (Mw) (in terms of polystyrene according to gel permeation chromatography (GPC)) of the component (A1) is not particularly limited, but is preferably in a range of 1000 to 50000, more preferably in a range of 2000 to 30000, and still more preferably in a range of 3000 to 20000.
In a case where the Mw of the component (A1) is less than or equal to the upper limit of the above-described preferable range, the resist composition exhibits a satisfactory solubility in a resist solvent for a resist enough to be used as a resist. On the contrary, in a case where the Mw of the component (A1) is greater than or equal to the lower limit of the above-described preferable range, the dry etching resistance and the cross-sectional shape of the resist pattern become excellent.
Further, the dispersity (Mw/Mn) of the component (A1) is not particularly limited, but is preferably in a range of 1.0 to 4.0, more preferably in a range of 1.0 to 3.0, and particularly preferably in a range of 1.0 to 2.0. Further, Mn represents the number average molecular weight.
In Regard to Base Material Components Other than Component (A1)
In the resist composition of the present embodiment, base material components which do not correspond to the component (A1) and whose solubility in a developing solution is changed due to the action of an acid may be used in combination as the component (A). The base material components that do not correspond to the component (A1) are not particularly limited and can be optionally selected from a plurality of components which have been known in the related art as the base material components for a chemically amplified resist composition and then used. Further, polymer compounds or low-molecular-weight compounds may be used alone or in combination of two or more kinds thereof.
In the resist composition of the present embodiment, the content of the component (A) may be adjusted according to the thickness of the resist film intended to be formed.
<Component (F)>
The component (F) is a fluorine additive component that exhibits decomposability with respect to an alkali developing solution. Here, “exhibits decomposability with respect to an alkali developing solution” indicates that hydrolysis occurs due to the action of an alkali developing solution (for example, a 2.38 mass % tetramethylammonium hydroxide (TMAH) aqueous solution (23° C.)) so that the decomposability is exhibited.
The component (F) contains a fluororesin component (F1) having a constitutional unit (f10) represented by Formula (f1-01) or Formula (f1-02) (hereinafter, also referred to as the component (F1)).
<<Constitutional Unit (f10)>>
The constitutional unit (f10) is a constitutional unit represented by Formula (f1-01) or Formula (f1-02).
Since the constitutional unit (f10) has three or more fluorine atoms, the surface segregation effect on the resist film is higher, and the affinity of the resist film for the developing solution can be sufficiently increased.
[In Formula (f1-01), R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms. Raf01 represents a divalent linking group that does not have an acid dissociable site. Raf02 represents a monovalent organic group. —O-Raf02 represents a group that is dissociated due to an action of a base. At least one of Raf01 and Raf02 represents a group in which some or all hydrogen atoms of a hydrocarbon group have been substituted with fluorine atoms. The total number of fluorine atoms in Raf01 and Raf02 is 3 or greater. In Formula (f1-02), R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms. Raf03 represents a divalent linking group that does not have an acid dissociable site. Raf04 represents a monovalent organic group. —C(═O)Raf04 represents a group that is dissociated due to an action of a base. At least one of Raf03 and Raf04 represents a group in which some or all hydrogen atoms of a hydrocarbon group have been substituted with fluorine atoms. The total number of fluorine atoms in Raf03 and Raf04 is 3 or greater.]
In Formula (f1-01) or (f1-02), R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms.
As the alkyl group having 1 to 5 carbon atoms represented by R, a linear or branched alkyl group having 1 to 5 carbon atoms is preferable, and specific examples thereof include a methyl group, an ethyl group, a propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a tert-butyl group, a pentyl group, an isopentyl group, and a neopentyl group.
The halogenated alkyl group having 1 to 5 carbon atoms as R is a group in which some or all hydrogen atoms of the above-described alkyl group having 1 to 5 carbon atoms have been substituted with halogen atoms. Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom. Among these, a fluorine atom is particularly preferable.
It is preferable that R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a fluorinated alkyl group having 1 to 5 carbon atoms. Further, from the viewpoint of the industrial availability, R represents more preferably a hydrogen atom, a methyl group, or a trifluoromethyl group, still more preferably a hydrogen atom or a methyl group, and particularly preferably a methyl group.
In Formula (f1-01), Raf01 represents a divalent linking group that does not have an acid dissociable site.
The “acid dissociable site” indicates a site to be dissociated due to the action of an acid generated upon exposure in the organic group as in a case of the “acid dissociable group” described above. That is, the 0 atom of (—C(═O)—O—) bonded to the main chain and Raf01 are not dissociated due to the action of an acid.
Examples of the divalent linking group that does not have an acid dissociable site as Raf01 include a divalent hydrocarbon group which may have a substituent and a divalent linking group having a hetero atom.
Divalent Hydrocarbon Group which May have Substituent:
In a case where Raf01 represents a divalent hydrocarbon group which may have a substituent, the hydrocarbon group may be an aliphatic hydrocarbon group or an aromatic hydrocarbon group.
Aliphatic Hydrocarbon Group as Raf01
The aliphatic hydrocarbon group indicates a hydrocarbon group that has no aromaticity. The aliphatic hydrocarbon group may be saturated or unsaturated. In general, it is preferable that the aliphatic hydrocarbon group is saturated.
Examples of the aliphatic hydrocarbon group include a linear or branched aliphatic hydrocarbon group, and an aliphatic hydrocarbon group having a ring in the structure thereof.
Linear or Branched Aliphatic Hydrocarbon Group
The linear aliphatic hydrocarbon group has preferably 1 to 10 carbon atoms, more preferably 1 to 6 carbon atoms, and still more preferably 1 to 4 carbon atoms.
As the linear aliphatic hydrocarbon group, a linear alkylene group is preferable. Specific examples thereof include a methylene group [—CH2—], an ethylene group [—(CH2)2—], a trimethylene group [—(CH2)3—], a tetramethylene group [—(CH2)4—], and a pentamethylene group [—(CH2)5—].
The branched aliphatic hydrocarbon group has preferably 2 to 10 carbon atoms, more preferably 3 to 6 carbon atoms, and still more preferably 3 or 4 carbon atoms.
As the branched aliphatic hydrocarbon group, a branched alkylene group is preferable, and specific examples thereof include alkylalkylene groups, for example, alkylmethylene groups such as —CH(CH3)— and —CH(CH2CH3)—; alkylethylene groups such as —CH(CH3)CH2—, —CH(CH3)CH(CH3)—, and —CH(CH2CH3)CH2—; alkyltrimethylene groups such as —CH(CH3)CH2CH2— and —CH2CH(CH3)CH2—; and alkyltetramethylene groups such as —CH(CH3)CH2CH2CH2— and —CH2CH(CH3)CH2CH2—. As the alkyl group in the alkylalkylene group, a linear alkyl group having 1 to 5 carbon atoms is preferable.
The linear or branched aliphatic hydrocarbon group may or may not have a substituent. Examples of the substituent include a fluorine atom, a fluorinated alkyl group having 1 to 5 carbon atoms which has been substituted with a fluorine atom, and a carbonyl group.
Aliphatic Hydrocarbon Group Having Ring in Structure Thereof
Examples of the aliphatic hydrocarbon group having a ring in the structure thereof include a cyclic aliphatic hydrocarbon group which may have a substituent having a hetero atom in the ring structure thereof (a group in which two hydrogen atoms have been removed from an aliphatic hydrocarbon ring), a group in which the cyclic aliphatic hydrocarbon group is bonded to the terminal of a linear or branched aliphatic hydrocarbon group, and a group in which the cyclic aliphatic hydrocarbon group is interposed in a linear or branched aliphatic hydrocarbon group. Examples of the linear or branched aliphatic hydrocarbon group include the same groups as those described above.
The cyclic aliphatic hydrocarbon group has preferably 3 to 20 carbon atoms and more preferably 3 to 12 carbon atoms.
The cyclic aliphatic hydrocarbon group may be a monocyclic group or a polycyclic group.
As the monocyclic alicyclic hydrocarbon group, a group in which two hydrogen atoms have been removed from a monocycloalkane is preferable. The monocycloalkane has preferably 3 to 6 carbon atoms, and specific examples thereof include cyclopentane and cyclohexane. As the polycyclic alicyclic hydrocarbon group, a group in which two hydrogen atoms have been removed from a polycycloalkane is preferable, and examples of the polycycloalkane include a polycycloalkane having a crosslinked ring polycyclic skeleton such as adamantane, norbornane, isobornane, tricyclodecane, or tetracyclododecane; and a polycycloalkane having a fused ring polycyclic skeleton such as a cyclic group having a steroid skeleton.
The cyclic aliphatic hydrocarbon group may or may not have a substituent. Examples of the substituent include an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxyl group, and a carbonyl group.
As the alkyl group as the substituent, an alkyl group having 1 to 5 carbon atoms is preferable, and a methyl group, an ethyl group, a propyl group, an n-butyl group, or a tert-butyl group is more preferable.
As the alkoxy group as the substituent, an alkoxy group having 1 to 5 carbon atoms is preferable, and a methoxy group, an ethoxy group, an n-propoxy group, an iso-propoxy group, an n-butoxy group, or a tert-butoxy group is more preferable, and a methoxy group or an ethoxy group is still more preferable.
Examples of the halogen atom as the substituent include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom. Among these, a fluorine atom is preferable.
Examples of the halogenated alkyl group as the substituent include groups in which some or all hydrogen atoms in the above-described alkyl groups have been substituted with the above-described halogen atoms.
In the cyclic aliphatic hydrocarbon group, some carbon atoms constituting the ring structure thereof may be substituted with a substituent having a hetero atom. As the substituent having a hetero atom, —O—, —C(═O)—O—, —S—, —S(═O)2—, or —S(═O)2—O— is preferable.
Aromatic Hydrocarbon Group as Raf01
The aromatic hydrocarbon group is a hydrocarbon group having at least one aromatic ring.
The aromatic ring is not particularly limited as long as the aromatic ring is a cyclic conjugated system having (4n+2) 1 electrons and may be monocyclic or polycyclic. The aromatic ring has preferably 5 to 30 carbon atoms, more preferably 5 to 20 carbon atoms, still more preferably 6 to 15 carbon atoms, and particularly preferably 6 to 12 carbon atoms. Here, the number of carbon atoms in a substituent is not included in the number of carbon atoms.
Specific examples of the aromatic ring include aromatic hydrocarbon rings such as benzene, naphthalene, anthracene, and phenanthrene; and aromatic hetero rings in which some carbon atoms constituting the above-described aromatic hydrocarbon rings have been substituted with hetero atoms. Examples of the hetero atom in the aromatic hetero rings include an oxygen atom, a sulfur atom, and a nitrogen atom. Specific examples of the aromatic hetero ring include a pyridine ring and a thiophene ring.
Specific examples of the aromatic hydrocarbon group include a group in which two hydrogen atoms have been removed from the above-described aromatic hydrocarbon ring or aromatic hetero ring (an arylene group or a heteroarylene group); a group in which two hydrogen atoms have been removed from an aromatic compound having two or more aromatic rings (such as biphenyl or fluorene); and a group in which one hydrogen atom of a group (an aryl group or a heteroaryl group) obtained by removing one hydrogen atom from the above-described aromatic hydrocarbon ring or aromatic hetero ring has been substituted with an alkylene group (for example, a group obtained by further removing one hydrogen atom from an aryl group in an arylalkyl group such as a benzyl group, a phenethyl group, a 1-naphthylmethyl group, a 2-naphthylmethyl group, a 1-naphthylethyl group, or a 2-naphthylethyl group). The number of carbon atoms in the alkylene group bonded to the aryl group or the heteroaryl group is preferably in a range of 1 to 4, more preferably 1 or 2, and particularly preferably 1.
In the aromatic hydrocarbon group, the hydrogen atom in the aromatic hydrocarbon group may be substituted with a substituent. For example, the hydrogen atom bonded to the aromatic ring in the aromatic hydrocarbon group may be substituted with a substituent. Examples of substituents include an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, and a hydroxyl group.
As the alkyl group as the substituent, an alkyl group having 1 to 5 carbon atoms is preferable, and a methyl group, an ethyl group, a propyl group, an n-butyl group, or a tert-butyl group is more preferable.
As the alkoxy group, the halogen atom, and the halogenated alkyl group as the substituents, the same groups as the above-described substituent groups that substitute a hydrogen atom in the cyclic aliphatic hydrocarbon group can be exemplified.
Divalent Linking Group Having Hetero Atom:
In a case where Raf01 represents a divalent linking group having a hetero atom, preferred examples of the linking group include —O—, —C(═O)—O—, —O—C(═O)—, —C(═O)—, —O—C(═O)—O—, —C(═O)—NH—, —NH—, —NH—C(═NH)— (H may be substituted with a substituent such as an alkyl group or an acyl group), —S—, —S(═O)2—, —S(═O)2—O—, and a group represented by Formula: —Y21—O—Y22, —Y21—O—, —Y21—C(═O)—O—, —C(═O)—O—Y21—, —[Y21—C(═O)—O]m″—Y22, —Y21—O—C(═O)—Y22—, or —Y2—S(═O)2—O—Y22— [in the formulae, Y21 and Y22 each independently represent a divalent hydrocarbon group which may have a substituent, 0 represents an oxygen atom, and m″ represents an integer of 0 to 3].
In a case where the divalent linking group containing a hetero atom is —C(═O)—NH—, —C(═O)—NH—C(═O)—, —NH—, or —NH—C(═NH)—, H may be substituted with a substituent such as an alkyl group, an acyl group, or the like. The substituent (an alkyl group, an acyl group, or the like) has preferably 1 to 10 carbon atoms, more preferably 1 to 8 carbon atoms, and particularly preferably 1 to 5 carbon atoms.
In Formula —Y21—, —Y22—, —Y21—O—, —Y21—C(═O)—O—, —C(═O)—O—Y21—, —[Y21—C(═O)—O]m″—Y22—, —Y21—O—C(═O)—Y22—, or —Y21—S(═O)2—O—Y22—, Y21 and Y22 each independently represent a divalent hydrocarbon group which may have a substituent. Examples of the divalent hydrocarbon group include those for (the divalent hydrocarbon group which may have a substituent) described in the section of the divalent linking group as Raf01.
As Y21, a linear aliphatic hydrocarbon group is preferable, a linear alkylene group is more preferable, a linear alkylene group having 1 to 5 carbon atoms is still more preferable, and a methylene group or an ethylene group is particularly preferable.
As Y22, a linear or branched aliphatic hydrocarbon group is preferable, and a methylene group, an ethylene group, or an alkylmethylene group is more preferable. The alkyl group in the alkylmethylene group is preferably a linear alkyl group having 1 to 5 carbon atoms, more preferably a linear alkyl group having 1 to 3 carbon atoms, and most preferably a methyl group.
In the group represented by Formula —[Y21—C(═O)—O]m″—Y22—, m″ represents an integer of 0 to 3, preferably an integer of 0 to 2, more preferably 0 or 1, and particularly preferably 1. That is, a group represented by Formula —Y21—C(═O)—O—Y22— is preferable as the group represented by Formula —[Y21—C(═O)—O]m″—Y22—. Among these, a group represented by Formula —(CH2)a′—C(═O)—O—(CH2)b′— is preferable. In the formula, a′ represents an integer of 1 to 10, preferably an integer of 1 to 8, more preferably an integer of 1 to 5, still more preferably 1 or 2, and most preferably 1. b′ represents an integer of 1 to 10, preferably an integer of 1 to 8, more preferably an integer of 1 to 5, still more preferably 1 or 2, and most preferably 1.
Among these, Raf01 represents preferably a single bond, an ester bond [—C(═O)—O—], an ether bond (—O—), a linear or branched alkylene group which may have a substituent or a combination thereof, more preferably a linear or branched alkylene group having 1 to 10 carbon atoms which may have a substituent, and still more preferably a linear alkylene group having 1 to 10 carbon atoms or a branched fluorinated alkylene group having 1 to 10 carbon atoms.
In Formula (f1-01), Raf02 represents a monovalent organic group, and —O-Raf02 represents a group that is dissociated due to the action of a base.
The monovalent organic group as Raf02 may or may not have an acid dissociable site, but it is preferable that the monovalent organic group does not have an acid dissociable site.
The “organic group” is a group having at least one carbon atom.
Examples of the monovalent organic group include —RfP1, —Rf2—RfP1, —CH (—RfP1)2, —RfP2—O—RfP1, —RfP—C(═O)—RfP1, —RfP2—C(═O)—ORfP1, and —RfP2—O—C(═O)—RfP1.
Here, RfP1 represents a linear or branched monovalent alkyl group, a monovalent alicyclic hydrocarbon group, or a monovalent aromatic hydrocarbon group. A plurality of RfP1's may be the same as or different from each other.
Some or all hydrogen atoms in the linear or branched alkyl group, the monovalent alicyclic hydrocarbon group, and the aromatic hydrocarbon group as RfP1 may be substituted with fluorine atoms, fluorinated alkyl groups having 1 to 5 carbon atoms which have been substituted with fluorine atoms, or carbonyl groups.
RfP2 represents a single bond, a linear or branched divalent alkylene group, a divalent alicyclic hydrocarbon group, or a divalent aromatic hydrocarbon group.
Some or all hydrogen atoms in the linear or branched divalent alkylene group, the divalent alicyclic hydrocarbon group, or the divalent aromatic hydrocarbon group as RfP2 may be substituted with fluorine atoms, fluorinated alkyl groups having 1 to 5 carbon atoms which have been substituted with fluorine atoms, or carbonyl groups.
The number of carbon atoms in the linear or branched monovalent alkyl group as RfP1 is preferably in a range of 1 to 40, more preferably in a range of 1 to 20, and still more preferably in a range of 1 to 12.
Specific examples of the linear monovalent alkyl group include a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group, a nonyl group, a decyl group, an undecyl group, and a dodecyl group.
Specific examples of the branched monovalent alkyl group include a 1-methylethyl group, a 1-methylpropyl group, a 2-methylpropyl group, a 1-methylbutyl group, a 2-methylbutyl group, a 3-methylbutyl group, a 1-ethylbutyl group, a 2-ethylbutyl group, a 1-methylpentyl group, a 2-methylpentyl group, a 3-methylpentyl group, and a 4-methylpentyl group.
Examples of the monovalent alicyclic hydrocarbon group as RfP1 include a monovalent monocyclic alicyclic hydrocarbon group and a monovalent polycyclic alicyclic hydrocarbon group. Here, an aliphatic cyclic group having a crosslinked structure is excluded.
Specific examples of the monovalent monocyclic alicyclic hydrocarbon group include a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, a cyclooctyl group, a cyclodecyl group, and a cyclododecyl group.
Specific examples of the monovalent polycyclic alicyclic hydrocarbon group include a group in which one hydrogen atom has been removed from a polycycloalkane. Examples of the polycycloalkane include a polycycloalkane having a crosslinked ring polycyclic skeleton such as adamantane, norbornane, isobornane, tricyclodecane, or tetracyclododecane; and a polycycloalkane having a fused ring polycyclic skeleton such as a cyclic group having a steroid skeleton.
Examples of the monovalent aromatic hydrocarbon group as RfP1 include a group in which one hydrogen atom has been removed from an aromatic ring. The aromatic ring is not particularly limited as long as the aromatic ring is a cyclic conjugated system having (4n+2) π electrons and may be monocyclic or polycyclic. The aromatic ring has preferably 5 to 30 carbon atoms, more preferably 5 to 20 carbon atoms, still more preferably 6 to 15 carbon atoms, and particularly preferably 6 to 12 carbon atoms. Specific examples of the aromatic ring include aromatic hydrocarbon rings such as benzene, naphthalene, anthracene, and phenanthrene; and aromatic hetero rings in which some carbon atoms constituting the above-described aromatic hydrocarbon rings have been substituted with hetero atoms. Examples of the hetero atom in the aromatic hetero rings include an oxygen atom, a sulfur atom, and a nitrogen atom. Specific examples of the aromatic hetero ring include a pyridine ring and a thiophene ring.
Examples of the linear or branched divalent alkylene group, the divalent alicyclic hydrocarbon group, or the divalent aromatic hydrocarbon group as RfP2 include the same groups as those for Raf01 described above.
Among these, it is preferable that Raf02 represents —RfP1, —RfP2—RfP1, or —CH (—RfP1)2.
At least one of Raf01 and Raf02 described above represents a group in which some or all hydrogen atoms in a hydrocarbon group have been substituted with fluorine atoms. The total number of fluorine atoms in Raf01 and Raf02 is 3 or greater. That is, a case where Raf01 contains a group in which some or all hydrogen atoms in a hydrocarbon group have been substituted with fluorine atoms and the total number of fluorine atoms is 3 or greater; a case where Raf02 contains a group in which some or all hydrogen atoms in a hydrocarbon group have been substituted with fluorine atoms and the total number of fluorine atoms is 3 or greater; and a case where Raf01 and Raf02 contain a group in which some or all hydrogen atoms in a hydrocarbon group have been substituted with fluorine atoms and the total number of fluorine atoms is 3 or greater are exemplified.
Among these, it is preferable that Raf01 and Raf02 contain a group in which some or all hydrogen atoms in a hydrocarbon group have been substituted with fluorine atoms.
The total number of fluorine atoms in Raf01 and Raf02 is 3 or greater, preferably 4 or greater, and more preferably 5 or greater.
In a case where the total number of fluorine atoms in Raf01 and Raf02 is greater than or equal to the above-described preferable number, the surface segregation effect is enhanced, and the affinity for the developing solution can be further improved.
In Formula (f1-02), Raf03 represents a divalent linking group, and examples thereof include the same groups as those for Raf01 in Formula (f1-01).
In Formula (f1-02), Raf4 represents a monovalent organic group, and examples thereof include the same groups as those for Raf02 in Formula (f1-01). —C(═O)Raf4 represents a group that is dissociated due to an action of a base.
At least one of Raf03 and Raf4 described above represents a group in which some or all hydrogen atoms in a hydrocarbon group have been substituted with fluorine atoms. The total number of fluorine atoms in Raf03 and Raf4 is 3 or greater. That is, a case where Raf03 contains a group in which some or all hydrogen atoms in a hydrocarbon group have been substituted with fluorine atoms and the total number of fluorine atoms is 3 or greater; a case where Raf0 contains a group in which some or all hydrogen atoms in a hydrocarbon group have been substituted with fluorine atoms and the total number of fluorine atoms is 3 or greater; and a case where both Raf03 and Raf04, contain a group in which some or all hydrogen atoms in a hydrocarbon group have been substituted with fluorine atoms and the total number of fluorine atoms is 3 or greater are exemplified.
Among these, it is preferable that Raf03 and Raf04 contain a group in which some or all hydrogen atoms in a hydrocarbon group have been substituted with fluorine atoms.
The total number of fluorine atoms in Raf03 and Raf04 is 3 or greater, preferably 4 or greater, and more preferably 5 or greater.
In a case where the total number of fluorine atoms in Raf03 and Raf04 is greater than or equal to the preferable number, the surface segregation effect is enhanced, and the affinity for the developing solution can be further improved.
It is preferable that the constitutional unit (f10) is a constitutional unit represented by Formula (f1-1) or Formula (f1-2).
Since the constitutional unit does not contain a hydrocarbon group forming a crosslinked structure, the solubility of the resist film in a developing solution is degraded and this degradation may result in deterioration of the resolution performance or deterioration of LWR.
[In Formula (f1-1), R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms. Raf11 represents a divalent linking group that does not have an acid dissociable site. Raf12 represents a monovalent organic group. —O-Raf12 represents a group that is dissociated due to the action of a base. Here, in Raf11 and Raf12, hydrocarbon groups forming a crosslinked structure are excluded. At least one of Raf11 and Raf12 is a group in which some or all hydrogen atoms in a hydrocarbon group have been substituted with fluorine atoms. The total number of fluorine atoms in Raf11 and Raf12 is 3 or greater. In Formula (f1-2), R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms. Raf13 represents a divalent linking group that does not have an acid dissociable site. Raf14 represents a monovalent organic group. —C(═O)Raf14 represents a group that is dissociated by the action of a base. Here, in Raf13 and Raf14, hydrocarbon groups forming a crosslinked structure are excluded. At least one of Raf13 and Raf14 is a group in which some or all hydrogen atoms in a hydrocarbon group have been substituted with fluorine atoms. The total number of fluorine atoms in Raf13 and Raf14 is 3 or greater.]
In Formulae (f1-1 and (f1-2), R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms and has the same definition as that for R in Formula (f1-01) and Formula (f1-02).
Raf11 in Formula (f1-1) represents a divalent linking group that does not have an acid dissociable site, and examples thereof include the same groups as those for Raf01 in Formula (f1-01). Here, hydrocarbon groups forming a crosslinked structure are excluded.
In Formula (f1-1), Raf12 represents a monovalent organic group, and —O-Raf12 represents a group that is dissociated due to the action of a base.
The monovalent organic group as Raf12 may or may not have an acid dissociable site, but it is preferable that the monovalent organic group does not have an acid dissociable group.
Examples of Raf12 include the same groups as those for Raf02 in Formula (f1-01). Here, hydrocarbon groups forming a crosslinked structure are excluded.
In Formula (f1-2), Raf13 represents a divalent linking group that does not have an acid dissociable site, and examples thereof include the same groups as those for Raf01 in Formula (f1-01). Here, hydrocarbon groups forming a crosslinked structure are excluded.
At least one of Raf11 and Raf12 described above represents a group in which some or all hydrogen atoms in a hydrocarbon group have been substituted with fluorine atoms. The total number of fluorine atoms in Raf11 and Raf12 is 3 or greater. That is, a case where Raf11 contains a group in which some or all hydrogen atoms in a hydrocarbon group have been substituted with fluorine atoms and the total number of fluorine atoms is 3 or greater; a case where Raf12 contains a group in which some or all hydrogen atoms in a hydrocarbon group have been substituted with fluorine atoms and the total number of fluorine atoms is 3 or greater; and a case where Raf11 and Raf12 contain a group in which some or all hydrogen atoms in a hydrocarbon group have been substituted with fluorine atoms and the total number of fluorine atoms is 3 or greater are exemplified.
Among these, it is preferable that Raf11 and Raf12 contain a group in which some or all hydrogen atoms in a hydrocarbon group have been substituted with fluorine atoms.
The total number of fluorine atoms in Raf11 and Raf12 is 3 or greater, preferably 4 or greater, and more preferably 5 or greater.
In a case where the total number of fluorine atoms in Raf11 and Raf12 is greater than or equal to the above-described preferable number, the surface segregation effect is enhanced, and the affinity for the developing solution can be further improved.
In Formula (f1-2), Raf13 represents a divalent linking group that does not have an acid dissociable site, and examples thereof include the same groups as those for Raf11 in Formula (f1-1).
In Formula (f1-2), Raf14 represents a monovalent organic group, and examples thereof include the same groups as those for Raf12 in Formula (f-1). —C(═O)Raf14 represents a group that is dissociated by the action of a base.
At least one of Raf13 and Raf14 described above represents a group in which some or all hydrogen atoms in a hydrocarbon group have been substituted with fluorine atoms. The total number of fluorine atoms in Raf13 and Raf14 is 3 or greater. That is, a case where Raf13 contains a group in which some or all hydrogen atoms in a hydrocarbon group have been substituted with fluorine atoms and the total number of fluorine atoms is 3 or greater; a case where Raf14 contains a group in which some or all hydrogen atoms in a hydrocarbon group have been substituted with fluorine atoms and the total number of fluorine atoms is 3 or greater; and a case where Raf13 and Raf14 contain a group in which some or all hydrogen atoms in a hydrocarbon group have been substituted with fluorine atoms and the total number of fluorine atoms is 3 or greater are exemplified.
Among these, it is preferable that Raf13 and Raf14 contain a group in which some or all hydrogen atoms in a hydrocarbon group have been substituted with fluorine atoms.
The total number of fluorine atoms in Raf13 and Raf14 is 3 or greater, preferably 4 or greater, and more preferably 5 or greater.
In a case where the total number of fluorine atoms in Raf13 and Raf14 is greater than or equal to the above-described preferable number, the surface segregation effect is enhanced, and the affinity for the developing solution can be further improved.
It is more preferable that the constitutional unit (f10) is a constitutional unit represented by Formula (f1-1-1) or (f1-2-1).
[In Formula (f1-1-1), R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having ito 5 carbon atoms. Raf′11 represents a linear, branched, or monocyclic divalent hydrocarbon group that does not have an acid dissociable site. Raf′12 represents a linear, branched, or monocyclic monovalent hydrocarbon group. —O-Raf′12 represents a group that is dissociated due to the action of a base. At least one of Raf′11 and Raf′12 represents a group in which some or all hydrogen atoms in a linear, branched, or monocyclic hydrocarbon group have been substituted with fluorine atoms. The total number of fluorine atoms in Raf′11 and Raf′12 is 5 or greater.
In Formula (f1-2-1), R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms. Raf′13 represents a linear, branched, or monocyclic divalent hydrocarbon group that does not have an acid dissociable site. Raf′14 represents a linear, branched, or monocyclic monovalent hydrocarbon group. —C(═O)Raf′14 represents a group that is dissociated due to the action of a base. At least one of Raf′13 and Raf′14 represents a group in which some or all hydrogen atoms in a linear, branched, or monocyclic hydrocarbon group have been substituted with fluorine atoms. The total number of fluorine atoms in Raf′13 and Raf′14 is 5 or greater]
In Formula (f1-1-1), R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms and has the same definition as that for R in Formulae (f1-01) and (f1-02).
In Formula (f1-1-1), Raf′11 represents a linear, branched, or monocyclic divalent hydrocarbon group that does not have an acid dissociable site. Some or all hydrogen atoms in the hydrocarbon group may be substituted with fluorine atoms, fluorinated alkyl groups having 1 to 5 carbon atoms which have been substituted with fluorine atoms, or carbonyl groups.
Examples of the linear, branched, or monocyclic divalent hydrocarbon group that does not have an acid dissociable site as Raf′11 include the linear or branched aliphatic hydrocarbon group, the monocyclic alicyclic hydrocarbon group, and the monocyclic aromatic hydrocarbon group as Raf0 in Formula (f1-01).
Among these, Raf′11 represents preferably a linear or branched alkylene group having 1 to 10 carbon atoms which may have a substituent, more preferably a linear alkylene group having 1 to 10 carbon atoms or a branched fluorinated alkylene group having 1 to 10 carbon atoms, and still more preferably a branched fluorinated alkylene group having 1 to 10 carbon atoms.
In Formula (f1-1-1), Raf′12 represents a linear, branched, or monocyclic monovalent hydrocarbon group. Some or all hydrogen atoms in the hydrocarbon group may be substituted with fluorine atoms, fluorinated alkyl groups having 1 to 5 carbon atoms which have been substituted with fluorine atoms, or carbonyl groups.
Examples of the linear, branched, or monocyclic monovalent hydrocarbon group as Raf′12 include those for the monovalent organic group as Raf1 in Formula (f1-01) such as a linear or branched monovalent alkyl group, a monovalent monocyclic alicyclic hydrocarbon group, and a monovalent monocyclic aromatic hydrocarbon group.
Among these, Raf′12 represents preferably a linear or branched monovalent fluorinated alkyl group or a monovalent monocyclic aromatic hydrocarbon group containing a fluorinated alkyl group and more preferably a linear monovalent fluorinated alkyl group.
At least one of Raf′11 and Raf′12 described above represents a group in which some or all hydrogen atoms in a linear, branched, or monocyclic hydrocarbon group have been substituted with fluorine atoms. The total number of fluorine atoms in Raf′11 and Raf′12 is 5 or greater. That is, a case where Raf′11 contains a group in which some or all hydrogen atoms in a hydrocarbon group have been substituted with fluorine atoms and the total number of fluorine atoms is 5 or greater; a case where Raf′12 contains a group in which some or all hydrogen atoms in a hydrocarbon group have been substituted with fluorine atoms and the total number of fluorine atoms is 5 or greater; and a case where Raf′11 and Raf′12 contain a group in which some or all hydrogen atoms in a hydrocarbon group have been substituted with fluorine atoms and the total number of fluorine atoms is 5 or greater are exemplified.
Among these, it is preferable that both Raf′11 and Raf′12 contain a group in which some or all hydrogen atoms in a hydrocarbon group have been substituted with fluorine atoms.
In a case where the total number of fluorine atoms in Raf′11 and Raf′12 is 5 or greater, the surface segregation effect is enhanced, and the affinity for the developing solution can be further improved.
In Formula (f1-2-1), R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms and has the same definition as that for R in Formula (f1-01) and Formula (f1-02).
In Formula (f1-2-1), Raf′13 has the same definition as that for Raf′11 in Formula (f1-1-1).
In Formula (f1-2-1), Raf′14 has the same definition as that for Raf′12 in Formula (f1-1-1).
At least one of Raf′13 and Raf′14 described above represents a group in which some or all hydrogen atoms in a linear, branched, or monocyclic hydrocarbon group have been substituted with fluorine atoms. The total number of fluorine atoms in Raf′13 and Raf′14 is 5 or greater. That is, a case where Raf′13 contains a group in which some or all hydrogen atoms in a hydrocarbon group have been substituted with fluorine atoms and the total number of fluorine atoms is 5 or greater; a case where Raf′14 contains a group in which some or all hydrogen atoms in a hydrocarbon group have been substituted with fluorine atoms and the total number of fluorine atoms is 5 or greater; and a case where Raf′13 and Raf′14 contain a group in which some or all hydrogen atoms in a hydrocarbon group have been substituted with fluorine atoms and the total number of fluorine atoms is 5 or greater are exemplified.
Among these, it is preferable that both Raf′13 and Raf′14 contain a group in which some or all hydrogen atoms in a hydrocarbon group have been substituted with fluorine atoms.
In a case where the total number of fluorine atoms in Raf′13 and Raf′14 is 5 or greater, the surface segregation effect is enhanced, and the affinity for the developing solution can be further improved.
Hereinafter, specific examples of the constitutional unit (f10) represented by Formula (f1-01) will be described.
In the formulae shown below, Ra represents a hydrogen atom, a methyl group, or a trifluoromethyl group.
Among the above, as the constitutional unit (f10) represented by Formula (f1-01), a constitutional unit represented by any of Formulae (f1-1-1) to (f1-1-4) is preferable, and a constitutional unit represented by Formula (f1-1-2) or (f1-1-3) is more preferable.
Hereinafter, specific examples of the constitutional unit (f10) represented by Formula (f1-02) will be described.
In the formulae shown below, Rα represents a hydrogen atom, a methyl group, or a trifluoromethyl group.
Among these, as the constitutional unit (f10) represented by Formula (f1-02), a constitutional unit represented by (f1-2-1) is preferable.
The constitutional unit (f10) included in the component (F1) may be used alone or in combination of two or more kinds thereof.
The proportion of the constitutional unit (f10) in the component (F1) is preferably 35% by mole or greater, more preferably 55% by mole or greater, and still more preferably 60% by mole or greater with respect to the total amount (100% by mole) of all constitutional units constituting the component (F1). Further, the proportion thereof may be 100% by mole, which means that the component is a homopolymer.
In a case where the constitutional unit (f10) is set to be greater than or equal to the lower limit of the above-described preferable range, since the surface segregation effect is enhanced and the affinity for the developing solution can be further improved, the lithography characteristics such as reduction of the roughness are improved. Further, in a case where the proportion thereof is set to be less than or equal to the upper limit of the above-described preferable range, the constitutional unit (f10) and other constitutional units can be balanced, and the lithography characteristics are improved.
In Regard to Constitutional Unit (f2):
The component (F1) may have a constitutional unit represented by Formula (f2-1) in addition to the constitutional unit (f10) described above.
Since the constitutional unit (f2) contains an acid dissociable group represented by Formula (f2-r-1) or (f2-r-2) which exhibits high reactivity with an acid, the lithography characteristics such as enhancement of the sensitivity and the resolution and reduction of the roughness can be improved. Further, since the acid dissociable group does not contain an aliphatic cyclic group having a crosslinked structure, degradation of the solubility of the resist film in a developing solution is unlikely to cause deterioration of the resolution performance or deterioration of LWR.
[In the Formula, R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms. Raf21 represents an acid dissociable group represented by Formula (f2-r-1) or (f2-r-2).]
[In Formula (f2-r-1), Yaf represents a carbon atom. Xaf represents a group that forms an aliphatic cyclic group with Yaf. Some or all hydrogen atoms in this cyclic aliphatic cyclic group may be substituted. Here, Xaf and Yaf do not form an aliphatic cyclic group having a crosslinked structure. Raf01 to Raf03 each independently represent a hydrogen atom, a chain-like monovalent saturated hydrocarbon group having 1 to 10 carbon atoms, or a monovalent aliphatic cyclic saturated hydrocarbon group having 3 to 20 carbon atoms. Some or all hydrogen atoms in the chain-like saturated hydrocarbon group and the aliphatic cyclic saturated hydrocarbon group may be substituted. Two or more of Raf01 to Raf03 may be bonded to one another to form a cyclic structure. The symbol * represents a bonding site.
In Formula (f2-r-2), Yaaf represents a carbon atom. Xaaf represents a group that forms an aliphatic cyclic group with Yaaf. Some or all hydrogen atoms in the aliphatic cyclic group may be substituted. Here, Xaaf and Yaaf do not form an aliphatic cyclic group having a crosslinked structure. Raf4 represents an aromatic hydrocarbon group which may have a substituent. The symbol * represents a bonding site.]
In Formula (f2-r-1), Xaf represents a group that forms an aliphatic cyclic group with Yaf. Some or all hydrogen atoms in the aliphatic cyclic group may be substituted. Here, Xaf and Yaf do not form an aliphatic cyclic group having a crosslinked structure.
The aliphatic cyclic group having no crosslinked structure which is formed by Xaf and Yaf may be a monocyclic group or a polycyclic group. Examples of the monocyclic aliphatic cyclic group include a group in which two or more hydrogen atoms have been removed from a monocycloalkane. It is preferable that the monocycloalkane has 3 to 8 carbon atoms, and specific examples thereof include cyclopropane, cyclobutane, cyclopentane, cyclohexane, cycloheptane, and cyclooctane. Examples of the polycyclic aliphatic cyclic group include a group in which two or more hydrogen atoms have been removed from a polycycloalkane. Examples of the polycycloalkane include a polycycloalkane having a fused ring polycyclic skeleton such as decalin, perhydroazulene, perhydroanthracene, or a ring structure having a steroid skeleton. Among these, a monocyclic aliphatic cyclic group is preferable, a group in which one or more hydrogen atoms have been removed from cyclopropane, cyclopentane, cyclohexane, or cyclooctane is more preferable, a group in which one or more hydrogen atoms have been removed from cyclopentane, cyclohexane, or cyclooctane is still more preferable, and a group in which one or more hydrogen atoms have been removed from cyclopentane is particularly preferred.
Some or all hydrogen atoms in the aliphatic cyclic group may be substituted, and examples of the substituent include those for Ra05 exemplified as the substituents for Ra′3 in Formula (a1-r-1). However, examples of the polycyclic aliphatic saturated hydrocarbon group include a group in which one or more hydrogen atoms have been removed from decalin, perhydroazulene, or perhydroanthracene that does not have a crosslinked structure.
In Formula (f2-r-1), examples of the chain-like monovalent saturated hydrocarbon group having 1 to 10 carbon atoms as Rami to Raf 3 include a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group, and a decyl group.
Examples of the monovalent aliphatic cyclic saturated hydrocarbon group having 3 to 20 carbon atoms as Rami to Raf 3 include a monocyclic aliphatic saturated hydrocarbon group such as a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, a cyclooctyl group, a cyclodecyl group, or a cyclododecyl group; and a polycyclic aliphatic saturated hydrocarbon group such as decalin, perhydroazulene, or perhydroanthracene.
From the viewpoint of easily synthesizing a monomer compound, it is preferable that Raf01 to Raf03 represent a hydrogen atom or a chain-like monovalent saturated hydrocarbon group having 1 to 10 carbon atoms. Among these, a hydrogen atom, a methyl group, or an ethyl group is more preferable, and a hydrogen atom is particularly preferable.
Examples of the substituent included in the chain-like saturated hydrocarbon group or the aliphatic cyclic saturated hydrocarbon group represented by Raf01 to Raf03 include the same groups as those for Ra05. However, examples of the polycyclic aliphatic saturated hydrocarbon group include a group in which one or more hydrogen atoms have been removed from decalin, perhydroazulene, or perhydroanthracene that does not have a crosslinked structure.
Examples of the group having a carbon-carbon double bond generated by two or more of Raf01 to Raf03 being bonded to one another to form a cyclic structure include a cyclopentenyl group, a cyclohexenyl group, a methylcyclopentenyl group, a methylcyclohexenyl group, a cyclopentylidenethenyl group, and a cyclohexylidenethenyl group.
Examples of the acid dissociable group represented by Formula (f2-r-1) include the same groups represented by Formulae (r-pr-sv1) to (r-pr-sv10) and (r-pr-mv01) to (r-pr-mv04) exemplified as the groups represented by Formula (a1-r2-2).
Among these, as the acid dissociable group represented by Formula (f2-r-1), groups represented by Formulae (r-pr-sv1) to (r-pr-sv10) are preferable, groups represented by Formulae (r-pr-sv1) to (r-pr-sv4) are more preferable, and groups represented by Formulae (r-pr-sv1), (r-pr-sv2), and (r-pr-sv4) are still more preferable.
In Formula (f2-r-2), the aliphatic cyclic group that does not have a crosslinked structure formed by Xaaf and Yaaf has the same definition as that for the aliphatic cyclic group that does not have a crosslinked structure formed by Xaf and Yaf in Formula (f2-r-1).
In Formula (f2-r-2), examples of the aromatic hydrocarbon group as Raf0 include a group in which one or more hydrogen atoms have been removed from an aromatic hydrocarbon ring having 5 to 30 carbon atoms. Among the examples, Raf0 represents preferably a group in which one or more hydrogen atoms have been removed from an aromatic hydrocarbon ring having 6 to 15 carbon atoms, more preferably a group in which one or more hydrogen atoms have been removed from benzene, naphthalene, anthracene, or phenanthrene, still more preferably a group in which one or more hydrogen atoms have been removed from benzene, naphthalene, or anthracene, particularly preferably a group in which one or more hydrogen atoms have been removed from benzene or naphthalene, and most preferably a group in which one or more hydrogen atoms have been removed from benzene.
Examples of the substituent which may be included in RafP in Formula (f2-r-2) include an alkyl group, a hydroxy group, a carboxyl group, a halogen atom (such as a fluorine atom, a chlorine atom, or a bromine atom), an alkoxy group (such as a methoxy group, an ethoxy group, a propoxy group, or a butoxy group), and an alkyloxycarbonyl group.
As the alkyl group as the substituent, an alkyl group having 1 to 5 carbon atoms is preferable, and a methyl group, or a tert-butyl group is more preferable.
Examples of the acid dissociable group represented by Formula (f2-r-2) are the same as the groups represented by Formulae (r-pr-sa1) to (r-pr-sa9) exemplified as the groups represented by Formula (a1-r2-3).
Hereinafter, specific examples of the constitutional unit (f2) will be described.
In the following formulae, Ra represents a hydrogen atom, a methyl group, or a trifluoromethyl group.
Among the examples shown above, as the constitutional unit (f2), at least one selected from the group consisting of constitutional units respectively represented by Chemical Formulae (f2-1-001) to (f2-1-004), (f2-2-001) to (f2-2-006), (f2-2-008), (f2-2-009), and (f2-2-011) to (f2-2-014) is preferable, at least one selected from the group consisting of constitutional unit respectively represented by Chemical Formulae (f2-1-001) to (f2-1-004) and (f2-2-001) to (f2-2-006) is more preferable, and at least one selected from the group consisting of constitutional units respectively represented by Chemical Formulae (f2-1-001), (f2-1-002), (f2-1-004), (f2-2-004), and (f2-2-005) is still more preferable.
The component (F) in the resist composition of the present embodiment contains the component (F1). More specific examples of the component (F1) include a polymer (homopolymer) formed of only the constitutional unit (f10); a copolymer of the constitutional unit (f10) and the constitutional unit (a2); a copolymer of a constitutional unit (f10) and the constitutional unit (f2); a copolymer of the constitutional unit (f10), the constitutional unit (f2), and the constitutional unit (a2); and a copolymer of the constitutional unit (f10), the constitutional unit (f2), and the constitutional unit (a6).
It is preferable that such a constitutional unit (a2) is a constitutional unit represented by Formula (a2-1). In Formula (a2-1), it is more preferable that Ra21 represents a lactone-containing cyclic group, a cyclic anhydride-containing cyclic group, or a carbonate-containing cyclic group. Specifically, it is particularly preferable that Ra21 represents a lactone-containing cyclic group represented by Formulae (r-lc-1-1), (r-1c-1-2), (r-lc-1-8), (r-lc-1-9), and (r-lc-8-1), a cyclic anhydride-containing cyclic group represented by Formula (r-aa-1), or a carbonate-containing cyclic group represented by Formula (r-cr-1-1).
The component (F) in the resist composition of the present embodiment is preferably a polymer (homopolymer) formed of only the constitutional unit (f10) from the viewpoint of the temporal stability.
As the component (F) in the resist composition of the present embodiment, from the viewpoint of improving the lithography characteristics, a copolymer of the constitutional unit (f10) and the constitutional unit (a2), a copolymer of the constitutional unit (f10) and the constitutional unit (f2); a copolymer of the constitutional unit (f10), the constitutional unit (f2), and the constitutional unit (a2), or a copolymer of the constitutional unit (f10), the constitutional unit (f2), and the constitutional unit (a6) is preferable; a copolymer of the constitutional unit (f10) and the constitutional unit (a2), a copolymer of the constitutional unit (f10), the constitutional unit (f2), and the constitutional unit (a2), or a copolymer of the constitutional unit (f10), the constitutional unit (f2), and the constitutional unit (a6) is more preferable; a copolymer of the constitutional unit (f10), the constitutional unit (f2), and the constitutional unit (a2), or a copolymer of the constitutional unit (f10), the constitutional unit (f2), and the constitutional unit (a6) is still more preferable; and a copolymer of the constitutional unit (f10), the constitutional unit (f2), and the constitutional unit (a2) is most preferable.
The content of the component (F) in the resist composition according to the present embodiment is preferably in a range of 0.5 to 20 parts by mass, more preferably in a range of 1 to 15 parts by mass, and still more preferably in a range of 3 to 12 parts by mass with respect to 100 parts by mass of the component (A).
In a case where the content of the component (F) is set to be greater than or equal to the lower limit of the above-described preferable range, lithography characteristics such as enhancement of the resolution and reduction of the roughness are improved. Further, in a case where the content thereof is set to be less than or equal to the upper limit of the above-described preferable range, the component and other constitutional units can be balanced, and the lithography characteristics are improved.
In the resist composition of the present embodiment, the proportion of the component (F1) in the entire component (F) is, for example, 50% by mass or greater, preferably 70% by mass or greater, and more preferably 95% by mass. In addition, the proportion thereof may be 100% by mass.
<Other Components>
The resist composition according to the present embodiment may further other components in addition to the component (A) and the component (F) described above. Examples of other components include a component (B), a component (D), a component (E), and a component (S) described below.
<<Acid Generator Component (B)>>
The resist composition of the present embodiment may further contain, in addition to the component (A), an acid generator component (B) that generates an acid upon exposure (hereinafter, referred to as a “component (B)”).
The component (B) is not particularly limited, and those which have been proposed as an acid generator for a chemically amplified resist composition in the related art can be used.
Examples of the acid generator include various acid generators, for example, onium salt-based acid generators such as iodonium salts and sulfonium salts; oxime sulfonate-based acid generators; diazomethane-based acid generators such as bisalkyl or bisaryl sulfonyl diazomethanes and poly(bis-sulfonyl)diazomethanes; nitrobenzylsulfonate-based acid generators, iminosulfonate-based acid generators, and disulfone-based acid generators.
Examples of the onium salt-based acid generators include a compound represented by Formula (b-1) (hereinafter, also referred to as a “component (b-1)”), a compound represented by Formula (b-2) (hereinafter, also referred to as a “component (b-2)”), and a compound represented by Formula (b-3) (hereinafter, also referred to as a “component (b-3)”).
[In the formulae, R101 and R104 to R108 each independently represent a cyclic group which may have a substituent, a chain-like alkyl group which may have a substituent, or a chain-like alkenyl group which may have a substituent. R104 and R105 may be bonded to each other to form a ring structure. R102 represents a fluorinated alkyl group having 1 to 5 carbon atoms or a fluorine atom. Y101 represents a divalent linking group having an oxygen atom or a single bond. V ° 1 to V103 each independently represent a single bond, an alkylene group, or a fluorinated alkylene group. L101 and L102 each independently represent a single bond or an oxygen atom. L103 to L105 each independently represent a single bond, —CO—, or —SO2—. m represents an integer of 1 or greater, and M′m+ represents an m-valent onium cation.]
{Anion Moiety}
Anions in Component (b-1)
In Formula (b-1), R101 represents a cyclic group which may have a substituent, a chain-like alkyl group which may have a substituent, or a chain-like alkenyl group which may have a substituent.
Cyclic Group which May have Substituent:
The cyclic group is preferably a cyclic hydrocarbon group, and the cyclic hydrocarbon group may be an aromatic hydrocarbon group or an aliphatic hydrocarbon group. The aliphatic hydrocarbon group indicates a hydrocarbon group that has no aromaticity. Further, the aliphatic hydrocarbon group may be saturated or unsaturated. In general, it is preferable that the aliphatic hydrocarbon group is saturated.
The aromatic hydrocarbon group as R101 is a hydrocarbon group having an aromatic ring. The aromatic hydrocarbon group has preferably 3 to 30 carbon atoms, more preferably 5 to 30, still more preferably 5 to 20, particularly preferably 6 to 15, and most preferably 6 to 10. Here, the number of carbon atoms in a substituent is not included in the number of carbon atoms.
Specific examples of the aromatic ring contained in the aromatic hydrocarbon group as R101 include benzene, fluorene, naphthalene, anthracene, phenanthrene, biphenyl, and an aromatic hetero ring in which some carbon atoms constituting these aromatic rings have been substituted with hetero atoms. Examples of the hetero atom in the aromatic hetero rings include an oxygen atom, a sulfur atom, and a nitrogen atom.
Specific examples of the aromatic hydrocarbon group as R101 include a group in which one hydrogen atom has been removed from the aromatic ring (for example, an aryl group such as a phenyl group or a naphthyl group), and a group in which one hydrogen atom in the aromatic ring has been substituted with an alkylene group (for example, an arylalkyl group such as a benzyl group, a phenethyl group, a 1-naphthylmethyl group, a 2-naphthylmethyl group, 1-naphthylethyl group, or a 2-naphthylethyl group). The alkylene group (an alkyl chain in the arylalkyl group) has preferably 1 to 4 carbon atoms, more preferably 1 or 2 carbon atoms, and particularly preferably 1 carbon atom.
Examples of the cyclic aliphatic hydrocarbon group as R101 include an aliphatic hydrocarbon group having a ring in the structure thereof.
Examples of the aliphatic hydrocarbon group having a ring in the structure thereof include an alicyclic hydrocarbon group (a group in which one hydrogen atom has been removed from an aliphatic hydrocarbon ring), a group in which the alicyclic hydrocarbon group is bonded to the terminal of a linear or branched aliphatic hydrocarbon group, and a group in which the alicyclic hydrocarbon group is interposed in a linear or branched aliphatic hydrocarbon group.
The alicyclic hydrocarbon group has preferably 3 to 20 carbon atoms and more preferably 3 to 12 carbon atoms.
The alicyclic hydrocarbon group may be a polycyclic group or a monocyclic group. As the monocyclic alicyclic hydrocarbon group, a group in which one or more hydrogen atoms have been removed from a monocycloalkane is preferable. The monocycloalkane has preferably 3 to 6 carbon atoms, and specific examples thereof include cyclopentane and cyclohexane. As the polycyclic alicyclic hydrocarbon group, a group in which one or more hydrogen atoms have been removed from a polycycloalkane is preferable, and the number of carbon atoms of the polycycloalkane is preferably in a range of 7 to 30. Among these, a polycycloalkane having a crosslinked ring polycyclic skeleton such as adamantane, norbornane, isobornane, tricyclodecane, or tetracyclododecane; and a polycycloalkane having a fused ring polycyclic skeleton such as a cyclic group having a steroid skeleton are preferable as the polycycloalkane.
Among these examples, as the cyclic aliphatic hydrocarbon group as R101, a group in which one or more hydrogen atoms have been removed from a monocycloalkane or a polycycloalkane is preferable, a group in which one hydrogen atom has been removed from a polycycloalkane is more preferable, an adamantyl group or a norbornyl group is particularly preferable, and an adamantyl group is most preferable.
The linear aliphatic hydrocarbon group which may be bonded to the alicyclic hydrocarbon group has preferably 1 to 10 carbon atoms, more preferably 1 to 6 carbon atoms, still more preferably 1 to 4 carbon atoms, and most preferably 1 to 3 carbon atoms. As the linear aliphatic hydrocarbon group, a linear alkylene group is preferable. Specific examples thereof include a methylene group [—CH2—], an ethylene group [—(CH2)2—], a trimethylene group [—(CH2)3—], a tetramethylene group [—(CH2)4—], and a pentamethylene group [—(CH2)5—].
The branched aliphatic hydrocarbon group which may be bonded to the alicyclic hydrocarbon group has preferably 2 to 10 carbon atoms, more preferably 3 to 6 carbon atoms, still more preferably 3 or 4 carbon atoms, and most preferably 3 carbon atoms. As the branched aliphatic hydrocarbon group, a branched alkylene group is preferable, and specific examples thereof include alkylalkylene groups, for example, alkylmethylene groups such as —CH(CH3)—, —CH(CH2CH3)—, —C(CH3)2—, —C(CH3)(CH2CH3)—, —C(CH3)(CH2CH2CH3)—, and —C(CH2CH3)2—; alkylethylene groups such as —CH(CH3)CH2—, —CH(CH3)CH(CH3)—, —C(CH3)2CH2—, —CH(CH2CH3)CH2—, and —C(CH2CH3)2—CH2—; alkyltrimethylene groups such as —CH(CH3)CH2CH2—, and —CH2CH(CH3)CH2—; and alkyltetramethylene groups such as —CH(CH3)CH2CH2CH2—, and —CH2CH(CH3)CH2CH2—. As the alkyl group in the alkylalkylene group, a linear alkyl group having 1 to 5 carbon atoms is preferable.
Further, the cyclic hydrocarbon group as R101 may have a hetero atom such as a hetero ring. Specific examples thereof include a lactone-containing cyclic group represented by any of Formulae (a2-r-1) to (a2-r-8), a —SO2-containing cyclic group represented by any of Formulae (a5-r-1) to (a5-r-4), and other heterocyclic groups represented by any of Chemical Formulae (r-hr-1) to (r-hr-16).
Examples of the substituent for the cyclic group as R101 include an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxyl group, a carbonyl group, and a nitro group.
As the alkyl group as the substituent, an alkyl group having 1 to 5 carbon atoms is preferable, and a methyl group, an ethyl group, a propyl group, an n-butyl group, or a tert-butyl group is most preferable.
As the alkoxy group as the substituent, an alkoxy group having 1 to 5 carbon atoms is preferable, a methoxy group, an ethoxy group, an n-propoxy group, an iso-propoxy group, an n-butoxy group, or a tert-butoxy group is more preferable, and a methoxy group or an ethoxy group is most preferable.
Examples of the halogen atom as the substituent include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom. Among these, a fluorine atom is preferable.
Example of the halogenated alkyl group as the substituent includes a group in which some or all hydrogen atoms in an alkyl group having 1 to 5 carbon atoms such as a methyl group, an ethyl group, a propyl group, an n-butyl group, or a tert-butyl group have been substituted with the halogen atoms.
The carbonyl group as the substituent is a group that substitutes a methylene group (—CH2—) constituting the cyclic hydrocarbon group.
Chain-Like Alkyl Group which May have Substituent:
The chain-like alkyl group as R101 may be linear or branched. The linear alkyl group has preferably 1 to 20 carbon atoms, more preferably 1 to 15 carbon atoms, and most preferably 1 to 10 carbon atoms. Specific examples thereof include a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group, a nonyl group, a decanyl group, an undecyl group, a dodecyl group, a tridecyl group, an isotridecyl group, a tetradecyl group, a pentadecyl group, a hexadecyl group, an isohexadecyl group, a heptadecyl group, an octadecyl group, a nonadecyl group, an icosyl group, a henicosyl group, and a docosyl group.
The branched alkyl group has preferably 3 to 20 carbon atoms, more preferably 3 to 15, and most preferably 3 to 10. Specific examples thereof include a 1-methylethyl group, a 1-methylpropyl group, a 2-methylpropyl group, a 1-methylbutyl group, a 2-methylbutyl group, a 3-methylbutyl group, a 1-ethylbutyl group, a 2-ethylbutyl group, a 1-methylpentyl group, a 2-methylpentyl group, a 3-methylpentyl group, and a 4-methylpentyl group.
Chain-Like Alkenyl Group which May have Substituent:
The chain-like alkenyl group as R101 may be linear or branched, and the number of carbon atoms thereof is preferably in a range of 2 to 10, more preferably in a range of 2 to 5, still more preferably in a range of 2 to 4, and particularly preferably 3. Examples of the linear alkenyl group include a vinyl group, a propenyl group (an allyl group), and a butynyl group. Examples of the branched alkenyl group include a 1-methylvinyl group, a 2-methylvinyl group, a 1-methylpropenyl group, and a 2-methylpropenyl group.
Among the examples, as the chain-like alkenyl group, a linear alkenyl group is preferable, a vinyl group or a propenyl group is more preferable, and a vinyl group is particularly preferable.
Examples of the substituent for the chain-like alkyl group or alkenyl group as R101 include an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxyl group, a carbonyl group, a nitro group, an amino group, a cyclic group as R101.
Among the examples, R101 represents preferably a cyclic group which may have a substituent and more preferably a cyclic hydrocarbon group which may have a substituent. More specific preferred examples thereof include a phenyl group, a naphthyl group, a group in which one or more hydrogen atoms have been removed from a polycycloalkane, a lactone-containing cyclic group represented by any of Formulae (a2-r-1) to (a2-r-8), and a —SO2-containing cyclic group represented by any of Formulae (a5-r-1) to (a5-r-4).
In Formula (b-1), Y101 represents a single bond or a divalent linking group having an oxygen atom.
In a case where Y01 represents a divalent linking group having an oxygen atom, Y101 may have an atom other than the oxygen atom. Examples of atoms other than an oxygen atom include a carbon atom, a hydrogen atom, a sulfur atom, and a nitrogen atom.
Examples of the divalent linking group having an oxygen atom include a non-hydrocarbon oxygen atom-containing linking group such as an oxygen atom (an ether bond: —O—), an ester bond (—C(═O)—O—), an oxycarbonyl group (—O—C(═O)—), an amide bond (—C(═O)—NH—), a carbonyl group (—C(═O)—), or a carbonate bond (—O—C(═O)—O—); and combinations of the above-described non-hydrocarbon oxygen atom-containing linking groups with an alkylene group. Further, a sulfonyl group (—SO2—) may be further linked to the combination. Examples of the divalent linking group having an oxygen atom include linking groups respectively represented by Formulae (y-a1-1) to (y-a1-7).
[In the formulae, V′101 represents a single bond or an alkylene group having 1 to 5 carbon atoms, and V′102 represents a divalent saturated hydrocarbon group having 1 to 30 carbon atoms.]
The divalent saturated hydrocarbon group as V′102 is preferably an alkylene group having 1 to 30 carbon atoms, more preferably an alkylene group having 1 to 10 carbon atoms, and still more preferably an alkylene group having 1 to 5 carbon atoms.
The alkylene group as V′101 and V′102 may be a linear alkylene group or a branched alkylene group, and a linear alkylene group is preferable.
Specific examples of the alkylene group as V′101 and V′102 include a methylene group [—CH2—]; an alkylmethylene group such as —CH(CH3)—, —CH(CH2CH3)—, —C(CH3)2—, —C(CH3)(CH2CH3)—, —C(CH3)(CH2CH2CH3)—, or —C(CH2CH3)2—; an ethylene group [—CH2CH2—]; an alkylethylene group such as —CH(CH3)CH2—, —CH(CH3)CH(CH3)—, —C(CH3)2CH2—, or —CH(CH2CH3)CH2—; a trimethylene group (n-propylene group) [—CH2CH2CH2—]; an alkyltrimethylene group such as —CH(CH3)CH2CH2— or —CH2CH(CH3)CH2—; a tetramethylene group [—CH2CH2CH2CH2—]; an alkyltetramethylene group such as —CH(CH3)CH2CH2CH2— or —CH2CH(CH3)CH2CH2—; and a pentamethylene group [—CH2CH2CH2CH2CH2—].
Further, a part of methylene group in the alkylene group as V′101 and V′102 may be substituted with a divalent aliphatic cyclic group having 5 to 10 carbon atoms. As the aliphatic cyclic group, a divalent group in which one hydrogen atom has been removed from the cyclic aliphatic hydrocarbon group (a monocyclic aliphatic hydrocarbon group or a polycyclic aliphatic hydrocarbon group) as Ra′3 in Formula (a1-r-1) is preferable, and a cyclohexylene group, a 1,5-adamantylene group, or a 2,6-adamantylene group is more preferable.
Y101 represents preferably a divalent linking group having an ester bond or a divalent linking group having an ether bond and more preferably linking groups respectively represented by Formulae (y-a1-1) to (y-a1-5).
In Formula (b-1), V101 represents a single bond, an alkylene group, or a fluorinated alkylene group. It is preferable that the alkylene group and the fluorinated alkylene group as V101 have 1 to 4 carbon atoms. Examples of the fluorinated alkylene group as V101 include a group in which some or all hydrogen atoms in the alkylene group as V101 have been substituted with fluorine atoms. Among these examples, it is preferable that V101 represents a single bond or a fluorinated alkylene group having 1 to 4 carbon atoms.
In Formula (b-1), R102 represents a fluorine atom or a fluorinated alkyl group having 1 to 5 carbon atoms. R102 represents preferably a fluorine atom or a perfluoroalkyl group having 1 to 5 carbon atoms and more preferably a fluorine atom.
In a case where Y101 represents a single bond, specific example of the anion moiety represented by Formula (b-1) include a fluorinated alkylsulfonate anion such as a trifluoromethanesulfonate anion or a perfluorobutanesulfonate anion. Further, in a case where Y101 represents a divalent linking group having an oxygen atom, specific examples thereof include an anion represented by any of Formulae (an-1) to (an-3).
[In the formulae, R″101 represents an aliphatic cyclic group which may have a substituent, a monovalent heterocyclic group represented by any of Chemical Formulae (r-hr-1) to (r-hr-6), or a chain-like alkyl group which may have a substituent. R″102 represents an aliphatic cyclic group which may have a substituent, a lactone-containing cyclic group represented by any of Formulae (a2-r-1) and (a2-r-3) to (a2-r-8), or a —SO2— containing cyclic group represented by any of Formulae (a5-r-1) to (a5-r-4). R″103 represents an aromatic cyclic group which may have a substituent, an aliphatic cyclic group which may have a substituent, or a chain-like alkenyl group which may have a substituent. V″1 represents a single bond, an alkylene group having 1 to 4 carbon atoms, or a fluorinated alkylene group having 1 to 4 carbon atoms. R102 represents a fluorine atom or a fluorinated alkyl group having 1 to 5 carbon atoms. Each v″ independently represents an integer of 0 to 3, each q″ independently represents an integer of 0 to 20, and n″ represents 0 or 1.]
As the aliphatic cyclic group as R″101, R″102, and R″103 which may have a substituent, the same groups as those for the cyclic aliphatic hydrocarbon group as R101 in Formula (b-1) are preferable. Examples of the substituent include the same groups as those for the substituent which may substitute the cyclic aliphatic hydrocarbon group as R101 in Formula (b-1).
As the aromatic cyclic group as R″103 which may have a substituent, the same groups as those for the aromatic hydrocarbon group in the cyclic hydrocarbon group as R101 in Formula (b-1) are preferable. Examples of the substituent include the same groups as those for the substituent which may substitute the aromatic hydrocarbon group as R101 in Formula (b-1).
As the chain-like alkyl group as R″101 which may have a substituent, the same groups as those for the chain-like alkyl group as R101 in Formula (b-1) are preferable.
As the chain-like alkenyl group as R″103 which may have a substituent, the same groups as those for the chain-like alkenyl group as R101 in Formula (b-1) are preferable.
Anions in Component (b-2)
In Formula (b-2), R104 and R105 each independently represent a cyclic group which may have a substituent, a chain-like alkyl group which may have a substituent, or a chain-like alkenyl group which may have a substituent, and examples thereof include the same groups as those for R101 in Formula (b-1). Here, R104 and R105 may be bonded to each other to form a ring.
R104 and R105 represent preferably a chain-like alkyl group which may have a substituent and more preferably a linear or branched alkyl group or a linear or branched fluorinated alkyl group.
The chain-like alkyl group has preferably 1 to 10 carbon atoms, more preferably 1 to 7 carbon atoms, and still more preferably 1 to 3 carbon atoms. It is preferable that the number of carbon atoms in the chain-like alkyl group as R104 and R105 becomes smaller within the range of the number of carbon atoms because the solubility in a solvent for a resist is also excellent. Further, in the chain-like alkyl group as R104 and R105, it is preferable that the number of hydrogen atoms substituted with fluorine atoms is as large as possible because the acid strength increases and the transparency to high energy light with a wavelength of 250 nm or less or electron beams is improved. The proportion of fluorine atoms in the chain-like alkyl group, that is, the fluorination ratio is preferably in a range of 70% to 100% and more preferably in a range of 90% to 100%, and it is most preferable that the chain-like alkyl group is a perfluoroalkyl group in which all hydrogen atoms are substituted with fluorine atoms.
In Formula (b-2), V102 and V103 each independently represent a single bond, an alkylene group, or a fluorinated alkylene group, and examples thereof include the same groups as those for V101 in Formula (b-1).
In Formula (b-2), L101 and L102 each independently represent a single bond or an oxygen atom.
Anions in Component (b-3)
In Formula (b-3), R106 to R108 each independently represent a cyclic group which may have a substituent, a chain-like alkyl group which may have a substituent, or a chain-like alkenyl group which may have a substituent, and examples thereof include the same groups as those for R101 in Formula (b-1).
In Formula (b-3), L103 to L105 each independently represent a single bond, —CO—, or —SO2—.
Among the examples, as the anion moiety of the component (B), an anion in the component (b-1) is preferable. Among the examples, an anion represented by any of Formulae (an-1) to (an-3) is more preferable, an anion represented by Formula (an-1) or (an-2) is still more preferable, and an anion represented by Formula (an-2) is particularly preferable.
{Cation Moiety}
In Formulae (b-1), (b-2), and (b-3), M′m+ represents an m-valent onium cation. Among these, a sulfonium cation and an iodonium cation are preferable.
m represents an integer of 1 or greater.
Preferred examples of the cation moiety ((M′m+)1/m) include organic cations respectively represented by Formulae (ca-1) to (ca-4).
[In the formulae, R201 to R207, R211, and R212 each independently represent an aryl group, an alkyl group or an alkenyl group which may have a substituent. R201 to R203, R206 and R207, and R211 and R212 may be bonded to each other to form a ring with the sulfur atom in the formula. R208 and R209 each independently represent a hydrogen atom or an alkyl group having 1 to 5 carbon atoms. R210 represents an aryl group which may have a substituent, an alkyl group which may have a substituent, an alkenyl group which may have a substituent, or a —SO2-containing cyclic group which may have a substituent. L201 represents —C(═O)— or —C(═O)—O—. Y201's each independently represent an arylene group, an alkylene group, or an alkenylene group. x represents 1 or 2. W201 represents a (x+1)-valent linking group.]
In Formulae (ca-1) to (ca-4), examples of the aryl group as R201 to R207, R211, and R212 include an unsubstituted aryl group having 6 to 20 carbon atoms. Among these, a phenyl group or a naphthyl group is preferable.
The alkyl group as R201 to R207, R211, and R212 is a chain-like or cyclic alkyl group, and the number of carbon atoms thereof is preferably in a range of 1 to 30.
It is preferable that the alkenyl group as R201 to R207, R211, and R212 has 2 to 10 carbon atoms.
Examples of the substituent which may be included in R201 to R207, R211 and R212 include an alkyl group, a halogen atom, a halogenated alkyl group, a carbonyl group, a cyano group, an amino group, an aryl group, and groups respectively represented by Formulae (ca-r-1) to (ca-r-7).
[In the formulae, each R′201 independently represents a hydrogen atom, a cyclic group which may have a substituent, a chain-like alkyl group which may have a substituent, or a chain-like alkenyl group which may have a substituent.]
Cyclic Group which May have Substituent:
The cyclic group is preferably a cyclic hydrocarbon group, and the cyclic hydrocarbon group may be an aromatic hydrocarbon group or an aliphatic hydrocarbon group. The aliphatic hydrocarbon group indicates a hydrocarbon group that has no aromaticity. Further, the aliphatic hydrocarbon group may be saturated or unsaturated. In general, it is preferable that the aliphatic hydrocarbon group is saturated.
The aromatic hydrocarbon group as R′201 is a hydrocarbon group having an aromatic ring. The aromatic hydrocarbon group has preferably 3 to 30 carbon atoms, more preferably 5 to 30, still more preferably 5 to 20, particularly preferably 6 to 15, and most preferably 6 to 10. Here, the number of carbon atoms in a substituent is not included in the number of carbon atoms.
Specific examples of the aromatic ring contained in the aromatic hydrocarbon group as R′201 include benzene, fluorene, naphthalene, anthracene, phenanthrene, biphenyl, or an aromatic hetero ring in which some carbon atoms constituting any of these aromatic rings have been substituted with hetero atoms. Examples of the hetero atom in the aromatic hetero rings include an oxygen atom, a sulfur atom, and a nitrogen atom.
Specific examples of the aromatic hydrocarbon group as R′201 include a group in which one hydrogen atom has been removed from the aromatic ring (an aryl group such as a phenyl group or a naphthyl group), and a group in which one hydrogen atom in the aromatic ring has been substituted with an alkylene group (for example, an arylalkyl group such as a benzyl group, a phenethyl group, a 1-naphthylmethyl group, a 2-naphthylmethyl group, 1-naphthylethyl group, or a 2-naphthylethyl group). The alkylene group (an alkyl chain in the arylalkyl group) has preferably 1 to 4 carbon atoms, more preferably 1 or 2 carbon atoms, and particularly preferably 1 carbon atom.
Examples of the cyclic aliphatic hydrocarbon group as R′201 include an aliphatic hydrocarbon group having a ring in the structure thereof.
Examples of the aliphatic hydrocarbon group having a ring in the structure thereof include an alicyclic hydrocarbon group (a group in which one hydrogen atom has been removed from an aliphatic hydrocarbon ring), a group in which the alicyclic hydrocarbon group is bonded to the terminal of a linear or branched aliphatic hydrocarbon group, and a group in which the alicyclic hydrocarbon group is interposed in a linear or branched aliphatic hydrocarbon group.
The alicyclic hydrocarbon group has preferably 3 to 20 carbon atoms and more preferably 3 to 12 carbon atoms.
The alicyclic hydrocarbon group may be a polycyclic group or a monocyclic group. As the monocyclic alicyclic hydrocarbon group, a group in which one or more hydrogen atoms have been removed from a monocycloalkane is preferable. The monocycloalkane has preferably 3 to 6 carbon atoms, and specific examples thereof include cyclopentane and cyclohexane. As the polycyclic alicyclic hydrocarbon group, a group in which one or more hydrogen atoms have been removed from a polycycloalkane is preferable, and the number of carbon atoms of the polycycloalkane is preferably in a range of 7 to 30. Among these, a polycycloalkane having a crosslinked ring polycyclic skeleton such as adamantane, norbornane, isobornane, tricyclodecane, or tetracyclododecane; and a polycycloalkane having a fused ring polycyclic skeleton such as a cyclic group having a steroid skeleton are preferable as the polycycloalkane.
Among these examples, as the cyclic aliphatic hydrocarbon group as R′201, a group in which one or more hydrogen atoms have been removed from a monocycloalkane or a polycycloalkane is preferable, a group in which one hydrogen atom has been removed from a polycycloalkane is more preferable, an adamantyl group or a norbornyl group is particularly preferable, and an adamantyl group is most preferable.
The linear or branched aliphatic hydrocarbon group which may be bonded to the alicyclic hydrocarbon group has preferably 1 to 10 carbon atoms, more preferably 1 to 6 carbon atoms, still more preferably 1 to 4 carbon atoms, and most preferably 1 to 3 carbon atoms.
As the linear aliphatic hydrocarbon group, a linear alkylene group is preferable. Specific examples thereof include a methylene group [—CH2—], an ethylene group [—(CH2)2—], a trimethylene group [—(CH2)3—], a tetramethylene group [—(CH2)4—], and a pentamethylene group [—(CH2)5—].
As the branched aliphatic hydrocarbon group, a branched alkylene group is preferable, and specific examples thereof include alkylalkylene groups, for example, alkylmethylene groups such as —CH(CH3)—, —CH(CH2CH3)—, —C(CH3)2—, —C(CH3)(CH2CH3)—, —C(CH3)(CH2CH2CH3)—, and —C(CH2CH3)2—; alkylethylene groups such as —CH(CH3)CH2—, —CH(CH3)CH(CH3)—, —C(CH3)2CH2—, —CH(CH2CH3)CH2—, and —C(CH2CH3)2—CH2—; alkyltrimethylene groups such as —CH(CH3)CH2CH2—, and —CH2CH(CH3)CH2—; and alkyltetramethylene groups such as —CH(CH3)CH2CH2CH2—, and —CH2CH(CH3)CH2CH2—. As the alkyl group in the alkylalkylene group, a linear alkyl group having 1 to 5 carbon atoms is preferable.
Further, the cyclic hydrocarbon group as R′201 may have a hetero atom such as a hetero ring. Specific examples thereof include a lactone-containing cyclic group represented by any of Formulae (a2-r-1) to (a2-r-8), a —SO2-containing cyclic group represented by any of Formulae (a5-r-1) to (a5-r-4), and other heterocyclic groups represented by any of Chemical Formulae (r-hr-1) to (r-hr-16).
Examples of the substituent for the cyclic group as R′201 include an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxyl group, a carbonyl group, and a nitro group.
As the alkyl group as the substituent, an alkyl group having 1 to 5 carbon atoms is preferable, and a methyl group, an ethyl group, a propyl group, an n-butyl group, or a tert-butyl group is most preferable.
As the alkoxy group as the substituent, an alkoxy group having 1 to 5 carbon atoms is preferable, a methoxy group, an ethoxy group, an n-propoxy group, an iso-propoxy group, an n-butoxy group, or a tert-butoxy group is more preferable, and a methoxy group or an ethoxy group is most preferable.
Examples of the halogen atom as the substituent include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom. Among these, a fluorine atom is preferable.
Example of the above-described halogenated alkyl group as the substituent includes a group in which some or all hydrogen atoms in an alkyl group having 1 to 5 carbon atoms such as a methyl group, an ethyl group, a propyl group, an n-butyl group, or a tert-butyl group have been substituted with the above-described halogen atoms.
The carbonyl group as the substituent is a group that substitutes a methylene group (—CH2—) constituting the cyclic hydrocarbon group.
Chain-like alkyl group which may have substituent:
The chain-like alkyl group as R′201 may be linear or branched.
The linear alkyl group has preferably 1 to 20 carbon atoms, more preferably 1 to 15 carbon atoms, and most preferably 1 to 10 carbon atoms. Specific examples thereof include a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group, a nonyl group, a decanyl group, an undecyl group, a dodecyl group, a tridecyl group, an isotridecyl group, a tetradecyl group, a pentadecyl group, a hexadecyl group, an isohexadecyl group, a heptadecyl group, an octadecyl group, a nonadecyl group, an icosyl group, a henicosyl group, and a docosyl group.
The branched alkyl group has preferably 3 to 20 carbon atoms, more preferably 3 to 15, and most preferably 3 to 10. Specific examples thereof include a 1-methylethyl group, a 1-methylpropyl group, a 2-methylpropyl group, a 1-methylbutyl group, a 2-methylbutyl group, a 3-methylbutyl group, a 1-ethylbutyl group, a 2-ethylbutyl group, a 1-methylpentyl group, a 2-methylpentyl group, a 3-methylpentyl group, and a 4-methylpentyl group.
Chain-like alkenyl group which may have substituent:
Such a chain-like alkenyl group as R′201 may be linear or branched, and the number of carbon atoms thereof is preferably in a range of 2 to 10, more preferably in a range of 2 to 5, still more preferably in a range of 2 to 4, and particularly preferably 3. Examples of the linear alkenyl group include a vinyl group, a propenyl group (an allyl group), and a butynyl group. Examples of the branched alkenyl group include a 1-methylvinyl group, a 2-methylvinyl group, a 1-methylpropenyl group, and a 2-methylpropenyl group.
Among the examples, as the chain-like alkenyl group, a linear alkenyl group is preferable, a vinyl group or a propenyl group is more preferable, and a vinyl group is particularly preferable.
Examples of the substituent for the chain-like alkyl group or alkenyl group as R′201 include an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxyl group, a carbonyl group, a nitro group, an amino group, and a cyclic group as R′201.
Examples of the cyclic group which may have a substituent, the chain-like alkyl group which may have a substituent, and the chain-like alkenyl group which may have a substituent as R′201 include the same groups as those for the acid dissociable group represented by Formula (a1-r-2) which are the exemplary examples of the cyclic group which may have a substituent and the chain-like alkyl group which may have a substituent, in addition to those described above.
Among the examples, R′201 represents preferably a cyclic group which may have a substituent and more preferably a cyclic hydrocarbon group which may have a substituent. More specific preferred examples thereof include a phenyl group, a naphthyl group, a group in which one or more hydrogen atoms have been removed from a polycycloalkane, a lactone-containing cyclic group represented by any of Formulae (a2-r-1) to (a2-r-8), and a —SO2-containing cyclic group represented by any of Formulae (a5-r-1) to (a5-r-4).
In Formulae (ca-1) to (ca-4), in a case where R201 to R203, R206 and R207, and R211 and R212 are bonded to each other to form a ring with a sulfur atom in the formula, these groups may be bonded to one another through a hetero atom such as a sulfur atom, an oxygen atom or a nitrogen atom, or a functional group such as a carbonyl group, —SO—, —SO2—, —SO3—, —COO—, —CONH— or —N(RN)— (here, RN represents an alkyl group having 1 to 5 carbon atoms). As a ring to be formed, a ring containing the sulfur atom in the formula in the ring skeleton thereof is preferably a 3- to 10-membered ring and particularly preferably a 5- to 7-membered ring including the sulfur atom. Specific examples of the ring to be formed include a thiophene ring, a thiazole ring, a benzothiophene ring, a thianthrene ring, a benzothiophene ring, a dibenzothiophene ring, a 9H-thioxanthene ring, a thioxanthone ring, a thianthrene ring, a phenoxathiin ring, a tetrahydrothiophenium ring, and a tetrahydrothiopyranium ring.
R208 and R209 each independently represent a hydrogen atom or an alkyl group having 1 to 5 carbon atoms and preferably a hydrogen atom or an alkyl group having 1 to 3 carbon atoms. In a case where R208 and R209 each represent an alkyl group, R208 and R209 may be bonded to each other to form a ring.
R210 represents an aryl group which may have a substituent, an alkyl group which may have a substituent, an alkenyl group which may have a substituent, or a —SO2— containing cyclic group which may have a substituent.
Examples of the aryl group as R210 include an unsubstituted aryl group having 6 to 20 carbon atoms. Among these, a phenyl group or a naphthyl group is preferable.
As the alkyl group as R210, a chain-like or cyclic alkyl group having 1 to 30 carbon atoms is preferable.
It is preferable that the alkenyl group as R210 has 2 to 10 carbon atoms.
As the —SO2-containing cyclic group as R210 which may have a substituent, the “—SO2-containing polycyclic group” is preferable, and a group represented by Formula (a5-r-1) is more preferable.
Y201's each independently represent an arylene group, an alkylene group, or an alkenylene group.
Examples of the arylene group as Y201 include a group in which one hydrogen atom has been removed from an aryl group exemplified as the aromatic hydrocarbon group represented by R101 in Formula (b-1).
Examples of the alkylene group and alkenylene group as Y201 include a group in which one hydrogen atom has been removed from the chain-like alkyl group or the chain-like alkenyl group as R101 in Formula (b-1).
In Formula (ca-4), x represents 1 or 2.
W201 represents a (x+1)-valent linking group, that is, a divalent or trivalent linking group.
As the divalent linking group represented by W201, a divalent hydrocarbon group which may have a substituent is preferable, and examples thereof include the same divalent hydrocarbon groups which may have a substituent as those for Ya21 in Formula (a2-1). The divalent linking group as W201 may be linear, branched, or cyclic and cyclic is more preferable. Among these, a group in which two carbonyl groups are combined with both ends of the arylene group is preferable. Examples of the arylene group include a phenylene group and a naphthylene group. Among these, a phenylene group is particularly preferable.
Examples of the trivalent linking group as W201 include a group in which one hydrogen atom has been removed from a divalent linking group as W201 and a group in which the divalent linking group has been further bonded to the divalent linking group. As the trivalent linking group as W201, a group in which two carbonyl groups are bonded to an arylene group is preferable.
Specific examples of suitable cations represented by Formula (ca-1) include cations respectively represented by Chemical Formulae (ca-1-1) to (ca-1-70).
[In the formulae, g1, g2, and g3 represent a repeating number, g1 represents an integer of 1 to 5, g2 represents an integer of 0 to 20, and g3 represents an integer of 0 to 20.]
[In the formulae, R″201 represents a hydrogen atom or a substituent, and examples of the substituent include the same groups as those for the substituents which may be included in R201 to R207 and R210 to R212.]
Specific examples of suitable cations represented by Formula (ca-2) include a diphenyliodonium cation and a bis(4-tert-butylphenyl)iodonium cation.
Specific examples of suitable cations represented by Formula (ca-3) include cations respectively represented by Formulae (ca-3-1) to (ca-3-6).
Specific examples of suitable cations represented by Formula (ca-4) include cations respectively represented by Formulae (ca-4-1) and (ca-4-2).
Among the examples, as the cation moiety ((M′m+)1/m), a cation represented by Formula (ca-1) is preferable.
In the resist composition according to the present embodiment, the component (B) may be used alone or in combination of two or more kinds thereof.
In a case where the resist composition contains the component (B), the content of the component (B) in the resist composition is preferably less than 50 parts by mass, more preferably in a range of 1 to 40 parts by mass, and still more preferably in a range of 5 to 25 parts by mass with respect to 100 parts by mass of the component (A).
In a case where the content of the component (B) is set to be in the above-described preferable range, pattern formation can be satisfactorily performed. Further, it is preferable that each component of the resist composition is dissolved in an organic solvent from the viewpoint that a uniform solution is easily obtained and the storage stability of the resist composition is improved.
<<Base Component (D)>>
The resist composition of the present embodiment may further contain, in addition to the component (A), a base component (component (D)) that traps an acid generated upon exposure (that is, controls diffusion of an acid). The component (D) functions as a quencher (an acid diffusion control agent) which traps an acid generated upon exposure in the resist composition.
Examples of the component (D) include a photodecomposable base (D1) (hereinafter, referred to as a “component (D1)”) which is decomposed upon exposure and loses an acid diffusion controllability and a nitrogen-containing organic compound (D2) (hereinafter, referred to as a component (D2)″) that does not correspond to the component (D1). Among these, the photodecomposable base (component (D1)) is preferable from the viewpoint of easily increasing the sensitivity, reducing the roughness, and improving the characteristic of suppressing occurrence of coating defects.
In Regard to Component (D1)
In a case where a resist composition containing the component (D1) is obtained, the contrast between an exposed portion and an unexposed portion of the resist film can be further improved in a case of forming a resist pattern.
The component (D1) is not particularly limited as long as the component is decomposed upon exposure and loses an acid diffusion controllability, and one or more compounds selected from the group consisting of a compound represented by Formula (d1-1) (hereinafter, referred to as a “component (d1-1)”), a compound represented by Formula (d1-2) (hereinafter, referred to as a “component (d1-2)”), and a compound represented by Formula (d1-3) (hereinafter, referred to as a “component (d1-3)”) are preferable.
Since the components (d1-1) to (d1-3) are decomposed and lose the acid diffusion controllability (basicity), the components (d1-1) to (d1-3) do not function as a quencher at the exposed portion of the resist film, but function as a quencher at the unexposed portion of the resist film.
[In the formulae, Rd1 to Rd4 represent a cyclic group which may have a substituent, a chain-like alkyl group which may have a substituent, or a chain-like alkenyl group which may have a substituent. Here, the carbon atom adjacent to the S atom as Rd2 in Formula (d1-2) has no fluorine atom bonded thereto. Yd1 represents a single bond or a divalent linking group. m represents an integer of 1 or greater, and each Mm+ independently represents an m-valent organic cation.]
{Component (d1-1)}
Anion Moiety
In Formula (d1-1), Rd1 represents a cyclic group which may have a substituent, a chain-like alkyl group which may have a substituent or a chain-like alkenyl group which may have a substituent, and examples thereof include the same groups as those for R′201.
Among these, it is preferable that the group as Rd1 represents an aromatic hydrocarbon group which may have a substituent, an aliphatic cyclic group which may have a substituent, and a chain-like alkyl group which may have a substituent. Examples of the substituent that may be included in these groups include a hydroxyl group, an oxo group, an alkyl group, an aryl group, a fluorine atom, a fluorinated alkyl group, a lactone-containing cyclic group represented by any of Formulae (a2-r-1) to (a2-r-8), an ether bond, an ester bond, and a combination thereof. In a case where an ether bond or an ester bond is included as the substituent, the substituent may be bonded through an alkylene group, and a linking group represented by any of Formulae (y-a1-1) to (y-a1-5) is preferable as the substituent.
Suitable examples of the aromatic hydrocarbon group include a phenyl group, a naphthyl group, and a polycyclic structure having a bicyclooctane skeleton (for example, a polycyclic structure formed of a bicyclooctane skeleton and a ring structure other than the bicyclooctane skeleton).
As the aliphatic cyclic group, a group in which one or more hydrogen atoms have been removed from a polycycloalkane such as adamantane, norbornane, isobornane, tricyclodecane or tetracyclododecane is more preferable.
It is preferable that the chain-like alkyl group has 1 to 10 carbon atoms, and specific examples thereof include a linear alkyl group such as a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group, a nonyl group, or a decyl group; and a branched alkyl group such as a 1-methylethyl group, a 1-methylpropyl group, a 2-methylpropyl group, a 1-methylbutyl group, a 2-methylbutyl group, a 3-methylbutyl group, a 1-ethylbutyl group, a 2-ethylbutyl group, a 1-methylpentyl group, a 2-methylpentyl group, a 3-methylpentyl group, or a 4-methylpentyl group.
In a case where the chain-like alkyl group is a fluorinated alkyl group having a fluorine atom or a fluorinated alkyl group as a substituent, the fluorinated alkyl group has preferably 1 to 11 carbon atoms, more preferably 1 to 8 carbon atoms, and still more preferably 1 to 4 carbon atoms. The fluorinated alkyl group may have an atom other than a fluorine atom. Examples of the atom other than a fluorine atom include an oxygen atom, a sulfur atom, and a nitrogen atom.
Rd1 represents preferably a fluorinated alkyl group in which some or all hydrogen atoms constituting a linear alkyl group have been substituted with fluorine atoms and particularly preferably a fluorinated alkyl group in which all hydrogen atoms constituting a linear alkyl group have been substituted with fluorine atoms (a linear perfluoroalkyl group).
Specific preferred examples of the anion moiety in the component (d1-1) are described below.
Cation Moiety
In Formula (d1-1), Mm+ represents an m-valent organic cation.
Examples of the organic cation as Mm+ include those for the cations represented by Formulae (ca-1) to (ca-4). Among these, the cation represented by Formula (ca-1) is more preferable, and the cations respectively represented by Formulae (ca-1-1) to (ca-1-70) are still more preferable.
The component (d1-1) may be used alone or in combination of two or more kinds thereof.
{Component (d1-2)}
Anion Moiety
In Formula (d1-2), Rd2 represents a cyclic group which may have a substituent, a chain-like alkyl group which may have a substituent, or a chain-like alkenyl group which may have a substituent, and examples thereof include the same groups as those for R′201.
Here, the carbon atom adjacent to the S atom in Rd2 has no fluorine atom bonded thereto (the carbon atom is not substituted with a fluorine atom). In this manner, the anion of the component (d-2) becomes an appropriately weak acid anion, thereby improving the quenching ability of the component (D).
It is preferable that Rd2 represents a chain-like alkyl group which may have a substituent or an aliphatic cyclic group which may have a substituent. The chain-like alkyl group has preferably 1 to 10 carbon atoms and more preferably 3 to 10 carbon atoms. As the aliphatic cyclic group, a group in which one or more hydrogen atoms have been removed from adamantane, norbornane, isobornane, tricyclodecane, or tetracyclododecane (a group which may have a substituent); and a group in which one or more hydrogen atoms have been removed from camphor are more preferable.
The hydrocarbon group as Rd2 may have a substituent, and examples of the substituent include the same groups as those for the substituent which may be included in the hydrocarbon group (such as an aromatic hydrocarbon group, an aliphatic cyclic group, or a chain-like alkyl group) as Rd1 in Formula (d1-1).
Specific preferred examples of the anion moiety in the component (d1-2) are described below.
Cation Moiety
In Formula (d1-2), M′m+ represents an m-valent organic cation and has the same definition as that for M′m+ in Formula (d1-1).
The component (d1-2) may be used alone or in combination of two or more kinds thereof.
{Component (d1-3)}
Anion Moiety
In Formula (d1-3), Rd3 represents a cyclic group which may have a substituent, a chain-like alkyl group which may have a substituent, or a chain-like alkenyl group which may have a substituent, and examples thereof include the same groups as those for R′201. Among these, a cyclic group having a fluorine atom, a chain-like alkyl group, or a chain-like alkenyl group is preferable. Among these, a fluorinated alkyl group is preferable, and the same groups as those for the fluorinated alkyl group represented by Rd1 are more preferable.
In Formula (d1-3), Rd4 represents a cyclic group which may have a substituent, a chain-like alkyl group which may have a substituent, or a chain-like alkenyl group which may have a substituent, and examples thereof include the same groups as those for R′201.
Among these, an alkyl group which may have a substituent, an alkoxy group which may have a substituent, an alkenyl group which may have a substituent, or a cyclic group which may have a substituent is preferable.
It is preferable that the alkyl group as Rd4 is a linear or branched alkyl group having 1 to 5 carbon atoms, and specific examples thereof include a methyl group, an ethyl group, a propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a tert-butyl group, a pentyl group, an isopentyl group, and a neopentyl group. Some hydrogen atoms in the alkyl group as Rd4 may be substituted with a hydroxyl group, a cyano group, or the like.
It is preferable that the alkoxy group as Rd4 is an alkoxy group having 1 to 5 carbon atoms, and specific examples of the alkoxy group having 1 to 5 carbon atoms include a methoxy group, an ethoxy group, an n-propoxy group, an iso-propoxy group, an n-butoxy group, and a tert-butoxy group. Among these, a methoxy group and an ethoxy group are preferable.
Examples of the alkenyl group as Rd4 include the same groups as those for the alkenyl group as R′201. Among these, a vinyl group, a propenyl group (an allyl group), a 1-methylpropenyl group, and a 2-methylpropenyl group are preferable. These groups may have an alkyl group having 1 to 5 carbon atoms or a halogenated alkyl group having 1 to 5 carbon atoms as a substituent.
Examples of the cyclic group as Rd4 include the same groups as those for the cyclic group as R′201. Among these, an alicyclic group in which one or more hydrogen atoms have been removed from a cycloalkane such as cyclopentane, cyclohexane, adamantane, norbornane, isobornane, tricyclodecane or tetracyclododecane or an aromatic group such as a phenyl group or a naphthyl group is preferable. In a case where Rd4 represents an alicyclic group, the resist composition is satisfactorily dissolved in an organic solvent so that the lithography characteristics are improved. Further, in a case where Rd4 represents an aromatic group, the resist composition has excellent light absorption efficiency in lithography using EUV or the like as an exposure light source, and thus the sensitivity and lithography characteristics are improved.
In Formula (d1-3), Yd1 represents a single bond or a divalent linking group.
The divalent linking group as Yd1 is not particularly limited, and examples thereof include a divalent hydrocarbon group (an aliphatic hydrocarbon group or an aromatic hydrocarbon group) which may have a substituent and a divalent linking group having a hetero atom. These divalent linking groups are the same as those for the divalent hydrocarbon group which may have a substituent and the divalent linking group having a hetero atom described in the section of the divalent linking group as Ya21 in Formula (a2-1).
It is preferable that Yd1 represents a carbonyl group, an ester bond, an amide bond, an alkylene group, or a combination of these. As the alkylene group, a linear or branched alkylene group is more preferable, and a methylene group or an ethylene group is still more preferable.
Specific preferred examples of the anion moiety in the component (d1-3) are described below.
Cation Moiety
In Formula (d1-3), Mm+ represents an m-valent organic cation and has the same definition as that for M′m+ in Formula (d1-1).
The component (d1-3) may be used alone or in combination of two or more kinds thereof.
As the component (D1), only one of the above-described components (d1-1) to (d1-3) or a combination of two or more kinds thereof may be used.
In a case where the resist composition contains the component (D1), the content of the component (D1) in the resist composition is preferably in a range of 0.5 to 20 parts by mass. more preferably in a range of 1 to 15 parts by mass, and still more preferably in a range of 5 to 10 parts by mass with respect to 100 parts by mass of the component (A).
In a case where the content of the component (D1) is greater than or equal to the lower limit of the above-described range, particularly excellent lithography characteristics and an excellent resist pattern shape are easily obtained. On the contrary, in a case where the content is less than or equal to the upper limit of the above-described range, the sensitivity can be satisfactorily maintained and the throughput is also excellent.
Method of Producing Component (D1):
The methods of producing the component (d1-1) and the component (d1-2) are not particularly limited, and these components can be produced according to known methods.
Further, the method of producing the component (d1-3) is not particularly limited, and the component (d1-3) can be produced according to the same method as disclosed in United States Patent Application, Publication No. 2012-0149916.
In Regard to Component (D2)
The component (D) may contain a nitrogen-containing organic compound component (hereinafter, referred to as a “(D2) component”) that does not correspond to the component (D1) described above.
The component (D2) is not particularly limited as long as the component functions as an acid diffusion control agent and does not correspond to the component (D1), and an optional component may be selected from known components and then used. Among the examples, an aliphatic amine is preferred, and particularly a secondary aliphatic amine and a tertiary aliphatic amine are more preferred.
The aliphatic amine is an amine containing one or more aliphatic groups, and the number of carbon atoms in the aliphatic group is preferably in a range of 1 to 12.
Examples of these aliphatic amines include amines in which at least one hydrogen atom of ammonia (NH3) has been substituted with an alkyl group or hydroxyalkyl group having 12 or less carbon atoms (alkylamines or alkylalcoholamines), and cyclic amines.
Specific examples of the alkylamines and the alkylalcoholamines include monoalkylamines such as n-hexylamine, n-heptylamine, n-octylamine, n-nonylamine, and n-decylamine; dialkylamines such as diethylamine, di-n-propylamine, di-n-heptylamine, di-n-octylamine, and dicyclohexylamine; trialkylamines such as trimethylamine, triethylamine, tri-n-propylamine, tri-n-butylamine, tri-n-pentylamine, tri-n-hexylamine, tri-n-heptylamine, tri-n-octylamine, tri-n-nonylamine, tri-n-decylamine, and tri-n-dodecylamine; and alkyl alcohol amines such as diethanolamine, triethanolamine, diisopropanolamine, triisopropanolamine, di-n-octanolamine, and tri-n-octanolamine. Among these, a trialkylamine of 5 to 10 carbon atoms is preferable, and tri-n-pentylamine and tri-n-octylamine are particularly preferable.
Examples of the cyclic amine include a heterocyclic compound having a nitrogen atom as a hetero atom. The heterocyclic compound may be a monocyclic compound (aliphatic monocyclic amine) or a polycyclic compound (aliphatic polycyclic amine).
Specific examples of the aliphatic monocyclic amine include piperidine and piperazine.
The aliphatic polycyclic amine preferably has 6 to 10 carbon atoms, and specific examples thereof include 1, 5-diazabicyclo[4.3.0]-5-nonene, 1,8-diazabicyclo[5.4.0]-7-undecene, hexamethylenetetramine, and 1,4-diazabicyclo[2.2.2]octane.
Examples of other aliphatic amines include tris(2-methoxymethoxyethyl)amine, tris{2-(2-methoxyethoxy)ethyl}amine, tris{2-(2-methoxyethoxymethoxy)ethyl}amine, tris{2-(1-methoxyethoxy)ethyl}amine, tris{2-(1-ethoxyethoxy)ethyl}amine, tris{2-(1-ethoxypropoxy)ethyl}amine, tris[2-{2-(2-hydroxyethoxy)ethoxy}ethyl]amine, and triethanolamine triacetate. Among these, triethanolamine triacetate is preferable.
As the component (D2), an aromatic amine may be used.
Examples of the aromatic amine include 4-dimethylaminopyridine, pyrrole, indole, pyrazole, imidazole, and derivatives thereof, tribenzylamine, 2,6-diisopropylaniline, and N-tert-butoxycarbonylpyrrolidine.
The component (D2) may be used alone or in combination of two or more kinds thereof.
In a case where the resist composition contains the component (D2), the content of the component (D2) in the resist composition is typically in a range of 0.01 to 5 parts by mass with respect to 100 parts by mass of the component (A). In a case where the content thereof is set to be in the above-described range, the resist pattern shape, the post exposure temporal stability, and the like are improved.
<< At Least One Compound (E) Selected from Group Consisting of Organic Carboxylic Acids, Phosphorus Oxo Acids, and Derivatives Thereof>>
For the purpose of preventing deterioration in sensitivity and improving the resist pattern shape and the post exposure temporal stability, the resist composition of the present embodiment may contain, as optional components, at least one compound (E) (hereinafter referred to as the component (E)) selected from the group consisting of organic carboxylic acids, phosphorus oxo acids, and derivatives thereof.
Examples of suitable organic carboxylic acids include acetic acid, malonic acid, citric acid, malic acid, succinic acid, benzoic acid, and salicylic acid.
Examples of phosphorus oxo acids include phosphoric acid, phosphonic acid, and phosphinic acid. Among these, phosphonic acid is particularly preferable.
Examples of the phosphorus oxo acid derivatives include esters in which a hydrogen atom in the above-described oxo acids is substituted with a hydrocarbon group.
Examples of the hydrocarbon group include an alkyl group having 1 to 5 carbon atoms and an aryl group having 6 to 15 carbon atoms.
Examples of the phosphoric acid derivatives include phosphoric acid esters such as di-n-butyl phosphate and diphenyl phosphate.
Examples of the phosphonic acid derivatives include phosphonic acid esters such as dimethyl phosphonate, di-n-butyl phosphonate, phenylphosphonic acid, diphenyl phosphonate, and dibenzyl phosphonate.
Examples of the phosphinic acid derivatives include phosphinic acid ester and phenylphosphinic acid.
In the resist composition of the present embodiment, the component (E) may be used alone or in combination of two or more kinds thereof.
In a case where the resist composition contains the component (E), the content of the component (E) is typically in a range of 0.01 to 5 parts by mass with respect to 100 parts by mass of the component (A).
<<Organic Solvent Component (S)>>
The resist composition of the present embodiment can be produced by dissolving the resist materials in an organic solvent component (hereinafter, referred to as a “component (S)”).
The component (S) may be any organic solvent which can dissolve the respective components to be used to obtain a uniform solution, and an optional organic solvent can be appropriately selected from those which have been known as solvents of a chemically amplified resist composition and then used.
Examples of the component (S) include lactones such as γ-butyrolactone; ketones such as acetone, methyl ethyl ketone, cyclohexanone, methyl-n-pentyl ketone, methyl isopentyl ketone, and 2-heptanone; polyhydric alcohols such as ethylene glycol, diethylene glycol, propylene glycol, and dipropylene glycol; compounds having an ester bond, such as ethylene glycol monoacetate, diethylene glycol monoacetate, propylene glycol monoacetate, and dipropylene glycol monoacetate; polyhydric alcohol derivatives of compounds having an ether bond such as monoalkyl ether or monophenyl ether, such as monomethylether, monoethylether, monopropylether, or monobutylether of polyhydric alcohols or compounds having an ester bond [among these, propylene glycol monomethyl ether acetate (PGMEA) and propylene glycol monomethyl ether (PGME) are preferable]; cyclic ethers such as dioxane; esters such as methyl lactate, ethyl lactate (EL), methyl acetate, ethyl acetate, butyl acetate, methyl pyruvate, ethyl pyruvate, methyl methoxypropionate, and ethyl ethoxypropionate; aromatic organic solvents such as anisole, ethylbenzylether, cresylmethylether, diphenylether, dibenzylether, phenetole, butylphenylether, ethylbenzene, diethylbenzene, pentylbenzene, isopropylbenzene, toluene, xylene, cymene, and mesitylene; and dimethylsulfoxide (DMSO).
In the resist composition of the present embodiment, the component (S) may be used alone or in the form of a mixed solvent of two or more kinds thereof. Among these, PGMEA, PGME, γ-butyrolactone, EL, or cyclohexanone is preferable.
Further, a mixed solvent obtained by mixing PGMEA with a polar solvent is also preferable as the component (S). The blending ratio (mass ratio) of the mixed solvent can be appropriately determined in consideration of the compatibility between PGMEA and the polar solvent, but is preferably in the range of 1:9 to 9:1 and more preferably in a range of 2:8 to 8:2.
More specifically, in a case where EL or cyclohexanone is blended as the polar solvent, the mass ratio of PGMEA to EL or cyclohexanone is preferably in a range of 1:9 to 9:1 and more preferably in a range of 2:8 to 8:2. Further, in a case where PGME is blended as the polar solvent, the mass ratio of PGMEA to PGME is preferably in a range of 1:9 to 9:1, more preferably in a range of 2:8 to 8:2, and still more preferably in a range of 3:7 to 7:3. Further, a mixed solvent of PGMEA, PGME, and cyclohexanone is also preferable.
Further, a mixed solvent of γ-butyrolactone and at least one selected from PGMEA and EL is also preferable as the component (S). In this case, as the mixing ratio, the mass ratio between the former and the latter is preferably in a range of 70:30 to 95:5.
The amount of the component (S) to be used is not particularly limited and is appropriately set to have a concentration which enables coating a substrate or the like depending on the thickness of the coated film. The component (S) is typically used in an amount such that the solid content concentration of the resist composition is set to be in a range of 0.1% to 20% by mass and preferably in a range of 0.2% to 15% by mass.
As desired, miscible additives such as additive resins, dissolution inhibitors, plasticizers, stabilizers, colorants, halation prevention agents, and dyes for improving the performance of the resist film can be added to the resist composition of the present embodiment, as appropriate.
After the resist material is dissolved in the component (S), impurities may be removed from the resist composition of the present embodiment using a porous polyimide film, a porous polyamideimide film, or the like. For example, the resist composition may be filtered using a filter formed of a porous polyimide film, a filter formed of a porous polyamideimide film, a filter formed of a porous polyimide film and a porous polyamideimide film, or the like. Examples of the porous polyimide film and the porous polyamideimide film include those described in Japanese Unexamined Patent Application, First Publication No. 2016-155121.
The resist composition according to the present embodiment contains the component (A), the component (F), and optional components as necessary.
Suitable examples thereof include a resist composition containing the component (A), the component (F), and the component (B). Suitable examples thereof include a resist composition containing the component (A), the component (F), the component (B), and the component (D).
As described above, the resist composition of the present embodiment contains the specific components (A) and (F). The component (A) contains a polymer compound having a constitutional unit (a01) that contains an acid dissociable group having high solubility in a developing solution and high reactivity with an acid. The component (F) contains a fluororesin component having a constitutional unit (f10) with a high surface segregation effect and a high affinity for a developing solution. Therefore, according to the resist composition of the present embodiment, the diffusion of an acid can be satisfactorily controlled, and the affinity for a developing solution can be improved.
Therefore, it is assumed that all the sensitivity, the property of reducing the roughness, and the resolution are excellent in the resist composition of the present embodiment, and thus a resist pattern with an excellent shape can be formed.
(Method of Forming Resist Pattern)
The method of forming a resist pattern according to the second embodiment of the present invention includes a step of forming a resist film on a support using the resist composition of the embodiment; a step of exposing the resist film; and a step of developing the exposed resist film to form a resist pattern.
According to the embodiment of the method of forming a resist pattern, a method of forming a resist pattern by performing processes as described below is exemplified.
First, a support is coated with the resist composition of the present embodiment using a spinner or the like, and a bake (post applied bake (PAB)) treatment is performed under a temperature condition of 80° C. to 150° C. for 40 to 120 seconds and preferably 60 to 90 seconds to form a resist film.
Next, the resist film is selectively exposed by performing exposure through a mask (mask pattern) on which a predetermined pattern has been formed or performing drawing by direct irradiation with electron beams without a mask pattern using an exposure device such as an electron beam drawing device or an EUV exposure device, and a bake (post exposure bake (PEB)) treatment is performed under a temperature condition of 80° C. to 150° C. for 40 to 120 seconds and preferably 60 to 90 seconds.
Next, the resist film is subjected to a developing treatment. The developing treatment is conducted using an alkali developing solution in a case of an alkali developing process and using a developing solution containing an organic solvent (organic developing solution) in a case of a solvent developing process.
After the developing treatment, it is preferable to conduct a rinse treatment. As the rinse treatment, water rinsing using pure water is preferable in a case of the alkali developing process, and rinsing using a rinse solution containing an organic solvent is preferable in a case of the solvent developing process.
In a case of the solvent developing process, after the developing treatment or the rinse treatment, the developing solution or the rinse solution attached onto the pattern may be removed by a treatment using a supercritical fluid.
After the developing treatment or the rinse treatment, drying is conducted. As desired, a bake treatment (post bake) may be conducted after the developing treatment.
In this manner, a resist pattern can be formed.
The support is not particularly limited and a known support of the related art can be used, and examples thereof include a substrate for an electronic component and a substrate on which a predetermined wiring pattern has been formed. Specific examples thereof include a metal substrate such as a silicon wafer, copper, chromium, iron, or aluminum; and a glass substrate. As the materials of the wiring pattern, copper, aluminum, nickel, or gold can be used.
Further, as the support, any one of the above-described supports provided with an inorganic and/or organic film on the above-described substrate may be used. As the inorganic film, an inorganic antireflection film (inorganic BARC) can be used. As the organic film, an organic film such as an organic antireflection film (organic BARC) or a lower-layer organic film used in a multilayer resist method can be used.
Here, the multilayer resist method is a method of providing at least one layer of an organic film (lower-layer organic film) and at least one layer of a resist film (upper-layer resist film) on a substrate and performing patterning of the lower-layer organic film using a resist pattern formed on the upper-layer resist film as a mask, and this method is considered to enable formation of a pattern with a high aspect ratio. That is, according to the multilayer resist method, since a desired thickness can be ensured by the lower-layer organic film, the thickness of the resist film can be reduced, and a fine pattern with a high aspect ratio can be formed.
The multilayer resist method is classified into a method in which a double-layer structure consisting of an upper-layer resist film and a lower-layer organic film is formed (two-layer resist method), and a method in which a multilayer structure having at least three layers consisting of an upper-layer resist film, a lower-layer organic film, and at least one intermediate layer (thin metal film or the like) provided between the upper-layer resist film and the lower-layer organic film (three-layer resist method).
The wavelength to be used for exposure is not particularly limited and the exposure can be conducted using radiation such as an ArF excimer laser, a KrF excimer laser, an F2 excimer laser, extreme ultraviolet (EUV) rays, vacuum ultraviolet rays (VUV), electron beams (EB), X-rays, and soft X-rays. The resist composition is useful for a KrF excimer laser, an ArF excimer laser, EB, and EUV, more useful for an ArF excimer laser, EB, and EUV, and particularly useful for EB and EUV. That is, the method of forming a resist pattern according to the present embodiment is a method particularly useful in a case where the step of exposing the resist film includes a process of exposing the resist film to extreme ultraviolet (EUV) rays or electron beams (EB).
The exposure of the resist film can be a general exposure (dry exposure) conducted in air or an inert gas such as nitrogen, or liquid immersion exposure (liquid immersion lithography).
The liquid immersion exposure is an exposure method in which the region between the resist film and the lens at the lowermost position of the exposure device is filled with a solvent (liquid immersion medium) in advance that has a larger refractive index than the refractive index of air, and the exposure (immersion exposure) is conducted in this state.
As the liquid immersion medium, a solvent which has a refractive index larger than the refractive index of air but smaller than the refractive index of the resist film to be exposed is preferable. The refractive index of such a medium is not particularly limited as long as the refractive index is in the above-described range.
Examples of the solvent which has a refractive index that is larger than the refractive index of air but smaller than the refractive index of the resist film include water, a fluorine-based inert liquid, a silicon-based solvent, and a hydrocarbon-based solvent.
Specific examples of the fluorine-based inert liquid include a liquid containing a fluorine-based compound such as C3HCl2 F5, C4F9OCH3, C4F9OC2H5, or C5H3F7 as a main component, and a liquid with a boiling point of 70° C. to 180° C. is preferable and a liquid with a boiling point of 80° C. to 160° C. is more preferable. A fluorine-based inert liquid having a boiling point in the above-described range is preferable from the viewpoint that a medium used for liquid immersion can be removed using a simple method after completion of exposure.
As the fluorine-based inert liquid, a perfluoroalkyl compound in which all hydrogen atoms in the alkyl group have been substituted with fluorine atoms is particularly preferable. Specific examples of the perfluoroalkyl compound include a perfluoroalkylether compound and a perfluoroalkylamine compound.
Further, specific examples of the perfluoroalkylether compound include perfluoro(2-butyl-tetrahydrofuran) (boiling point of 102° C.), and specific examples of the perfluoroalkylamine compound include perfluorotributylamine (boiling point of 174° C.).
As the liquid immersion medium, water is preferable from the viewpoints of the cost, the safety, the environmental issues, and the versatility.
As the alkali developing solution used for the developing treatment in the alkali developing process, a 0.1 to 10 mass % tetramethylammonium hydroxide (TMAH) aqueous solution is exemplified.
The organic solvent contained in the organic developing solution used for the developing treatment in the solvent developing process may be any solvent that is capable of dissolving the component (A) (the component (A) before exposure) and can be appropriately selected from known organic solvents. Specific examples thereof include a polar solvent such as a ketone-based solvent, an ester-based solvent, an alcohol-based solvent, a nitrile-based solvent, an amide-based solvent, and an ether-based solvent, and a hydrocarbon solvent.
The ketone-based solvent is an organic solvent containing C—C(═O)—C in the structure thereof. The ester-based solvent is an organic solvent containing C—C(═O)—O—C in the structure thereof. The alcohol-based solvent is an organic solvent containing an alcoholic hydroxyl group in the structure thereof. The “alcoholic hydroxyl group” indicates a hydroxyl group bonded to a carbon atom of an aliphatic hydrocarbon group. The nitrile-based solvent is an organic solvent containing a nitrile group in the structure thereof. The amide-based solvent is an organic solvent containing an amide group in the structure thereof. The ether-based solvent is an organic solvent containing C—O—C in the structure thereof.
Some organic solvents have a plurality of the functional groups which characterize each of the solvents in the structure thereof. In such a case, the organic solvents are considered to correspond to all the solvents containing the functional groups. For example, diethylene glycol monomethylether corresponds to both the alcohol-based solvent and the ether-based solvent which have been classified above.
The hydrocarbon-based solvent is a hydrocarbon solvent which is formed of a hydrocarbon that may be halogenated and does not have a substituent other than halogen atoms. Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom. Among these, a fluorine atom is preferable.
Among the examples, as the organic solvent contained in the organic developing solution, a polar solvent is preferable. Further, a ketone solvent, an ester solvent, and a nitrile solvent are preferable.
Examples of the ketone-based solvent include 1-octanone, 2-octanone, 1-nonanone, 2-nonanone, acetone, 4-heptanone, 1-hexanone, 2-hexanone, diisobutyl ketone, cyclohexanone, methylcyclohexanone, phenylacetone, methyl ethyl ketone, methyl isobutyl ketone, acetylacetone, acetonylacetone, ionone, diacetonylalcohol, acetylcarbinol, acetophenone, methyl naphthyl ketone, isophorone, propylenecarbonate, γ-butyrolactone, and methyl amyl ketone (2-heptanone). Among these examples, methyl amyl ketone (2-heptanone) is preferable as the ketone-based solvent.
Examples of the ester-based solvent include methyl acetate, butyl acetate, ethyl acetate, isopropyl acetate, amyl acetate, isoamyl acetate, ethyl methoxyacetate, ethyl ethoxyacetate, ethylene glycol monoethyl ether acetate, ethylene glycol monopropyl ether acetate, ethylene glycol monobutyl ether acetate, ethylene glycol monophenyl ether acetate, diethylene glycol monomethyl ether acetate, diethylene glycol monopropyl ether acetate, diethylene glycol monophenyl ether acetate, diethylene glycol monobutyl ether acetate, diethylene glycol monoethyl ether acetate, 2-methoxybutyl acetate, 3-methoxybutyl acetate, 4-methoxybutyl acetate, 3-methyl-3-methoxybutyl acetate, 3-ethyl-3-methoxybutyl acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, 2-ethoxybutyl acetate, 4-ethoxybutyl acetate, 4-propoxybutyl acetate, 2-methoxypentyl acetate, 3-methoxypentyl acetate, 4-methoxypentyl acetate, 2-methyl-3-methoxypentyl acetate, 3-methyl-3-methoxypentyl acetate, 3-methyl-4-methoxypentyl acetate, 4-methyl-4-methoxypentyl acetate, propylene glycol diacetate, methyl formate, ethyl formate, butyl formate, propyl formate, ethyl lactate, butyl lactate, propyl lactate, ethyl carbonate, propyl carbonate, butyl carbonate, methyl pyruvate, ethyl pyruvate, propyl pyruvate, butyl pyruvate, methyl acetoacetate, ethyl acetoacetate, methyl propionate, ethyl propionate, propyl propionate, isopropyl propionate, methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate, methyl-3-methoxypropionate, ethyl-3-methoxypropionate, ethyl-3-ethoxypropionate, and propyl-3-methoxypropionate. Among these examples, butyl acetate is preferable as the ester-based solvent.
Examples of the nitrile-based solvent include acetonitrile, propionitrile, valeronitrile, and butyronitrile.
Known additives can be blended into the organic developing solution as desired. Examples of the additive include a surfactant. The surfactant is not particularly limited, and for example, an ionic or non-ionic fluorine-based and/or silicon-based surfactant can be used. As the surfactant, a non-ionic surfactant is preferable, and a non-ionic fluorine-based surfactant or a non-ionic silicon-based surfactant is more preferable.
In a case where a surfactant is blended into the solution, the amount of the surfactant to be blended is typically in a range of 0.001% to 5% by mass, preferably in a range of 0.005% to 2% by mass, and more preferably in a range of 0.01% to 0.5% by mass with respect to the total amount of the organic developing solution.
The developing treatment can be performed according to a known developing method, and examples thereof include a method of immersing a support in a developing solution for a certain time (a dip method), a method of raising a developing solution on the surface of a support using the surface tension and maintaining the state for a certain time (a puddle method), a method of spraying a developing solution to the surface of a support (spray method), and a method of continuously ejecting a developing solution onto a support rotating at a certain rate while scanning a developing solution ejection nozzle at a certain rate (dynamic dispense method).
As the organic solvent contained in the rinse solution used for the rinse treatment after the developing treatment in the solvent developing process, a solvent that is unlikely to dissolve a resist pattern can be appropriately selected from the organic solvents exemplified as the organic solvent used in the organic developing solution and then used. Typically, at least one solvent selected from a hydrocarbon-based solvent, a ketone-based solvent, an ester-based solvent, an alcohol-based solvent, an amide-based solvent, and an ether-based solvent is used. Among these, at least one solvent selected from a hydrocarbon-based solvent, a ketone-based solvent, an ester-based solvent, an alcohol-based solvent, and an amide-based solvent is preferable, at least one solvent selected from an alcohol-based solvent and an ester-based solvent is more preferable, and an alcohol-based solvent is particularly preferable.
As the alcohol-based solvent used in the rinse solution, a monohydric alcohol having 6 to 8 carbon atoms is preferable, and the monohydric alcohol may be linear, branched, or cyclic. Specific examples thereof include 1-hexanol, 1-heptanol, 1-octanol, 2-hexanol, 2-heptanol, 2-octanol, 3-hexanol, 3-heptanol, 3-octanol, 4-octanol, and benzyl alcohol. Among these, 1-hexanol, 2-heptanol, and 2-hexanol are preferable, and 1-hexanol and 2-hexanol are more preferable.
These organic solvents may be used alone or in combination of two or more kinds thereof. Further, an organic solvent other than the above-described solvents and water may be mixed and used. However, in consideration of the development characteristics, the amount of water to be blended into the rinse solution is preferably 30% by mass or less, more preferably 10% by mass or less, still more preferably 5% by mass or less, and particularly preferably 3% by mass or less with respect to the total amount of the rinse solution.
A known additive can be blended into the rinse solution as necessary. Examples of the additive include a surfactant. As the surfactant, the same surfactants as those described above can be exemplified. Among these, a non-ionic surfactant is preferable, and a non-ionic fluorine-based surfactant or a non-ionic silicon-based surfactant is more preferable.
In a case where a surfactant is blended into the solution, the amount of the surfactant to be blended is typically in a range of 0.001% to 5% by mass, preferably in a range of 0.005% to 2% by mass, and more preferably in a range of 0.01% to 0.5% by mass with respect to the total amount of the rinse solution.
The rinse treatment carried out using a rinse solution (washing treatment) can be performed according to a known rinse method. Examples of the method of performing the rinse treatment include a method of continuously ejecting a rinse solution onto a support rotating at a certain rate (rotary coating method), a method of immersing a support in a rinse solution for a certain time (dip method), and a method of spraying a rinse solution to the surface of a support (spray method).
According to the method of forming a resist pattern of the present embodiment described above, since the resist composition according to the first embodiment described above is used, a resist pattern with an excellent shape in which the sensitivity, the property of reducing the roughness, and the resolution are excellent can be formed.
Hereinafter, the present invention will be described in more detail based on examples, but the present invention is not limited to these examples.
Each copolymer was synthesized by radical polymerization using the compounds shown below at a predetermined molar ratio.
For each of the obtained copolymers, the copolymer composition ratio (the proportion (molar ratio) of each constitutional unit in the copolymer) of the copolymer acquired by 13C-NMR, and the weight-average molecular weight (Mw) in terms of standard polystyrene and the molecular weight dispersity (Mw/Mn) acquired by GPC measurement are listed in Table 1.
The constitutional unit represented by Chemical Formula (a10-1) which constitutes the above-described copolymer is a constitutional unit derived from a monomer represented by Chemical Formula (a10-1pre).
Each copolymer was synthesized by radical polymerization using the compounds shown below at a predetermined molar ratio.
For each of the obtained copolymers, the copolymer composition ratio (the proportion (molar ratio) of each constitutional unit in the copolymer) of the copolymer acquired by 13C-NMR, and the weight-average molecular weight (Mw) in terms of standard polystyrene and the molecular weight dispersity (Mw/Mn) acquired by GPC measurement are listed in Tables 2 and 3.
<Preparation of Resist Composition>
Respective components listed in Tables 4 to 8 were mixed and dissolved to prepare each resist composition (solid content concentration of 1.0% by mass) of each example.
In Tables 4 to 8, each abbreviation has the following meaning. The numerical values in the parentheses are blending amounts (parts by mass).
(A1)-1 to (A1)-11: Polymer compounds respectively represented by Chemical Formulae (A1-1) to (A1-11).
(A2)-1: A polymer compound represented by Chemical Formula (A2-1).
(F1)-1 to (F1)-28: Polymer compounds respectively represented by Chemical Formulae (F1-1) to (F1-28).
(F2)-1: A polymer compound represented by Chemical Formula (F2-1). The mass average molecular weight (Mw) in terms of standard polystyrene which had been acquired by GPC measurement was 17100, and the molecular weight dispersity (Mw/Mn) was 1.72.
(F2)-2: A polymer compound represented by Chemical Formula (F2-2). The mass average molecular weight (Mw) in terms of standard polystyrene which had been acquired by GPC measurement was 17200, and the molecular weight dispersity (Mw/Mn) was 1.70.
(B)-1: An acid generator formed of a compound represented by Chemical Formula (B1-1).
(D)-1: A photodecomposable base formed of a compound represented by Chemical Formula (D1-1).
(S)-1: γ-Butyrolactone
(S)-2: A mixed solvent of propylene glycol monomethyl ether acetate and propylene glycol monomethyl ether at a mass ratio of 60/40
<Formation of Resist Pattern>
An 8-inch silicon substrate to which a hexamethyldisilazane (HMDS) had been applied was coated with the resist composition of each example using a spinner, and a prebake (PAB) treatment was performed thereon on a hot plate at a temperature of 110° C. for 60 seconds so that the composition was dried, thereby forming a resist film having a film thickness of 30 nm.
Next, drawing (exposing) was performed on the resist film at an accelerating voltage of 100 kV such that the target size was set to a 1:1 line and space pattern with a line width of 50 nm to 26 nm (hereinafter, referred to as an “LS pattern”) using an electron beam lithography device JEOL-JBX-9300FS (manufactured by JEOL Ltd.). Thereafter, a post exposure bake (PEB) treatment was performed thereon at 110° C. for 60 seconds.
Subsequently, alkali development was performed at 23° C. for 60 seconds using a 2.38 mass % tetramethylammonium hydroxide (TMAH) aqueous solution “NMD-3” (trade name, manufactured by TOKYO OHKA KOGYO CO., LTD.).
Thereafter, water rinsing was performed for 15 seconds using pure water.
As the result, a 1:1 LS pattern with a line width of 50 nm to 26 nm was formed.
[Evaluation of Optimum Exposure Amount (Eop)]
An optimum exposure amount Eop (μC/cm2) at which the LS pattern with a target size was formed according to the method in the section of “formation of resist pattern” was acquired. The results are listed in Tables 9 to 13 in the columns of “EoP (μC/cm2)”.
[Evaluation of Resolution]
An optimum exposure amount Eop (μC/cm2) at which the LS pattern with a target size was formed according to the method in the section of “formation of resist pattern” was acquired. In addition, the minimum dimension of a pattern (line width) to be resolved without collapsing while the exposure amount from the optimum exposure amount Eop was increased to form an LS pattern was acquired using a scanning electron microscope S-9380 (manufactured by Hitachi High-Technologies Corporation). The results are listed in Tables 9 to 13 in the columns of “resolution (nm)”.
[Evaluation of Line Width Roughness (LWR)]
Using the LS pattern formed in the section of the “formation of resist pattern”, the 3σ which is the scale that indicates the LWR was acquired. The results are listed in Tables 9 to 13 in the columns of “LWR (nm)”.
The “3σ” indicates three times (3σ) (unit: nm) the standard deviation (σ) acquired based on the result of measurement performed by measuring 400 sites of line positions in the longitudinal direction of the line using a scanning electron microscope (trade name: S-9380, manufactured by Hitachi High-Technologies Corporation, accelerating voltage of 800 V).
In a case where the value of the 3σ is small, this indicates that the roughness of a line side wall is small and an LS pattern with a uniform width is obtained.
[Evaluation of Resist Pattern Shape]
In the <formation of resist pattern>, the cross-sectional shape of each of the obtained LS patterns was observed with a scanning electron microscope (trade name: SU8000, manufactured by Hitachi High-Technologies Corporation, accelerating voltage of 300 V). The shape was evaluated according to the following evaluation criteria. The results are listed in the columns of “shape” of Tables 9 to 13.
A: The cross-sectional shape of the pattern is rectangular and has high perpendicularity.
B: The cross-sectional shape of the pattern is top rounding (the top of the pattern is round) and is a T-top shape.
From the results listed in Tables 9 to 13, it was confirmed that the resist compositions of Examples 1 to 43 enable an increase of the sensitivity, have excellent lithography characteristics, and enable formation of a resist pattern with an excellent shape as compared with the resist compositions of Comparative Examples 1 to 6. While preferred embodiments of the invention have been described and illustrated above, it should be understood that these are exemplary of the invention and are not to be considered as limiting. Additions, omissions, substitutions, and other modifications can be made without departing from the spirit or scope of the present invention. Accordingly, the invention is not to be considered as being limited by the foregoing description, and is only limited by the scope of the appended claims.
| Number | Date | Country | Kind |
|---|---|---|---|
| 2019-117448 | Jun 2019 | JP | national |
